JPH0785973A - Organic thin film el element - Google Patents

Abstract

PURPOSE:To enhance the mechanical strength and heat resistance and make unsoluble in organic solvent by using one or more organic thin film layer(s) as sandwiched electrodes, and preparing this layer through polymerization or bridging of a composition which contains compound having epoxy radical. CONSTITUTION:An anode 2, organic hole implanting/conveying layer 3, organic light emitting layer 4, cathode 5, and seal layer 7 are laid one over another upon a base board 1, and thereto a glass plate 8 is adhered using an adhesive resin 9 so that a tight seal is generated. At least either of the layers 3, 4 may be formed through polymerization or bridging of a composition which contains compound having epoxy radical. The organic thin film layer can be of single layer sturucture as produced by mixing the material to organic hole implanting/ conveying layer with the material to organic light emitting layer, or by using a material for organic light emitting layer which permits sufficient implantation of holes from the anode. This enables to produce an organic layer having a high mechanical strength and heat resistance and unsoluble in organic solvent, and even though any other film is formed on this layer by a coating application method which uses solvent such as a spin coat method, there is no risk of being dissolved and mixed together.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an organic thin film EL device utilizing the electroluminescence (hereinafter simply referred to as EL) phenomenon of an organic thin film.

[0002]

2. Description of the Related Art C. of Eastman Kodak Company. W. T
The organic thin film EL device developed by Ang et al. is disclosed in JP-A-59-194393 and JP-A-63-264692.
Publication No. 63-295695, Applied Physics Letters Vol. 51 No. 12, 913 (1987), and Journal of Applied Physics Vol. 65 No. 9, 3610 (1989).
In general, the anode, the organic hole injecting and transporting layer, the organic light emitting layer, and the cathode are formed in this order, and are manufactured as follows.

As shown in FIG. 1, first, on a transparent insulating substrate (1) such as glass or a resin film, a transparent conductive material of a complex oxide of indium and tin (hereinafter referred to as ITO) is formed by vapor deposition or sputtering. The positive electrode (2) of the functional coating is formed. Next, as the organic hole injecting and transporting layer (3), copper phthalocyanine (hereinafter abbreviated as CuPc) or a compound represented by the following (Chemical Formula 1):

[0004]

[Chemical 1]

1,1-bis (4-di-p-tolylaminophenyl) cyclohexane (melting point 181.4 ° C.-18
2.4 ° C.) or a compound represented by (Chemical Formula 2):

[0006]

[Chemical 2]

N, N, N ', N'-tetra-p-tolyl-1,1'-biphenyl-4,4'-diamine (melting point 1
(20 ° C.) tetraaryldiamine or the like having a thickness of about 0.1 μm or less is formed as a single layer or a laminated layer by vapor deposition.

Next, an organic phosphor such as tris (8-quinolinol) aluminum (hereinafter abbreviated as Alq ₃ ) is vapor-deposited on the organic hole injecting and transporting layer (3) to a thickness of about 0.1 μm or less to emit organic light. Form the layer (4). Finally, as a cathode (5), Mg: Ag, Ag: Eu, Mg: Cu, and
An alloy of Mg: In, Mg: Sn, etc. is formed by a co-evaporation method.
The vapor deposition is about 0 nm.

Also, Adachi et al. Provided an organic electron injecting and transporting layer (6) between the organic light emitting layer and the cathode (5) to fabricate the device shown in FIG. According to Applied Physics Letters Vol. 57, No. 6, pp. 531 (1990), the device has an organic hole injecting and transporting layer (3) on an ITO anode.
As N, N′-diphenyl-N, N′-bis (3-methylphenyl) -1,1′-biphenyl-4,4′-diamine [melting point 159 to 163 ° C., glass transition temperature 67 ° C.
(Measured by DSC under nitrogen at a temperature rising rate of 10 ° C./min); hereinafter abbreviated as TPD], as the organic light emitting layer (4) 1- [4-
N, N-bis (p-methoxyphenyl) aminostyryl] naphthalene, 2- as organic electron injecting and transporting layer (6)
(4-biphenylyl) -5- (4-t-butylphenyl) -1,3,4-oxadiazole (hereinafter, simply BP
BD) and an alloy of Mg and Ag as a cathode (5) are sequentially laminated.

In the device manufactured as described above, holes and electrons are injected into the light emitting layer by applying a direct current low voltage of 20 to 30 V or less with the transparent electrode side serving as an anode, and the light is recombined to emit light of 1000 cd. A brightness of about / m ² can be obtained. However, the hole injecting and transporting material shown above is CuP.
Although c is heat resistant, it has a large absorption in the visible light wavelength region, and since it is crystalline, the deposited film becomes uneven, and Cu
An element using only Pc as the organic hole injecting and transporting material is E
There was a problem that the extraction efficiency of L emission was low and the element was likely to be electrically short-circuited.

Compounds represented by (Chemical Formula 1) and (Chemical Formula 2) and T
PD is an amorphous and smooth vapor-deposited film that does not absorb in the visible wavelength region, but has a low melting point and glass transition temperature, so it is mixed with the light-emitting layer due to heat generated during the device manufacturing process and device driving. There was a problem that the film crystallized and became uneven as time passed. For example, when a thin film having a thickness of about 50 nm and TPD and Alq ₃ layers were laminated, both layers were mixed at a temperature of about 95 ° C.

Further, when the organic hole injecting and transporting layer is formed into a multi-layer by a coating method using an organic solvent such as a spin coating method, when the organic light emitting layer is formed on the organic hole injecting and transporting layer, or when the organic light emitting layer is formed. In the case of forming an organic electron injecting and transporting layer on the layer, when a conventional organic material layer composed of low-molecular compounds that are not three-dimensionally crosslinked serves as a base, a solution of the layer material applied thereon is used. It was often dissolved by the organic solvent used.

[0013]

The conventional organic thin film EL material composed of small molecules as described above has low heat resistance,
Since it is not three-dimensionally crosslinked, it dissolves in organic solvents. Also,
As a low molecular weight organic hole injecting and transporting material having high heat resistance, C
Although uPc, quinacridone and the like are known, there is a problem that they have low light transmission and are crystalline.

The present invention has been made for the purpose of providing an organic thin film EL element having a three-dimensionally crosslinkable layer having high heat resistance and solvent resistance, which solves the above problems.

[0015]

SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems, and is an organic thin film EL device constituted by interposing at least one organic thin film layer including at least an organic light emitting layer. , At least one organic thin film layer between the electrodes, specifically, an organic hole injecting and transporting layer, or any one or more of an organic light emitting layer and an organic electron injecting and transporting layer has an epoxy group, and is positive. An organic thin film EL device comprising a layer obtained by polymerizing and cross-linking a composition containing a compound having a hole injecting / transporting property, a light emitting property, or an electron injecting / transporting function.

The organic thin film EL device of the present invention will be described below with reference to FIGS. 1 to 3. FIG. 1 shows an organic thin film EL device according to the present invention, in which an anode (2), an organic hole injecting and transporting layer (3), an organic light emitting layer (4), a cathode (5), a sealing layer ( This is an example in which the glass plate (8) is formed in the order of 7) and is adhered and sealed with an adhesive resin (9), and is a layer obtained by polymerizing and crosslinking a composition containing a compound having an epoxy group in the present invention. Can be used in either the organic hole injecting and transporting layer (3) or the organic light emitting layer (4), or both. Further, if the organic hole injecting and transporting layer material and the organic light emitting layer material are mixed or an organic light emitting layer material capable of sufficiently injecting holes from the anode is used, it is possible to have only one organic thin film layer. .

In the device shown in FIG. 3, in order to enhance the efficiency of hole injection from the anode or to enhance the efficiency of confining excited electrons at the interface with the light emitting layer, the hole injection transport layer is used as the first hole injection layer. The transport layer (10) and the second hole injection transport layer (1
This is an example in the case of being composed of two layers of 1).

The layer obtained by polymerizing and crosslinking the composition containing the compound having an epoxy group in the present invention can be used as either the first or second hole injecting and transporting layer, or both layers. Further, the hole injecting and transporting layer can be composed of three or more layers. Further, as shown in FIG. 2, an electron injecting and transporting layer (6) that blocks the flow of holes at the interface between the organic light emitting layer (4) and the cathode (5) is provided on the substrate (1). In addition, an anode (2), an organic hole injecting and transporting layer (3), an organic light emitting layer (4), an organic electron injecting and transporting layer (6), a cathode (5), and a sealing layer (7) may be formed in this order. Then
The same structure may be formed on the substrate in the reverse order from the cathode.

The materials and the method of manufacturing the device will be described in more detail below. The anode (2) is ITO on a transparent insulating substrate (1) such as glass or plastic film.
(Work function 4.6 to 4.8 eV) or a transparent electrode having a surface resistance of 10 to 50 Ω / □ and a visible light transmittance of 80% or more coated with a transparent conductive material such as zinc aluminum oxide by vacuum deposition or sputtering. Alternatively, a semitransparent electrode in which gold or platinum is thinly vapor-deposited or a semitransparent electrode coated with a polymer such as polyaniline, polypyrrole, or polythiophene is preferable.

In another case, however, the anode (2) is opaque and the organic light-emitting layer (4) passes through the hole injecting and transporting layer (3).
A metal plate such as gold, platinum, palladium, nickel, or the like having a large work function value for easily injecting holes into a semiconductor substrate, a semiconductor substrate such as silicon, gallium phosphide, or amorphous silicon carbide having a work function of 4.6 eV or more, or a metal thereof. Anode (2) in which a semiconductor is coated on an insulating substrate (1)
Alternatively, the cathode (5) can be a transparent electrode or a semitransparent electrode. If the cathode (5) is also opaque, at least one end of the organic light emitting layer (4) needs to be transparent.

Next, an example of using a layer obtained by polymerizing and crosslinking a composition containing a compound having an epoxy group in the present invention as the organic hole injecting and transporting layer (3) will be given. Examples of the compound having an epoxy group include 1 to 8 in one molecule represented by the general formulas (Chemical formula 3) to (Chemical formula 8) and (Chemical formula 11).
Examples thereof include compounds having an epoxy group, but the present invention is not limited thereto.

[0022]

[Chemical 3]

(G _{1 and} G ₂ are independently selected from the following groups, and R ₁ in these is selected from hydrogen, methyl group, trifluoromethyl group, hydroxyl group, methoxy group and fluorine, and R ₂ Represents a linking group representing a bond or a methylene chain having 1 to 4 carbon atoms, n is an integer of 1 to 3, and m is a positive integer representing the number of substituents.)

[0024]

[Chemical 4]

[0025]

[Chemical 5]

[0026]

[Chemical 6]

G _{1 to} G ₂ : n and m are the same as in (formula 3)

[0028]

[Chemical 7]

G ₂ , n, and m are the same as in (formula 3)

[0030]

[Chemical 8]

G ₁ , G ₂ , n, and m are the same as in (formula 3).

[0032]

[Chemical 9]

G ₂ , n and m are the same as in (formula 3)

The compound represented by (Chemical Formula 3) is reacted with a catalyst such as sodium hydroxide to obtain the linear polyether represented by (Chemical Formula 10), which is dissolved in an appropriate organic catalyst. Can also be applied on the substrate.

[0035]

[Chemical 10]

N is an integer of 1 to 3 l is an integer representing the degree of polymerization

Further, a compound having two hydroxyl groups represented by the chemical formula 11 and epichlorohydrin

[0038]

[Chemical 11]

The compound represented by (Chemical formula 12) is reacted with the compound represented by (Chemical formula 12) in the presence of a catalyst such as sodium hydroxide at a charging ratio of 1: 1 to obtain a condensate represented by (Chemical formula 13).

[0040]

[Chemical 12]

N is an integer of 1 to 3

[0042]

[Chemical 13]

N is an integer of 1 to 3 l is an integer representing the degree of polymerization

Compounds represented by (Chemical Formula 6) to (Chemical Formula 9) and (Chemical Formula 13) and compounds obtained by further reacting the hydroxyl group of the compound represented by (Chemical Formula 13) with epichlorohydrin and the like are "Epoxy by Masaki Shinbo". Jushi Handbook "(198
7) Amine system mentioned in (Nikkan Kogyo Shimbun),
Polyaminoamide-based, can be mixed with a compound selected from hardeners such as acids and anhydrides and dissolved in common organic solvents such as toluene, tetrahydrofuran, chloroform, dioxane, dimethylacetamide, dimethylformamide, cyclohexane, etc. After coating by spin coating method, dip coating method, roll coating method or the like on the above, it is heat-treated under appropriate conditions to obtain a three-dimensionally crosslinked, highly heat-resistant, solvent-insoluble organic hole injecting and transporting layer. To be

As the curing agent, 1,4 diaminocyclohexane and the curing agents represented by (Chemical formula 14) and (Chemical formula 15) can also be used.

[0046]

[Chemical 14]

G ₁ and G ₂ are the same as in (formula 3)

[0048]

[Chemical 15]

G ₂ is the same as (Chemical Formula 3)

In order to increase the molecular weight and heat resistance, it is desirable that the ratio of epoxy groups to amino groups in the composition is 2: 1. In (Chemical Formula 3), (Chemical Formula 5) and (Chemical Formula 11), the epoxy group is bonded via an methylene chain by an ether bond, but an ester bond is also possible.

For the organic hole injecting and transporting layer, a layer obtained by polymerizing and cross-linking the composition containing the compound having an epoxy group according to the present invention can be used as a single layer, but has another epoxy group having a different work function or the like. As shown in FIG. 3, a layer obtained by polymerizing and cross-linking a composition containing a compound may be laminated, or referred to in Japanese Patent Application Nos. 4-72009 and 4-300888 (Formula 16). The indicated polyphosphazene polymer, Japanese Patent Application Nos. 4-72009 and 4-1.
No. 42791 and Japanese Patent Application No. 5-126717, laminated with a polymer or a low molecular weight hole transport material,
It is also possible to mix them to form a hole injecting and transporting layer.

[0052]

[Chemical 16]

Here, 59% or more of X is substituted with a group selected from the following groups.

[0054]

[Chemical 17]

[0055]

[Chemical 18]

[0056]

[Chemical 19]

The thickness of the hole injecting and transporting layer is preferably 5 to 100 nm when formed as a single layer or a laminated layer.

In some cases, the hole injecting and transporting layer also has a function as a light emitting layer depending on the compound, and the EL device can be formed by a single organic thin film layer.

Next, the organic light emitting layer (4) is formed on the hole injecting and transporting layer (3). As an example in the present invention, an epoxy compound represented by

[0060]

[Chemical 20]

(N is an integer of 1 to 3, l and m are integers of 0 to 3 and 1 + m is a valence of the central metal M)

It is possible to use it as an organic light emitting layer by polymerizing and cross-linking a composition containing the above with a suitable curing agent after forming a film, but it is not particularly limited to this example, and it is not limited to this application. It can be selected and used from the fluorescent substances of the materials for the organic light emitting layer which are referred to in Japanese Patent Application No. 126717 and Japanese Patent Application No. 4-300885.

These organic light emitting layer materials can be formed by vacuum vapor deposition method, cumulative film method, coating by dissolving in a suitable solvent, or dispersing in a resin binder and coating by spin coating or the like. Done.

The film thickness of the organic light emitting layer (4) is 1 μm or less, and preferably 1 to 100 nm even when it is formed by a single layer or a laminated layer. In addition, these fluorescent polymers and molecules include glycidyl group, isocyanate group, vinyl group, acryl group, methacryloyloxymethyl group,
Using materials introduced with polymerizable or crosslinkable groups such as methacryloyloxy group, methacryloyloxyethyl group, acryloyl group, acryloyloxymethyl group, acryloyloxyethyl group, cinnamoyl group, styrenemethyloxy group, propioloyl group, propargyl group It is also possible to polymerize and crosslink with heat, light or radiation after the film formation.

The phosphor in the organic light-emitting layer (4) is a coumarin-based material described in the laser die catalog of Lambda Fizzic Co., Ltd. or Eastman Kodak Co., Ltd. in order to convert emission wavelength and improve luminous efficiency. You may dope two or more kinds of phosphors such as quinacridone type, perylene type, pyran type, etc., or stack two or more light emitting layers of various kinds of phosphors, one of which is in the infrared region or the ultraviolet region. It may exhibit fluorescence.

Next, when the organic electron injecting and transporting layer (6) is laminated on the organic light emitting layer (4), preferable conditions for the organic electron injecting and transporting material are that the electron mobility is high and the LUMO (lowest unoccupied occupied guiding) ) Has an energy level of LU of the organic light emitting layer material
It is in the same range as the energy level of MO and between the Fermi level (work function) of the cathode material, the work function is larger than that of the organic light emitting layer material, and film formability may be good. Furthermore, the anode (2) is opaque and is a transparent or semi-transparent cathode (5).
In the element configured to extract light from the organic light emitting layer material, it is necessary that the element is substantially transparent in at least the fluorescence wavelength region.

For the electron injecting and transporting layer in the present invention, the materials mentioned in Japanese Patent Application No. 4-300885 can be used, but in some cases, the compounds mentioned as examples of the organic light emitting layer material can be used. It is possible.

The method for forming the organic electron injecting and transporting layer (6) is as follows.
It is applied by a method such as a spin coat method or a method such as a vacuum vapor deposition method or a cumulative film method to form a film having a thickness of 1 to 100 nm.

Next, the cathode (5) is formed on the organic light emitting layer (4) or the organic electron injecting and transporting layer (6).

For the cathode, a material having a low work function is used on the surface in contact with the organic light emitting layer (4) or the electron injecting and transporting layer (6) in order to effectively inject electrons, and Li, Na, Mg, L are used.
a, Ce, Ca, Sr, Al, Ag, In, Sn, Z
A single metal element such as n or Zr, or a binary or ternary alloy system containing them for improving stability is used.

In particular, Al added with Li or Ca has a work function lowered to about 3.1 eV, makes it easy to inject electrons into the light emitting layer, and is more stable than a Mg-based alloy, and is therefore excellent as a cathode. There is.

When a low work function cathode containing Li or Ca is used, Li or Ca is not contained on the cathode.
A metal layer of 1, 1, In, Ag or the like may be laminated to serve as a protective layer against oxidation.

The cathode (5) is formed by co-evaporation by a resistance heating method under a vacuum degree of 10 ^-5 Torr order or less, while monitoring the film thickness gauge from a crystal oscillator from different vapor deposition sources for each component. . At this time, the film is formed with a film thickness of about 0.01 to 0.3 μm, but it is also possible to use an alloy target instead of co-deposition by the electron beam evaporation method, the ion plating method, or the sputtering method. .

Next, a sealing layer (7) is formed on the device in order to prevent oxidation of the organic layers and electrodes of the device. The sealing layer (7) is
It is formed immediately after the formation of the cathode (5). Examples of the sealing layer material include SiO ₂ , SiO, GeO, MgO, and Al ₂ O.
₃ , TiO ₂ , GeO ₂ , ZnO, TeO ₂ , Sb ₂ O
₃ , oxides such as SnO and B ₂ O ₃ , MgF ₂ , LiF,
Fluoride Z such as BaF ₂ , AlF ₃ , FeF ₃ , CaF ₂
Examples thereof include sulfides and other gases such as nS, GeS, and SnS, and inorganic compounds having a high water vapor barrier property, but are not limited to the above examples. These are used alone or in combination to form a single layer, or laminated to form a film by vapor deposition, a sputtering method, an ion plating method, or the like. In the case of vapor deposition by the resistance heating method, GeO, which can be vapor-deposited at low temperature, is excellent. Also, the metal-particulating layers can be easily formed by depositing the metals that calibrate them through oxygen plasma. In order to protect the cathode, a mixed layer of a sealing inorganic compound and an alkali metal such as Li or an alkaline earth metal such as Ca may be provided in the sealing layer or on the surface in contact with the sealing layer. It is desirable to use a plasma process such as ion plating in order to improve the adhesion and the denseness of the sealing film.

Further, in order to prevent invasion of moisture, an adhesive resin such as a commercially available low hygroscopic photocurable adhesive, epoxy adhesive, silicone adhesive, crosslinked ethylene-vinyl acetate copolymer adhesive sheet, or the like, A low melting point glass is used to adhere and seal the periphery or the whole surface of the sealing plate (8) such as a glass plate. Besides the glass plate, a metal plate, a plastic plate or the like can be used.

[0076]

In the organic thin film EL device constructed as described above, the organic hole injecting and transporting layer (3) is positively connected to the power source (12) by the lead wire (13) and light is emitted by applying a DC voltage. However, even when an AC voltage is applied, light is emitted while the electrode on the hole injecting and transporting layer (3) side is positively applied.

By arranging the organic thin film EL device according to the present invention two-dimensionally on the substrate, a thin display capable of displaying characters and images can be produced.

[0078]

【Example】

<Example 1> The thickness of the transparent insulating substrate (1) was 1.1.
mm glass plate, 120nm IT on it
O was coated to form an anode (2). This transparent conductive substrate was thoroughly washed with water and plasma before use, and then the diepoxy compound represented by the formula ( ¹ ) ( ¹ H-NMR spectrum measured in deuterated chloroform, and ¹³ C-NM
R spectra are shown in FIGS. 4 and 5, respectively, and Japanese Patent Application No.
No. 142791 describes the synthesis method (Chemical formula 21) (Chemical formula 2)
Diamine curing agent shown in 2)

[0079]

[Chemical 21]

[0080]

[Chemical formula 22]

Tetrahydrofuran solution in which the molar ratio of 2: 1 was mixed was spin-coated, then heated to 200 ° C. and three-dimensionally cured to form a hole injection transport layer (3) having a thickness of 50 nm. This hole injecting and transporting layer was insoluble in tetrahydrofuran and showed strong substrate adhesion. Then, a chloroform solution of Alq ₃ was spin-coated on the upper surface thereof to form an organic light emitting layer (4) having a thickness of 50 nm.

Next, Al and Li were formed as a cathode (5) on the upper surface thereof at a vapor deposition rate ratio of 3: 1 to a thickness of 20 nm, and then only Al was further stacked by 2000 Å. Finally, LiF was vapor-deposited to a thickness of 400 nm as a sealing layer (7), and then GeO ₂ was vapor-deposited in an oxygen plasma to form a film having a thickness of 600 nm. Then, the glass plate (8) was coated with a photocurable resin (9). ) And then sealed.

This device is applied with a DC voltage of 20 V
It exhibited a yellow-green emission of ³ cd / m ² . Current density is 32m
It was A / cm ² .

Example 2 A hole injecting and transporting layer was formed in the same manner as in Example 1 to obtain a first hole injecting and transporting layer (10). Next, TPD was vapor-deposited with a thickness of 7 nm as a second hole injecting and transporting layer (11). Next, as the organic light emitting layer (4), Alq ₃ is 50 nm.
After vapor deposition, a device was prepared in the same manner as in Example 1.

This element is applied with a DC voltage of 20 V
A yellow-green light emission of 825 cd / m ² was exhibited. Current density is 3
It was 54 mA / cm ² .

Example 3 A device was prepared in the same manner as in the device of Example 2 except that the second hole injecting and transporting layer was omitted. This element is 1127 cd / m ² when a DC voltage of 19 V is applied.
Yellowish green luminescence was exhibited. Current density is 273mA / cm
^{Was 2} .

[0087]

EFFECT OF THE INVENTION A layer obtained by polymerizing and cross-linking a composition containing a compound having an epoxy group and having a hole injecting / transporting, emitting, or electron injecting / transporting function in the present invention is used as an organic layer of an organic thin film EL device. By using it, an organic layer having high mechanical strength and high heat resistance and insoluble in an organic solvent can be obtained, and another film is formed on the organic layer of the present invention by a coating method using a solvent such as a spin coating method. Even if it is melted, it will not be mixed.

[0088]

[Brief description of drawings]

FIG. 1 is an explanatory diagram showing an example of an organic thin film EL element of the present invention.

FIG. 2 is an explanatory view showing another embodiment of the organic thin film EL element of the present invention.

FIG. 3 is an explanatory view showing another embodiment of the organic thin film EL element of the present invention.

FIG. 4 is a ¹ H-NMR spectrum obtained by measuring the dipoxy compound shown in this example in deuterated chloroform.

FIG. 5 is a ¹³ C-NMR spectrum obtained by measuring the dipoxy compound shown in this example in deuterated chloroform.

[Explanation of symbols]

 (1) ... Substrate (2) ... Anode (3) ... Hole injecting and transporting layer (4) ... Organic light emitting layer (5) ... Cathode (6) ... Organic electron injecting and transporting layer (7) ... Sealing layer (8) ... Glass plate (9) ... Adhesive resin layer (10) ... First hole injection transport layer (11) ... Second hole injection transport layer (12) ... Power supply (13) ... Lead wire (14) ... Cathode extraction mouth

─────────────────────────────────────────────────── ───

[Procedure amendment]

[Submission date] November 4, 1994

[Procedure Amendment 1]

[Document name to be amended] Statement

[Correction target item name] 0035

[Correction method] Change

[Correction content]

[0035]

[Chemical 10]

Claims (11)

[Claims] 1. An organic thin-film EL device comprising at least one organic thin-film layer including at least an organic light-emitting layer interposed between electrodes facing each other, and at least one layer sandwiched between the electrodes. An organic thin film EL device, characterized in that the organic thin film layer comprises a layer obtained by polymerizing and crosslinking a composition containing a compound having an epoxy group. 2. The organic thin film EL device according to claim 1, wherein the organic thin film layer sandwiched between the electrodes facing each other comprises a single layer or a multilayer organic hole injecting and transporting layer and an organic light emitting layer. At least one organic thin film layer in the hole injecting and transporting layer comprises a layer obtained by polymerizing and cross-linking a composition containing a compound having an epoxy group.
element. 3. The organic thin film EL element according to claim 1, wherein the organic thin film layer sandwiched between the electrodes facing each other comprises at least one organic hole injecting and transporting layer and an organic light emitting layer. At least one organic thin film layer in the injecting and transporting layer is formed by polymerizing and crosslinking a composition containing at least a compound having two or more epoxy groups and a compound having two or more amino groups. And an organic thin film EL device. 4. The organic thin film EL device according to claim 3, wherein a layer obtained by polymerizing and crosslinking a composition containing at least a compound having two or more epoxy groups and a compound having two or more amino groups is the composition. An organic thin film EL element, which is a layer formed by polymerizing and crosslinking by applying a solution containing a substance, drying it, and then heating it. 5. The organic thin film EL device according to claim 3, wherein the organic thin film is prepared by using a composition having a molar ratio of epoxy groups to amino groups of 2 to 1 in the composition. EL element. 6. The organic thin film EL device according to claim 2, wherein the organic light emitting layer is formed by applying a solution containing at least one or more kinds of fluorescent substances onto the organic hole injecting and transporting layer and then drying it. Organic thin film E characterized by
L element. 7. The organic thin film EL element according to claim 1, wherein one electrode is a transparent electrode having a light transmittance of 50% or more in a visible light wavelength region, or a semitransparent electrode, and the other opposite electrode is lithium. Or an organic thin film EL element characterized by being a metal alloy electrode containing calcium. 8. The organic thin film EL element according to claim 7, wherein a noncorrosive metal layer containing no lithium or calcium is provided on a metal electrode containing lithium or calcium. . 9. The organic thin film EL device according to claim 1, which is laminated on a substrate, and further selected from a metal oxide, a metal fluoride and a metal sulfide on the electrode surface side which is not in contact with the substrate in the light emitting part. An organic thin film EL element, characterized in that at least one inorganic sealing layer made of at least one kind of material is provided. 10. The organic thin film EL device according to claim 7, wherein at least one inorganic sealing layer is laminated by a plasma process method. 11. The organic thin film EL element according to claim 9 or 10, wherein an airtight plate or foil is adhered to the inorganic sealing layer with an adhesive resin.