JPH09153446A5 - - Google Patents
Info
- Publication number
- JPH09153446A5 JPH09153446A5 JP1995312914A JP31291495A JPH09153446A5 JP H09153446 A5 JPH09153446 A5 JP H09153446A5 JP 1995312914 A JP1995312914 A JP 1995312914A JP 31291495 A JP31291495 A JP 31291495A JP H09153446 A5 JPH09153446 A5 JP H09153446A5
- Authority
- JP
- Japan
- Prior art keywords
- prism
- photosensitive film
- interference exposure
- exposure apparatus
- interference
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31291495A JP3564215B2 (ja) | 1995-11-30 | 1995-11-30 | 干渉露光装置およびそれを用いた干渉露光方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31291495A JP3564215B2 (ja) | 1995-11-30 | 1995-11-30 | 干渉露光装置およびそれを用いた干渉露光方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH09153446A JPH09153446A (ja) | 1997-06-10 |
| JP3564215B2 JP3564215B2 (ja) | 2004-09-08 |
| JPH09153446A5 true JPH09153446A5 (enrdf_load_html_response) | 2004-12-16 |
Family
ID=18034990
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31291495A Expired - Fee Related JP3564215B2 (ja) | 1995-11-30 | 1995-11-30 | 干渉露光装置およびそれを用いた干渉露光方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3564215B2 (enrdf_load_html_response) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4514317B2 (ja) * | 2000-11-27 | 2010-07-28 | 株式会社ミツトヨ | 露光装置 |
| US8110345B2 (en) | 2002-12-04 | 2012-02-07 | Taiwan Semiconductor Manufacturing Company, Ltd. | High resolution lithography system and method |
| US7492442B2 (en) * | 2004-08-27 | 2009-02-17 | Asml Holding N.V. | Adjustable resolution interferometric lithography system |
| KR100881140B1 (ko) * | 2007-08-09 | 2009-02-02 | 삼성전기주식회사 | 나노패턴 형성장치 및 이를 이용한 나노패턴 형성방법 |
| JP5487592B2 (ja) * | 2007-11-06 | 2014-05-07 | セイコーエプソン株式会社 | レーザー加工方法 |
| CN112596139A (zh) * | 2020-12-18 | 2021-04-02 | 中国科学院上海光学精密机械研究所 | 一种短波范围反射式体光栅的光栅结构写入方法 |
-
1995
- 1995-11-30 JP JP31291495A patent/JP3564215B2/ja not_active Expired - Fee Related
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