JPH09270331A - Electronic part - Google Patents

Electronic part

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Publication number
JPH09270331A
JPH09270331A JP10370296A JP10370296A JPH09270331A JP H09270331 A JPH09270331 A JP H09270331A JP 10370296 A JP10370296 A JP 10370296A JP 10370296 A JP10370296 A JP 10370296A JP H09270331 A JPH09270331 A JP H09270331A
Authority
JP
Japan
Prior art keywords
layer
conductor
electronic component
insulating resin
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10370296A
Other languages
Japanese (ja)
Inventor
Kazuya Kimura
一弥 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokin Corp
Original Assignee
Tokin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokin Corp filed Critical Tokin Corp
Priority to JP10370296A priority Critical patent/JPH09270331A/en
Publication of JPH09270331A publication Critical patent/JPH09270331A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide an electronic part which is easy to produce, has desired characteristic which blocks water content from penetrating into inner conductor layers and has a high reliability. SOLUTION: This device has a laminate composed of alternately laminated insulation resin layers 13a-13d and conductor layers 14a-14c on an insulation substrate 11. The uppermost layer of the laminate 12 is an insulation resin layer 13d. The first conductor layer 14c, the uppermost one of the conductor layers, has a conductor pattern connected to leading electrodes 1b of the second upper layer 14b through through-holes 18 of the first resin layer 13c inserted therebetween, leading electrodes 1c, 2c of the pattern 14c are connected to those 1b, 2b of a 2nd electrode layer through second through-holes 15b, 16b of the resin layer 13c, exposed in a direction perpendicular to the laminating direction from the uppermost resin layer 13d and extend to the side face of the laminate, and the interface between leading electrodes 1c, 2c of the first pattern 14c and first resin or less 13c is sealed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は,電子部品に関し,
詳しくは,インダクタ(L),キャパシタ(C),電気
抵抗素子(R),薄膜EMIフィルタ,コモンモードチ
ョークコイル,カレントセンサ,信号用トランス,及び
これらを一つの部品に構成した複合電子部品等の表面実
装部品もしくはリード部品である電子部品に関する。
TECHNICAL FIELD The present invention relates to an electronic component,
Specifically, inductors (L), capacitors (C), electric resistance elements (R), thin film EMI filters, common mode choke coils, current sensors, signal transformers, and composite electronic parts that combine these into one part The present invention relates to surface mount components or electronic components that are lead components.

【0002】[0002]

【従来の技術】従来,図7に示される電子部品が知られ
ている(特開平3−201417号公報参照)。この電
子部品は,絶縁基板101上に,ポリイミド樹脂からな
る絶縁樹脂層102およびスパッタ法によって形成され
たTi,Ti−Ag,Agからなる内部導体パターン1
03,104を交互に積層させ,絶縁樹脂層102の端
部を取り除くことによって最上部の導体パターン104
の端部を,露出させて電子部品100を形成している。
2. Description of the Related Art Conventionally, an electronic component shown in FIG. 7 has been known (see Japanese Patent Laid-Open No. 3-201417). This electronic component includes an insulating resin layer 102 made of a polyimide resin on an insulating substrate 101 and an internal conductor pattern 1 made of Ti, Ti-Ag, Ag formed by a sputtering method.
03 and 104 are alternately laminated and the end portion of the insulating resin layer 102 is removed so that the uppermost conductor pattern 104 is formed.
The end portion of is exposed to form the electronic component 100.

【0003】尚,導体パターン104の端部に接続する
ように端子下地部を電子部品100の側面に形成し,こ
の端子下地を覆うように,電子部品本体の上面端部か
ら,側面を介して下面端部に至る外部電極端子部を形成
して用いられている。
A terminal base portion is formed on a side surface of the electronic component 100 so as to be connected to an end portion of the conductor pattern 104, and the terminal base portion is covered from the upper end portion of the electronic component body through the side surface. The external electrode terminal portion reaching the lower end portion is formed and used.

【0004】[0004]

【発明が解決しようとする課題】しかしながら,上記電
子部品を,絶縁基板上に絶縁樹脂層と導体パターンとを
交互に積層して構成する場合,絶縁樹脂層と導体パター
ンとの界面の密着性が最も弱いことから,内部導体パタ
ーンから外部に引き出す引き出し部を介して水分や湿気
が侵入し,特性を変化させたり,品質を著しく悪化させ
ていた。
However, when the above electronic component is constructed by alternately laminating the insulating resin layer and the conductor pattern on the insulating substrate, the adhesiveness of the interface between the insulating resin layer and the conductor pattern is improved. Since it was the weakest, moisture and humidity entered through the lead-out portion that was pulled out from the internal conductor pattern, changing the characteristics and significantly deteriorating the quality.

【0005】さらに,外部電極端子を設けるには,通
常,めっき工程を有するが,めっきの際に,めっき液が
侵入し,導体パターンを腐食させるおそれがあった。
Further, although a plating step is usually required to provide the external electrode terminals, there is a risk that the plating solution may enter during the plating to corrode the conductor pattern.

【0006】したがって,電子部品の露出した界面をメ
タル層で封止することも考えられるが,工程数の増加を
もたらし,コスト高に繋がる。
Therefore, it may be possible to seal the exposed interface of the electronic component with a metal layer, but this leads to an increase in the number of steps and an increase in cost.

【0007】そこで,本発明の技術的課題は,製造が容
易であるとともに,所望する特性を備えた信頼性の高い
電子部品を提供することにある。
Therefore, a technical object of the present invention is to provide a highly reliable electronic component which is easy to manufacture and has desired characteristics.

【0008】[0008]

【課題を解決するための手段】本発明によれば,絶縁基
板と,前記絶縁基板上に複数の絶縁樹脂層と複数の導体
層とを交互に積層した積層体と,前記導体層中の導体パ
ターンの引き出し電極部に接続され,前記積層体の側面
から前記絶縁基板の側面に渡って形成された外部電極端
子部とを備えた電子部品において,前記積層体の内最上
層のものは,絶縁樹脂層であり,前記複数の導体層の内
の上層から一つ目の第1の導体層中の導体パターンは、
上層から2つ目の第2の導体層中の導体パターンの引き
出し電極部に、これらの間に介在する絶縁樹脂層に設け
られた第1の貫通孔を介して接続され,前記第1の導体
層の引き出し電極部は,前記第2の導体層の引き出し電
極部に、前記第1および第2の導体層の間に介在する絶
縁樹脂層に設けられた第2の貫通孔を介して接続されて
おり、前記第1の導体層の前記引き出し電極部は、前記
最上層の絶縁樹脂層から積層方向に直角の方向に露出し
て,前記積層体の側面まで延在していることを特徴とす
る電子部品が得られる。
According to the present invention, an insulating substrate, a laminate in which a plurality of insulating resin layers and a plurality of conductor layers are alternately laminated on the insulating substrate, and a conductor in the conductor layer In the electronic component, which is connected to the extraction electrode portion of the pattern and has an external electrode terminal portion formed from the side surface of the laminated body to the side surface of the insulating substrate, one of the uppermost layers of the laminated body is an insulating material. A conductor pattern in the first conductor layer, which is a resin layer and is the first from the upper layers of the plurality of conductor layers,
The first conductor is connected to the lead electrode portion of the conductor pattern in the second conductor layer which is the second layer from the upper layer, through the first through hole provided in the insulating resin layer interposed therebetween. The lead electrode portion of the layer is connected to the lead electrode portion of the second conductor layer through a second through hole provided in the insulating resin layer interposed between the first and second conductor layers. The lead-out electrode portion of the first conductor layer is exposed from the uppermost insulating resin layer in a direction perpendicular to the stacking direction and extends to the side surface of the stack. An electronic component that operates is obtained.

【0009】また、本発明によれば、前記絶縁樹脂層の
内の少なくとも一層は,実質的にベンゾシクロブテンで
構成され得る。
Further, according to the present invention, at least one of the insulating resin layers may be substantially composed of benzocyclobutene.

【0010】また、前記導体層は,導電金属膜からなる
下地層と前記下地層上に電解めっきによって形成された
Cuめっき膜で構成され得る。
The conductor layer may be composed of a base layer made of a conductive metal film and a Cu plating film formed on the base layer by electrolytic plating.

【0011】さらにまた、前記下地層は,スパッタによ
り形成されたTi又はCr膜から構成され得る。
Furthermore, the underlayer may be composed of a Ti or Cr film formed by sputtering.

【0012】[0012]

【発明の実施の形態】以下,本発明の実施の形態につい
て図面を参照して説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0013】図1は本発明の実施の形態による電子部品
の要部を示す部分断面図である。図1に示すように,電
子部品は,電子部品本体10を備えている。電子部品本
体10は,絶縁基板11と,この絶縁基板11上に形成
された積層体12とから構成されている。積層体12
は、絶縁樹脂層13a、13b、13c、13dおよび
導体層14a、14b、14c、が交互に積層してな
る。
FIG. 1 is a partial cross-sectional view showing an essential part of an electronic component according to an embodiment of the present invention. As shown in FIG. 1, the electronic component includes an electronic component body 10. The electronic component body 10 includes an insulating substrate 11 and a laminated body 12 formed on the insulating substrate 11. Laminate 12
The insulating resin layers 13a, 13b, 13c, 13d and the conductor layers 14a, 14b, 14c are alternately laminated.

【0014】各導体層には、導体パターン引き出し用と
して,両端部付近に引き出し電極部1a,1b,1c,
2a,2b,2cを備えている。
Each of the conductor layers has lead electrode portions 1a, 1b, 1c, and
2a, 2b, 2c are provided.

【0015】引き出し電極部1a,1b,1cは,貫通
穴15a,15bを介して互いに接続されており,ま
た,引き出し電極2a,2b,2cは貫通孔16a,1
6bを介して互いに接続されている。
The lead electrode portions 1a, 1b, 1c are connected to each other through the through holes 15a, 15b, and the lead electrodes 2a, 2b, 2c are connected to the through holes 16a, 1c.
They are connected to each other via 6b.

【0016】また、上から1番目の導体層14cの導体
パターンは、上から2番目の引出し電極1bに、両者の
間の絶縁樹脂層13cに設けた貫通孔18を介して接続
されている。
The conductor pattern of the first conductor layer 14c from the top is connected to the second lead electrode 1b from the top through a through hole 18 provided in the insulating resin layer 13c between them.

【0017】また,引き出し電極部1c,引き出し電極
部2cは,切欠部15c,16cを介して,積層体12
の側面に至っている。
The lead-out electrode portion 1c and the lead-out electrode portion 2c are provided with the laminated body 12 through the notches 15c and 16c.
Has reached the side.

【0018】この構造による時は、第1の導体パターン
14cの引き出し電極部1c,2cと前記第1の絶縁樹
脂層13cとの界面が最上層の絶縁樹脂層13dおよび
第1の導体パターン14c自身で封止されているので、
外部から水分やめっき液が浸透することが効果的に阻止
される。
With this structure, the interface between the lead electrode portions 1c and 2c of the first conductor pattern 14c and the first insulating resin layer 13c is the uppermost insulating resin layer 13d and the first conductor pattern 14c itself. Since it is sealed with
Permeation of water or plating solution from the outside is effectively prevented.

【0019】絶縁基板としては、快削性の良好なセラミ
ックを用いると良い。また、絶縁樹脂層13a、13
b、13c、13dは、紫外線感光性のベンゾシクロブ
テン樹脂(BCB)を用いている。
As the insulating substrate, it is preferable to use a ceramic having a good free-cutting property. In addition, the insulating resin layers 13a, 13
For b, 13c, and 13d, an ultraviolet-sensitive benzocyclobutene resin (BCB) is used.

【0020】図2乃至図4は、図1における各絶縁樹脂
層及び各導体層を形成する方法を模式的に示した図であ
る。
2 to 4 are schematic views showing a method of forming each insulating resin layer and each conductor layer in FIG.

【0021】図2を参照して、セラミックス基板(図示
せず)をアセトン、メタノール等で洗浄した後、必要な
ら、図2(a)に示すように、逆スパッタを行って洗浄
し、その上に、スパッタ法によって、Ti膜及びその上
に形成したCu膜からなる下地パターン層3をスパッタ
形成する。図2(b)は下地層21を一面に形成した絶
縁樹脂層13aを示している。図2(b)において、T
i膜は、厚さ0.05μm、Cu膜は、厚さ0.25〜
0.3μmである。
Referring to FIG. 2, a ceramic substrate (not shown) is washed with acetone, methanol, or the like, and if necessary, reverse sputtering is performed to wash it, and then, as shown in FIG. Then, the underlying pattern layer 3 made of a Ti film and a Cu film formed thereon is formed by sputtering by sputtering. FIG. 2B shows the insulating resin layer 13a on which the underlayer 21 is formed. In FIG. 2B, T
The i film has a thickness of 0.05 μm, and the Cu film has a thickness of 0.25 to 0.25.
0.3 μm.

【0022】なお、絶縁樹脂層として、BCBを用いる
ことによって、絶縁樹脂層の平坦性が良好に確保される
ので、表面が凹凸なく平坦な積層体を得ることができ、
電気的特性良好となる。
By using BCB as the insulating resin layer, the flatness of the insulating resin layer is ensured well, so that it is possible to obtain a laminate having a flat surface without irregularities.
Good electrical characteristics.

【0023】次に図2(c)に示すように、レジスト2
2を塗布した後、図2(d)に示すように、ホトリソグ
ラフィを用いて、マスク23を介して、露光し、現像し
て、図3(a)に示すレジストのパターン22´を得
る。
Next, as shown in FIG. 2C, the resist 2
2 is applied, then, as shown in FIG. 2D, it is exposed through a mask 23 using photolithography and developed to obtain a resist pattern 22 'shown in FIG. 3A.

【0024】次に、図3(a)に示すものをH2 SO4
で表面処理した後、図3(b)に示すように、電解Cu
めっきによって、電解Cuめっき層24を得る。
Next, as shown in FIG. 3 (a), H 2 SO 4
After surface treatment with Cu, as shown in FIG.
The electrolytic Cu plating layer 24 is obtained by plating.

【0025】次に、レジストのパターン22´を剥離し
て、図3(c)に示す形状の中間導体パターン25を得
る。
Next, the resist pattern 22 'is peeled off to obtain an intermediate conductor pattern 25 having the shape shown in FIG. 3 (c).

【0026】次に、図3(c)に示す中間導体パターン
25に対してウエットエッチング(ドライエッチングで
も可)を行い、電解Cuめっき層24の間に露出してい
る下地層21の部分を除去し、HClで洗浄して図3
(d)に示すように、絶縁樹脂層13a上に形成された
孤立パターン14aを得る。尚、エッチングによって、
電解Cuめっき層24の上面も若干エッチングされる
が、下地めっき層21よりも厚いので、導体パターンが
失われることはない。
Next, the intermediate conductor pattern 25 shown in FIG. 3C is subjected to wet etching (or dry etching is possible) to remove the portion of the underlayer 21 exposed between the electrolytic Cu plating layers 24. And then washed with HCl, as shown in FIG.
As shown in (d), an isolated pattern 14a formed on the insulating resin layer 13a is obtained. In addition, by etching,
Although the upper surface of the electrolytic Cu plating layer 24 is also slightly etched, since it is thicker than the base plating layer 21, the conductor pattern is not lost.

【0027】得られた導体層14aは、下地層21のパ
ターンと、電解Cuめっき層24のパターンとからな
り、厚さ約3〜5μm、幅約30μmで、洗浄、フォト
リソグラフィ、エッチング、洗浄工程等において、製作
プロセス中に不具合は発生しなかった。
The conductor layer 14a thus obtained is composed of the pattern of the underlayer 21 and the pattern of the electrolytic Cu plating layer 24 and has a thickness of about 3 to 5 μm and a width of about 30 μm, and is subjected to cleaning, photolithography, etching and cleaning steps. No problems occurred during the manufacturing process.

【0028】図4は、樹脂絶縁層を形成する方法を模式
的に示す図である。図4を参照して、図3(d)に示す
絶縁層13a上に形成された導体層14aを覆うよう
に、図4(a)に示すように、スピンコーティングによ
って、紫外線感光性BCB樹脂を塗布して、絶縁樹脂層
26を得る。次に、図4(b)に示すように、フォトリ
ソグラフィを用い、マスク27を介して露光して、図4
(c)に示すように、絶縁樹脂層26に貫通孔18を形
成する。尚、貫通孔18は、絶縁樹脂層26の上部に形
成される導体と電気的コンタクトを得るためのものであ
るから、全ての導体パターン14a上に設ける必要のな
いことはいうまでもない。
FIG. 4 is a diagram schematically showing a method for forming a resin insulating layer. Referring to FIG. 4, as shown in FIG. 4A, the UV-sensitive BCB resin is spin-coated so as to cover the conductor layer 14a formed on the insulating layer 13a shown in FIG. 3D. The coating is applied to obtain the insulating resin layer 26. Next, as shown in FIG. 4B, photolithography is used to perform exposure through the mask 27, and then, as shown in FIG.
As shown in (c), the through hole 18 is formed in the insulating resin layer 26. It is needless to say that the through hole 18 is not required to be provided on all the conductor patterns 14a because it is for obtaining electrical contact with the conductor formed on the insulating resin layer 26.

【0029】次に、窒素雰囲気中で210℃、30分ハ
ーフキュアすることで、図4(d)に示す絶縁樹脂層1
3bを得る。
Next, by half-curing at 210 ° C. for 30 minutes in a nitrogen atmosphere, the insulating resin layer 1 shown in FIG.
You get 3b.

【0030】以上の工程を繰り返すことによって,図1
に示す電子部品本体を複数個セラミック基板によってに
縦横に接続されたものを得る。
By repeating the above steps, FIG.
A plurality of electronic component bodies shown in (1) are connected vertically and horizontally by a ceramic substrate.

【0031】また,図1における他の導体パターン14
b,14c,14dも図2及び図3に示した工程と同様
にして得られる。また,絶縁樹脂層13b,13c,1
3dも,図4に示した工程と同様に得られる。
Further, another conductor pattern 14 in FIG.
b, 14c and 14d are also obtained in the same manner as the steps shown in FIGS. Also, the insulating resin layers 13b, 13c, 1
3d is also obtained in the same manner as the step shown in FIG.

【0032】次に,図5を用いて電子部品本体1に外部
電極端子部を形成する工程について述べる。
Next, the process of forming the external electrode terminal portion on the electronic component body 1 will be described with reference to FIG.

【0033】図5を参照すると,図1に示す電子部品本
体10の上面の端部には,引き出し電極部1cが露出し
た形となっている。この引き出し電極部1cに接続する
ように,絶縁基板11と積層体12の側面に,Ni粉を
含むエポキシ樹脂等からなるNi導電ペースト5を塗布
して熱硬化させた。次に,電解バレルめっき法にてNi
めっき膜を下地層6aとして導電ペースト硬化物上に形
成した。ここで,Niは,電解マイグレーションに優れ
ており,半田等が引き出しへ拡散することを防止する。
次に,この下地層6a上に,半田浴から夫々電解バレル
めっきによって,外部接続膜として半田めっき膜6bを
形成した。
Referring to FIG. 5, the extraction electrode portion 1c is exposed at the end of the upper surface of the electronic component body 10 shown in FIG. A Ni conductive paste 5 made of epoxy resin or the like containing Ni powder was applied to the side surfaces of the insulating substrate 11 and the laminated body 12 so as to be connected to the lead electrode portion 1c, and was thermally cured. Next, by electrolytic barrel plating, Ni
The plating film was formed on the conductive paste cured product as the base layer 6a. Here, Ni is excellent in electrolytic migration and prevents solder or the like from diffusing into the drawer.
Next, on the base layer 6a, a solder plating film 6b was formed as an external connection film by electrolytic barrel plating from a solder bath.

【0034】図6は図1の電子部品本体から形成した電
子部品を示す斜視図である。
FIG. 6 is a perspective view showing an electronic component formed from the electronic component body of FIG.

【0035】なお、本発明の電子部品としては、両端及
び側面中央部に外部電極端子部6を有する3端子構造を
備えたローパスフィルタやLCR回路素子が挙げられ
る。
Examples of the electronic component of the present invention include a low-pass filter and an LCR circuit element having a three-terminal structure having external electrode terminal portions 6 at both ends and side surface center portions.

【0036】[0036]

【発明の効果】以上,説明したように,本発明によれ
ば,構造が簡単で、製造が容易であるとともに,外部か
ら水分やめっき液が浸透することを阻止した、所望の特
性を備えた信頼性の高い電子部品を提供することができ
る。
As described above, according to the present invention, the structure is simple, the manufacturing is easy, and the desired characteristics are obtained in which moisture and plating solution are prevented from penetrating from the outside. A highly reliable electronic component can be provided.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施の形態による電子部品の電子部品
本体を示す部分断面図である。
FIG. 1 is a partial cross-sectional view showing an electronic component body of an electronic component according to an embodiment of the present invention.

【図2】図1における導体層を形成する方法を模式的に
示す断面図である。
FIG. 2 is a cross-sectional view schematically showing a method for forming a conductor layer in FIG.

【図3】図2に引き続く導体層を形成する工程を模式的
に示す断面図である。
FIG. 3 is a cross-sectional view schematically showing a step of forming a conductor layer following that of FIG.

【図4】導体層の上に絶縁樹脂層及を形成する方法を模
式的に示す断面図である。
FIG. 4 is a cross-sectional view schematically showing a method of forming an insulating resin layer on a conductor layer.

【図5】図1の電子部品の外部電極端子部を示す部分断
面図である。
5 is a partial cross-sectional view showing an external electrode terminal portion of the electronic component of FIG.

【図6】図5の外部電極端子部を有する電子部品を示す
斜視図である。
6 is a perspective view showing an electronic component having the external electrode terminal portion of FIG.

【図7】従来の電子部品の一例を示す部分断面図であ
る。
FIG. 7 is a partial cross-sectional view showing an example of a conventional electronic component.

【符号の説明】[Explanation of symbols]

6 外部電極端子 6a 下地層 6b 外部接続膜 10 電子部品本体 11 絶縁基板 13a,13b,13c,13d,13e 絶縁樹脂
層 14a,14b,14c,14d, 導体層 15a,15b,16a,16b,18 貫通孔 21 下地層 22 レジスト 23 マスク 22´ レジストのパターン 24 電解Cuめっき層 25 中間導体パターン 26 絶縁樹脂層
6 External Electrode Terminal 6a Underlayer 6b External Connection Film 10 Electronic Component Main Body 11 Insulating Substrate 13a, 13b, 13c, 13d, 13e Insulating Resin Layer 14a, 14b, 14c, 14d, Conductor Layer 15a, 15b, 16a, 16b, 18 Penetration Hole 21 Underlayer 22 Resist 23 Mask 22 'Resist pattern 24 Electrolytic Cu plating layer 25 Intermediate conductor pattern 26 Insulating resin layer

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 絶縁基板と,前記絶縁基板上に複数の絶
縁樹脂層と複数の導体層とを交互に積層した積層体と,
前記導体層中の導体パターンの引き出し電極部に接続さ
れ,前記積層体の側面から前記絶縁基板の側面に渡って
形成された外部電極端子部とを備えた電子部品におい
て,前記積層体の内最上層のものは,絶縁樹脂層であ
り,前記複数の導体層の内の上層から一つ目の第1の導
体層中の導体パターンは、上層から2つ目の第2の導体
層中の導体パターンの引き出し電極部に、これらの間に
介在する絶縁樹脂層に設けられた第1の貫通孔を介して
接続され,前記第1の導体層の引き出し電極部は,前記
第2の導体層の引き出し電極部に、前記第1および第2
の導体層の間に介在する絶縁樹脂層に設けられた第2の
貫通孔を介して接続されており、前記第1の導体層の前
記引き出し電極部は、前記最上層の絶縁樹脂層から積層
方向に直角の方向に露出して,前記積層体の側面まで延
在していることを特徴とする電子部品。
1. An insulating substrate, and a laminate in which a plurality of insulating resin layers and a plurality of conductor layers are alternately laminated on the insulating substrate,
In the electronic component, which is connected to the lead-out electrode portion of the conductor pattern in the conductor layer and has an external electrode terminal portion formed from the side surface of the laminated body to the side surface of the insulating substrate, The upper layer is an insulating resin layer, and the conductor pattern in the first conductor layer which is the first layer from the upper layers of the plurality of conductor layers is the conductor in the second conductor layer which is the second layer from the upper layer. The lead-out electrode portion of the first conductor layer is connected to the lead-out electrode portion of the pattern through a first through hole provided in the insulating resin layer interposed therebetween. The lead electrode portion is provided with the first and second
Connected via a second through hole provided in an insulating resin layer interposed between the conductor layers of the first conductive layer, the lead electrode portion of the first conductive layer is laminated from the uppermost insulating resin layer. An electronic component, which is exposed in a direction perpendicular to the direction and extends to the side surface of the laminate.
【請求項2】 請求項1又は2記載の電子部品におい
て,前記絶縁樹脂層の内の少なくとも一層は,実質的に
ベンゾシクロブテンからなることを特徴とする電子部
品。
2. The electronic component according to claim 1, wherein at least one of the insulating resin layers is substantially made of benzocyclobutene.
【請求項3】 請求項1乃至3の内のいずれかに記載の
電子部品において,前記導体層は,導電金属膜からなる
下地層と前記下地層上に電解めっきによって形成された
Cuめっき膜であることを特徴とする電子部品。
3. The electronic component according to claim 1, wherein the conductor layer is a base layer made of a conductive metal film and a Cu plating film formed on the base layer by electrolytic plating. An electronic component characterized by being present.
【請求項4】 請求項3記載の電子部品において,前記
下地層は,スパッタにより形成されたTi又はCr膜か
らなることを特徴とする電子部品。
4. The electronic component according to claim 3, wherein the underlayer is made of a Ti or Cr film formed by sputtering.
JP10370296A 1996-03-29 1996-03-29 Electronic part Pending JPH09270331A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10370296A JPH09270331A (en) 1996-03-29 1996-03-29 Electronic part

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10370296A JPH09270331A (en) 1996-03-29 1996-03-29 Electronic part

Publications (1)

Publication Number Publication Date
JPH09270331A true JPH09270331A (en) 1997-10-14

Family

ID=14361096

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10370296A Pending JPH09270331A (en) 1996-03-29 1996-03-29 Electronic part

Country Status (1)

Country Link
JP (1) JPH09270331A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102157513A (en) * 2009-10-16 2011-08-17 阿维科斯公司 Thin film surface mount components

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102157513A (en) * 2009-10-16 2011-08-17 阿维科斯公司 Thin film surface mount components

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