JP3015552B2 - LiTaO3 single crystal material - Google Patents

LiTaO3 single crystal material

Info

Publication number
JP3015552B2
JP3015552B2 JP3286799A JP28679991A JP3015552B2 JP 3015552 B2 JP3015552 B2 JP 3015552B2 JP 3286799 A JP3286799 A JP 3286799A JP 28679991 A JP28679991 A JP 28679991A JP 3015552 B2 JP3015552 B2 JP 3015552B2
Authority
JP
Japan
Prior art keywords
single crystal
litao
pores
crystal material
average particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP3286799A
Other languages
Japanese (ja)
Other versions
JPH05124897A (en
Inventor
柾雄 角田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP3286799A priority Critical patent/JP3015552B2/en
Publication of JPH05124897A publication Critical patent/JPH05124897A/en
Application granted granted Critical
Publication of JP3015552B2 publication Critical patent/JP3015552B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、単結晶の製造に使用さ
れる原材料に係り、特にLiTaO3 などの酸化物単結
晶をチョコラルスキー法により引き上げて製造する際に
使用される単結晶材料に関する。
BACKGROUND OF THE INVENTION The present invention relates to a single crystal material used in relates to raw materials used in the manufacture of single crystal, in particular produced by pulling oxide single crystals such as LiTaO 3 by Czochralski .

【0002】[0002]

【従来の技術】従来より、LiTaO3 、LiNb
3 、あるいはLi2 4 7 などの酸化物単結晶の製
造方法の一つとして、チョコラルスキー法と呼ばれる引
き上げ方法が知られている。このチョコラルスキー法
は、PtあるいはPt−Rhなどの貴金属製の溶融るつぼ
に原料を収容し、この原料を、溶融るつぼに周設した高
周波コイルなどの加熱手段により加熱溶融した後、種子
結晶を原料融液に接触させ、この種子結晶を回転させな
がら引き上げることにより、単結晶を育成する方法であ
る。
2. Description of the Related Art Conventionally, LiTaO 3 , LiNb
As one method for producing an oxide single crystal such as O 3 or Li 2 B 4 O 7 , a pulling method called the Czochralski method is known. In the Czochralski method, a raw material is contained in a melting crucible made of a noble metal such as Pt or Pt-Rh, and the raw material is heated and melted by a heating means such as a high-frequency coil provided around the melting crucible. In this method, a single crystal is grown by bringing the seed crystal into contact with the melt and pulling it while rotating the seed crystal.

【0003】[0003]

【発明が解決しようとする課題】このチョコラルスキー
法によりLiTaO3 単結晶を製造するにあたっては、
得られた結晶内に大きさ、位置、数などの不規則な気泡
が発生することがあり、このような気泡の発生が、製造
歩留まりを低下させる原因の一つとなっていた。このよ
うに結晶内にランダムに生じる気泡は、内部全体に発生
することから、通称全ポアと呼ばれている。原料融液に
温度変動が生じた場合にこのような気泡(以下全ポアと
記す)が発生することがあるが、原料融液の温度制御だ
けでは全ポアの発生を防止できないのが現状である。そ
のため、他の要因に対する考察を進めて、このような全
ポアの発生をできるだけ少なくすることが望まれてい
た。
In producing a LiTaO 3 single crystal by the Czochralski method,
Irregular bubbles such as size, position and number may be generated in the obtained crystal, and such generation of bubbles has been one of the causes of lowering the production yield. Such randomly generated bubbles in the crystal are generally called all pores because they are generated in the entire interior. Such a bubble (hereinafter referred to as "all pores") may be generated when the temperature of the raw material melt fluctuates. However, at present, generation of all pores cannot be prevented only by controlling the temperature of the raw material melt. . Therefore, it has been desired to reduce the occurrence of such all pores as much as possible by studying other factors.

【0004】本発明はこのような事情に対処してなされ
たものであり、全ポアの発生率を低減し製造歩留まりを
向上し得るLiTaO3 単結晶材料を提供することをそ
の目的とする。
The present invention has been made in view of such circumstances, and an object of the present invention is to provide a LiTaO 3 single crystal material capable of reducing the generation rate of all pores and improving the production yield.

【0005】[0005]

【課題を解決するための手段】本発明は、チョコラルス
キー法によるLiTaO3 単結晶製造において、原材料
として工業的に入手されるTa2 5 およびLi2 CO
3 粉末の粒径に着目して成されたものである。
SUMMARY OF THE INVENTION The present invention relates to a method for producing LiTaO 3 single crystal by the Czochralski method, which comprises Ta 2 O 5 and Li 2 CO 3 which are industrially obtained as raw materials.
(3) Focused on the particle size of the powder.

【0006】現在のところ、引き上げ法によるLiTa
3 単結晶材料としては、Ta2 5 およびLi2 CO
3 が使用されている。Li2 CO3 の粒径は通常20μ
m 程度であって水分の吸着も少なく安定した粒子と考え
られる。一方Ta2 5 は、サブミクロンオーダーの平
均粒子径(通気法による)を有し、Li2 CO3 に比較
して活性な微粒子である。そこで、引き上げ法によるL
iTaO3 単結晶製造における、単結晶材料中のTa2
5 の平均粒子径と引き上げられたLiTaO3 単結晶
の全ポア発生率とを比較し検討を行った。その結果、平
均粒子径(通気法による)が0.70〜0.80μm の
範囲内のTa2 5 粉末を使用してLiTaO3 単結晶
を引き上げた場合に、全ポアの発生件数率が低減される
ことが判明した。
At present, LiTa by the pulling method is used.
As the O 3 single crystal material, Ta 2 O 5 and Li 2 CO
3 are used. The particle size of Li 2 CO 3 is usually 20μ
It is considered to be a stable particle with a moisture absorption of about m. Ta 2 O 5, on the other hand, has an average particle size on the order of submicrons (based on the aeration method) and is an active fine particle compared to Li 2 CO 3 . Therefore, L
Ta 2 in the single crystal material in the production of iTaO 3 single crystal
The average particle diameter of O 5 and the total pore generation rate of the pulled LiTaO 3 single crystal were compared and examined. As a result, when LiTaO 3 single crystal is pulled up using Ta 2 O 5 powder having an average particle diameter (by aeration method) in the range of 0.70 to 0.80 μm, the number of occurrences of all pores is reduced. It turned out to be.

【0007】LiTaO3 単結晶材料として使用される
Ta2 5 の平均粒子径は0.70〜0.80μm が好
ましく、より好ましい範囲は0.70〜0.75μm で
ある。Pt−Rhるつぼ内で溶融される際に、Ta2
5 の平均粒子径が0.80μm より大きい場合には、加
熱時に溶解しにくなって融液内部からのガスの発散も不
十分となり、気泡(全ポア)を生じやすくなる。同一時
間の加熱では粒子径が小さいほど溶解しやすいが、Ta
2 5 の平均粒子径が0.70μm より小さい場合には
Li2 CO3 との混合性が極端に悪くなり、材料の偏析
を生み、最終製品において不良品となってしまうため、
好ましくない。
The average particle diameter of Ta 2 O 5 used as a LiTaO 3 single crystal material is preferably 0.70 to 0.80 μm, and more preferably 0.70 to 0.75 μm. When melted in a Pt-Rh crucible, Ta 2 O
If the average particle size of 5 is larger than 0.80 μm, it becomes difficult to dissolve at the time of heating, the gas is not sufficiently diffused from the inside of the melt, and bubbles (all pores) are easily generated. In heating for the same time, the smaller the particle size, the easier it is to dissolve,
If the average particle diameter of 2 O 5 is smaller than 0.70 μm, the miscibility with Li 2 CO 3 becomes extremely poor, causing segregation of the material and resulting in a defective product in the final product.
Not preferred.

【0008】なお、単結晶材料中の不純物含有量と全ポ
アの発生件数率との関係を検討し、その結果を図2、図
3、および図4に示した。図2は不純物として含まれる
Si含有量と全ポアの発生件数率との関係、図3は不純物
として含まれるAl含有量と全ポアの発生件数率との関
係、および図4は水分含有量と全ポアの発生件数率との
関係を、それぞれ示している。これらの図から明らかな
ように、Ta2 5 の平均粒子径以外の因子は全ポアの
発生件数率に影響を及ぼしていないことが理解される。
The relationship between the impurity content in the single crystal material and the rate of occurrence of all pores was examined, and the results are shown in FIGS. 2, 3 and 4. FIG. 2 is included as an impurity
Fig. 3 shows the relationship between the Si content and the incidence rate of all pores, Fig. 3 shows the relationship between the Al content contained as impurities and the incidence rate of all pores, and Fig. 4 shows the moisture content and the incidence rate of all pores. Are shown, respectively. As is clear from these figures, it is understood that factors other than the average particle diameter of Ta 2 O 5 do not affect the incidence rate of all pores.

【0009】すなわち本発明は、Pt−Rhるつぼを用
いた引上げ法によりLiTaO3 単結晶を製造する際に
用いられる、Ta2 5 およびLi2 3 を主体とする
LiTaO3 単結晶材料において、Ta2 5 の平均粒
子径(通気法による)を0.70〜0.80μm とした
ことを特徴とする。
[0009] The present invention, in producing a LiTaO 3 single crystal by pulling method using Pt-Rh crucibles
In the LiTaO 3 single crystal material mainly composed of Ta 2 O 5 and Li 2 O 3 used, the average particle diameter of Ta 2 O 5 (by aeration method) is set to 0.70 to 0.80 μm. I do.

【0010】[0010]

【作用】このように構成された本発明のLiTaO3
結晶材料においては、Ta2 5 の平均粒子径(通気法
による)を0.70〜0.80μm としたことにより、
Li2 CO3 との混合性を良好に保ちつつ加熱時に溶解
しやすく、かつ溶融時の融液内部からのガスの発散も十
分に行わせることが可能になる。
In the LiTaO 3 single crystal material of the present invention thus constituted, by setting the average particle diameter of Ta 2 O 5 (by aeration method) to 0.70 to 0.80 μm,
While maintaining good mixing with Li 2 CO 3, it can be easily dissolved at the time of heating, and gas can be sufficiently diffused from the inside of the melt at the time of melting.

【0011】このため、全ポアの発生率が低減され、高
品質なLiTaO3単結晶を高歩留まりで製造すること
が可能になる。
As a result, the generation rate of all pores is reduced, and a high-quality LiTaO 3 single crystal can be manufactured with a high yield.

【0012】[0012]

【実施例】以下、本発明を実施例にしたがって説明す
る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to embodiments.

【0013】実施例 単結晶材料を収容する溶融るつぼとして、(外径124
mm、高さ122mm、厚さ2mmのPt−Rhるつぼ(Rh含
有率30%)を用い、Ta2 5 (平均粒子径0.70〜
0.75μm 、三井金属社製)およびLi2 CO3 粉末
のそれぞれを8.9kg、および57.0kg秤量し、Vブ
レンダにて混合し、これらを予め70kg/cm2 程度の圧
力でプレスし焼結後粉砕して溶融るつぼに収容した。な
お、上記単結晶材料に含まれる不純物は併せて、Siが
2 ppm、Alが1 ppm、Feが1 ppm、Cuが1 ppm、
そしてNbが5 ppm以下であった。同様に、上記単結晶
材料の水分含量は原料受入れ時に0.04%、秤量混合
時に0.04%であった。
EXAMPLE As a melting crucible accommodating a single crystal material, (an outer diameter of 124
mm, height 122 mm, using a Pt-Rh crucibles thickness 2 mm (Rh content 30%), Ta 2 O 5 ( average particle diameter 0.70
0.75 .mu.m, Mitsui Mining & Smelting Co., Ltd.) and Li 2 CO 3 each powder 8.9 kg, and then 57.0kg weighed and mixed in a V blender, then press them in advance at 70 kg / cm 2 pressure of about ware After sintering, it was ground and stored in a melting crucible. The impurities contained in the single crystal material were combined with 2 ppm of Si, 1 ppm of Al, 1 ppm of Fe, 1 ppm of Cu,
And Nb was 5 ppm or less. Similarly, the water content of the single crystal material was 0.04% at the time of receiving the raw materials, and 0.04% at the time of weighing and mixing.

【0014】上記した単結晶材料を、Pt−Rhるつぼ
に周設した高周波コイルによりm.p.である1650℃以
上に加熱溶融し、1時間ガス出しを行って混入空気の除
去を行った後、<111>を持つ種子結晶を溶融した原
材料と馴染ませ、種子結晶を10 rpmで回転させながら
LiTaO3 単結晶の引き上げを行った。
The above-mentioned single crystal material is heated and melted to a temperature of 1650 ° C. or more by a high-frequency coil provided around a Pt-Rh crucible, degassed for 1 hour to remove mixed air, and then cooled to <111. > Was blended with the melted raw material, and the LiTaO 3 single crystal was pulled up while rotating the seed crystal at 10 rpm.

【0015】引き上げ速度は5.4mm/hr とし、15時間
に亘り結晶の育成を行った。結晶の直径が3インチにな
るまで引き上げて肩部分の形成を行い、その後直胴部の
育成を開始した。直胴部を約80mm引き上げた時点で原料
融液から育成した単結晶を切り離し、冷却を行った。
The pulling speed was 5.4 mm / hr, and the crystal was grown for 15 hours. The shoulder portion was formed by pulling up until the diameter of the crystal became 3 inches, and then the growth of the straight body was started. When the straight body was pulled up by about 80 mm, the single crystal grown from the raw material melt was cut off and cooled.

【0016】このようにして得られたLiTaO3 単結
晶には、気泡や割れなどは見られなかった。さらに、引
き上げ軸に平行に直径 4mm、長さ75mmの結晶を切り出し
てその両端面を研磨後、トワイマン−グリ―ン干渉計で
結晶縦方向の歪を観察したところ殆ど歪は観察されず、
光学歪の非常に少ない高品質な結晶が得られた。
No bubbles or cracks were observed in the LiTaO 3 single crystal thus obtained. Furthermore, a crystal having a diameter of 4 mm and a length of 75 mm was cut out in parallel with the pulling axis, and after polishing both end faces thereof, almost no distortion was observed when distortion was observed in the crystal longitudinal direction with a Twyman-Green interferometer.
High quality crystals with very little optical distortion were obtained.

【0017】なお、上記した実施例を含めて、本発明の
単結晶材料を使用して138Lot のLiTaO3 単結晶
の引き上げを行なったところ、気泡(全ポア)の発生件
数率は、0.7%であった。
When 138 Lot of LiTaO 3 single crystal was pulled up using the single crystal material of the present invention including the above-mentioned embodiment, the number of bubbles (total pores) was 0.7%. %Met.

【0018】比較例1 LiTaO3 単結晶材料として、平均粒子径が本発明に
従わない(0.61〜0.69μm )のTa2 5 粉末
を用いて、実施例1と同様にしてLiTaO3 単結晶の
引き上げを行なったところ、引き上げられたLiTaO
3 単結晶に気泡(全ポア)の発生がみられた。
Comparative Example 1 As a LiTaO 3 single crystal material, a Ta 2 O 5 powder having an average particle size (0.61 to 0.69 μm) not according to the present invention was used, and LiTaO 3 was produced in the same manner as in Example 1. When the single crystal was pulled, the pulled LiTaO
3. Bubbles (all pores) were generated in the single crystal.

【0019】比較例2 LiTaO3 単結晶材料として、平均粒子径が本発明に
従わない(0.81〜0.90μm )Ta2 5 粉末を
用いて、実施例1と同様にしてLiTaO3 単結晶の引
き上げを行なったところ、引き上げられたLiTaO3
単結晶に気泡(全ポア)の発生がみられた。
[0019] Comparative Example 2 LiTaO 3 single crystal material, the average particle diameter is not according to the invention (0.81~0.90μm) Ta 2 O 5 powder with, LiTaO 3 single in the same manner as in Example 1 When the crystal was pulled, the pulled LiTaO 3
Bubbles (all pores) were generated in the single crystal.

【0020】なお、上記した比較例1および2を含め
て、平均粒子径が本発明に従わないTa2 5 粉末を用
いた307Lot のLiTaO3 単結晶の引き上げを行な
ったところ、気泡(全ポア)の発生件数率は6.2%に
も達した。
In addition, when the 307 Lot LiTaO 3 single crystal using the Ta 2 O 5 powder having an average particle size not in accordance with the present invention, including Comparative Examples 1 and 2, was pulled up, bubbles (all pores) were observed. ) Has reached 6.2%.

【0021】また、図1には、実施例を含めて138Lo
t の、および比較例1および2を含めて307Lot のL
iTaO3 単結晶の引き上げを行った際の、Ta2 5
粉末の平均粒子径(通気法による)と全ポアの発生件数
率との関係を示してある。図1からも明らかなように本
発明によれば、全ポアの発生件数率が6.2%から0.
7%へと低減された。
FIG. 1 shows 138 Lo including the embodiment.
t and 307 Lot of L including Comparative Examples 1 and 2
When the iTaO 3 single crystal was pulled, Ta 2 O 5
The relationship between the average particle size of the powder (by the aeration method) and the occurrence rate of all pores is shown. As is clear from FIG. 1, according to the present invention, the rate of occurrence of all pores is reduced from 6.2% to 0.2%.
It was reduced to 7%.

【0022】[0022]

【発明の効果】以上説明したように本発明によれば、T
2 5粉末の平均粒子径(通気法による)を0.70〜0.8
0μm としたことにより、引き上げたLiTaO3 単結
晶における気泡(全ポア)の発生率を低減し得るため、
良好な品質のLiTaO3 単結晶が高歩留まりで得られ
る。
As described above, according to the present invention, T
a 2 average particle diameter of the O 5 powder (by insufflation) from 0.70 to 0.8
By setting the thickness to 0 μm, the rate of generation of bubbles (all pores) in the pulled LiTaO 3 single crystal can be reduced.
Good quality LiTaO 3 single crystals can be obtained with high yield.

【図面の簡単な説明】[Brief description of the drawings]

【図1】Ta2 5 粉末の平均粒子径と全ポアの発生件
数率との関係を示す図である。
FIG. 1 is a graph showing the relationship between the average particle diameter of Ta 2 O 5 powder and the rate of occurrence of all pores.

【図2】Ta2 5 粉末に不純物として含まれるSi含有
量と全ポアの発生件数率との関係を示す図である。
FIG. 2 is a diagram showing the relationship between the content of Si contained as an impurity in Ta 2 O 5 powder and the incidence rate of all pores.

【図3】Ta2 5 粉末に不純物として含まれるAl含有
量と全ポアの発生件数率との関係を示す図である。
FIG. 3 is a graph showing the relationship between the content of Al contained as an impurity in Ta 2 O 5 powder and the rate of occurrence of all pores.

【図4】Ta2 5 粉末の水分含有量と全ポアの発生件
数率との関係を示す図である。
FIG. 4 is a graph showing the relationship between the water content of Ta 2 O 5 powder and the rate of occurrence of all pores.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 Pt−Rhるつぼを用いた引上げ法によ
りLiTaO3 単結晶を製造する際に用いられる、Ta
2 5 およびLi2 3 を主体とするLiTaO3 単結
晶材料において、Ta2 5 の平均粒子径(通気法によ
る)を0.70〜0.80μm としたことを特徴とする
LiTaO3 単結晶材料。
1. A method for producing a LiTaO 3 single crystal by a pulling method using a Pt-Rh crucible , Ta
In LiTaO 3 single crystal material mainly composed of 2 O 5 and Li 2 O 3, LiTaO 3 single, characterized in that the average particle size of the Ta 2 O 5 and (by insufflation) and 0.70~0.80μm Crystal material.
JP3286799A 1991-10-31 1991-10-31 LiTaO3 single crystal material Expired - Fee Related JP3015552B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3286799A JP3015552B2 (en) 1991-10-31 1991-10-31 LiTaO3 single crystal material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3286799A JP3015552B2 (en) 1991-10-31 1991-10-31 LiTaO3 single crystal material

Publications (2)

Publication Number Publication Date
JPH05124897A JPH05124897A (en) 1993-05-21
JP3015552B2 true JP3015552B2 (en) 2000-03-06

Family

ID=17709198

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3286799A Expired - Fee Related JP3015552B2 (en) 1991-10-31 1991-10-31 LiTaO3 single crystal material

Country Status (1)

Country Link
JP (1) JP3015552B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4742254B2 (en) * 2000-11-29 2011-08-10 独立行政法人物質・材料研究機構 Single crystal growth method
JP3938147B2 (en) 2003-04-08 2007-06-27 住友金属鉱山株式会社 Lithium tantalate substrate and manufacturing method thereof
CN116905087B (en) * 2023-09-13 2023-11-28 天通控股股份有限公司 Growth method of lithium tantalate crystal

Also Published As

Publication number Publication date
JPH05124897A (en) 1993-05-21

Similar Documents

Publication Publication Date Title
US4144117A (en) Method for producing a lithium tantalate single crystal
JP3015552B2 (en) LiTaO3 single crystal material
JPS62212298A (en) Method of increasing ti-al203 synchronizable laser crystal fluorescence by controlling crystal growth atomosphere
US4135963A (en) Lithium tantalate single crystal growth from a platinum-rhodium crucible in an inert gas, nitrogen or reducing gas atmosphere
JPH07118096A (en) Single crystal material
US4634492A (en) Chrysoberyl single crystal and method of producing the same
JP2507910B2 (en) Method for producing oxide single crystal
JP3123696B2 (en) Method for manufacturing quartz glass crucible
JPS60195016A (en) Purification of metallic silicon
JPH0791148B2 (en) Quartz crucible for pulling silicon single crystal and manufacturing method thereof
JP2507997B2 (en) Single crystal growth method
WO1999061686A1 (en) Method for producing monocrystals of lanthanum and gallium silicate
JPH09328400A (en) Production of lithium tantalate single crystal
JP3132956B2 (en) Method for producing oxide single crystal
JP2553967B2 (en) Ultra-high cleanliness stainless steel manufacturing method
JP2003137691A (en) Method of producing single crystal
JPS6128639B2 (en)
JP2787995B2 (en) Method for producing lithium tetraborate single crystal
KR960005521B1 (en) Preparation of litao3 single crystal
JP3115145B2 (en) Single crystal manufacturing method
JPS59131595A (en) Production of single crystal
JPH0798715B2 (en) Method for producing silicon single crystal
JPH0253397B2 (en)
RU2156327C2 (en) Method of preparing charge for growing lanthanum-gallium silicate monocrystals
EP2143831B1 (en) Method for pulling up silicon single crystal using a silica glass crucible.

Legal Events

Date Code Title Description
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 19991130

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20071217

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081217

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20091217

Year of fee payment: 10

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20091217

Year of fee payment: 10

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101217

Year of fee payment: 11

LAPS Cancellation because of no payment of annual fees