JPH08332696A - Metal member fitted with insulating adhesive material and production thereof - Google Patents
Metal member fitted with insulating adhesive material and production thereofInfo
- Publication number
- JPH08332696A JPH08332696A JP13906895A JP13906895A JPH08332696A JP H08332696 A JPH08332696 A JP H08332696A JP 13906895 A JP13906895 A JP 13906895A JP 13906895 A JP13906895 A JP 13906895A JP H08332696 A JPH08332696 A JP H08332696A
- Authority
- JP
- Japan
- Prior art keywords
- insulating adhesive
- metal body
- metal member
- adhesive
- adhesive layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Laminated Bodies (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Insulated Metal Substrates For Printed Circuits (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、絶縁接着材料付き金属
体及びその製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a metal body with an insulating adhesive material and a method for manufacturing the same.
【0002】[0002]
【従来の技術】電気機器が小型かつ高性能となるのに伴
い、電子部品の実装密度が高くなり、これら電子部品か
ら発生する熱を放散させる手段が必要となっている。電
子部品から発生する熱を放散させる手段として、発熱源
の全面又は一部に金属体を接着したものがある。なお、
発熱源とは、作動時に直接熱源となる素子のほか、半導
体素子のパッケージ、電子部品を搭載したプリント基板
なども含む意味である。金属体としては、放熱性の良好
なアルミニウム、銅、42合金(低熱膨張率の合金とし
て知られる)などを用いられている。2. Description of the Related Art As electric equipment becomes smaller and has higher performance, the mounting density of electronic parts becomes higher, and a means for dissipating heat generated from these electronic parts is required. As a means for dissipating heat generated from an electronic component, there is one in which a metal body is bonded to the entire surface or a part of the heat source. In addition,
The heat generation source is meant to include not only an element that directly becomes a heat source during operation, but also a semiconductor element package, a printed board on which electronic components are mounted, and the like. As the metal body, aluminum, copper, 42 alloy (known as an alloy having a low coefficient of thermal expansion) or the like having good heat dissipation is used.
【0003】金属体と発熱源とは、絶縁接着材料、例え
ばガラスエポキシプリプレグ、アクリルゴムを主成分と
する絶縁接着材料などを用いて接着している。金属体と
発熱源との接着作業を簡単にするため、金属体の表面
に、あらかじめ、Bステージ化した絶縁接着剤層を形成
しておくことも提案されている。The metal body and the heat source are bonded together by using an insulating adhesive material such as glass epoxy prepreg or an insulating adhesive material containing acrylic rubber as a main component. In order to simplify the work of adhering the metal body and the heat source, it has been proposed to previously form an insulating adhesive layer in a B stage on the surface of the metal body.
【0004】[0004]
【発明が解決しようとする課題】絶縁接着材料を用いる
方法では、1)接着の直前に金属体の表面処理を行う必
要があり工程が煩雑、2)絶縁接着材料シートと金属板
のそれぞれについて使用する形状への打抜き及び積層時
の位置合わせが必要、3)ガラスエポキシプリプレグや
接着シートでは、放熱性が不十分である。などの問題点
があった。In the method using the insulating adhesive material, 1) the surface treatment of the metal body needs to be performed immediately before the adhesion, and the process is complicated, and 2) the insulating adhesive material sheet and the metal plate are used respectively. It is necessary to perform punching into a desired shape and alignment during lamination. 3) Glass epoxy prepreg and adhesive sheet have insufficient heat dissipation. There were problems such as.
【0005】金属体にあらかじめ、Bステージ化した絶
縁接着剤層を形成しておけば、このような問題点を解決
できる。しかしながら、Bステージ化した絶縁接着剤層
を形成するには、絶縁接着材料を印刷、乾燥する工程を
行うことが行われているが、金属体上に絶縁接着材料を
印刷するとき、気泡が残り易く、絶縁特性が低下すると
いう重大な問題があった。また、発熱源の表面には、プ
リント回路が形成されていることが多く、回路導体の間
には、凹みががある。この凹みを埋めるためには、接着
剤の流動性を大にしなければならない。そうすると、接
着時に流れすぎて、回路導体と金属体間との絶縁に必要
な間隔を保持できず、絶縁信頼性を維持できない。本発
明は、金属体の表面に、あらかじめ、Bステージ化した
絶縁接着剤層を形成した金属体について、絶縁特性を改
善することを目的とするものである。If a B-staged insulating adhesive layer is formed on the metal body in advance, such a problem can be solved. However, in order to form the B-staged insulating adhesive layer, a step of printing and drying the insulating adhesive material is performed, but when the insulating adhesive material is printed on the metal body, bubbles remain. However, there is a serious problem that the insulation characteristics are deteriorated. Further, a printed circuit is often formed on the surface of the heat source, and there is a recess between the circuit conductors. In order to fill this recess, the fluidity of the adhesive must be increased. If so, the flow of too much at the time of bonding cannot maintain a space required for insulation between the circuit conductor and the metal body, and insulation reliability cannot be maintained. An object of the present invention is to improve the insulating property of a metal body in which a B-staged insulating adhesive layer is formed on the surface of the metal body in advance.
【0006】[0006]
【課題を解決するための手段】本発明は、表面に絶縁接
着層を形成した金属体において、絶縁接着層の金属体側
を流動性小、表面側を流動性大としてなる絶縁接着材料
付き金属体である。DISCLOSURE OF THE INVENTION The present invention provides a metal body having an insulating adhesive layer formed on the surface thereof, wherein the metal body side of the insulating adhesive layer has low fluidity and the surface side has high fluidity. Is.
【0007】次に、前記絶縁接着層を形成する方法を説
明する。第1は、シート状支持体上に接着剤を塗工して
得られた接着剤シートを、あらかじめ加熱した金属体表
面に接着剤層が金属体と接するようにして積層する方法
である。金属体と絶縁接着層とを積層するときに、あら
かじめ金属体が加熱されているので、積層する絶縁接着
層のうち、金属体と接する側が加熱され、表面側は冷却
されるので、金属体と接する側の硬化が表面側より進行
し、絶縁接着層の金属体側を流動性小、表面側を流動性
大とすることができる。この方法では、絶縁接着層を2
層にわけて塗工する必要がなく、工程的に有利である。
なお、金属体の加熱温度は、130〜200℃とするの
が好ましい。金属体の温度が高いと流動性が大きい層が
少なくなり、逆では流動性が小さい層が少なくなる。Next, a method of forming the insulating adhesive layer will be described. The first is a method of laminating an adhesive sheet obtained by applying an adhesive on a sheet-shaped support so that the adhesive layer is in contact with the metal body on the surface of the metal body that has been heated in advance. When the metal body and the insulating adhesive layer are laminated, since the metal body is heated in advance, the side of the insulating adhesive layer to be laminated that is in contact with the metal body is heated, and the surface side is cooled. Curing of the contacting side proceeds from the surface side, and the metal body side of the insulating adhesive layer can have low fluidity and the surface side can have high fluidity. In this method, two insulating adhesive layers are used.
It is not necessary to apply the coating in layers, which is advantageous in terms of process.
The heating temperature of the metal body is preferably 130 to 200 ° C. When the temperature of the metal body is high, the number of layers having high fluidity decreases, and conversely, the number of layers having low fluidity decreases.
【0008】絶縁接着層を形成する方法の第2は、シー
ト状支持体上に、流動性が大きい接着剤ワニスを塗布
し、その上に流動性が小さい接着剤ワニスを塗布して得
られた接着剤シートを、金属体表面に、接着剤層が金属
体と接するようにして積層する方法である。このように
することにより、絶縁接着材料をホットロールラミネー
タ等の連続積層工程により積層することができ、絶縁接
着材料付き金属体を安定的に製造可能となる。The second method of forming an insulating adhesive layer was obtained by applying an adhesive varnish having a high fluidity onto a sheet-shaped support and then applying an adhesive varnish having a low fluidity thereon. This is a method of laminating an adhesive sheet on the surface of a metal body so that the adhesive layer is in contact with the metal body. By doing so, the insulating adhesive material can be laminated by a continuous laminating process such as a hot roll laminator, and the metal body with the insulating adhesive material can be stably manufactured.
【0009】接着剤としては、エポキシ樹脂系、ポリイ
ミド樹脂系、フェノール樹脂系などを使用することがで
きる。接着剤組成物中に、可とう性付与成分を加えるこ
とが好ましい。可とう性付与成分としては、電気絶縁性
の良い高分子物質、例えば、高分子量エポキシ樹脂、超
高分子量エポキシ樹脂、アクリルゴム、NBR、エポキ
シ変性アクリルゴム、エポキシ化ポリブタジエン、フェ
ノキシ樹脂などがあり、これらは、単独でも2種以上併
用してもよい。As the adhesive, an epoxy resin type, a polyimide resin type, a phenol resin type or the like can be used. It is preferable to add a flexibility imparting component to the adhesive composition. Examples of the flexibility-imparting component include a polymer substance having a good electric insulation property, such as a high molecular weight epoxy resin, an ultra high molecular weight epoxy resin, an acrylic rubber, NBR, an epoxy modified acrylic rubber, an epoxidized polybutadiene, and a phenoxy resin. These may be used alone or in combination of two or more.
【0010】また、回路導体との接着性を向上させるた
め、エポキシシラン、アミノシラン、尿素シランなどの
シランカップリング剤を配合するのが好ましい。このよ
うなカップリング剤としては、γ−グリシドキシプロピ
ルトリメトキシシラン、γ−メルカプトプロピルトリメ
トキシシラン、γ−アミノプロピルトリエトキシシラ
ン、N−β−アミノエチル−γ−アミノプロピルトリメ
トキシシランなどが挙げられる。Further, in order to improve the adhesiveness to the circuit conductor, it is preferable to add a silane coupling agent such as epoxysilane, aminosilane, ureasilane or the like. Examples of such coupling agents include γ-glycidoxypropyltrimethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, N-β-aminoethyl-γ-aminopropyltrimethoxysilane, and the like. Is mentioned.
【0011】流動性を大とすには、分子量500以下
の、ビスフェノールA型又はビスフェノールF型エポキ
シ樹脂を含有させる。またエポキシ樹脂の硬化剤として
は特に制限するものではないが、ワニスライフの長い潜
在性の高いものが望ましい。この例としては、3級アミ
ン、酸無水物、イミダゾール化合物、ポリフェノール樹
脂、マスクイソシアネートなどの1種以上を使用するこ
とができる。To increase fluidity, a bisphenol A type or bisphenol F type epoxy resin having a molecular weight of 500 or less is contained. The curing agent for the epoxy resin is not particularly limited, but a curing agent having a long varnish life and high potential is desirable. As this example, one or more kinds of tertiary amine, acid anhydride, imidazole compound, polyphenol resin, masked isocyanate and the like can be used.
【0012】さらに、硬化促進剤としてイミダゾール類
を配合するのが好ましい。このようなイミダゾール類と
しては、2−メチルイミダゾール、2−エチル−4−メ
チルイミダゾール、1−シアノエチル−2−フェニルイ
ミダゾール、1−シアノエチル−2−フェニルイミダゾ
リウムトリメリテートなどが挙げられる。Further, it is preferable to add imidazoles as a curing accelerator. Examples of such imidazoles include 2-methylimidazole, 2-ethyl-4-methylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-phenylimidazolium trimellitate and the like.
【0013】放熱性をよくするため、接着剤に高熱伝導
率の無機フィラーを加える。この目的に合う無機フィラ
ーとしては、アルミナ粉末、窒化アルミニウム粉末、窒
化ホウ素粉末などが挙げられる。無機フィラーの配合量
は、全接着剤の10〜60体積%である必要がある。1
0%未満では放熱性向上の効果が少ないため不適当であ
り、60%を超えて添加した場合、接着シートの可とう
性低下、接着性の低下、ボイド残存による耐電圧の低下
等の問題が発生するため不適当である。また流動性の調
整及び耐クラック性の向上のために1種類以上の短繊維
状無機物を添加してもよい。In order to improve heat dissipation, an inorganic filler having a high thermal conductivity is added to the adhesive. Examples of the inorganic filler suitable for this purpose include alumina powder, aluminum nitride powder, and boron nitride powder. The blending amount of the inorganic filler needs to be 10 to 60% by volume of the total adhesive. 1
If it is less than 0%, the effect of improving heat dissipation is small, so that it is unsuitable, and if it is added in excess of 60%, the flexibility of the adhesive sheet, the adhesiveness, and the withstand voltage due to the remaining voids may decrease. It is inappropriate because it occurs. Further, one or more kinds of short fibrous inorganic substances may be added for the purpose of adjusting fluidity and improving crack resistance.
【0014】接着剤をシート状支持体に塗工する方法と
してはバーコータ、リップコータ、ロールコータなどが
あるがクレータ、ボイドなどの欠陥が少なく、塗膜厚を
ほぼ均一に塗工できる方法ならば、どのような方法でも
よい。A bar coater, a lip coater, a roll coater and the like can be used as a method for applying an adhesive to a sheet-like support, but if the method has few defects such as craters and voids and the coating film thickness can be applied almost uniformly, Any method will do.
【0015】2層の絶縁接着材料をシート状支持体上に
形成する方法については以下の通りである。シート状支
持体上に塗膜第1層とし絶縁接着材料を塗工し、これを
Bステージ状態(若干硬化、ゲル化が進んだ状態であり
全硬化発熱量の20から60%の発熱を終えた状態)に
加熱硬化する。この上に塗膜第2層を塗工し、これをA
(ほぼ未硬化でゲル化していない状態であり、全硬化発
熱量の0から20%の発熱を終えた状態)又はBステー
ジ状態に加熱硬化する。The method for forming the two-layer insulating adhesive material on the sheet-like support is as follows. An insulating adhesive material was applied as the first layer of the coating film on the sheet-like support, and this was in a B stage state (a state in which it was slightly cured and gelled, and the heat generation of 20 to 60% of the total curing heat value was completed. Heat curing to A second layer of coating film is applied on this, and this is
(It is in a state that it is almost uncured and has not gelled, and the heat generation of 0 to 20% of the total amount of heat generated for curing has been completed) or it is heat-cured to the B stage state.
【0016】なお、絶縁接着材料の膜厚については、被
着体である片面又は両面配線板等の凹凸を充填可能であ
る程度の厚さが必要である。膜厚が厚すぎる場合には、
熱抵抗が増大するため好ましくない。35μm回路を充
填するために必要とする絶縁接着材料の膜厚は通常70
〜120μmが好ましく、70μm回路を充填するため
には120〜210μmが好ましい。The insulating adhesive material needs to have a certain thickness so that it can fill the irregularities of the adherend such as a single-sided or double-sided wiring board. If the film thickness is too thick,
It is not preferable because the thermal resistance increases. The thickness of the insulating adhesive material required to fill the 35 μm circuit is usually 70
˜120 μm is preferable, and for filling a 70 μm circuit, 120 to 210 μm is preferable.
【0017】このようにして得られた絶縁接着材料を金
属体に積層し、加熱加圧して一体化する。これには、ホ
ットロールラミネータ、真空ラミネータ、プレス、真空
プレスなどを用いることができる。ホットロールラミネ
ータを用いた場合は、プレスを用いた場合に比べて連続
的に低コストで積層可能である点で好ましい。この場合
の絶縁接着材料積層後の絶縁接着材料の硬化度は、A又
はBステージにあることが必要である。The insulating adhesive material thus obtained is laminated on a metal body and heated and pressed to be integrated. For this, a hot roll laminator, a vacuum laminator, a press, a vacuum press or the like can be used. The use of a hot roll laminator is preferable in that stacking can be continuously performed at low cost as compared with the case of using a press. In this case, the curing degree of the insulating adhesive material after the insulating adhesive material is laminated needs to be in the A or B stage.
【0018】得られた絶縁接着材料付き金属板は次のよ
うな用途に適している。すなわち、絶縁接着材料付き金
属板に必要に応じて打抜き、穴あけ、等の加工を行い、
これと片面または両面銅回路付き積層板、または多層配
線板、銅はく、銅板、半導体チップ、半導体パッケージ
等を積層し絶縁接着材料を硬化させる。これにより、放
熱性、密着性に優れる配線板、半導体パッケージ等を得
ることができる。The obtained metal plate with an insulating adhesive material is suitable for the following uses. That is, the metal plate with insulating adhesive material is punched, punched, etc., if necessary,
This is laminated with a single-sided or double-sided copper circuit laminated board, or a multilayer wiring board, a copper foil, a copper plate, a semiconductor chip, a semiconductor package, and the insulating adhesive material is cured. This makes it possible to obtain a wiring board, a semiconductor package, and the like that have excellent heat dissipation and adhesion.
【0019】金属体表面に絶縁接着剤層を形成する前
に、絶縁接着材料の密着性を向上するために表面処理を
行うことが好ましい。以下その処理方法について説明す
る。Before forming the insulating adhesive layer on the surface of the metal body, it is preferable to perform a surface treatment in order to improve the adhesion of the insulating adhesive material. The processing method will be described below.
【0020】アルミニウム板を用いる場合。 1.表面を研摩する。 2.脱脂処理(約70℃の熱水で洗浄)する。 3.表面にカップリング剤を付着させる。 4.乾燥する。When using an aluminum plate. 1. Polish the surface. 2. Degrease (wash with hot water at about 70 ° C.). 3. Apply the coupling agent to the surface. 4. dry.
【0021】銅板を用いる場合。 1.表面を研摩する。 2.硫酸水溶液、過硫酸アンモニウム水溶液、塩化銅と
塩酸を含む水溶液で洗浄して脱脂する。 3.表面を酸化する。 4.表面に形成された酸化銅を化学還元する。 5.表面にカップリング剤を付着させる。 6.乾燥する。When using a copper plate. 1. Polish the surface. 2. Degrease by washing with an aqueous solution of sulfuric acid, an aqueous solution of ammonium persulfate, an aqueous solution containing copper chloride and hydrochloric acid. 3. Oxidize the surface. 4. The copper oxide formed on the surface is chemically reduced. 5. Apply the coupling agent to the surface. 6. dry.
【0022】42合金を用いる場合。 1.表面を研摩する。 2.硫酸水溶液、過硫酸アンモニウム水溶液、塩化銅と
塩酸を含む水溶液中で、洗浄して脱脂する。 3.表面にカップリング剤を付着させる。 4.乾燥する。When using 42 alloy. 1. Polish the surface. 2. Wash and degrease in an aqueous solution of sulfuric acid, an aqueous solution of ammonium persulfate, and an aqueous solution containing copper chloride and hydrochloric acid. 3. Apply the coupling agent to the surface. 4. dry.
【0023】表面処理後、24時間以内に絶縁接着材料
を積層するのが望ましい。望ましくは、処理直後に絶縁
接着材料と積層することが望ましい。It is desirable to laminate the insulating adhesive material within 24 hours after the surface treatment. Desirably, it is desirable to laminate the insulating adhesive material immediately after the treatment.
【0024】[0024]
【作用】流動性の低い層により絶縁接着剤層の厚みを確
保し、流動性が大きい層により回路パターンの間隙を埋
める。かくて、配線板の内層回路の埋め込み性を良好に
することと、内層回路と金属ベース基板間の絶縁信頼性
を確保することが可能である。また、絶縁接着材料の膜
厚を薄くすることにより、ボイド、クレータ、異物混入
などの塗膜欠陥による絶縁信頼性の低下の効果がより多
く期待できる。The layer having low fluidity secures the thickness of the insulating adhesive layer, and the layer having high fluidity fills the gap of the circuit pattern. Thus, it is possible to improve the embeddability of the inner layer circuit of the wiring board and to secure the insulation reliability between the inner layer circuit and the metal base substrate. Further, by reducing the film thickness of the insulating adhesive material, the effect of lowering the insulation reliability due to coating film defects such as voids, craters, and inclusion of foreign matter can be expected more.
【0025】[0025]
接着剤ワニスAの調製 エポキシ当量210のビスフェノールA型エポキシ樹脂
60部(重量部、以下同じ)、フェノキシ樹脂20部、
フェノールノボラック30部、1−シアノエチル−2−
フェニルイミダゾール0.5部、γ−グリシドキシプロ
ピルトリメトキシシラン2部、アルミナ130部を溶剤
に混練した。Preparation of adhesive varnish A 60 parts of bisphenol A type epoxy resin having an epoxy equivalent of 210 (weight part, the same applies hereinafter), 20 parts of phenoxy resin,
30 parts of phenol novolac, 1-cyanoethyl-2-
0.5 part of phenylimidazole, 2 parts of γ-glycidoxypropyltrimethoxysilane and 130 parts of alumina were kneaded in a solvent.
【0026】接着剤ワニスBの調製 エポキシ当量210のビスフェノールA型エポキシ樹脂
50部、エポキシ当量1750のビスフェノールA型エ
ポキシ樹脂20部、フェノキシ樹脂40部、フェノール
ノボラック30部、1−シアノエチル−2−フェニルイ
ミダゾール0.5部、γ−グリシドキシプロピルトリメ
トキシシラン2部、アルミナ230部を溶剤に混練し
た。Preparation of Adhesive Varnish B 50 parts of bisphenol A type epoxy resin having an epoxy equivalent of 210, 20 parts of bisphenol A type epoxy resin having an epoxy equivalent of 1750, 40 parts of phenoxy resin, 30 parts of phenol novolac, 1-cyanoethyl-2-phenyl 0.5 parts of imidazole, 2 parts of γ-glycidoxypropyltrimethoxysilane and 230 parts of alumina were kneaded in a solvent.
【0027】接着剤ワニスCの調製 エポキシ当量1750のビスフェノールA型エポキシ樹
脂60部、フェノキシ樹脂40部、フェノールノボラッ
ク15部、1−シアノエチル−2−フェニルイミダゾー
ル0.5部、γ−グリシドキシプロピルトリメトキシシ
ラン2部、アルミナ130部を溶剤に混練した。Preparation of adhesive varnish C 60 parts of bisphenol A type epoxy resin having an epoxy equivalent of 1750, 40 parts of phenoxy resin, 15 parts of phenol novolac, 0.5 part of 1-cyanoethyl-2-phenylimidazole, γ-glycidoxypropyl 2 parts of trimethoxysilane and 130 parts of alumina were kneaded in a solvent.
【0028】実施例1 ポリエステルフィルムに、第1層として、乾燥後の膜厚
が70μmになるようにワニスAを塗工し、110℃に
て10分間乾燥した。第1層の上に、乾燥後の膜厚が7
0μmになるようにワニスAを再度塗工し、110℃に
て10分間乾燥した。表面を研摩し、γ−グリシドキシ
プロピルトリメトキシシランを付着させたアルミニウム
板に、上記の絶縁接着材料シートの第2層がアルミニウ
ム板表面に接するようにホットロールラミネータ(線圧
98N/cm、120℃、加圧時間1.5秒)で積層し
た。このアルミニウム板からポリエステルフィルムを剥
がし、回路形成済みのガラス−エポキシ両面回路基板
(銅はく厚さ35μm、基材厚さ200μm)に重ねて
170℃、3MPaで1時間加熱加圧した。Example 1 A varnish A was applied as a first layer to a polyester film so that the film thickness after drying was 70 μm, and dried at 110 ° C. for 10 minutes. The film thickness after drying is 7 on the first layer.
Varnish A was applied again to 0 μm and dried at 110 ° C. for 10 minutes. The surface was polished and an aluminum plate having γ-glycidoxypropyltrimethoxysilane attached thereto was placed on a hot roll laminator (linear pressure 98 N / cm, linear pressure 98 N / cm, so that the second layer of the insulating adhesive material sheet was in contact with the surface of the aluminum plate. The layers were laminated at 120 ° C. and a pressing time of 1.5 seconds). The polyester film was peeled from the aluminum plate, and the glass-epoxy double-sided circuit board (copper foil thickness 35 μm, base material thickness 200 μm) on which a circuit was formed was overlaid and heated and pressed at 170 ° C. and 3 MPa for 1 hour.
【0029】実施例2 ポリエステルフィルムに、第1層として、乾燥後の膜厚
が80μmになるように接着剤ワニスAを塗工し、11
0℃にて10分間乾燥した。第1層の上に、第2層とし
て、乾燥後の膜厚が第1層、第2層合わせて200μm
になるように接着剤ワニスBを塗工し、110℃にて1
0分間乾燥した。表面を研摩し、γ−グリシドキシプロ
ピルトリメトキシシランを付着させたアルミニウム板
に、上記の絶縁接着材料シートの第2層がアルミニウム
板表面に接するようにホットロールラミネータ(線圧9
8N/cm、120℃、加圧時間1.5秒)で積層し
た。このアルミニウム板からポリエステルフィルムを剥
がし、回路形成済みのガラス−エポキシ両面回路基板
(銅はく厚さ70μm、基材厚さ200μm)に重ねて
170℃、3MPaで1時間加熱加圧した。Example 2 A polyester film was coated with an adhesive varnish A as a first layer so that the film thickness after drying was 80 μm.
It was dried at 0 ° C. for 10 minutes. On the first layer, as the second layer, the film thickness after drying is 200 μm in total for the first layer and the second layer.
Adhesive varnish B is applied so that
Dry for 0 minutes. The surface of the aluminum plate was polished and γ-glycidoxypropyltrimethoxysilane was adhered to the aluminum plate. A hot roll laminator (line pressure 9) was used so that the second layer of the insulating adhesive material sheet was in contact with the surface of the aluminum plate.
The layers were laminated at 8 N / cm, 120 ° C., and a pressing time of 1.5 seconds). The polyester film was peeled from the aluminum plate, and the glass-epoxy double-sided circuit board (copper foil thickness 70 μm, base material thickness 200 μm) on which a circuit was formed was overlaid and heated and pressed at 170 ° C. and 3 MPa for 1 hour.
【0030】実施例3 ポリエステルフィルムに、第1層として、乾燥後の膜厚
が80μmになるように接着剤ワニスAを塗工し、11
0℃にて10分間乾燥した。第1層の上に、第2層とし
て、乾燥後の膜厚が第1層、第2層合わせて200μm
になるように接着剤ワニスCを塗工し、110℃にて1
0分間乾燥した。表面を研摩し、γ−グリシドキシプロ
ピルトリメトキシシランを付着させたアルミニウム板
に、上記の絶縁接着材料シートの第2層がアルミニウム
板表面に接するようにホットロールラミネータ(線圧9
8N/cm、120℃、加圧時間1.5秒)で積層し
た。このアルミニウム板からポリエステルフィルムを剥
がし、回路形成済みのガラス−エポキシ両面回路基板
(銅はく厚さ70μm、基材厚さ200μm)に重ねて
170℃、3MPaで1時間加熱加圧した。Example 3 A polyester film was coated with an adhesive varnish A as a first layer so that the film thickness after drying was 80 μm.
It was dried at 0 ° C. for 10 minutes. On the first layer, as the second layer, the film thickness after drying is 200 μm in total for the first layer and the second layer.
Adhesive varnish C is applied so that
Dry for 0 minutes. The surface of the aluminum plate was polished and γ-glycidoxypropyltrimethoxysilane was adhered to the aluminum plate. A hot roll laminator (line pressure 9) was used so that the second layer of the insulating adhesive material sheet was in contact with the surface of the aluminum plate.
The layers were laminated at 8 N / cm, 120 ° C., and a pressing time of 1.5 seconds). The polyester film was peeled from the aluminum plate, and the glass-epoxy double-sided circuit board (copper foil thickness 70 μm, base material thickness 200 μm) on which a circuit was formed was overlaid and heated and pressed at 170 ° C. and 3 MPa for 1 hour.
【0031】実施例4 ポリエステルフィルムに、乾燥後の膜厚が100μmに
なるように接着剤ワニスAを塗工し、110℃にて20
分間乾燥した。表面を研摩し、γ−グリシドキシプロピ
ルトリメトキシシランを付着させ、あらかじめ表面温度
150℃に加熱したアルミニウム板に、上記の絶縁接着
材料シートの接着剤層がアルミニウム板表面に接するよ
うにホットロールラミネータ(線圧98N/cm、12
0℃、加圧時間1.5秒)で積層した。このアルミニウ
ム板からポリエステルフィルムを剥がし、回路形成済み
のガラス−エポキシ両面回路基板(銅はく厚さ70μ
m、基材厚さ200μm)に重ねて170℃、3MPa
で1時間加熱加圧した。Example 4 A polyester film was coated with an adhesive varnish A so that the film thickness after drying was 100 μm, and the film was dried at 110 ° C. for 20 minutes.
Dried for minutes. The surface is polished, γ-glycidoxypropyltrimethoxysilane is attached, and the aluminum plate preheated to a surface temperature of 150 ° C. is hot-rolled so that the adhesive layer of the insulating adhesive material sheet is in contact with the aluminum plate surface. Laminator (Line pressure 98N / cm, 12
The layers were laminated at 0 ° C. and a pressing time of 1.5 seconds). The polyester film was peeled off from this aluminum plate, and the circuit-formed glass-epoxy double-sided circuit board (copper foil thickness 70μ
m, substrate thickness 200 μm) and 170 ° C., 3 MPa
It was heated and pressed for 1 hour.
【0032】比較例1 表面を研摩し、γ−グリシドキシプロピルトリメトキシ
シランを付着させたアルミニウム板に、乾燥後の膜厚が
70μmになるように接着剤ワニスAをスクリーン印刷
後、110℃にて10分乾燥した。このアルミニウム板
を回路形成済みのガラス−エポキシ両面回路基板(銅は
く厚さ70μm、基材厚さ200μm)に重ねて、17
0℃、3MPaで1時間加熱加圧した。Comparative Example 1 The surface of the aluminum varnish was abraded, and γ-glycidoxypropyltrimethoxysilane was attached to the aluminum plate. Screen printing of the adhesive varnish A was performed at 110 ° C. so that the film thickness after drying was 70 μm. And dried for 10 minutes. This aluminum plate was laminated on a circuit-formed glass-epoxy double-sided circuit board (copper foil thickness 70 μm, base material thickness 200 μm), and 17
It was heated and pressed at 0 ° C. and 3 MPa for 1 hour.
【0033】比較例2 ポリエステルフィルムに、乾燥後の膜厚が200μmに
なるようにワニスAを塗工し、110℃にて20分乾燥
した。表面を研摩し、γ−グリシドキシプロピルトリメ
トキシシランを付着させたアルミニウム板に、上記の絶
縁接着材料シートの接着剤層がアルミニウム板表面に接
するようにホットロールラミネータ(線圧98N/c
m、120℃、加圧時間1.5秒)で積層した。このア
ルミニウム板を回路形成済みのガラス−エポキシ両面回
路基板(銅はく厚さ70μm、基材厚さ200μm)に
重ねて、170℃、3MPaで1時間加熱加圧した。Comparative Example 2 Varnish A was applied to a polyester film so that the film thickness after drying was 200 μm, and dried at 110 ° C. for 20 minutes. The surface of the aluminum plate was polished and γ-glycidoxypropyltrimethoxysilane was attached to the aluminum plate so that the adhesive layer of the insulating adhesive material sheet was in contact with the surface of the aluminum plate.
m, 120 ° C., pressure time 1.5 seconds). This aluminum plate was placed on a circuit-formed glass-epoxy double-sided circuit board (copper foil thickness 70 μm, base material thickness 200 μm) and heated and pressed at 170 ° C. and 3 MPa for 1 hour.
【0034】以上述べたようにして作製した多層配線板
について、耐電圧、耐電圧不良率、パターン埋込性、表
面平滑性及びはんだ耐熱性(260℃)を調べた。その
結果を表1に示す。With respect to the multilayer wiring board produced as described above, withstand voltage, withstand voltage failure rate, pattern embedding property, surface smoothness and solder heat resistance (260 ° C.) were examined. Table 1 shows the results.
【0035】[0035]
【表1】 ━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━ 項 目 実施例1 実施例2 実施例3 実施例2 ────────────────────────────────── 耐電圧(kV) 5.6 6.6 6.0 6.2 耐電圧不良率(%) 1.8 1.8 1.3 1.2 パターン埋込み性 良好 良好 良好 良好 表面平滑性 良好 良好 良好 良好 はんだ耐熱性(s) 180以上 180以上 180以上 180以上 ━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━ 項 目 比較例1 比較例2 ───────────────────── 耐電圧(kV) 3.4 4.4 耐電圧不良率(%) 5.8 4.8 パターン埋込み性 良好 不良 表面平滑性 良好 不良 はんだ耐熱性(s) 5 6 ━━━━━━━━━━━━━━━━━━━━━[Table 1] ━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━ Item Item Example 1 Example 2 Example 3 Example 2 ────────────────────────────────── Withstanding voltage (kV) 5.6 6.6 6.0 6 2.2 Failure withstanding voltage ratio (%) 1.8 1.8 1.3 1.2 Pattern embedding property Good Good Good Good Surface smoothness Good Good Good Good Solder heat resistance (s) 180 or more 180 or more 180 or more 180 or more ━ ━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━━ Item Comparative Example 1 Comparative Example 2 ────────── ──────────── Withstand voltage (kV) 3.4 4.4 Withstand voltage defect rate (%) 5.8 4.8 Pattern embedding property is good Defective surface smoothness is good Defective solder heat resistance ( s) 5 6 ━━━ ━━━━━━━━━━━━━━━━━━
【0036】表1から、本発明実施例による多層配線板
は、比較例の多層配線板に比べて、パターン埋込性、表
面平滑性、はんだ耐熱性などの点で優れていることがわ
かる。From Table 1, it is understood that the multilayer wiring board according to the example of the present invention is superior to the multilayer wiring board of the comparative example in terms of pattern embedding property, surface smoothness, solder heat resistance and the like.
【0037】試験方法は以下の通りである。 耐電圧:25℃で、上部回路とベースアルミニウム板間
に交流電圧を印加する。0Vから始めて、100V/s
の速度で電圧を高め、1mAの電流が流れたときの電圧
を耐電圧とする。 耐電圧不良率:耐電圧が3kV以下であるものの割合。 パターン埋め込み性:下層銅はくと絶縁接着材料との間
に、直径10μmを超える空隙有無を顕微鏡で観察。空
隙有:不良、空隙無:良好。 表面平滑性:配線板の表面に露出した銅はく回路の凹凸
を表面粗さ計で測定し、凹凸が20μm超のものを不
良、20μm以下のものを良好とした。 はんだ耐熱性:25mm四方に切断したサンプルを、2
60℃のはんだ浴に浮かべ、ふくれ、はくりが発生する
までの時間を測定。The test method is as follows. Withstand voltage: At 25 ° C., an AC voltage is applied between the upper circuit and the base aluminum plate. Starting from 0V, 100V / s
The voltage is increased at the speed of 1 and the withstand voltage is the voltage when a current of 1 mA flows. Insufficient withstand voltage ratio: The ratio of withstand voltage of 3 kV or less. Pattern embedding property: The presence or absence of voids having a diameter of more than 10 μm is observed with a microscope between the lower layer copper foil and the insulating adhesive material. With voids: bad, without voids: good. Surface smoothness: The unevenness of the copper foil circuit exposed on the surface of the wiring board was measured by a surface roughness meter, and the unevenness of more than 20 μm was evaluated as bad and the unevenness of 20 μm or less was evaluated as good. Solder heat resistance: Samples cut in 25 mm square are 2
Measure the time to float, blister, and peel off in a 60 ° C solder bath.
【0038】[0038]
【発明の効果】回路基板の放熱用金属体において、その
表面に、回路基板と接着するときに回路導体の凹凸埋込
性が良好で、接着後の回路導体と金属体間の絶縁性も良
好な接着剤層を形成できる。EFFECTS OF THE INVENTION In a heat-dissipating metal body of a circuit board, the surface conductor has good embedding of irregularities in the circuit conductor when it is bonded to the circuit board, and good insulation between the circuit conductor and the metal body after bonding. Can form an excellent adhesive layer.
Claims (3)
いて、絶縁接着層の金属体側を流動性小、表面側を流動
性大としてなる絶縁接着材料付き金属体。1. A metal body having an insulating adhesive layer formed on the surface thereof, wherein the metal body side of the insulating adhesive layer has low fluidity and the surface side has high fluidity.
られた接着剤シートを、あらかじめ加熱した金属体表面
に接着剤層が金属体と接するようにして積層することを
特徴とする絶縁接着材料付き金属体の製造方法。2. An adhesive sheet obtained by applying an adhesive onto a sheet-shaped support is laminated on a surface of a metal body which has been heated in advance such that the adhesive layer is in contact with the metal body. Of manufacturing a metal body with an insulating adhesive material.
性が大きい接着剤を塗工し、その上に接着作業時の流動
性が小さい接着剤を塗工して得られた接着剤シートを、
金属体表面に、接着剤層が金属体と接するようにして積
層することを特徴とする絶縁接着材料付き金属体の製造
方法。3. An adhesive obtained by coating a sheet-shaped support with an adhesive having a high fluidity during the bonding operation and then applying an adhesive having a low fluidity during the bonding operation on the sheet-shaped support. Sheet,
A method for producing a metal body with an insulating adhesive material, comprising laminating an adhesive layer on the surface of a metal body so as to be in contact with the metal body.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13906895A JP3646890B2 (en) | 1995-06-06 | 1995-06-06 | Metal body with insulating adhesive material and manufacturing method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13906895A JP3646890B2 (en) | 1995-06-06 | 1995-06-06 | Metal body with insulating adhesive material and manufacturing method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH08332696A true JPH08332696A (en) | 1996-12-17 |
JP3646890B2 JP3646890B2 (en) | 2005-05-11 |
Family
ID=15236751
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---|---|---|---|
JP13906895A Expired - Fee Related JP3646890B2 (en) | 1995-06-06 | 1995-06-06 | Metal body with insulating adhesive material and manufacturing method thereof |
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JP2012077123A (en) * | 2010-09-30 | 2012-04-19 | Nippon Steel Chem Co Ltd | Adhesive resin composition, cured product of the same, and adhesive film |
CN103283313A (en) * | 2010-12-28 | 2013-09-04 | 住友电木株式会社 | Metal base circuit board, and method for producing metal base circuit board |
WO2012090360A1 (en) * | 2010-12-28 | 2012-07-05 | 住友ベークライト株式会社 | Metal base circuit board, and method for producing metal base circuit board |
JP5870934B2 (en) * | 2010-12-28 | 2016-03-01 | 住友ベークライト株式会社 | Method for manufacturing metal-based circuit board |
CN103748673A (en) * | 2011-10-28 | 2014-04-23 | 积水化学工业株式会社 | Laminate and method for producing component for power semiconductor modules |
WO2013061981A1 (en) * | 2011-10-28 | 2013-05-02 | 積水化学工業株式会社 | Laminate and method for producing component for power semiconductor modules |
CN103748673B (en) * | 2011-10-28 | 2016-12-14 | 积水化学工业株式会社 | Laminated body and the manufacture method of power semiconductor modular parts |
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