JPH08181448A - Manufacture of multilayer ceramic circuit board - Google Patents
Manufacture of multilayer ceramic circuit boardInfo
- Publication number
- JPH08181448A JPH08181448A JP6325725A JP32572594A JPH08181448A JP H08181448 A JPH08181448 A JP H08181448A JP 6325725 A JP6325725 A JP 6325725A JP 32572594 A JP32572594 A JP 32572594A JP H08181448 A JPH08181448 A JP H08181448A
- Authority
- JP
- Japan
- Prior art keywords
- multilayer ceramic
- resistor
- copper
- paste
- ruthenium oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、多層セラミック配線基
板の製造方法に関し、特に基板表面に形成する厚膜抵抗
部として、酸化ルテニウム系の抵抗体を用い、内部配線
として、銅系の導体を用いた多層セラミック配線基板の
製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a multilayer ceramic wiring board, and more particularly, a ruthenium oxide-based resistor is used as a thick film resistance portion formed on the surface of the board, and a copper-based conductor is used as internal wiring. The present invention relates to a method for manufacturing a multilayer ceramic wiring board used.
【0002】[0002]
【従来の技術】近年、内部配線に銅系の導体を用いた低
温焼結セラミック材からなる多層セラミック配線基板が
携帯電話用のフィルタ、VCO、パワーアンプ、カプラ
等に広く実用化されているが、これらの応用によって
は、基板表面に厚膜抵抗部を形成する必要がある。厚膜
抵抗部に用いられる抵抗体としては、酸化ルテニウム系
の抵抗体が信頼性に高く、抵抗値の適用範囲が広いもの
の、酸化雰囲気中で焼成しなければならず、銅系の内部
配線を酸化する恐れがあった。そのため、従来は非酸化
雰囲気で焼成可能な硼化ランタン、硼化ニオブ、または
それらとガラスの混合物等の抵抗体が用いられていた。2. Description of the Related Art In recent years, a multilayer ceramic wiring board made of a low-temperature sintered ceramic material using a copper-based conductor for internal wiring has been widely put to practical use as a filter, a VCO, a power amplifier, a coupler, etc. for a mobile phone. Depending on these applications, it is necessary to form a thick film resistance portion on the substrate surface. As the resistor used for the thick film resistor, a ruthenium oxide type resistor has high reliability and a wide range of application of the resistance value, but it must be fired in an oxidizing atmosphere, and copper type internal wiring is required. There was a risk of oxidation. Therefore, conventionally, a resistor such as lanthanum boride, niobium boride, or a mixture thereof with glass that can be fired in a non-oxidizing atmosphere has been used.
【0003】[0003]
【発明が解決しようとする課題】ところが、このような
非酸化雰囲気で焼成可能な抵抗体は、抵抗値のバラツキ
が大きく、1MΩ以上の高抵抗または100Ω以下の低
抵抗の領域では再現性が乏しいため、実用上問題があっ
た。However, such a resistor that can be fired in a non-oxidizing atmosphere has a large variation in resistance value and has poor reproducibility in a high resistance region of 1 MΩ or more or a low resistance region of 100 Ω or less. Therefore, there was a problem in practical use.
【0004】本発明者は種々実験をした結果、一度中性
乃至弱還元性雰囲気中で焼成してなる多層セラミック配
線基板の銅系の内部配線は、酸化ルテニウム系の抵抗体
の焼成温度程度では酸化雰囲気中で焼成しても酸化され
難いことを知見した。As a result of various experiments conducted by the present inventor, the copper-based internal wiring of the multilayer ceramic wiring substrate once fired in a neutral to weakly reducing atmosphere has a temperature of about the firing temperature of the ruthenium oxide-based resistor. It was found that even if fired in an oxidizing atmosphere, it is difficult to be oxidized.
【0005】本発明は、このような知見に基づいて考案
されたものであり、基板表面に形成する厚膜抵抗部とし
て、信頼性に高く、抵抗値の適用範囲が広い酸化ルテニ
ウム系の抵抗体を用い、内部配線として、安価で導電性
に優れた銅系の導体を用いた多層セラミック配線基板の
製造方法を提供することである。The present invention was devised on the basis of such knowledge, and as a thick film resistor portion formed on the surface of a substrate, a ruthenium oxide resistor having high reliability and a wide range of application of resistance value. And to provide a method for manufacturing a multilayer ceramic wiring board using a copper-based conductor that is inexpensive and has excellent conductivity as internal wiring.
【0006】[0006]
【課題を解決するための手段】上記の目的を達成するた
めに、本発明は、銅系の導体ペーストを印刷した低温焼
結セラミック材からなるグリーンシートを複数枚用意
し、これを積層、圧縮した後、中性乃至弱還元性雰囲気
中で焼成して基板本体を形成する工程と、基板本体の表
面に銀−パラジウム系の導体ペーストと酸化ルテニウム
系の抵抗体ペーストとを印刷し、基板本体の焼成温度以
下の温度で酸化雰囲気中で同時に焼成する工程とを含む
ことを特徴とする。In order to achieve the above object, the present invention prepares a plurality of green sheets made of a low temperature sintered ceramic material printed with a copper-based conductor paste, and laminates and compresses the green sheets. After that, a step of forming a substrate body by firing in a neutral to weakly reducing atmosphere, and printing a silver-palladium-based conductor paste and a ruthenium oxide-based resistor paste on the surface of the substrate body, And a step of simultaneously firing in an oxidizing atmosphere at a temperature equal to or lower than the firing temperature.
【0007】[0007]
【作用】上記の製造方法によれば、焼成済の基板本体に
内蔵された銅系の導体は、基板本体の焼成温度以下であ
る酸化ルテニウム系の抵抗体の焼成温度程度では酸化雰
囲気中で焼成しても酸化され難いので、電気的な特性を
損なうことなく、酸化ルテニウム系の厚膜抵抗部と銅系
の内部配線とを共有する多層セラミック配線基板を作成
できる。According to the above-described manufacturing method, the copper-based conductor embedded in the fired substrate body is fired in an oxidizing atmosphere at about the firing temperature of the ruthenium oxide-based resistor, which is lower than the firing temperature of the board body. Even if it is difficult to be oxidized, a multilayer ceramic wiring board that shares the ruthenium oxide-based thick film resistor portion and the copper-based internal wiring can be prepared without impairing the electrical characteristics.
【0008】[0008]
【実施例】以下、本発明に係る多層セラミック配線基板
の製造方法を図面を用いて説明する。図1は本発明の多
層セラミック配線基板の製造方法により得られる多層セ
ラミック配線基板の一例を示す要部断面図である。図1
において、1は多層セラミック配線基板である。2は複
数の絶縁層3を積層した基板本体であり、複数の絶縁層
3の間に配置された銅系の内部配線4と、内部配線4間
を電気的に接続するビアホール5とから構成される。DESCRIPTION OF THE PREFERRED EMBODIMENTS A method of manufacturing a multilayer ceramic wiring board according to the present invention will be described below with reference to the drawings. FIG. 1 is a sectional view of an essential part showing an example of a multilayer ceramic wiring board obtained by the method for manufacturing a multilayer ceramic wiring board of the present invention. FIG.
In the figure, 1 is a multilayer ceramic wiring board. Reference numeral 2 is a substrate body in which a plurality of insulating layers 3 are laminated, and is composed of copper-based internal wirings 4 arranged between the plurality of insulating layers 3 and via holes 5 for electrically connecting the internal wirings 4. It
【0009】基板本体2の表面には、銀−パラジウム系
金属からなる表面配線6と、酸化ルテニウム系抵抗体か
らなる厚膜抵抗部7が形成される。ここで、表面配線6
はビアホール5を介して内部配線4と電気的に接続さ
れ、所定の回路を構成する。なお、必要に応じて、基板
本体2の表面には、他の電子部品(図示せず)が搭載さ
れる。On the surface of the substrate body 2, a surface wiring 6 made of silver-palladium type metal and a thick film resistance portion 7 made of a ruthenium oxide type resistor are formed. Here, the surface wiring 6
Is electrically connected to the internal wiring 4 through the via hole 5 and constitutes a predetermined circuit. Note that other electronic components (not shown) are mounted on the surface of the substrate body 2 as needed.
【0010】次に、本発明の多層セラミック配線基板の
製造方法の一例について説明する。Next, an example of a method for manufacturing the multilayer ceramic wiring board of the present invention will be described.
【0011】絶縁層3を構成する基材として、例えばB
aO−Al2 O3 −SiO2 系低温焼結セラミック材か
らなるグリーンシートを複数枚用意する。そして、グリ
ーンシートにビアホール5となる穴をあけて銅系ペース
トを充填し、内部配線4となる銅系(銅または銅に少量
のセラミック粉或いは銀を加えたもの)の導体ペースト
を所定のパターンで印刷する。このようにビアホール5
及び内部配線4を形成したグリーンシートを積層、圧縮
した後、約980℃の窒素ガス雰囲気中で焼成し、基板
本体2を形成する。なお、基板本体2にはビアホール5
以外にスルーホールを設けてもよく、スルーホールの場
合は焼成後、銀−パラジウム系導体ペーストを印刷する
か、またはニッケルメッキを施す。As the base material forming the insulating layer 3, for example, B
aO-Al 2 O 3 to a plurality prepared green sheet comprising -SiO 2 based low-temperature co-fired ceramic material. Then, a hole to be the via hole 5 is made in the green sheet and filled with a copper-based paste, and a copper-based (copper or copper plus a small amount of ceramic powder or silver) conductive paste to be the internal wiring 4 is formed into a predetermined pattern. To print. Like this, via hole 5
After stacking and compressing the green sheets on which the internal wiring 4 is formed, the green sheets are fired in a nitrogen gas atmosphere at about 980 ° C. to form the substrate body 2. The substrate body 2 has a via hole 5
Alternatively, a through hole may be provided. In the case of a through hole, after firing, a silver-palladium-based conductor paste is printed or nickel plating is performed.
【0012】次に、この基板本体2の表面に、表面配線
6となる酸化雰囲気中でも焼成可能な銀−パラジウム系
導体ペーストと、厚膜抵抗部7となる酸化ルテニウム系
の抵抗体ペーストとを所定のパターンで印刷し、基板本
体2の焼成温度以下の約800℃の空気中で同時に焼成
する。これにより、表面に酸化ルテニウム系の厚膜抵抗
部7を有し、銅系の内部配線4を内蔵する多層セラミッ
ク配線基板1が形成される。Next, on the surface of the substrate main body 2, a silver-palladium-based conductor paste which becomes the surface wiring 6 and which can be fired in an oxidizing atmosphere, and a ruthenium oxide-based resistor paste which becomes the thick film resistor portion 7 are predetermined. The pattern is printed and simultaneously fired in the air at about 800 ° C., which is lower than the firing temperature of the substrate body 2. As a result, the multilayer ceramic wiring substrate 1 having the ruthenium oxide-based thick film resistor portion 7 on the surface and incorporating the copper-based internal wiring 4 is formed.
【0013】なお、上述の実施例では基板本体2を窒素
ガス雰囲気中で焼成したが、特に窒素ガス雰囲気中に限
定されるものではなく、他の中性乃至弱還元性雰囲気中
で焼成してもよい。また、上述の実施例では表面配線6
と厚膜抵抗部7とを空気中で焼成したが、これも空気中
に限定されるものではなく、他の酸化雰囲気中で焼成し
てもよい。Although the substrate body 2 was fired in a nitrogen gas atmosphere in the above-mentioned embodiments, it is not particularly limited to a nitrogen gas atmosphere, and it is fired in another neutral or weakly reducing atmosphere. Good. Further, in the above embodiment, the surface wiring 6
The thick film resistance portion 7 and the thick film resistance portion 7 were fired in air, but the thickness is not limited to air and may be fired in another oxidizing atmosphere.
【0014】次に、本発明の多層セラミック配線基板の
製造方法により形成された多層セラミック配線基板に内
蔵された銅系の内部配線の酸化の程度について実験を行
った結果を以下に示す。Next, the results of experiments conducted on the degree of oxidation of the copper-based internal wiring built in the multilayer ceramic wiring board formed by the method for manufacturing a multilayer ceramic wiring board of the present invention are shown below.
【0015】BaO−Al2 O3 −SiO2 系低温焼結
セラミック材からなるグリーンシートを複数枚用意し、
うち1枚に銅の導体ペーストで幅150μm、厚み5μ
m、長さ10cmの細い帯状の内部配線を印刷し、印刷
していないグリーンシートと積み重ね、圧縮したのち内
部配線の両端が露出するように適当な形状にカットす
る。そして、端面に露出した内部配線の両端を覆うよう
に銀−パラジウム系導体ペーストを印刷して外部電極を
形成し、約980℃の窒素ガス雰囲気中で焼成すること
により、試料を作成する。次に、酸化ルテニウム系の抵
抗体の焼成を想定して、約800℃の空気中と、約80
0℃の窒素ガス雰囲気中とで熱処理を行い、試料の直流
抵抗値を測定して抵抗率を求め、銅の内部配線の酸化の
程度を調べた。その結果を表1に示す。A plurality of green sheets made of BaO--Al 2 O 3 --SiO 2 system low temperature sintered ceramic material are prepared.
One of them is a copper conductor paste with a width of 150 μm and a thickness of 5 μ
A thin strip-shaped internal wiring having a length of m and a length of 10 cm is printed, stacked with an unprinted green sheet, compressed, and then cut into an appropriate shape so that both ends of the internal wiring are exposed. Then, a silver-palladium-based conductor paste is printed so as to cover both ends of the internal wiring exposed on the end face to form an external electrode, and the external electrode is fired in a nitrogen gas atmosphere at about 980 ° C. to prepare a sample. Next, assuming firing of a ruthenium oxide-based resistor, in air at about 800 ° C. and about 80 ° C.
Heat treatment was performed in a nitrogen gas atmosphere at 0 ° C., the direct current resistance value of the sample was measured to obtain the resistivity, and the degree of oxidation of the copper internal wiring was examined. Table 1 shows the results.
【0016】[0016]
【表1】 [Table 1]
【0017】表1に示すように、空気中で熱処理した場
合、抵抗率は3.30×10-6Ω・cmとなり、窒素ガ
ス雰囲気中で熱処理した場合の抵抗率3.01×10-6
Ω・cmとほとんど変わらなかった。As shown in Table 1, when heat-treated in air, the resistivity was 3.30 × 10 −6 Ω · cm, and when heat-treated in a nitrogen gas atmosphere, the resistivity was 3.01 × 10 −6.
It was almost the same as Ω · cm.
【0018】以上の実験から窒素ガス雰囲気中で焼成し
てなる多層セラミック配線基板の銅系の内部配線は、そ
の後、空気中で基板の焼成温度より低い約800℃程度
の熱処理を行ってもほとんど抵抗率が上がらず、酸化さ
れ難いことがわかった。From the above experiment, the copper-based internal wiring of the multi-layer ceramic wiring board which is fired in the nitrogen gas atmosphere is almost always heated in air at about 800 ° C. which is lower than the firing temperature of the board. It was found that the resistivity did not increase and was hard to be oxidized.
【0019】次に、携帯電話の出力信号を増幅するパワ
ーアンプに、本発明の多層セラミック配線基板の製造方
法により製造した多層セラミック配線基板を用い、この
パワーアンプの電気特性を測定した。Next, a multilayer ceramic wiring board manufactured by the method for manufacturing a multilayer ceramic wiring board according to the present invention was used as a power amplifier for amplifying an output signal of a mobile phone, and electric characteristics of this power amplifier were measured.
【0020】この場合、パワーアンプ10は図2の回路
図に示すように、増幅セクション11と、ストリップラ
インS1乃至S11と、コンデンサC1乃至C7と、抵
抗R1乃至R2とにより構成される。そして、これに用
いられる多層セラミック配線基板の表面には、ランド、
入出力端子、及び表面配線となる銀−パラジウム系の導
体と、抵抗R1乃至R2となる酸化ルテニウム系の厚膜
抵抗部とが形成され、増幅セクション11となるICが
搭載される。また、多層セラミック配線基板のの内部に
は、コンデンサC1乃至C7となるコンデンサ用電極、
ストリップラインS1乃至S11となるストリップライ
ン、及び他の内部配線が銅系の導体によって形成され
る。さらに、厚膜抵抗部はトリミングされ、所定の抵抗
値に調整される。このようなパワーアンプ10の電気特
性の測定結果を表2に示す。In this case, the power amplifier 10 is composed of an amplification section 11, strip lines S1 to S11, capacitors C1 to C7, and resistors R1 and R2, as shown in the circuit diagram of FIG. And, on the surface of the multilayer ceramic wiring board used for this, land,
An input / output terminal, a silver-palladium-based conductor that serves as a surface wiring, and a ruthenium oxide-based thick film resistor portion that serves as resistors R1 and R2 are formed, and an IC that serves as the amplification section 11 is mounted. Further, inside the multilayer ceramic wiring board, capacitor electrodes to be capacitors C1 to C7,
Strip lines to be the strip lines S1 to S11 and other internal wiring are formed of copper-based conductors. Further, the thick film resistance portion is trimmed and adjusted to a predetermined resistance value. Table 2 shows the measurement results of the electrical characteristics of the power amplifier 10.
【0021】[0021]
【表2】 [Table 2]
【0022】表2に示すように、パワーアンプ10の電
気特性は良好である。この結果、本発明の多層セラミッ
ク配線基板の製造方法により作成した多層セラミック配
線基板は、実用上十分に使用可能であることがわかる。As shown in Table 2, the electric characteristics of the power amplifier 10 are good. As a result, it can be seen that the multilayer ceramic wiring board produced by the method for manufacturing a multilayer ceramic wiring board of the present invention can be sufficiently used in practice.
【0023】[0023]
【発明の効果】以上説明したように、本発明にかかる多
層セラミック配線基板の製造方法によれば、信頼性に優
れ、抵抗値の適用範囲が広い酸化ルテニウム系の厚膜抵
抗部と、安価で導電性に優れた銅系の内部配線とを共有
する多層セラミック配線基板を容易に得ることができ、
これを用いることで、電気的特性に優れた複合電子部品
を提供できる。As described above, according to the method for manufacturing a multilayer ceramic wiring board according to the present invention, a thick film resistor portion of ruthenium oxide type, which is excellent in reliability and has a wide range of application of resistance value, can be manufactured at low cost. A multilayer ceramic wiring board that shares copper-based internal wiring with excellent conductivity can be easily obtained,
By using this, a composite electronic component having excellent electrical characteristics can be provided.
【図1】本発明の実施例における多層セラミック配線基
板を示す要部断面図である。FIG. 1 is a cross-sectional view of essential parts showing a multilayer ceramic wiring board according to an embodiment of the present invention.
【図2】携帯電話用パワーアンプを示す回路図である。FIG. 2 is a circuit diagram showing a power amplifier for a mobile phone.
1 多層セラミック配線基板 2 基板本体 3 絶縁層 4 内部配線 5 ビアホール 6 表面配線 7 厚膜抵抗部 1 Multilayer Ceramic Wiring Board 2 Board Body 3 Insulating Layer 4 Internal Wiring 5 Via Hole 6 Surface Wiring 7 Thick Film Resistor
Claims (1)
ラミック材からなるグリーンシートを複数枚用意し、こ
れを積層、圧縮した後、中性乃至弱還元性雰囲気中で焼
成して基板本体を形成する工程と、 基板本体の表面に銀−パラジウム系の導体ペーストと酸
化ルテニウム系の抵抗体ペーストとを印刷し、基板本体
の焼成温度以下の温度で酸化雰囲気中で同時に焼成する
工程と、を含むことを特徴とする多層セラミック配線基
板の製造方法。1. A substrate main body prepared by preparing a plurality of green sheets made of a low-temperature sintered ceramic material printed with a copper-based conductor paste, stacking and compressing the green sheets, and then firing them in a neutral to weakly reducing atmosphere. And a step of printing a silver-palladium-based conductor paste and a ruthenium oxide-based resistor paste on the surface of the substrate body, and simultaneously firing in an oxidizing atmosphere at a temperature not higher than the firing temperature of the substrate body, A method of manufacturing a multilayer ceramic wiring board, comprising:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32572594A JP3248377B2 (en) | 1994-12-27 | 1994-12-27 | Manufacturing method of multilayer ceramic wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32572594A JP3248377B2 (en) | 1994-12-27 | 1994-12-27 | Manufacturing method of multilayer ceramic wiring board |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH08181448A true JPH08181448A (en) | 1996-07-12 |
JP3248377B2 JP3248377B2 (en) | 2002-01-21 |
Family
ID=18179993
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP32572594A Expired - Fee Related JP3248377B2 (en) | 1994-12-27 | 1994-12-27 | Manufacturing method of multilayer ceramic wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3248377B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100674843B1 (en) * | 2005-03-15 | 2007-01-26 | 삼성전기주식회사 | Method for manufacturing LTCC substrate having minimized deimension change, and LTCC substrate thus obtained |
-
1994
- 1994-12-27 JP JP32572594A patent/JP3248377B2/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100674843B1 (en) * | 2005-03-15 | 2007-01-26 | 삼성전기주식회사 | Method for manufacturing LTCC substrate having minimized deimension change, and LTCC substrate thus obtained |
Also Published As
Publication number | Publication date |
---|---|
JP3248377B2 (en) | 2002-01-21 |
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