JPH09126900A5 - - Google Patents

Info

Publication number
JPH09126900A5
JPH09126900A5 JP1996224091A JP22409196A JPH09126900A5 JP H09126900 A5 JPH09126900 A5 JP H09126900A5 JP 1996224091 A JP1996224091 A JP 1996224091A JP 22409196 A JP22409196 A JP 22409196A JP H09126900 A5 JPH09126900 A5 JP H09126900A5
Authority
JP
Japan
Prior art keywords
spatially separated
beams
polarized
phase
pair
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996224091A
Other languages
English (en)
Japanese (ja)
Other versions
JP3791975B2 (ja
JPH09126900A (ja
Filing date
Publication date
Priority claimed from US08/523,559 external-priority patent/US5663793A/en
Application filed filed Critical
Publication of JPH09126900A publication Critical patent/JPH09126900A/ja
Publication of JPH09126900A5 publication Critical patent/JPH09126900A5/ja
Application granted granted Critical
Publication of JP3791975B2 publication Critical patent/JP3791975B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP22409196A 1995-09-05 1996-08-26 ホモダイン干渉受信計及びその受信法 Expired - Fee Related JP3791975B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/523,559 US5663793A (en) 1995-09-05 1995-09-05 Homodyne interferometric receiver and calibration method having improved accuracy and functionality
US08/523559 1995-09-05

Publications (3)

Publication Number Publication Date
JPH09126900A JPH09126900A (ja) 1997-05-16
JPH09126900A5 true JPH09126900A5 (enExample) 2004-08-19
JP3791975B2 JP3791975B2 (ja) 2006-06-28

Family

ID=24085499

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22409196A Expired - Fee Related JP3791975B2 (ja) 1995-09-05 1996-08-26 ホモダイン干渉受信計及びその受信法

Country Status (3)

Country Link
US (1) US5663793A (enExample)
JP (1) JP3791975B2 (enExample)
DE (1) DE19635907C2 (enExample)

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US6548801B1 (en) * 2000-01-13 2003-04-15 Agilent Technologies, Inc. System and method for optical heterodyne detection of an optical signal
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US6856400B1 (en) * 2000-12-14 2005-02-15 Luna Technologies Apparatus and method for the complete characterization of optical devices including loss, birefringence and dispersion effects
JP2004530869A (ja) * 2001-03-13 2004-10-07 ザイゴ コーポレーション 平均干渉位置測定におけるサイクリック・エラーの低減
JP4030960B2 (ja) * 2001-08-23 2008-01-09 ザイゴ コーポレーション 入力ビームの方向の動的干渉分光制御
JP2005509147A (ja) 2001-11-05 2005-04-07 ザイゴ コーポレーション 干渉周期誤差の補償
US7030994B2 (en) * 2002-02-12 2006-04-18 Zygo Corporation Method and apparatus to measure fiber optic pickup errors in interferometry systems
US6906784B2 (en) 2002-03-04 2005-06-14 Zygo Corporation Spatial filtering in interferometry
WO2003095940A2 (en) * 2002-05-13 2003-11-20 Zygo Corporation Compensation for geometric effects of beam misalignments in plane mirror interferometers
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US7616322B2 (en) * 2002-07-08 2009-11-10 Zygo Corporation Cyclic error compensation in interferometry systems
US7428685B2 (en) * 2002-07-08 2008-09-23 Zygo Corporation Cyclic error compensation in interferometry systems
US7262860B2 (en) * 2002-07-29 2007-08-28 Zygo Corporation Compensation for errors in off-axis interferometric measurements
US7274462B2 (en) * 2002-09-09 2007-09-25 Zygo Corporation In SITU measurement and compensation of errors due to imperfections in interferometer optics in displacement measuring interferometry systems
AU2003267144A1 (en) * 2002-09-09 2004-03-29 Zygo Corporation Measurement and compensation of errors in interferometrs
EP1583934A1 (en) * 2002-12-12 2005-10-12 Zygo Corporation In-process correction of stage mirror deformations during a photolithography exposure cycle
WO2004113826A2 (en) * 2003-06-19 2004-12-29 Zygo Corporation Compensation for imperfections in a measurement object and for beam misalignments in plane mirror interferometers
US7327465B2 (en) * 2003-06-19 2008-02-05 Zygo Corporation Compensation for effects of beam misalignments in interferometer metrology systems
US7180603B2 (en) * 2003-06-26 2007-02-20 Zygo Corporation Reduction of thermal non-cyclic error effects in interferometers
US7057737B2 (en) * 2003-08-29 2006-06-06 4D Technology Corporation Common optical-path testing of high-numerical-aperture wavefronts
US7230717B2 (en) * 2003-08-28 2007-06-12 4D Technology Corporation Pixelated phase-mask interferometer
US7079251B2 (en) * 2003-10-16 2006-07-18 4D Technology Corporation Calibration and error correction in multi-channel imaging
WO2005045529A2 (en) * 2003-11-04 2005-05-19 Zygo Corporation Characterization and compensation of errors in multi-axis interferometry system
WO2005067815A1 (en) * 2004-01-05 2005-07-28 Zygo Corporation Stage alignment in lithography tools
WO2005067579A2 (en) * 2004-01-06 2005-07-28 Zygo Corporation Multi-axis interferometers and methods and systems using multi-axis interferometers
US7310152B2 (en) * 2004-03-03 2007-12-18 Zygo Corporation Interferometer assemblies having reduced cyclic errors and system using the interferometer assemblies
US7206069B2 (en) * 2004-03-29 2007-04-17 Lucent Technologies Inc. Optical analyzers of polarization properties
US7280224B2 (en) * 2004-04-22 2007-10-09 Zygo Corporation Interferometry systems and methods of using interferometry systems
US7375823B2 (en) * 2004-04-22 2008-05-20 Zygo Corporation Interferometry systems and methods of using interferometry systems
WO2006014406A2 (en) 2004-06-30 2006-02-09 Zygo Corporation Interferometric optical assemblies and systems including interferometric optical assemblies
WO2006041984A2 (en) * 2004-10-06 2006-04-20 Zygo Corporation Error correction in interferometry systems
WO2006102234A2 (en) * 2005-03-18 2006-09-28 Zygo Corporation Multi-axis interferometer with procedure and data processing for mirror mapping
EP1869399A2 (en) 2005-04-11 2007-12-26 Zetetic Institute Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry
WO2006124707A2 (en) * 2005-05-18 2006-11-23 Zetetic Institute Apparatus and method for in situ and ex situ measurements of optical system flare
US7405832B2 (en) * 2005-08-08 2008-07-29 Zetetic Institute Apparatus and methods for reduction and compensation of effects of vibrations and of environmental effects in wavefront interferometry
WO2007025147A2 (en) * 2005-08-26 2007-03-01 Zetetic Institute Apparatus and method for measurement and compensation of atmospheric turbulence effects in wavefront interferometry
US20070121115A1 (en) * 2005-11-15 2007-05-31 Zetetic Institute Apparatus and method for reducing effects of coherent artifacts and compensation of effects of vibrations and environmental changes in interferometry
DE102007025037B3 (de) * 2007-05-29 2008-12-18 Bundesrepublik Deutschland, vertr. d. d. Bundesministerium für Wirtschaft und Technologie, dieses vertr. d. d. Präsidenten der Physikalisch-Technischen Bundesanstalt Verfahren zum Ermitteln eines Frequenz- und/oder Phasenunterschieds
US7576868B2 (en) * 2007-06-08 2009-08-18 Zygo Corporation Cyclic error compensation in interferometry systems
US7821647B2 (en) * 2008-02-21 2010-10-26 Corning Incorporated Apparatus and method for measuring surface topography of an object
US8649019B2 (en) 2009-01-28 2014-02-11 Kobe Steel, Ltd. Shape determining device
JP5849103B2 (ja) * 2011-02-01 2016-01-27 ザイゴ コーポレーションZygo Corporation 干渉ヘテロダイン光学エンコーダシステム
CN102266116B (zh) * 2011-06-08 2014-03-26 广东中烟工业有限责任公司 一种再造烟叶及其制备方法和应用
KR101514679B1 (ko) * 2014-04-10 2015-04-24 한국표준과학연구원 상태 변분 원리를 이용한 진동 변위 측정 방법
KR102436448B1 (ko) 2017-12-13 2022-08-24 에이에스엠엘 홀딩 엔.브이. 빔 분할 프리즘 시스템
US11262191B1 (en) 2018-07-12 2022-03-01 Onto Innovation Inc. On-axis dynamic interferometer and optical imaging systems employing the same
US12216051B2 (en) 2022-01-21 2025-02-04 Onto Innovation Inc. Dynamic phase-shift interferometer utilizing a synchronous optical frequency-shift
CN114719951A (zh) * 2022-03-01 2022-07-08 天津大学 适用于测量微振动的光学系统

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JPH0663867B2 (ja) * 1985-05-28 1994-08-22 キヤノン株式会社 波面状態検出用の干渉装置
US4842408A (en) * 1986-05-09 1989-06-27 Canon Kabushiki Kaisha Phase shift measuring apparatus utilizing optical meterodyne techniques
US4787747A (en) * 1987-11-13 1988-11-29 Zygo Corporation Straightness of travel interferometer
US5018862A (en) * 1989-11-02 1991-05-28 Aerotech, Inc. Successive fringe detection position interferometry
US5374991A (en) * 1991-03-29 1994-12-20 Gradient Lens Corporation Compact distance measuring interferometer
DE4114786A1 (de) * 1991-05-06 1992-11-12 Zimmer Gmbh Beruehrungsfreies Interferometer zum bestimmen des betrags und der richtung einer messgutbewegung
EP0561015A1 (de) * 1992-03-17 1993-09-22 International Business Machines Corporation Interferometrische Phasenmessung
US5243649A (en) * 1992-09-29 1993-09-07 The Johns Hopkins University Apparatus and method for quantum mechanical encryption for the transmission of secure communications
US5557399A (en) * 1995-03-22 1996-09-17 Zygo Corporation Optical gap measuring apparatus and method

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