JPH08980Y2 - 有害・有毒ガス配管装置 - Google Patents
有害・有毒ガス配管装置Info
- Publication number
- JPH08980Y2 JPH08980Y2 JP1987097853U JP9785387U JPH08980Y2 JP H08980 Y2 JPH08980 Y2 JP H08980Y2 JP 1987097853 U JP1987097853 U JP 1987097853U JP 9785387 U JP9785387 U JP 9785387U JP H08980 Y2 JPH08980 Y2 JP H08980Y2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- toxic gas
- harmful
- pipe
- toxic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000002341 toxic gas Substances 0.000 title claims description 25
- 231100001261 hazardous Toxicity 0.000 title claims description 4
- 239000007789 gas Substances 0.000 claims description 32
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 9
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 9
- 238000001514 detection method Methods 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000011328 necessary treatment Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
Landscapes
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
- Thermal Insulation (AREA)
- Rigid Pipes And Flexible Pipes (AREA)
- Physical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987097853U JPH08980Y2 (ja) | 1987-06-25 | 1987-06-25 | 有害・有毒ガス配管装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987097853U JPH08980Y2 (ja) | 1987-06-25 | 1987-06-25 | 有害・有毒ガス配管装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS645639U JPS645639U (enrdf_load_stackoverflow) | 1989-01-12 |
| JPH08980Y2 true JPH08980Y2 (ja) | 1996-01-17 |
Family
ID=31323606
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987097853U Expired - Lifetime JPH08980Y2 (ja) | 1987-06-25 | 1987-06-25 | 有害・有毒ガス配管装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08980Y2 (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100801843B1 (ko) * | 2006-08-22 | 2008-02-11 | 동부일렉트로닉스 주식회사 | 가스 처리 장치 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2511363B2 (ja) * | 1992-07-06 | 1996-06-26 | 株式会社荏原製作所 | 真空処理装置 |
| JP2001053066A (ja) * | 1999-05-28 | 2001-02-23 | Tokyo Electron Ltd | オゾン処理装置およびその方法 |
| US6515290B1 (en) * | 2000-09-05 | 2003-02-04 | Axcelis Technologies, Inc. | Bulk gas delivery system for ion implanters |
| JP7273665B2 (ja) * | 2019-09-11 | 2023-05-15 | 東京エレクトロン株式会社 | 熱媒体循環システム及び基板処理装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6286598U (enrdf_load_stackoverflow) * | 1985-11-20 | 1987-06-02 |
-
1987
- 1987-06-25 JP JP1987097853U patent/JPH08980Y2/ja not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100801843B1 (ko) * | 2006-08-22 | 2008-02-11 | 동부일렉트로닉스 주식회사 | 가스 처리 장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS645639U (enrdf_load_stackoverflow) | 1989-01-12 |
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