JPH09241092A - Production of oxide single crystal - Google Patents
Production of oxide single crystalInfo
- Publication number
- JPH09241092A JPH09241092A JP7826796A JP7826796A JPH09241092A JP H09241092 A JPH09241092 A JP H09241092A JP 7826796 A JP7826796 A JP 7826796A JP 7826796 A JP7826796 A JP 7826796A JP H09241092 A JPH09241092 A JP H09241092A
- Authority
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- Japan
- Prior art keywords
- crystal
- single crystal
- oxide single
- diameter
- growth rate
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、チョクラルスキー
法を用いる酸化物単結晶の製造方法に関するものであ
り、特に表面弾性波素子や光導波路などの光学素子の基
板として有用とされるタンタル酸リチウム単結晶又はニ
オブ酸リチウム単結晶の製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an oxide single crystal using the Czochralski method, and in particular, tantalic acid useful as a substrate for optical elements such as surface acoustic wave elements and optical waveguides. The present invention relates to a method for producing a lithium single crystal or a lithium niobate single crystal.
【0002】[0002]
【従来の技術】タンタル酸リチウム、ニオブ酸リチウム
等の酸化物単結晶は融点が高いことから、貴金属ルツボ
を用い、その中に収納された原料を高周波加熱又は抵抗
加熱によって溶解し、その融液の湯面に種子結晶を接触
させて引上げを行うチョクラルスキー法で製造すること
が一般に行われている。通常、結晶の育成速度はその生
産性を上げるために、セル成長が発生するぎりぎりの速
度と早く、単位時間当たりの結晶成長量が多いため、直
胴部分の制御性もよく、結晶が偏心することもない。2. Description of the Related Art Since oxide single crystals of lithium tantalate, lithium niobate, etc. have a high melting point, a precious metal crucible is used to melt the raw material contained therein by high frequency heating or resistance heating to melt it. It is generally performed by the Czochralski method in which a seed crystal is brought into contact with the hot water surface to pull up. Usually, the crystal growth rate is as fast as cell growth occurs to increase its productivity, and the amount of crystal growth per unit time is large, so the controllability of the straight body part is good and the crystal is eccentric. Nothing.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、タンタ
ル酸リチウム、ニオブ酸リチウムなどの単結晶はコング
ルエント組成で育成を行っており、例えばタンタル酸リ
チウムの場合、このコングルエント組成では化学量論値
よりもTa量が多いことより結晶としては何らかの欠陥
を含んでおり、結晶欠陥を生じ易くなっている。特に、
育成速度を上げると育成結晶中に微小な面ズレが発生
し、それが起点となって大きな結晶欠陥を誘発するとい
う問題が生じてくる。形状については、直胴部分に直径
変動の多いものや、捻れなどの偏心が多いものは、その
部分に結晶歪みが蓄積しており、結晶欠陥等の発生の原
因となる。表面弾性波デバイスは、今後そのデバイスパ
ターンが益々微細化するといわれており、その場合、従
来のSAWグレードで問題とされなかった結晶欠陥がパ
ターニングの際に問題となってくる。また、光導波路な
どの光学素子の場合、結晶欠陥の存在する部位で屈折率
変化を起こし、素子の性能を著しく低下させるという問
題を生じる。また、これらの結晶を育成する際に必要な
種子結晶は、これらの結晶から加工して作成しているた
め、結晶中の欠陥が育成中の結晶に伝搬して大きな結晶
欠陥を誘発し、クラックを発生するという問題を生じ
る。However, single crystals of lithium tantalate, lithium niobate, and the like are grown in a congruent composition. For example, in the case of lithium tantalate, Ta is higher than the stoichiometric value in this congruent composition. Since the amount is large, the crystal contains some defects, and crystal defects are likely to occur. Especially,
When the growth rate is increased, a minute surface shift occurs in the grown crystal, which becomes a starting point and induces a large crystal defect. Regarding the shape, if the straight body portion has a large variation in diameter or if there is a large amount of eccentricity such as twisting, crystal strain accumulates in that portion, which causes crystal defects and the like. It is said that the device pattern of the surface acoustic wave device will be further miniaturized in the future, and in that case, crystal defects, which have not been a problem in the conventional SAW grade, become a problem during patterning. Further, in the case of an optical element such as an optical waveguide, there occurs a problem that the refractive index changes at a portion where a crystal defect exists, and the performance of the element is significantly deteriorated. Further, the seed crystals necessary for growing these crystals are produced by processing these crystals, defects in the crystals propagate to the growing crystals and induce large crystal defects, and cracks occur. Causes a problem that occurs.
【0004】本発明は上記事情に鑑みなされたもので、
結晶欠陥の少ない良質なタンタル酸リチウム、ニオブ酸
リチウム等の酸化物単結晶を得ることができる酸化物単
結晶の製造方法を提供することを目的とする。[0004] The present invention has been made in view of the above circumstances,
An object of the present invention is to provide a method for producing an oxide single crystal, which can obtain a high-quality oxide single crystal such as lithium tantalate or lithium niobate with few crystal defects.
【0005】[0005]
【課題を解決するための手段及び発明の実施の形態】本
発明者は、上記目的を達成するため鋭意検討を行った結
果、ルツボ内の融液に種子結晶を接触させてタンタル酸
リチウム、ニオブ酸リチウム等の酸化物単結晶をチョク
ラルスキー法によって成長させるに際し、結晶成長速度
をセル成長を生じさせる育成速度の1/4〜1/2倍と
して引上げを行うことにより、結晶欠陥の少ない酸化物
単結晶を得ることができること、またこの場合、特に結
晶中心からの半径の偏差が±7mm以内の形状で、結晶
の直径がほぼ一定の部分において、結晶直径の短径をX
mmとした時に、直径変動がX/16mm以内の部分の
ものが結晶欠陥が少なく、屈折率変化の少ない光学素子
用の結晶となることを知見し、本発明をなすに至ったも
のである。Means for Solving the Problems and Modes for Carrying Out the Invention As a result of intensive studies for achieving the above-mentioned object, the present inventor has brought seed crystals into contact with a melt in a crucible to obtain lithium tantalate and niobium. When growing an oxide single crystal such as lithium oxide by the Czochralski method, by increasing the crystal growth rate to 1/4 to 1/2 times the growth rate that causes cell growth, oxidation with few crystal defects is performed. A single crystal of the crystal can be obtained, and in this case, particularly, in a portion where the deviation of the radius from the center of the crystal is within ± 7 mm and the diameter of the crystal is almost constant, the minor axis of the crystal diameter is X.
The present invention has been made based on the finding that a portion having a diameter variation of X / 16 mm or less when having a thickness of mm is a crystal for an optical element with few crystal defects and a small change in refractive index.
【0006】従って、本発明は、(1)ルツボ内の融液
に種子結晶を接触させて酸化物単結晶をチョクラルスキ
ー法によって成長させるに際し、結晶成長速度をセル成
長を生じさせる育成速度の1/4〜1/2倍とすること
を特徴とする酸化物単結晶の製造方法、(2)上記
(1)の製造方法で得られた酸化物単結晶で、結晶中心
からの半径の偏差が±7mm以内のものであり、かつ結
晶の直径がほぼ一定の部分のものであって、結晶直径の
短径をXmmとしたとき、直径変動がX/16mm以内
の部分のものを採取することを特徴とする酸化物単結晶
の製造方法、(3)酸化物単結晶がタンタル酸リチウム
単結晶又はニオブ酸リチウム単結晶である上記(1)又
は(2)記載の製造方法を提供する。Therefore, according to the present invention, (1) when a seed crystal is brought into contact with a melt in a crucible to grow an oxide single crystal by the Czochralski method, the crystal growth rate is set to a growth rate that causes cell growth. A method for producing an oxide single crystal, which is characterized by being ¼ to ½ times, (2) A deviation of a radius from a crystal center in the oxide single crystal obtained by the production method of (1) above. Is within ± 7 mm, and the diameter of the crystal is almost constant, and when the minor axis of the crystal diameter is X mm, the diameter variation should be within X / 16 mm. And (3) the method for producing an oxide single crystal according to the above (1) or (2), wherein the oxide single crystal is a lithium tantalate single crystal or a lithium niobate single crystal.
【0007】以下、本発明につき更に詳しく説明する。The present invention will be described in more detail below.
【0008】本発明の酸化物単結晶の製造方法は、チョ
クラルスキー法による引上げ法によって行われるもの
で、特にタンタル酸リチウム、ニオブ酸リチウム単結晶
の製造に有効に採用し得るものである。The method for producing an oxide single crystal of the present invention is carried out by a pulling method based on the Czochralski method, and it can be effectively used particularly for producing a lithium tantalate or lithium niobate single crystal.
【0009】この場合、原料組成、単結晶引上げ条件、
装置などは公知の方法、装置を用いることができるが、
本発明においては、結晶の育成速度をセル成長を生じさ
せる育成速度の1/4〜1/2倍、望ましくは1/3〜
1/2倍の範囲として結晶育成を行うもので、これによ
り育成速度が遅くなり、育成界面での固液平衡が安定
し、結晶面のズレなどを生ずることなく、結晶欠陥の発
生を抑制することができる。これに対し、結晶育成速度
がセル成長を発生する速度の1/4倍より小さいと、結
晶欠陥の密度の低下はみられず、生産性だけが悪くな
る。また、育成速度をセル成長を発生する最小の速度の
1/2倍より大きくすると、固液平衡が不安定になり、
結晶欠陥の密度が急激に増加する。なお、セル成長の発
生する最小の育成速度は例えば3インチ、4インチとい
う大口径結晶では約8mm/H程度である。In this case, the raw material composition, the single crystal pulling conditions,
As the device and the like, known methods and devices can be used,
In the present invention, the crystal growth rate is 1/4 to 1/2 times, preferably 1/3 to, the cell growth rate.
Crystal growth is performed in a range of ½ times, which slows down the growth rate, stabilizes the solid-liquid equilibrium at the growth interface, and prevents the occurrence of crystal defects without causing crystal plane misalignment. be able to. On the other hand, when the crystal growth rate is less than 1/4 times the cell growth rate, the density of crystal defects is not decreased and only the productivity is deteriorated. Further, if the growth rate is larger than 1/2 times the minimum rate for generating cell growth, the solid-liquid equilibrium becomes unstable,
The density of crystal defects increases sharply. The minimum growth rate at which cell growth occurs is about 8 mm / H for large-diameter crystals of 3 inches and 4 inches, for example.
【0010】本発明においては、このように育成速度を
セル成長を発生させる速度の1/4〜1/2倍としたも
のであり、育成速度を落としたことによって、単位時間
当たりの結晶成長量が少なくなり、重量変化を用いる自
動制御方法においては、直胴の制御性が悪くなり、形状
が所定のものから外れ、これによる歪み及び結晶欠陥が
生じる場合がある。In the present invention, the growth rate is set to 1/4 to 1/2 times the cell growth rate in this way. By lowering the growth rate, the amount of crystal growth per unit time is increased. In the automatic control method using the weight change, the controllability of the straight body may be deteriorated, and the shape may deviate from a predetermined shape, resulting in distortion and crystal defects.
【0011】この場合、上記育成速度で得られた酸化物
単結晶の形成について、結晶中心からの半径の偏差が±
7mm以内であればその形状は捻れではなく、また、結
晶直径の短径をXmmとしたときに、直径の径変動がX
/16mmを超える場合は径変動による熱歪の蓄積及び
固液界面が不安定になることから結晶欠陥の密度が増加
する。従って、このような点から、結晶の中心からの半
径の偏差が±7mm、望ましくは±4mm以内で、直径
の径変動がX/16mm以下、望ましくはX/18mm
以内の結晶を採取することが好ましい。この採取した単
結晶を使用することにより、屈折率変化の少ない光学素
子の結晶とすることができる。In this case, in forming the oxide single crystal obtained at the above growth rate, the deviation of the radius from the crystal center is ±.
If the diameter is within 7 mm, the shape is not twisted, and when the minor axis of the crystal diameter is X mm, the diameter fluctuation of the diameter is X.
If it exceeds / 16 mm, thermal strain is accumulated due to the diameter variation and the solid-liquid interface becomes unstable, so that the density of crystal defects increases. Therefore, from such a point, the deviation of the radius from the center of the crystal is ± 7 mm, preferably within ± 4 mm, and the diameter variation of the diameter is X / 16 mm or less, preferably X / 18 mm.
It is preferable to collect crystals within. By using this collected single crystal, it is possible to obtain a crystal of an optical element with a small change in refractive index.
【0012】[0012]
【発明の効果】本発明によれば、結晶欠陥の極めて少な
い良質な単結晶を得ることができ、この結晶から光学的
特性に優れたLT、LN基板を提供することができる。According to the present invention, it is possible to obtain a good-quality single crystal with extremely few crystal defects, and from this crystal, an LT or LN substrate having excellent optical characteristics can be provided.
【0013】[0013]
【実施例】以下、実施例と比較例を示し、本発明を具体
的に説明するが、本発明は下記の実施例に制限されるも
のではない。EXAMPLES The present invention will be described below in detail with reference to examples and comparative examples, but the present invention is not limited to the following examples.
【0014】〔実施例1〜3、比較例1,2〕図1に示
す装置を用いてタンタル酸リチウム単結晶の引上げを行
った。ここで、図1において、1は耐火性ルツボ台、2
はアルミナ台、3はルツボ、4は断熱材、5は断熱材4
の上端部に配設されたアルミナ製のリフレクター支持
体、6はリフレクター、7はアフターヒーター、8は加
熱用コイル、9は融液、10はシードホルダー、11は
種子結晶、12は育成結晶、13は蓋体を示す。[Examples 1 to 3 and Comparative Examples 1 and 2] A lithium tantalate single crystal was pulled using the apparatus shown in FIG. Here, in FIG. 1, 1 is a refractory crucible stand, 2
Is an alumina base, 3 is a crucible, 4 is a heat insulating material, 5 is a heat insulating material 4.
A reflector support made of alumina disposed on the upper end of the, 6 is a reflector, 7 is an after-heater, 8 is a heating coil, 9 is a melt, 10 is a seed holder, 11 is a seed crystal, 12 is a growing crystal, Reference numeral 13 indicates a lid.
【0015】直径150mm、高さ150mmのイリジ
ウム製ルツボに10000gの原料(Li/Ta=0.
943(モル比))をチャージし、チョクラルスキー法
にて直径80mm、直胴長130mm、重量6500g
のタンタル酸リチウム単結晶の引上げを行った。まず、
育成速度8mm/Hで引上げを行い、結晶底部にセル成
長が発生することを確認した。次に、表1に示す育成速
度で結晶を育成し、両端面切断、研磨後に単一分域化を
行い、可視光及び偏光にて欠陥の有無、本数を調べた。
結果を表1に示す。In an iridium crucible having a diameter of 150 mm and a height of 150 mm, 10000 g of raw material (Li / Ta = 0.
943 (molar ratio)) and charged by the Czochralski method with a diameter of 80 mm, a straight body length of 130 mm, and a weight of 6500 g.
The single crystal of lithium tantalate was pulled up. First,
It was confirmed that cell growth occurred at the bottom of the crystal by pulling up at a growth rate of 8 mm / H. Next, the crystal was grown at the growth rate shown in Table 1, cut into both end faces and polished to perform single domainization, and the presence or absence of defects and the number of defects were examined by visible light and polarized light.
The results are shown in Table 1.
【0016】[0016]
【表1】 [Table 1]
【0017】表1の結果より、結晶成長速度をセル成長
を生じさせる育成速度の1/4〜1/2倍の範囲とする
ことによって、欠陥の少ないタンタル酸リチウム単結晶
が得られることが確認された。From the results shown in Table 1, it was confirmed that a lithium tantalate single crystal with few defects can be obtained by setting the crystal growth rate to a range of 1/4 to 1/2 times the growth rate that causes cell growth. Was done.
【0018】次に、上記実施例2の条件で結晶育成(直
径80mm)を行い、得られた単結晶の形状(直径の径
変動、結晶中心からの半径の偏差)と欠陥について検討
を行った。直径の径変動の結果を表2に、結晶中心から
の半径の偏差の結果を表3に示す。Next, crystal growth (diameter 80 mm) was carried out under the conditions of Example 2 above, and the shape of the obtained single crystal (diameter diameter variation, radius deviation from crystal center) and defects were examined. . Table 2 shows the result of the diameter variation of the diameter, and Table 3 shows the result of the deviation of the radius from the crystal center.
【0019】[0019]
【表2】 [Table 2]
【0020】[0020]
【表3】 [Table 3]
【0021】表2,3の結果より、No.1〜3及びN
o.5,6のものが欠陥が少ないことが認められた。From the results of Tables 2 and 3, No. 1-3 and N
o. It was confirmed that the defects of 5 and 6 had few defects.
【0022】なお、ニオブ酸リチウム単結晶の引上げを
行った場合も同様の結果であった。The same result was obtained when the lithium niobate single crystal was pulled up.
【図1】本発明の実施に用いる単結晶引上げ装置の概略
断面図である。FIG. 1 is a schematic sectional view of a single crystal pulling apparatus used for carrying out the present invention.
1 ルツボ台 2 アルミナ台 3 ルツボ 4 断熱材 5 支持体 6 リフレクター 7 アフターヒーター 8 加熱用コイル 9 融液 10 シードホルダー 11 種子結晶 12 育成結晶 13 蓋体 1 crucible table 2 alumina table 3 crucible 4 heat insulating material 5 support 6 reflector 7 after-heater 8 heating coil 9 melt 10 seed holder 11 seed crystal 12 growing crystal 13 lid
Claims (3)
酸化物単結晶をチョクラルスキー法によって成長させる
に際し、結晶成長速度をセル成長を生じさせる育成速度
の1/4〜1/2倍とすることを特徴とする酸化物単結
晶の製造方法。1. When a seed crystal is brought into contact with the melt in a crucible to grow an oxide single crystal by the Czochralski method, the crystal growth rate is 1/4 to 1/2 of the growth rate that causes cell growth. A method for producing an oxide single crystal, which is characterized by doubling.
物単結晶で、結晶中心からの半径の偏差が±7mm以内
のものであり、かつ結晶の直径がほぼ一定の部分のもの
であって、結晶直径の短径をXmmとしたとき、直径変
動がX/16mm以内の部分のものを採取することを特
徴とする酸化物単結晶の製造方法。2. An oxide single crystal obtained by the method according to claim 1, which has a radius deviation from the crystal center of ± 7 mm or less and a diameter of the crystal which is substantially constant. A method for producing an oxide single crystal, characterized in that, when a minor axis of a crystal diameter is X mm, a portion whose diameter variation is within X / 16 mm is sampled.
晶又はニオブ酸リチウム単結晶である請求項1又は2記
載の製造方法。3. The method according to claim 1, wherein the oxide single crystal is a lithium tantalate single crystal or a lithium niobate single crystal.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7826796A JPH09241092A (en) | 1996-03-06 | 1996-03-06 | Production of oxide single crystal |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7826796A JPH09241092A (en) | 1996-03-06 | 1996-03-06 | Production of oxide single crystal |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH09241092A true JPH09241092A (en) | 1997-09-16 |
Family
ID=13657214
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7826796A Pending JPH09241092A (en) | 1996-03-06 | 1996-03-06 | Production of oxide single crystal |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH09241092A (en) |
-
1996
- 1996-03-06 JP JP7826796A patent/JPH09241092A/en active Pending
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