WO2022016820A1 - Quantum dot light-emitting diode and preparation method therefor - Google Patents

Quantum dot light-emitting diode and preparation method therefor Download PDF

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Publication number
WO2022016820A1
WO2022016820A1 PCT/CN2020/141559 CN2020141559W WO2022016820A1 WO 2022016820 A1 WO2022016820 A1 WO 2022016820A1 CN 2020141559 W CN2020141559 W CN 2020141559W WO 2022016820 A1 WO2022016820 A1 WO 2022016820A1
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quantum dot
dot light
poly
emitting diode
layer
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PCT/CN2020/141559
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French (fr)
Chinese (zh)
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周礼宽
邹文鑫
刘文勇
杨一行
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Tcl科技集团股份有限公司
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Publication of WO2022016820A1 publication Critical patent/WO2022016820A1/en

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H10K50/115OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers comprising active inorganic nanostructures, e.g. luminescent quantum dots
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/14Carrier transporting layers
    • H10K50/15Hole transporting layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10Organic polymers or oligomers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • H10K71/421Thermal treatment, e.g. annealing in the presence of a solvent vapour using coherent electromagnetic radiation, e.g. laser annealing

Definitions

  • the present application relates to the technical field of display devices, in particular to a quantum dot light-emitting diode and a preparation method thereof.
  • Quantum Dot has the characteristics of wide excitation spectrum, narrow emission spectrum and symmetry.
  • the peak position of the luminescence spectrum can be adjusted by changing its size, and the emission spectrum can be covered by changing the size and chemical composition of the quantum dot. to the entire visible light region; in addition, the manufacturing price of quantum dot light-emitting diodes (Quantum Dot Light Emitting Diode, QLED) is relatively lower than that of organic light-emitting diodes (Organic Light Emitting Diodes). Emitting Diode, OLED). Therefore, quantum dot light-emitting diodes are considered to be the most promising technology in the future solid-state lighting industry.
  • Common QLED devices generally have both forward and reverse structures. Whether it is a device with a forward or reverse structure, a hole transport layer and an electron transport layer can be provided on both sides of the quantum dot light-emitting layer.
  • the layer materials are mostly inorganic nano-ions, which generally have high carrier mobility, and the interface contact barrier between electrodes is small, resulting in stronger electron injection and transport capabilities than hole transport materials. Therefore, in QLED devices, The main reason for the low electro-optical efficiency is due to the unbalanced charge injection. When there is an excess of electrons in the device, on the one hand, the electrons will pass through the QD light-emitting layer to the hole transport layer, resulting in the recombination of exciton radiation outside the QD light-emitting layer.
  • the excess electrons will accumulate in the QD light-emitting layer. , resulting in quantum dots with dots and increasing the Auger recombination rate; so balancing the carrier injection efficiency of electrons and holes is the main way to improve the performance of quantum dot light-emitting diodes.
  • the forbidden band width is adjusted by doping Mg in the electron transport layer material such as ZnO, and the electron injection barrier is increased, so as to achieve the injection balance of electrons and holes.
  • the relatively large energy level difference between the hole transport layer and the quantum dot light-emitting layer will block the injection of holes, and poor interfacial contact will still lead to an imbalance in the injection rates of electrons and holes, resulting in device efficiency and Lifespan is low.
  • the purpose of the embodiments of the present application is to provide a quantum dot light-emitting diode and a preparation method thereof, aiming at solving the technical problem that the interface contact between the quantum dot light-emitting layer and the hole functional layer of the existing quantum dot diode is not ideal, thereby causing interface defects .
  • the present application provides a method for preparing a quantum dot light-emitting diode, comprising the following steps:
  • An anode substrate is provided, a hole functional layer is provided on the anode substrate, and the material of the hole functional layer is an organic material containing a benzyl group;
  • a quantum dot light-emitting layer containing quantum dots and a cross-linking agent is prepared on the surface of the hole functional layer, and then the cross-linking reaction is carried out by ultraviolet light;
  • a cathode substrate is provided, and a quantum dot light-emitting layer containing quantum dots and a cross-linking agent is provided on the cathode substrate;
  • a hole functional layer is prepared on the surface of the quantum dot light-emitting layer, and then cross-linking reaction is performed by ultraviolet light; wherein, the material of the hole functional layer is an organic material containing a benzyl group.
  • the present application provides a quantum dot light-emitting diode, comprising an anode, a cathode, and a quantum dot light-emitting layer located between the anode and the cathode, and a quantum dot light-emitting layer is disposed between the anode and the quantum dot light-emitting layer A hole function layer; the material of the hole function layer is an organic material containing benzyl groups, the quantum dot light-emitting layer contains quantum dots and a crosslinking agent, and the quantum dot light-emitting layer and the hole function layer interface cross-linked.
  • the beneficial effect of the preparation method of the quantum dot light-emitting diode is that when the quantum dot light-emitting diode prepares the adjacent hole functional layer and the quantum dot light-emitting layer, the material of the hole functional layer is a benzyl group-containing organic Materials, the material of the quantum dot light-emitting layer includes quantum dots and a cross-linking agent, so that during the ultraviolet irradiation process, at the interface between the quantum dot light-emitting layer and the hole functional layer, the cross-linking agent and the organic material containing benzyl groups will occur.
  • the cross-linking agent reacts with benzyl hydrogen to form stable free radicals, and the cross-linking reaction is carried out through free radical coupling, so as to stabilize the interface contact between the quantum dot light-emitting layer and the hole functional layer, which can reduce interface defects
  • the resulting non-radiative recombination improves the electro-optical efficiency and lifetime of quantum dot light-emitting diodes.
  • the beneficial effect of the quantum dot light-emitting diode provided by the embodiments of the present application is that the quantum dot light-emitting diode can stabilize the interface contact between the quantum dot light-emitting layer and the hole functional layer, thereby reducing the non-radiative recombination caused by interface defects, and improving the quantum dot light-emitting diode. electro-optical efficiency and lifetime.
  • FIG. 1 is a schematic flow chart of a method for preparing a quantum dot light-emitting diode with an upright structure of the present application
  • FIG. 2 is a schematic flowchart of a method for preparing a quantum dot light-emitting diode with an inverted structure of the present application
  • FIG. 3 is a schematic structural diagram of a quantum dot light-emitting diode with an upright structure of the present application
  • Fig. 4 is the device electroluminescence spectrogram of Example 1, Example 2 and Comparative Example 1;
  • Example 5 is a graph of the current efficiency of the quantum dot light-emitting diode device of Example 1;
  • FIG. 8 is a graph of device life test curves of Example 1, Example 2 and Comparative Example 1.
  • FIG. 8 is a graph of device life test curves of Example 1, Example 2 and Comparative Example 1.
  • some embodiments of the present application provide a preparation method of a quantum dot light-emitting diode.
  • the preparation method includes the following steps:
  • S01 Provide an anode substrate, the anode substrate is provided with a hole functional layer, and the material of the hole functional layer is an organic material containing a benzyl group;
  • S02 prepare a quantum dot light-emitting layer containing quantum dots and a cross-linking agent on the surface of the hole functional layer, and then perform a cross-linking reaction with ultraviolet light.
  • the preparation method includes the following steps:
  • E01 Provide a cathode substrate, on which a quantum dot light-emitting layer containing quantum dots and a cross-linking agent is provided;
  • E02 Prepare a hole functional layer on the surface of the quantum dot light-emitting layer, and then perform a cross-linking reaction with ultraviolet light; wherein, the material of the hole functional layer is an organic material containing a benzyl group.
  • the material of the hole function layer is a material containing Benzyl-based organic materials
  • quantum dot light-emitting layer materials include quantum dots and cross-linking agents, so that in the process of ultraviolet irradiation, at the interface between the quantum dot light-emitting layer and the hole functional layer, the cross-linking agent and benzyl-containing organic materials. The material will undergo a cross-linking reaction.
  • the cross-linking agent reacts with benzyl hydrogen to form a stable free radical, and the cross-linking reaction is carried out through free radical coupling, so as to stabilize the interface contact between the quantum dot light-emitting layer and the hole functional layer, so that The non-radiative recombination caused by interface defects can be reduced, thereby improving the electro-optical efficiency and lifetime of quantum dot light-emitting diodes.
  • the quantum dot light-emitting layer and the hole functional layer are formed into adjacent deposited film layers by spin coating, blade coating, printing, spraying and other film forming processes.
  • the hole is transported to the quantum dot light-emitting layer through the hole functional layer.
  • the interface contact quality and defects of the quantum dot light-emitting layer film and the hole functional layer film will affect the non-radiative recombination probability of excitons, and the current efficiency and lifetime of the QLED device.
  • Quantum dots are inorganic nano-quantum dot materials, and the hole functional layer is generally an organic polymer material.
  • the quantum dot material is used in the quantum dot material.
  • the cross-linking agent doped in the quantum dot light-emitting layer and the organic material containing benzyl groups in the hole functional layer are freed at the interface by means of ultraviolet light.
  • the cross-linking agent in the quantum dot light-emitting layer is selected from at least one of benzophenone and benzophenone derivatives.
  • the cross-linking agent may be benzophenone, or It is a benzophenone derivative or a combination of benzophenone and benzophenone derivatives.
  • a certain proportion of benzophenone and benzophenone derivatives are doped in the quantum dot light-emitting layer, and the above-mentioned benzophenone and benzophenone derivatives are combined with the hole functional layer under the condition of ultraviolet light.
  • the highly active benzyl hydrogen on the surface reacts, and after the reaction, stable free radicals can be formed, and the free radicals are coupled and cross-linked to form a stable interface contact between the quantum dot light-emitting layer and the hole functional layer, which can reduce the undesired effects of interface defects. Radiation recombination, thereby improving the electro-optical efficiency and lifetime of quantum dot light-emitting diodes.
  • the benzophenone derivative is selected from 2,4-dinitrobenzophenone, 2-hydroxy-4-methoxybenzophenone and 2-hydroxy-4-n-octyloxydiphenone
  • At least one of the benzophenones can be 2,4-dinitrobenzophenone, or 2-hydroxy-4-methoxybenzophenone, or 2-hydroxy-4-normal Octyloxybenzophenone, or 2,4-dinitrobenzophenone, 2-hydroxy-4-methoxybenzophenone and 2-hydroxy-4-n-octyloxybenzophenone above A combination of two or three of the ketones.
  • the quantum dots in the above-mentioned quantum dot light-emitting layer include at least one of II-VI, IV-VI, III-V, I-VI group compound single structure and composite structure quantum dots, and the composite structure quantum dot includes a core-shell structure Quantum dots, the cores constituting the core-shell quantum dots include CdSe, CdS, CdTe, CdSeTe, CdZnS, PbSe, ZnTe, CdSeS, PbS, PbTe, HgS, HgSe, HgTe, GaN, GaP, GaAs, InP, InAs, At least one of InZnP, InGaP and InGaN; the shell constituting the core-shell structure quantum dot contains at least one of ZnSe, ZnS and ZnSeS.
  • the benzyl-containing organic material of the hole functional layer is selected from poly(9-vinylcarbazole), poly[(9,9-di-n-octylfluorenyl-2,7-di base)-alt-(4,4′-(N-(4-n-butyl)phenyl)-diphenylamine)] (TFB), poly[(9,9-di-n-octylfluorenyl-2,7 -Phenyleneethylene)-alt-(2-methoxy-5-(2-ethylhexyloxy)-1,4diyl)], poly(9,9-dioctylfluorene-2, 7-diyl)-alt-(N,N'-diphenylbenzidine-N,N'-diyl), poly(9,9-di-n-octylfluorenyl-2,7-diyl), Poly[(N,N'-(TFB), poly
  • the step of preparing a quantum dot light-emitting layer containing quantum dots and a cross-linking agent on the surface of the hole functional layer includes: mixing a mixture containing the cross-linking agent and the hole functional material The solution is deposited on the surface of the hole functional layer and then annealed.
  • the mixed solution containing the cross-linking agent and quantum dots is formulated by dissolving the above-mentioned cross-linking agent and quantum dot material in a solvent.
  • the concentration of the quantum dot material in the mixed solution is 10-50mg/ml, specifically, the concentration of the quantum dot material can be 10mg/ml, 20mg/ml, 30mg/ml, 40mg/ml, 50mg/ml ml, etc., the quantum dot material dispersion effect is better within the above concentration range;
  • the mass ratio of the crosslinking agent and the quantum dot material in the mixed solution is (0.5-5): 100, specifically, the crosslinking agent
  • the mass ratio of the quantum dot material can be 0.5:100, 1:100, 2:100, 4:100, 5:100, etc.
  • the quantum dot light-emitting layer and hole functional layer If the crosslinking agent component at the interface is too small, it is difficult to fully crosslink with the hole functional layer material, and the interface contact effect is not good; Conductive cross-linking agent, although excessive cross-linking agent is beneficial to cross-linking, it will increase the difficulty of electron and hole injection and transport in the quantum dot light-emitting layer, and reduce the probability of the radiative recombination of carriers in the quantum dot light-emitting layer. Therefore, the quantum dot light-emitting layer formed by the crosslinking agent and the quantum dot material within the above ratio range can not only obtain a good interface morphology, but also improve the electro-optical efficiency and lifetime performance of the QLED device.
  • the solvent in the mixed solution is selected from non-polar solvents such as hydrocarbon solvents.
  • the hydrocarbon solvent is selected from at least one of saturated or unsaturated alkanes and saturated or unsaturated aromatic hydrocarbons.
  • the method of depositing the mixed solution containing the crosslinking agent and the quantum dots on the surface of the hole functional layer includes spin coating, blade coating, printing, spray coating, and the like.
  • the subsequent annealing process can be performed in an anhydrous and oxygen-free environment.
  • the temperature of the annealing treatment is 50-250°C, for example, the temperature of the annealing treatment may be 50°C, 80°C, 100°C, 150°C, 200°C, 250°C, etc.;
  • the temperature is 10-30min, for example, the time of annealing treatment can be 10min, 15min, 20min, 25min, 30min, etc. The film-forming effect is better under the above annealing conditions.
  • the wavelength of the ultraviolet light is 200-410nm, such as 200nm, 250nm, 300nm, 400nm, etc.; the time of the ultraviolet light is 5-15min, such as 5min, 10min, 15min; the above-mentioned ultraviolet light conditions Under 200-410nm ultraviolet light, the carbonyl group on benzophenone and benzophenone derivatives reacts with the highly active benzyl hydrogen on the hole functional layer material, and the reaction After that, stable free radicals can be formed, and the generated free radicals can undergo a cross-linking reaction through free radical coupling, thereby obtaining a quantum dot light-emitting layer and a hole functional group layer film with closely adjacent interfaces.
  • step S02 preparing a quantum dot light-emitting layer containing quantum dots and a cross-linking agent on the surface of the hole functional layer, and then performing a cross-linking reaction with ultraviolet light, and also including the quantum dot light-emitting layer on the surface of the hole functional layer. Prepare the cathode.
  • the quantum dot light-emitting diode thus obtained comprises an anode, a cathode and a quantum dot light-emitting layer between the anode and the cathode, and a hole functional layer is arranged between the anode and the quantum dot light-emitting layer; the material of the hole functional layer is benzyl-containing
  • the organic material of the quantum dot light-emitting layer contains quantum dots and a cross-linking agent, and the quantum dot light-emitting layer and the hole functional layer interface are cross-linked. Further, after preparing the electronic functional layer on the quantum dot light-emitting layer, the cathode is prepared.
  • the mixed solution further contains a high molecular polymer, and the temperature of the annealing treatment is greater than or equal to the glass transition temperature of the high molecular polymer.
  • the polymer when the temperature of the annealing treatment is equal to the glass transition temperature of the polymer, the polymer is in a highly elastic state, and when the temperature of the annealing treatment is greater than the glass transition temperature of the polymer When the temperature is high, the polymer is in a viscous fluid state, and the above conditions can make the molecular structure of the polymer more relaxed, so that the positions of the quantum dots in the quantum dot light-emitting layer are rearranged, and the polymer is densely packed and compacted.
  • the arrangement is regular to form a flat quantum dot film; at the same time, under the condition of subsequent ultraviolet irradiation, the cross-linking reaction is carried out with the organic material containing the benzyl group on the surface of the hole functional layer to form a stable interface contact, and the quantum dot obtained by this preparation method emits light. layers can significantly improve the electro-optical efficiency and lifetime of the device.
  • the high molecular polymer is selected from at least one of vinyl-based polymers, acryl-based polymers, amide-based polymers, phenyl-based polymers and carbonate-based polymers, for example , which can be vinyl-based polymers, or propylene-based polymers, or amide-based polymers, or phenyl-based polymers, or carbonate-based polymers, or one or both of the above-mentioned polymers etc combination.
  • a suitable glass transition temperature ⁇ annealing temperature
  • the vinyl-based polymer is selected from at least one of polyvinyl alcohol, polyvinyl carbazole, polyvinyl acetate, polytetrafluoroethylene, polyvinylidene fluoride and polyvinyl chloride;
  • the base polymer is selected from at least one of polyacrylic acid, polymethyl methacrylate, poly( ⁇ -butyl nitrile acrylate), polyacrylamide and polyacrylonitrile;
  • the amide polymer is selected from polyamide At least one of decyl formamide and polyethylene sebacate;
  • the phenyl-based polymer is selected from at least one of polyphenylene sulfide and polyethylene terephthalate;
  • the quasi-polymer is selected from at least one of polycarbonate diol and brominated polycarbonate.
  • the glass transition temperature of the high-molecular polymer is 30-200° C.; the temperature of the annealing treatment is 50-250° C., and the temperature of the annealing treatment is greater than or equal to the glass transition temperature of the high-molecular polymer . Further, preferably, the glass transition temperature is selected to be in the range of 50-150°C, and the temperature of the annealing treatment is 120-180°C.
  • the low glass transition temperature enables low-temperature annealing and has little effect on the thermal aging of the device.
  • the glass transition temperature of polymethyl methacrylate is 105°C
  • the annealing temperature can be selected to be ⁇ 105°C.
  • the glass transition temperature of polytetrafluoroethylene is 130°C, so the annealing temperature can be selected to be ⁇ 130°C; the glass transition temperature of polyacrylamide is 165°C, and the annealing temperature to be selected is ⁇ 165°C.
  • the mixed solution containing the cross-linking agent, quantum dots and high molecular polymer is prepared by dissolving the above-mentioned cross-linking agent, quantum dots and high molecular polymer in a solvent.
  • the concentration of the quantum dots in the mixed solution is 10-50mg/ml, and specifically, the concentration of the quantum dot material can be 10mg/ml, 20mg/ml, 30mg/ml, 40mg/ml, 50mg/ml etc., the dispersion effect of quantum dots is better at this concentration;
  • the mass ratio of the high molecular polymer and the quantum dots in the mixed solution is (0.5-10): 100, specifically, the high molecular polymer and quantum
  • the mass ratio of the dot material can be 0.5:100, 1:100, 4:100, 5:100, 10:100, etc. Under this mass ratio, the quantum dots can be better stacked and arranged into regular quantum dots Point film.
  • the step of preparing a quantum dot light-emitting layer containing quantum dots and a cross-linking agent on a cathode substrate includes: depositing a mixed solution containing a cross-linking agent and quantum dots on the cathode substrate , perform annealing treatment.
  • the preparation of the specific mixed solution and the annealing conditions are the same as the preparation method of the quantum dot light-emitting diode with the vertical structure.
  • the mixed solution further contains a high-molecular polymer, and the temperature of the annealing treatment is greater than or equal to the glass transition temperature of the high-molecular polymer.
  • a mixed solution containing a cross-linking agent, quantum dots and a high molecular polymer is deposited on the cathode substrate, and annealed to obtain a quantum dot light-emitting layer, because during the annealing process, the annealing temperature is greater than or equal to the polymer
  • the glass transition temperature of the polymer specifically, when the temperature of the annealing treatment is equal to the glass transition temperature of the polymer, the polymer has a high elastic state, and when the temperature of the annealing treatment is greater than the glass transition temperature of the polymer At the transition temperature, the polymer is in a viscous fluid state.
  • All the above conditions can make the molecular structure of the polymer more relaxed, so that the positions of the quantum dots in the light-emitting layer of the quantum dots are rearranged and packed tightly in the polymer. , and the arrangement is regular to form a flat quantum dot film; at the same time, under the condition of subsequent ultraviolet irradiation, the cross-linking reaction is carried out with the organic material containing the benzyl group on the surface of the hole functional layer to form a stable interface contact.
  • the quantum dots obtained by such a preparation method The light-emitting layer can significantly improve the electro-optical efficiency and lifetime of the device.
  • the selection of high molecular polymers, the specific glass transition temperature and the temperature of annealing treatment, the concentration of quantum dots in the mixed solution, the mass ratio of high molecular polymer and quantum dots can be compared with the preparation of quantum dot light-emitting diodes with upright structure
  • the method is the same.
  • step E02 preparing a hole functional layer on the surface of the quantum dot light-emitting layer, and then performing a cross-linking reaction with ultraviolet light, further comprising preparing an anode on the hole functional layer.
  • the quantum dot light-emitting diode thus obtained comprises an anode, a cathode and a quantum dot light-emitting layer between the anode and the cathode, and a hole functional layer is arranged between the anode and the quantum dot light-emitting layer; the material of the hole functional layer is benzyl-containing
  • the organic material of the quantum dot light-emitting layer contains quantum dots and a cross-linking agent, and the quantum dot light-emitting layer and the hole functional layer interface are cross-linked.
  • an electronic functional layer and the quantum dot light-emitting layer containing quantum dots and a cross-linking agent are stacked in sequence.
  • an embodiment of the present application also provides a quantum dot light-emitting diode, comprising an anode, a cathode, and a quantum dot light-emitting layer located between the anode and the cathode, the anode and the quantum dot light-emitting layer are A hole functional layer is arranged between; the material of the hole functional layer is an organic material containing a benzyl group, the quantum dot light-emitting layer contains quantum dots and a cross-linking agent, and the quantum dot light-emitting layer and the hole Functional layer interface cross-linking.
  • the quantum dot light-emitting diode provided by the embodiment of the present application can stabilize the interface contact between the quantum dot light-emitting layer and the hole functional layer, thereby reducing the non-radiative recombination caused by interface defects, and improving the electro-optical efficiency and life of the quantum dot light-emitting diode.
  • the quantum dot light-emitting diodes described in the embodiments of the present application are prepared by the preparation methods described in the embodiments of the present application.
  • the quantum dot light-emitting diodes provided in the embodiments of the present application are obtained by the unique preparation methods of the embodiments of the present application.
  • Such quantum dot light-emitting diodes can stabilize the interface contact between the quantum dot light-emitting layer and the hole functional layer, thereby reducing the non-radiative recombination caused by interface defects. , to improve the electro-optical efficiency and lifespan of quantum dot light-emitting diodes.
  • the crosslinking agent is selected from at least one of benzophenone and benzophenone derivatives;
  • the benzyl group-containing organic material is selected from poly(9-vinylcarbazole), poly[(( 9,9-Di-n-octylfluorenyl-2,7-diyl)-alt-(4,4′-(N-(4-n-butyl)phenyl)-diphenylamine)], poly[(9 ,9-Di-n-octylfluorenyl-2,7-phenyleneethylene)-alt-(2-methoxy-5-(2-ethylhexyloxy)-1,4diyl)], Poly(9,9-dioctylfluorene-2,7-diyl)-alt-(N,N'-diphenylbenzidine-N,N'-diyl), poly(9,9-dinormal Octylfluorenyl-2,7-diyl
  • the quantum dot light-emitting layer further contains a high molecular polymer, and the annealing temperature when the quantum dot light-emitting layer is annealed to form a film is greater than or equal to the glass transition temperature of the high molecular polymer.
  • the mass ratio of the high molecular polymer and the quantum dots is (0.5-10): 100; 4:100, 5:100, 10:100, etc.
  • the high molecular polymer is selected from at least one of vinyl-based polymers, acryl-based polymers, amide-based polymers, phenyl-based polymers and carbonate-based polymers.
  • the hole functional layer is a hole transport layer
  • the hole functional material is a benzyl group-containing hole transport material
  • an electronic functional layer is disposed between the cathode and the quantum dot light-emitting layer.
  • an electron transport layer or a stacked electron injection layer and electron transport layer, wherein the electron injection layer is adjacent to the cathode.
  • the hole functional layer material is selected from poly[(N,N'-(4-n-butylphenyl)-N,N'-diphenyl-1,4-phenylenediamine)- ALT-(9,9-di-n-octylfluorenyl-2,7-diyl)](TFB), a quantum dot light-emitting layer is formed on the hole functional layer, and the preparation solution of the quantum dot light-emitting layer is added with 3 % poly( ⁇ -butyl cyanoacrylate) (mass fraction of quantum dots) in green quantum dot solution containing 2% bisbenzophenone (mass fraction of quantum dots), followed by irradiation with a 365nm UV curing lamp After 10 minutes, radical coupling and cross-linking reaction with TFB was carried out to obtain a tightly connected interface layer. After annealing at 100 °C, the positions of quantum dots in the light-emitting layer were rearranged.
  • the prepared device is selected from
  • the quantum dot light-emitting diode provided by the embodiments of the present application includes an upside-down structure and an upside-down structure.
  • the quantum dot light emitting diode with the upright structure is obtained by the preparation method shown in FIG. 1
  • the quantum dot light emitting diode with the inverted structure is obtained by the preparation method shown in FIG. 2 .
  • the upright structure quantum dot light-emitting diode comprises a stacked structure of oppositely disposed anode and cathode, a quantum dot light-emitting layer disposed between the anode and the cathode, disposed between the anode and the cathode
  • a hole transport layer between the quantum dot light-emitting layers, and the anode is disposed on the substrate.
  • a hole functional layer such as a hole injection layer and an electron blocking layer can also be arranged between the anode and the quantum dot light-emitting layer; an electron transport layer can also be arranged between the cathode and the quantum dot light-emitting layer. layer, electron injection layer and hole blocking layer and other electronic functional layers.
  • the quantum dot light-emitting diode includes a substrate, an anode disposed on the surface of the substrate, the hole injection layer disposed on the surface of the anode, and the hole injection layer disposed on the surface of the anode.
  • an inverted-structure quantum dot light-emitting diode includes a stacked structure of an anode and a cathode disposed opposite to each other, a quantum dot light-emitting layer disposed between the anode and the cathode, and disposed between the anode and the cathode.
  • a hole transport layer between the quantum dot light-emitting layers, and the cathode is disposed on the substrate.
  • a hole functional layer such as a hole injection layer and an electron blocking layer can also be arranged between the anode and the quantum dot light-emitting layer; an electron transport layer can also be arranged between the cathode and the quantum dot light-emitting layer.
  • the quantum dot light-emitting diode comprises a substrate, a cathode disposed on the surface of the substrate, the electron transport layer disposed on the surface of the cathode, and an electron transport layer disposed on the surface of the electron transport layer.
  • Substrates include rigid, flexible substrates, specifically glass, silicon wafers, polycarbonate, polymethyl methacrylate, polyethylene terephthalate, polyethylene naphthalate, polyamide, Polyethersulfone, or a combination thereof.
  • Anodes include metals or alloys thereof such as nickel, platinum, vanadium, chromium, copper, zinc, or gold; conductive metal oxides such as zinc oxide, indium oxide, tin oxide, indium tin oxide (ITO), indium zinc oxide (IZO), or fluorine-doped tin oxide; or a combination of metals and oxides such as ZnO and Al or SnO 2 and Sb, but not limited thereto, any two or more of the above may be combined.
  • metals or alloys thereof such as nickel, platinum, vanadium, chromium, copper, zinc, or gold
  • conductive metal oxides such as zinc oxide, indium oxide, tin oxide, indium tin oxide (ITO), indium zinc oxide (IZO), or fluorine-doped tin oxide
  • a combination of metals and oxides such as ZnO and Al or SnO 2 and Sb, but not limited thereto, any two or more of the above may be combined.
  • the hole injection layer includes conductive compounds, including polythiophene, polyaniline, polypyrrole, poly(p-phenylene), polyfluorene, poly(3,4-ethylenedioxythiophene), poly(3,4-ethylenediene) ethyldioxythiophene) polystyrene sulfonate (PEDOT: PSS), MoO 3 , WoO 3 , NiO, HATCN, CuO, V 2 O 5 , CuS, or a combination thereof.
  • conductive compounds including polythiophene, polyaniline, polypyrrole, poly(p-phenylene), polyfluorene, poly(3,4-ethylenedioxythiophene), poly(3,4-ethylenediene) ethyldioxythiophene) polystyrene sulfonate (PEDOT: PSS), MoO 3 , WoO 3 , NiO, HATCN, CuO, V 2 O 5 , CuS, or a combination thereof.
  • the benzyl-containing organic material of the hole transport layer is selected from poly(9-vinylcarbazole), poly[(9,9-di-n-octylfluorenyl-2,7-diyl)-alt-(4, 4′-(N-(4-n-butyl)phenyl)-diphenylamine)], poly[(9,9-di-n-octylfluorenyl-2,7-phenylethylene)-alt-( 2-methoxy-5-(2-ethylhexyloxy)-1,4diyl)], poly(9,9-dioctylfluorene-2,7-diyl)-alt-(N, N'-diphenylbenzidine-N,N'-diyl), poly(9,9-di-n-octylfluorenyl-2,7-diyl), poly[(N,N'-(4- n-butylphen
  • the quantum dots in the quantum dot light-emitting layer are group II-VI CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe, CdH
  • the crosslinking agent in the quantum dot light-emitting layer is selected from at least one of benzophenone and benzophenone derivatives, wherein the benzophenone derivatives are selected from 2,4-dinitrodi At least one of benzophenone, 2-hydroxy-4-methoxybenzophenone, and 2-hydroxy-4-n-octyloxybenzophenone.
  • the quantum dot light-emitting layer also contains a high molecular polymer, and the high molecular polymer is selected from vinyl-based polymers, acryl-based polymers, amide-based polymers, phenyl-based polymers and carbonate-based polymers at least one of them.
  • the material of the electron transport layer is one or more of ZnO, TiO 2 , Alq 3 , SnO 2 , ZrO, AlZnO, ZnSnO, BCP, TAZ, PBD, TPBI, Bphen, and CsCO 3 .
  • Cathodes include metals or their alloys such as magnesium, calcium, sodium, potassium, titanium, indium, yttrium, lithium, gadolinium, aluminum, silver, tin, lead, cesium, or barium; multilayer construction materials include alkali metal halides, alkaline earth metals A structure of a first layer of halide, alkali metal oxide, or a combination thereof, and a metal layer, wherein the metal layer comprises an alkaline earth metal, a Group 13 metal, or a combination thereof.
  • LiF/Al, LiO 2 /Al, LiF/Ca, Liq/Al, and BaF 2 /Ca but not limited thereto.
  • the anode in the upright structure quantum dot light-emitting diode, is selected from indium tin oxide (ITO), the hole injection layer is PEDOT:PSS, the hole transport layer is TFB, and the quantum dot light-emitting layer is doped
  • ITO indium tin oxide
  • the hole injection layer is PEDOT:PSS
  • the hole transport layer is TFB
  • the quantum dot light-emitting layer is doped
  • the electron transport layer is ZnO
  • the cathode is Al.
  • the thickness of the anode is 20-200 nm; the thickness of the hole injection layer is 20 nm. ⁇ 200 nm; the thickness of the hole transport layer is 30 ⁇ 180 nm; the total thickness of the quantum dot light-emitting layer is 30 ⁇ 180 nm; the thickness of the electron transport layer is 10 ⁇ 180 nm; the thickness of the cathode is 40 nm ⁇ 190 nm.
  • the QLED device includes a substrate 1 , an anode 2 , a hole injection layer 3 , a hole transport layer 4 , and a quantum dot light-emitting layer 5 in order from bottom to top , electron transport layer 6 , cathode 7 .
  • the material of substrate 1 is glass sheet
  • the material of anode 2 is ITO substrate
  • the material of hole injection layer 3 is PEDOT:PSS
  • the material of hole transport layer 4 is TFB
  • the material of quantum dot light-emitting layer 5 is CdZnSe /ZnSe/ZnS green quantum dots and bisbenzophenone
  • the material of the electron transport layer 6 is ZnO
  • the material of the cathode 7 is Al.
  • the preparation method of the device includes the following steps:
  • a hole injection layer PEDOT:PSS material was spin-coated on the anode ITO, and then annealed at 100 °C for 15 min; then a TFB hole transport layer was formed on the hole injection layer, and annealed at 100 °C for 15 min;
  • the bisbenzophenone at the bottom of the quantum dot light-emitting layer and the TFB on the surface of the hole transport layer are subjected to radical coupling for cross-linking reaction; an ethanol solution of ZnO is prepared on the quantum dot light-emitting layer to obtain an electron transport layer; Al cathode electrode layer, encapsulated to form an electroluminescent device.
  • the QLED device includes a substrate 1 , an anode 2 , a hole injection layer 3 , a hole transport layer 4 , and a quantum dot light-emitting layer 5 in order from bottom to top , electron transport layer 6 , cathode 7 .
  • the material of substrate 1 is glass sheet
  • the material of anode 2 is ITO substrate
  • the material of hole injection layer 3 is PEDOT:PSS
  • the material of hole transport layer 4 is TFB
  • the material of quantum dot light-emitting layer 5 is CdZnSe /ZnSe/ZnS green quantum dots and 2,4-dinitrobenzophenone
  • the material of the electron transport layer 6 is ZnO
  • the material of the cathode 7 is Al.
  • the preparation method of the device includes the following steps:
  • a hole injection layer PEDOT:PSS material was spin-coated on the anode ITO, and then annealed at 100 °C for 15 min; then a TFB hole transport layer was formed on the hole injection layer, and annealed at 100 °C for 15 min;
  • the QLED device includes a substrate 1 , an anode 2 , a hole injection layer 3 , a hole transport layer 4 , and a quantum dot light-emitting layer 5 in order from bottom to top , electron transport layer 6 , cathode 7 .
  • the material of the substrate 1 is a glass sheet
  • the material of the anode 2 is an ITO substrate
  • the material of the hole injection layer 3 is PEDOT:PSS
  • the material of the hole transport layer 4 is poly(9-vinylcarbazole)
  • the quantum The material of the point light-emitting layer 5 includes CdZnSe/ZnSe/ZnS green quantum dots and 2-hydroxy-4-methoxybenzophenone
  • the material of the electron transport layer 6 is ZnO
  • the material of the cathode 7 is Al.
  • the preparation method of the device includes the following steps:
  • a hole injection layer PEDOT:PSS material was spin-coated on the anode ITO, and then annealed at 100 °C for 15 min; then a poly(9-vinylcarbazole) hole transport layer was formed on the hole injection layer, annealed at 100 °C for 15 min;
  • a quantum dot light-emitting layer containing 2-hydroxy-4-methoxybenzophenone and CdZnSe/ZnSe/ZnS green quantum dots with a mass ratio of 5:100 was formed on the supported hole transport layer; and under a 365 nm UV lamp Irradiate for 10 min, so that the 2-hydroxy-4-methoxybenzophenone at the bottom of the quantum dot light-emitting layer and the poly(9-vinylcarbazole) on the surface of the hole transport layer undergo free radical coupling for cross-linking reaction;
  • An ethanol solution of ZnO is spin-coated on the spot light-emitting layer to obtain an electron transport layer; finally, an
  • the quantum dot light-emitting diode device of this comparative example is the same as that of Example 1 except that the material of the quantum dot light-emitting layer is only CdZnSe/ZnSe/ZnS green quantum dots.
  • the quantum dot light-emitting diode device of this comparative example is the same as that of Example 3 except that the material of the quantum dot light-emitting layer is only CdZnSe/ZnSe/ZnS green quantum dots.
  • the life test of the device adopts the 128-channel life test system customized by Guangzhou New Vision Company.
  • the system architecture is to drive the QLED with a constant voltage and constant current source, and test the change of voltage or current; the photodiode detector and test system test the change of the brightness (photocurrent) of the QLED; the luminance meter tests and calibrates the brightness (photocurrent) of the QLED.
  • the quantum dot light-emitting layer of the device in the embodiment of the present application contains benzophenone or benzophenone derivative that can undergo interfacial cross-linking reaction with the hole transport layer in the green quantum dot material used. , which can stabilize the interface contact between the quantum dot light-emitting layer and the hole functional layer, reduce the non-radiative recombination caused by interface defects, and thus improve the electro-optical efficiency and life of the quantum dot light-emitting diode.
  • Example 1 and 2 Compared with Comparative Example 1, Examples 1 and 2 have a nearly 3 times improvement in current efficiency, and due to the optimization of the interface between the quantum dot light-emitting layer and the hole transport layer, the life of the device is improved by 5-8 times; the same conclusion is as follows: The experimental results of Example 3 and Comparative Example 2 are consistent.

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Abstract

A quantum dot light-emitting diode and a preparation method therefor. The preparation method comprises the following steps: providing an anode substrate, said anode substrate being provided with a hole functional layer, the material of the hole functional layer being a benzyl-containing organic material (S01); preparing on the surface of the hole functional layer a quantum dot light-emitting layer containing quantum dots and a crosslinking agent, and performing ultraviolet illumination to perform a crosslinking reaction (S02); or, providing a cathode substrate, said cathode substrate being provided with a quantum dot light-emitting layer containing quantum dots and a crosslinking agent (E01); preparing on the surface of the quantum dot light-emitting layer a hole functional layer, and performing ultraviolet illumination so as to perform a crosslinking reaction, wherein the material of the hole functional layer is a benzyl-containing organic material (E02). The preparation method stabilizes the interface contact between the quantum dot light-emitting layer and the hole functional layer, and reduces the non-radiative recombination caused by interface defects, thereby improving the electro-optical efficiency and service life of a component.

Description

量子点发光二极管及其制备方法Quantum dot light-emitting diode and preparation method thereof
本申请要求于2020年07月22日在中国专利局提交的、申请号为202010709910.2、发明名称为“量子点发光二极管及其制备方法”的中国专利申请的优先权,其全部内容通过引用结合在本申请中。This application claims the priority of the Chinese patent application with the application number of 202010709910.2 and the invention title "Quantum Dot Light Emitting Diode and its Preparation Method", which was filed with the China Patent Office on July 22, 2020, the entire contents of which are incorporated by reference in in this application.
技术领域technical field
本申请涉及显示器件技术领域,具体涉及一种量子点发光二极管及其制备方法。The present application relates to the technical field of display devices, in particular to a quantum dot light-emitting diode and a preparation method thereof.
背景技术Background technique
量子点(Quantum Dot,QD)具有激发谱宽、发射谱窄并且对称的特点,可以通过改变其尺寸来调控发光光谱的峰位置,并且可以通过改变量子点的尺寸和化学组成使其发射光谱覆盖到整个可见光区域;另外,量子点发光二极管(Quantum Dot Light Emitting Diode,QLED)的制造价格相对低于有机发光二极管(Organic Light Emitting Diode,OLED)。因此,量子点发光二极管被认为是未来固态照明界最具潜力的技术。Quantum Dot (QD) has the characteristics of wide excitation spectrum, narrow emission spectrum and symmetry. The peak position of the luminescence spectrum can be adjusted by changing its size, and the emission spectrum can be covered by changing the size and chemical composition of the quantum dot. to the entire visible light region; in addition, the manufacturing price of quantum dot light-emitting diodes (Quantum Dot Light Emitting Diode, QLED) is relatively lower than that of organic light-emitting diodes (Organic Light Emitting Diodes). Emitting Diode, OLED). Therefore, quantum dot light-emitting diodes are considered to be the most promising technology in the future solid-state lighting industry.
常见的QLED器件一般具有正向和反向两种结构,无论是正向或者反向结构的器件,在量子点发光层两侧可以分别设置空穴传输层和电子传输层,由于目前使用的电子传输层材料多为无机纳米离子,一般具有较高的载流子迁移率,且电极间的界面接触势垒较小,导致电子注入和传输的能力强于空穴传输材料,故在QLED器件中,电光效率低的主要原因是由于电荷注入不平衡引起的。当器件中存在过量的电子时,一方面电子会穿越量子点发光层到达空穴传输层,导致量子点发光层以外激子辐射复合发光,另一方面,过量的电子会在量子点发光层累积,造成量子点带点,增加俄歇复合速率;所以平衡电子和空穴的载流子注入效率是改善量子点发光二极管性能的主要途径。现有的技术方案中,通过在电子传输层材料如ZnO中掺杂Mg来调节禁带宽度,增加电子注入势垒,以达到电子和空穴的注入平衡。但是,空穴传输层与量子点发光层之间的之间相对较大的能级差会阻挡空穴的注入,而且界面接触不好仍会导致电子和空穴注入速率不平衡,导致器件效率和寿命偏低。Common QLED devices generally have both forward and reverse structures. Whether it is a device with a forward or reverse structure, a hole transport layer and an electron transport layer can be provided on both sides of the quantum dot light-emitting layer. The layer materials are mostly inorganic nano-ions, which generally have high carrier mobility, and the interface contact barrier between electrodes is small, resulting in stronger electron injection and transport capabilities than hole transport materials. Therefore, in QLED devices, The main reason for the low electro-optical efficiency is due to the unbalanced charge injection. When there is an excess of electrons in the device, on the one hand, the electrons will pass through the QD light-emitting layer to the hole transport layer, resulting in the recombination of exciton radiation outside the QD light-emitting layer. On the other hand, the excess electrons will accumulate in the QD light-emitting layer. , resulting in quantum dots with dots and increasing the Auger recombination rate; so balancing the carrier injection efficiency of electrons and holes is the main way to improve the performance of quantum dot light-emitting diodes. In the existing technical solution, the forbidden band width is adjusted by doping Mg in the electron transport layer material such as ZnO, and the electron injection barrier is increased, so as to achieve the injection balance of electrons and holes. However, the relatively large energy level difference between the hole transport layer and the quantum dot light-emitting layer will block the injection of holes, and poor interfacial contact will still lead to an imbalance in the injection rates of electrons and holes, resulting in device efficiency and Lifespan is low.
因此,相关技术有待改进。Therefore, the related technology needs to be improved.
技术问题technical problem
本申请实施例的目的在于:提供一种量子点发光二极管及其制备方法,旨在解决现有量子点二极管的量子点发光层和空穴功能层界面接触不理想,从而产生界面缺陷的技术问题。The purpose of the embodiments of the present application is to provide a quantum dot light-emitting diode and a preparation method thereof, aiming at solving the technical problem that the interface contact between the quantum dot light-emitting layer and the hole functional layer of the existing quantum dot diode is not ideal, thereby causing interface defects .
技术解决方案technical solutions
为解决上述技术问题,本申请实施例采用的技术方案是:In order to solve the above-mentioned technical problems, the technical solutions adopted in the embodiments of the present application are:
第一方面,本申请提供了一种量子点发光二极管的制备方法,包括如下步骤:In a first aspect, the present application provides a method for preparing a quantum dot light-emitting diode, comprising the following steps:
提供阳极基板,所述阳极基板上设置有空穴功能层,所述空穴功能层的材料为含苄基的有机材料;An anode substrate is provided, a hole functional layer is provided on the anode substrate, and the material of the hole functional layer is an organic material containing a benzyl group;
在所述空穴功能层表面制备含量子点和交联剂的量子点发光层,然后紫外光照进行交联反应;A quantum dot light-emitting layer containing quantum dots and a cross-linking agent is prepared on the surface of the hole functional layer, and then the cross-linking reaction is carried out by ultraviolet light;
或者,or,
提供阴极基板,所述阴极基板上设置有含量子点和交联剂的量子点发光层;A cathode substrate is provided, and a quantum dot light-emitting layer containing quantum dots and a cross-linking agent is provided on the cathode substrate;
在所述量子点发光层表面制备空穴功能层,然后紫外光照进行交联反应;其中,所述空穴功能层的材料为含苄基的有机材料。A hole functional layer is prepared on the surface of the quantum dot light-emitting layer, and then cross-linking reaction is performed by ultraviolet light; wherein, the material of the hole functional layer is an organic material containing a benzyl group.
第二方面,本申请提供了一种量子点发光二极管,包括阳极、阴极以及位于所述阳极和所述阴极之间的量子点发光层,所述阳极与所述量子点发光层之间设置有空穴功能层;所述空穴功能层的材料为含苄基的有机材料,所述量子点发光层含有量子点和交联剂,且所述量子点发光层与所述空穴功能层界面交联。In a second aspect, the present application provides a quantum dot light-emitting diode, comprising an anode, a cathode, and a quantum dot light-emitting layer located between the anode and the cathode, and a quantum dot light-emitting layer is disposed between the anode and the quantum dot light-emitting layer A hole function layer; the material of the hole function layer is an organic material containing benzyl groups, the quantum dot light-emitting layer contains quantum dots and a crosslinking agent, and the quantum dot light-emitting layer and the hole function layer interface cross-linked.
有益效果beneficial effect
本申请实施例提供的量子点发光二极管的制备方法的有益效果在于:该量子点发光二极管制备相邻的空穴功能层和量子点发光层时,空穴功能层的材料为含苄基的有机材料,量子点发光层的材料包括含量子点和交联剂,这样紫外光照过程中,在量子点发光层和空穴功能层的界面处,交联剂与含苄基的有机材料会发生交联反应,具体地,交联剂与苄基氢反应形成稳定的自由基,并且通过自由基耦合进行交联反应,从而稳固量子点发光层和空穴功能层的界面接触,这样可以减少界面缺陷产生的非辐射复合,从而提高量子点发光二极管的电光效率和寿命。The beneficial effect of the preparation method of the quantum dot light-emitting diode provided by the embodiment of the present application is that when the quantum dot light-emitting diode prepares the adjacent hole functional layer and the quantum dot light-emitting layer, the material of the hole functional layer is a benzyl group-containing organic Materials, the material of the quantum dot light-emitting layer includes quantum dots and a cross-linking agent, so that during the ultraviolet irradiation process, at the interface between the quantum dot light-emitting layer and the hole functional layer, the cross-linking agent and the organic material containing benzyl groups will occur. Specifically, the cross-linking agent reacts with benzyl hydrogen to form stable free radicals, and the cross-linking reaction is carried out through free radical coupling, so as to stabilize the interface contact between the quantum dot light-emitting layer and the hole functional layer, which can reduce interface defects The resulting non-radiative recombination improves the electro-optical efficiency and lifetime of quantum dot light-emitting diodes.
本申请实施例提供的量子点发光二极管的有益效果在于:该量子点发光二极管可以稳固量子点发光层和空穴功能层的界面接触,从而减少界面缺陷产生的非辐射复合,提高量子点发光二极管的电光效率和寿命。The beneficial effect of the quantum dot light-emitting diode provided by the embodiments of the present application is that the quantum dot light-emitting diode can stabilize the interface contact between the quantum dot light-emitting layer and the hole functional layer, thereby reducing the non-radiative recombination caused by interface defects, and improving the quantum dot light-emitting diode. electro-optical efficiency and lifetime.
附图说明Description of drawings
为了更清楚地说明本申请实施例中的技术方案,下面将对实施例或示范性技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其它的附图。In order to illustrate the technical solutions in the embodiments of the present application more clearly, the following briefly introduces the accompanying drawings that are used in the description of the embodiments or exemplary technologies. Obviously, the drawings in the following description are only for the present application. In some embodiments, for those of ordinary skill in the art, other drawings can also be obtained according to these drawings without any creative effort.
图1是本申请正置结构的量子点发光二极管的制备方法流程示意图;1 is a schematic flow chart of a method for preparing a quantum dot light-emitting diode with an upright structure of the present application;
图2是本申请倒置结构的量子点发光二极管的制备方法流程示意图;2 is a schematic flowchart of a method for preparing a quantum dot light-emitting diode with an inverted structure of the present application;
图3是本申请正置结构的量子点发光二极管的结构示意图;3 is a schematic structural diagram of a quantum dot light-emitting diode with an upright structure of the present application;
图4是实施例1、实施例2和对比例1的器件电致发光光谱图;Fig. 4 is the device electroluminescence spectrogram of Example 1, Example 2 and Comparative Example 1;
图5是实施例1的量子点发光二极管器件的电流效率曲线图;5 is a graph of the current efficiency of the quantum dot light-emitting diode device of Example 1;
图6是实施例2的量子点发光二极管器件的电流效率曲线图;6 is a graph of the current efficiency of the quantum dot light-emitting diode device of Example 2;
图7是对比例1的量子点发光二极管器件的电流效率曲线图;7 is a graph of the current efficiency of the quantum dot light-emitting diode device of Comparative Example 1;
图8是实施例1、实施例2和对比例1的器件寿命测试曲线图。FIG. 8 is a graph of device life test curves of Example 1, Example 2 and Comparative Example 1. FIG.
本发明的实施方式Embodiments of the present invention
为了使本申请的目的、技术方案及优点更加清楚明白,以下结合附图及实施例,对本申请进行进一步详细说明。应当理解,此处所描述的具体实施例仅用以解释本申请,并不用于限定本申请。In order to make the purpose, technical solutions and advantages of the present application more clearly understood, the present application will be described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application, but not to limit the present application.
一方面,本申请一些实施例提供了一种量子点发光二极管的制备方法,当该量子点发光二极管为正置结构的量子点发光二极管,如图1所示,该制备方法包括如下步骤:On the one hand, some embodiments of the present application provide a preparation method of a quantum dot light-emitting diode. When the quantum dot light-emitting diode is a quantum dot light-emitting diode with an upright structure, as shown in FIG. 1 , the preparation method includes the following steps:
S01:提供阳极基板,所述阳极基板上设置有空穴功能层,所述空穴功能层的材料为含苄基的有机材料;S01: Provide an anode substrate, the anode substrate is provided with a hole functional layer, and the material of the hole functional layer is an organic material containing a benzyl group;
S02:在所述空穴功能层表面制备含量子点和交联剂的量子点发光层,然后紫外光照进行交联反应。S02: prepare a quantum dot light-emitting layer containing quantum dots and a cross-linking agent on the surface of the hole functional layer, and then perform a cross-linking reaction with ultraviolet light.
或者,当该量子点发光二极管为倒置结构的量子点发光二极管,如图2所示,该制备方法包括如下步骤:Alternatively, when the quantum dot light-emitting diode is a quantum dot light-emitting diode with an inverted structure, as shown in FIG. 2 , the preparation method includes the following steps:
E01:提供阴极基板,所述阴极基板上设置有含量子点和交联剂的量子点发光层;E01: Provide a cathode substrate, on which a quantum dot light-emitting layer containing quantum dots and a cross-linking agent is provided;
E02:在所述量子点发光层表面制备空穴功能层,然后紫外光照进行交联反应;其中,所述空穴功能层的材料为含苄基的有机材料。E02: Prepare a hole functional layer on the surface of the quantum dot light-emitting layer, and then perform a cross-linking reaction with ultraviolet light; wherein, the material of the hole functional layer is an organic material containing a benzyl group.
本申请实施例提供的量子点发光二极管的制备方法中,不管是正置结构还是倒置结构,其均是制备相邻的空穴功能层和量子点发光层时,其中空穴功能层的材料为含苄基的有机材料,量子点发光层的材料包括含量子点和交联剂,这样紫外光照过程中,在量子点发光层和空穴功能层的界面处,交联剂与含苄基的有机材料会发生交联反应,具体地,交联剂与苄基氢反应形成稳定的自由基,并且通过自由基耦合进行交联反应,从而稳固量子点发光层和空穴功能层的界面接触,这样可以减少界面缺陷产生的非辐射复合,从而提高量子点发光二极管的电光效率和寿命。In the preparation method of the quantum dot light-emitting diode provided in the embodiment of the present application, whether it is an upright structure or an inverted structure, when preparing the adjacent hole function layer and the quantum dot light-emitting layer, the material of the hole function layer is a material containing Benzyl-based organic materials, quantum dot light-emitting layer materials include quantum dots and cross-linking agents, so that in the process of ultraviolet irradiation, at the interface between the quantum dot light-emitting layer and the hole functional layer, the cross-linking agent and benzyl-containing organic materials. The material will undergo a cross-linking reaction. Specifically, the cross-linking agent reacts with benzyl hydrogen to form a stable free radical, and the cross-linking reaction is carried out through free radical coupling, so as to stabilize the interface contact between the quantum dot light-emitting layer and the hole functional layer, so that The non-radiative recombination caused by interface defects can be reduced, thereby improving the electro-optical efficiency and lifetime of quantum dot light-emitting diodes.
对于QLED器件,在正置结构或者倒置结构中,量子点发光层和空穴功能层通过旋涂,刮涂、印刷,喷涂等成膜工艺形成相邻沉积的膜层,在上述器件中,空穴通过空穴功能层传输到量子点发光层,量子点发光层薄膜和空穴功能层薄膜的界面接触质量和缺陷多少,会影响激子的非辐射复合几率,对QLED器件的电流效率和寿命影响甚大。量子点为无机纳米量子点材料,空穴功能层一般是有机高分子聚合物材料,如果两者界面接触不良,会使空穴注入效率低下,导致QLED器件电子和空穴的注入不平衡问题更加严重,从而降低发光二极管器件电光效率和寿命。而本申请实施例为了在量子点发光层和空穴功能层薄膜间获得较好的界面接触,减少界面缺陷,提高注入到量子点发光层的空穴载流子速率,通过在量子点材料中掺杂交联剂,这样制备得到量子点发光层薄膜后,通过紫外光照的方式,掺杂在量子点发光层里的交联剂与空穴功能层含苄基的有机材料在界面处发生自由基耦合交联反应,从而形成接触紧密的量子点发光层和空穴功能层界面。For QLED devices, in the upright structure or the inverted structure, the quantum dot light-emitting layer and the hole functional layer are formed into adjacent deposited film layers by spin coating, blade coating, printing, spraying and other film forming processes. The hole is transported to the quantum dot light-emitting layer through the hole functional layer. The interface contact quality and defects of the quantum dot light-emitting layer film and the hole functional layer film will affect the non-radiative recombination probability of excitons, and the current efficiency and lifetime of the QLED device. Great impact. Quantum dots are inorganic nano-quantum dot materials, and the hole functional layer is generally an organic polymer material. If the interface between the two is not in good contact, the hole injection efficiency will be low, resulting in a more unbalanced injection of electrons and holes in QLED devices. serious, thereby reducing the electro-optical efficiency and life of the light-emitting diode device. In the embodiment of the present application, in order to obtain better interface contact between the quantum dot light-emitting layer and the hole functional layer film, reduce interface defects, and improve the rate of hole carriers injected into the quantum dot light-emitting layer, the quantum dot material is used in the quantum dot material. Doping the cross-linking agent, after the quantum dot light-emitting layer thin film is prepared in this way, the cross-linking agent doped in the quantum dot light-emitting layer and the organic material containing benzyl groups in the hole functional layer are freed at the interface by means of ultraviolet light. Base coupling cross-linking reaction, thus forming the interface between the quantum dot light-emitting layer and the hole functional layer in close contact.
在一些实施例中,上述量子点发光层中的交联剂选自二苯甲酮和二苯甲酮衍生物中的至少一种,具体地,交联剂可以是二苯甲酮,也可以是二苯甲酮衍生物,也可以是二苯甲酮和二苯甲酮衍生物的组合。本申请实施例通过在量子点发光层中掺杂一定比例的二苯甲酮和二苯甲酮衍生物,上述二苯甲酮和二苯甲酮衍生物在紫外光照条件下跟空穴功能层表面的高活性的苄基氢反应,反应后可以形成稳定的自由基,自由基耦合交联反应,形成稳定的量子点发光层和空穴功能层的界面接触,这样可以减少界面缺陷产生的非辐射复合,从而提高量子点发光二极管的电光效率和寿命。进一步地,所述二苯甲酮衍生物选自2,4-二硝基二苯甲酮、2-羟基-4-甲氧基二苯甲酮和2-羟基-4-正辛氧基二苯甲酮中的至少一,具体地,可以是2,4-二硝基二苯甲酮,或者是2-羟基-4-甲氧基二苯甲酮,或者是2-羟基-4-正辛氧基二苯甲酮,或者是上述2,4-二硝基二苯甲酮、2-羟基-4-甲氧基二苯甲酮和2-羟基-4-正辛氧基二苯甲酮中两种或三种的组合。上述量子点发光层中的量子点包括II-VI、IV-VI、III-V、I-VI族化合物单一结构和复合结构量子点中的至少一种,所述复合结构量子点包括核壳结构量子点,构成所述核壳结构量子点的核包括CdSe、CdS、CdTe、CdSeTe、CdZnS、PbSe、ZnTe、CdSeS、PbS、PbTe、HgS、HgSe、HgTe、GaN、GaP、GaAs、InP、InAs、InZnP、InGaP和InGaN中的至少一种;构成所述核壳结构量子点的壳包含ZnSe、ZnS和ZnSeS中的至少一种。In some embodiments, the cross-linking agent in the quantum dot light-emitting layer is selected from at least one of benzophenone and benzophenone derivatives. Specifically, the cross-linking agent may be benzophenone, or It is a benzophenone derivative or a combination of benzophenone and benzophenone derivatives. In the embodiment of the present application, a certain proportion of benzophenone and benzophenone derivatives are doped in the quantum dot light-emitting layer, and the above-mentioned benzophenone and benzophenone derivatives are combined with the hole functional layer under the condition of ultraviolet light. The highly active benzyl hydrogen on the surface reacts, and after the reaction, stable free radicals can be formed, and the free radicals are coupled and cross-linked to form a stable interface contact between the quantum dot light-emitting layer and the hole functional layer, which can reduce the undesired effects of interface defects. Radiation recombination, thereby improving the electro-optical efficiency and lifetime of quantum dot light-emitting diodes. Further, the benzophenone derivative is selected from 2,4-dinitrobenzophenone, 2-hydroxy-4-methoxybenzophenone and 2-hydroxy-4-n-octyloxydiphenone At least one of the benzophenones, specifically, can be 2,4-dinitrobenzophenone, or 2-hydroxy-4-methoxybenzophenone, or 2-hydroxy-4-normal Octyloxybenzophenone, or 2,4-dinitrobenzophenone, 2-hydroxy-4-methoxybenzophenone and 2-hydroxy-4-n-octyloxybenzophenone above A combination of two or three of the ketones. The quantum dots in the above-mentioned quantum dot light-emitting layer include at least one of II-VI, IV-VI, III-V, I-VI group compound single structure and composite structure quantum dots, and the composite structure quantum dot includes a core-shell structure Quantum dots, the cores constituting the core-shell quantum dots include CdSe, CdS, CdTe, CdSeTe, CdZnS, PbSe, ZnTe, CdSeS, PbS, PbTe, HgS, HgSe, HgTe, GaN, GaP, GaAs, InP, InAs, At least one of InZnP, InGaP and InGaN; the shell constituting the core-shell structure quantum dot contains at least one of ZnSe, ZnS and ZnSeS.
在一些实施例中,所述空穴功能层的含苄基的有机材料选自聚(9-乙烯基咔唑)、聚[(9,9-二正辛基芴基-2,7-二基) -alt- (4,4′-(N-(4-正丁基)苯基)-二苯胺)] (TFB)、聚[(9,9-二正辛基芴基-2,7-亚苯基乙撑)-alt-(2-甲氧基-5-(2-乙基己氧基)-1,4二基)]、聚(9,9-二辛基芴-2,7-二基)-alt-(N,N’-二苯基联苯胺-N,N’-二基)、聚(9,9-二正辛基芴基-2,7-二基)、聚[(N,N’-(4-正丁基苯基)-N,N’-二苯基-1,4-苯二胺)-alt-(9,9-二正辛基芴基-2,7-二基)]、聚[9-(1-辛基壬基)-9H-咔唑]、聚[2-甲氧基-5-(2-乙基己氧基)-1,4-苯乙炔]、聚[2-甲氧基-5-(2-乙基己氧基)-1,4-苯乙炔]、聚[(9,9-二辛基芴基-2,7-二基)-co-并噻吩]和聚[(9,9-二辛基芴基-2,7-二基)-alt-(苯并[2,1,3]噻二唑-4,8-二基)]中的至少一种,例如,可以是上述含苄基的有机材料中的一种,或者是其中的两种或三种的组合。该空穴功能层可以是空穴传输层,上述空穴功能材料不仅含有苄基,可以与二苯甲酮或二苯甲酮衍生物进行交联反应,而且具有很好的空穴传输性能。In some embodiments, the benzyl-containing organic material of the hole functional layer is selected from poly(9-vinylcarbazole), poly[(9,9-di-n-octylfluorenyl-2,7-di base)-alt-(4,4′-(N-(4-n-butyl)phenyl)-diphenylamine)] (TFB), poly[(9,9-di-n-octylfluorenyl-2,7 -Phenyleneethylene)-alt-(2-methoxy-5-(2-ethylhexyloxy)-1,4diyl)], poly(9,9-dioctylfluorene-2, 7-diyl)-alt-(N,N'-diphenylbenzidine-N,N'-diyl), poly(9,9-di-n-octylfluorenyl-2,7-diyl), Poly[(N,N'-(4-n-butylphenyl)-N,N'-diphenyl-1,4-phenylenediamine)-alt-(9,9-di-n-octylfluorenyl- 2,7-diyl)], poly[9-(1-octylnonyl)-9H-carbazole], poly[2-methoxy-5-(2-ethylhexyloxy)-1,4- Phenylacetylene], poly[2-methoxy-5-(2-ethylhexyloxy)-1,4-phenylacetylene], poly[(9,9-dioctylfluorenyl-2,7-di yl)-co-thiophene] and poly[(9,9-dioctylfluorenyl-2,7-diyl)-alt-(benzo[2,1,3]thiadiazole-4,8- At least one of the benzyl group)], for example, may be one of the above-mentioned benzyl group-containing organic materials, or a combination of two or three thereof. The hole function layer can be a hole transport layer, and the hole function material not only contains a benzyl group, can be cross-linked with benzophenone or a benzophenone derivative, but also has good hole transport performance.
对于正置结构的量子点发光二极管的制备方法,在所述空穴功能层表面制备含量子点和交联剂的量子点发光层的步骤包括:将含有交联剂和空穴功能材料的混合溶液沉积在所述空穴功能层表面,然后进行退火处理。For the preparation method of a quantum dot light-emitting diode with an upright structure, the step of preparing a quantum dot light-emitting layer containing quantum dots and a cross-linking agent on the surface of the hole functional layer includes: mixing a mixture containing the cross-linking agent and the hole functional material The solution is deposited on the surface of the hole functional layer and then annealed.
在一些实施例中,含有交联剂和量子点的混合溶液通过上述交联剂和量子点材料溶解在溶剂中配制。其中,所述混合溶液中的所述量子点材料的浓度为10-50mg/ml,具体地,量子点材料的浓度可以为10mg/ml、20mg/ml、30mg/ml、40mg/ml、50mg/ml等,上述浓度范围内量子点材料分散效果更佳;所述混合溶液中的所述交联剂和所述量子点材料的质量比为(0.5-5):100,具体地,交联剂和量子点材料的质量比可以为0.5:100、1:100、2:100、4:100、5:100等,当交联剂成分比例过低时,量子点发光层和空穴功能层的界面处交联剂成分过少,难以与空穴功能层材料充分交联,界面接触效果不佳;当交联剂成分比例过高时,由于二苯甲酮或二苯甲酮衍生物属于不导电交联剂,过量的交联剂虽对交联有利,但会增加量子点发光层内电子和空穴注入和传输的难度,降低载流子在量子点发光层辐射复合的几率。因此,上述比例范围内的交联剂和量子点材料形成的量子点发光层,既可以获得良好的界面形态,又可以提升QLED器件的电光效率和寿命性能。In some embodiments, the mixed solution containing the cross-linking agent and quantum dots is formulated by dissolving the above-mentioned cross-linking agent and quantum dot material in a solvent. Wherein, the concentration of the quantum dot material in the mixed solution is 10-50mg/ml, specifically, the concentration of the quantum dot material can be 10mg/ml, 20mg/ml, 30mg/ml, 40mg/ml, 50mg/ml ml, etc., the quantum dot material dispersion effect is better within the above concentration range; the mass ratio of the crosslinking agent and the quantum dot material in the mixed solution is (0.5-5): 100, specifically, the crosslinking agent The mass ratio of the quantum dot material can be 0.5:100, 1:100, 2:100, 4:100, 5:100, etc. When the proportion of the crosslinking agent is too low, the quantum dot light-emitting layer and hole functional layer If the crosslinking agent component at the interface is too small, it is difficult to fully crosslink with the hole functional layer material, and the interface contact effect is not good; Conductive cross-linking agent, although excessive cross-linking agent is beneficial to cross-linking, it will increase the difficulty of electron and hole injection and transport in the quantum dot light-emitting layer, and reduce the probability of the radiative recombination of carriers in the quantum dot light-emitting layer. Therefore, the quantum dot light-emitting layer formed by the crosslinking agent and the quantum dot material within the above ratio range can not only obtain a good interface morphology, but also improve the electro-optical efficiency and lifetime performance of the QLED device.
进一步地,所述混合溶液中的溶剂选自非极性溶剂如烃类溶剂。具体地,所述烃类溶剂选自饱和或者不饱和的烷烃、饱和或者不饱和的芳香烃中的至少一种。将分散有交联剂和量子点的混合溶液沉积在空穴功能层表面,并进行退火去除溶剂,然后紫外光照条件下与空穴功能层表面的含苄基的有机材料进行交联反应形成稳定的界面接触。Further, the solvent in the mixed solution is selected from non-polar solvents such as hydrocarbon solvents. Specifically, the hydrocarbon solvent is selected from at least one of saturated or unsaturated alkanes and saturated or unsaturated aromatic hydrocarbons. The mixed solution dispersed with the cross-linking agent and quantum dots is deposited on the surface of the hole functional layer, and annealed to remove the solvent, and then cross-linked with the benzyl-containing organic material on the surface of the hole functional layer under the condition of ultraviolet light to form a stable solution. interface contact.
在一些实施例中,将含交联剂和量子点的混合溶液沉积在空穴功能层表面的方式包括旋涂,刮涂、印刷,喷涂等。后续退火过程可以在无水无氧环境下进行。In some embodiments, the method of depositing the mixed solution containing the crosslinking agent and the quantum dots on the surface of the hole functional layer includes spin coating, blade coating, printing, spray coating, and the like. The subsequent annealing process can be performed in an anhydrous and oxygen-free environment.
在一些实施例中,所述退火处理的温度为50-250℃,例如,退火处理的温度可以为50℃、80℃、100℃、150℃、200℃、250℃等;所述退火处理的温度为10-30min,例如,退火处理的时间可以是10min、15min、20min、25min、30min等;上述退火条件下成膜效果更佳。In some embodiments, the temperature of the annealing treatment is 50-250°C, for example, the temperature of the annealing treatment may be 50°C, 80°C, 100°C, 150°C, 200°C, 250°C, etc.; The temperature is 10-30min, for example, the time of annealing treatment can be 10min, 15min, 20min, 25min, 30min, etc. The film-forming effect is better under the above annealing conditions.
在一些实施例中,所述紫外光照的波长为200-410nm,例如200nm、250nm、300nm、400nm等;所述紫外光照的时间为5-15min,例如5 min、10min、15min;上述紫外光照条件下,交联反应的效果更佳;在200-410nm的紫外光照下,二苯甲酮和二苯甲酮衍生物上的羰基跟空穴功能层材料上的高活性的苄基氢反应,反应后可以形成稳定的自由基,生成的自由基可以通过自由基耦合进行交联反应,从而获得界面紧密相邻的量子点发光层和空穴功能团层薄膜。In some embodiments, the wavelength of the ultraviolet light is 200-410nm, such as 200nm, 250nm, 300nm, 400nm, etc.; the time of the ultraviolet light is 5-15min, such as 5min, 10min, 15min; the above-mentioned ultraviolet light conditions Under 200-410nm ultraviolet light, the carbonyl group on benzophenone and benzophenone derivatives reacts with the highly active benzyl hydrogen on the hole functional layer material, and the reaction After that, stable free radicals can be formed, and the generated free radicals can undergo a cross-linking reaction through free radical coupling, thereby obtaining a quantum dot light-emitting layer and a hole functional group layer film with closely adjacent interfaces.
对于基板为阳极基板时,步骤S02中:在空穴功能层表面制备含量子点和交联剂的量子点发光层,然后进行紫外光照进行交联反应之后,还包括在所述量子点发光层上制备阴极。这样得到的量子点发光二极管,包括阳极、阴极以及位于阳极和阴极之间的量子点发光层,阳极与量子点发光层之间设置有空穴功能层;空穴功能层的材料为含苄基的有机材料,量子点发光层含有量子点和交联剂,且量子点发光层与所述空穴功能层界面交联。更进一步地,在所述量子点发光层上制备电子功能层之后,再制备所述阴极。When the substrate is an anode substrate, step S02: preparing a quantum dot light-emitting layer containing quantum dots and a cross-linking agent on the surface of the hole functional layer, and then performing a cross-linking reaction with ultraviolet light, and also including the quantum dot light-emitting layer on the surface of the hole functional layer. Prepare the cathode. The quantum dot light-emitting diode thus obtained comprises an anode, a cathode and a quantum dot light-emitting layer between the anode and the cathode, and a hole functional layer is arranged between the anode and the quantum dot light-emitting layer; the material of the hole functional layer is benzyl-containing The organic material of the quantum dot light-emitting layer contains quantum dots and a cross-linking agent, and the quantum dot light-emitting layer and the hole functional layer interface are cross-linked. Further, after preparing the electronic functional layer on the quantum dot light-emitting layer, the cathode is prepared.
在一些实施例中,所述混合溶液还含有高分子聚合物,所述退火处理的温度≥所述高分子聚合物的玻璃化转变温度。In some embodiments, the mixed solution further contains a high molecular polymer, and the temperature of the annealing treatment is greater than or equal to the glass transition temperature of the high molecular polymer.
将含有交联剂、量子点和高分子聚合物的混合溶液沉积在上述空穴功能层表面,进行退火处理得到量子点发光层,因该退火处理的过程中,退火处理的温度≥高分子聚合物的玻璃化转变温度,具体地,当退火处理的温度等于高分子聚合物的玻璃化转变温度时,高分子聚合物呈高弹态,当退火处理的温度大于高分子聚合物的玻璃化转变温度时,高分子聚合物呈粘流态,上述情况均可以使高分子聚合物的分子结构更加松弛,从而使量子点发光层中的量子点位置重排,在高分子聚合物中堆积紧密、排布规整,形成平整的量子点薄膜;同时,后续紫外光照条件下与空穴功能层表面的含苄基的有机材料进行交联反应形成稳定的界面接触,这样的制备方法得到的量子点发光层可以显著提高器件的电光效率和寿命。Deposit a mixed solution containing a crosslinking agent, quantum dots and a high molecular polymer on the surface of the above hole functional layer, and perform annealing treatment to obtain a quantum dot light-emitting layer, because in the process of the annealing treatment, the temperature of the annealing treatment is greater than or equal to the polymer polymerization. Specifically, when the temperature of the annealing treatment is equal to the glass transition temperature of the polymer, the polymer is in a highly elastic state, and when the temperature of the annealing treatment is greater than the glass transition temperature of the polymer When the temperature is high, the polymer is in a viscous fluid state, and the above conditions can make the molecular structure of the polymer more relaxed, so that the positions of the quantum dots in the quantum dot light-emitting layer are rearranged, and the polymer is densely packed and compacted. The arrangement is regular to form a flat quantum dot film; at the same time, under the condition of subsequent ultraviolet irradiation, the cross-linking reaction is carried out with the organic material containing the benzyl group on the surface of the hole functional layer to form a stable interface contact, and the quantum dot obtained by this preparation method emits light. layers can significantly improve the electro-optical efficiency and lifetime of the device.
在一些实施例中,所述高分子聚合物选自乙烯基类聚合物、丙烯基类聚合物、酰胺类聚合物、苯基类聚合物和碳酸酯基类聚合物中的至少一种,例如,可以是乙烯基类聚合物,或者丙烯基类聚合物,或者酰胺类聚合物,或者苯基类聚合物,或者碳酸酯基类聚合物,或者上述高分子聚合物中的一种、两种等的组合。从上述高分子聚合物中,选择合适的玻璃化转变温度(≤退火处理的温度)与量子点和交联剂材料混合,制备得到量子点发光层。In some embodiments, the high molecular polymer is selected from at least one of vinyl-based polymers, acryl-based polymers, amide-based polymers, phenyl-based polymers and carbonate-based polymers, for example , which can be vinyl-based polymers, or propylene-based polymers, or amide-based polymers, or phenyl-based polymers, or carbonate-based polymers, or one or both of the above-mentioned polymers etc combination. From the above macromolecular polymers, select a suitable glass transition temperature (≤ annealing temperature) and mix with quantum dots and crosslinking agent materials to prepare a quantum dot light-emitting layer.
具体地,所述乙烯基类聚合物选自聚乙烯醇、聚乙烯基咔唑、聚醋酸乙烯酯、聚四氟乙烯、聚偏二氟乙烯和聚氯乙烯中的至少一种;所述丙烯基类聚合物选自聚丙烯酸、聚甲基丙烯酸甲酯、聚(α-腈基丙烯酸丁酯)、聚丙烯酰胺和聚丙烯腈中的至少一种;所述酰胺类聚合物选自聚亚癸基甲酰胺和聚癸二酰乙二胺中的至少一种;所述苯基类聚合物选自聚苯硫醚和聚对苯二甲酸乙二酯中的至少一种;所述碳酸酯类聚合物选自聚碳酸酯二醇、溴化聚碳酸酯中的至少一种。Specifically, the vinyl-based polymer is selected from at least one of polyvinyl alcohol, polyvinyl carbazole, polyvinyl acetate, polytetrafluoroethylene, polyvinylidene fluoride and polyvinyl chloride; the propylene The base polymer is selected from at least one of polyacrylic acid, polymethyl methacrylate, poly(α-butyl nitrile acrylate), polyacrylamide and polyacrylonitrile; the amide polymer is selected from polyamide At least one of decyl formamide and polyethylene sebacate; the phenyl-based polymer is selected from at least one of polyphenylene sulfide and polyethylene terephthalate; the carbonate The quasi-polymer is selected from at least one of polycarbonate diol and brominated polycarbonate.
在一些实施例中,所述高分子聚合物的玻璃化转变温度为30-200℃;所述退火处理的温度为50-250℃,且退火处理的温度≥高分子聚合物的玻璃化转变温度。进一步地,优选的,选择玻璃化转变温度范围在50-150℃,退火处理的温度为120-180℃,低的玻璃化转变温度从而可以进行低温退火,从而对器件的热老化影响小。例如,聚甲基丙烯酸甲酯的玻璃化转变温度为105℃,此时退火温度可以选择≥105℃。聚四氟乙烯的玻璃化转变温度为130℃,故退火温度可以选择≥130℃;聚丙烯酰胺的玻璃化转变温度为165℃,需选择的退火温度为≥165℃。In some embodiments, the glass transition temperature of the high-molecular polymer is 30-200° C.; the temperature of the annealing treatment is 50-250° C., and the temperature of the annealing treatment is greater than or equal to the glass transition temperature of the high-molecular polymer . Further, preferably, the glass transition temperature is selected to be in the range of 50-150°C, and the temperature of the annealing treatment is 120-180°C. The low glass transition temperature enables low-temperature annealing and has little effect on the thermal aging of the device. For example, the glass transition temperature of polymethyl methacrylate is 105°C, and the annealing temperature can be selected to be ≥105°C. The glass transition temperature of polytetrafluoroethylene is 130°C, so the annealing temperature can be selected to be ≥130°C; the glass transition temperature of polyacrylamide is 165°C, and the annealing temperature to be selected is ≥165°C.
在一些实施例中,含有交联剂、量子点和高分子聚合物的混合溶液通过上述交联剂、量子点和高分子聚合物溶解在溶剂中配制。其中,所述混合溶液中的所述量子点的浓度为10-50mg/ml,具体地,量子点材料的浓度可以为10mg/ml、20mg/ml、30mg/ml、40mg/ml、50mg/ml等,该浓度下量子点分散效果更佳;所述混合溶液中的所述高分子聚合物和所述量子点的质量比为(0.5-10):100,具体地,高分子聚合物和量子点材料的质量比可以为0.5:100、1:100、4:100、5:100、10:100等,该质量比条件下,可以使量子点更好地进行堆积、排布成规整的量子点薄膜。In some embodiments, the mixed solution containing the cross-linking agent, quantum dots and high molecular polymer is prepared by dissolving the above-mentioned cross-linking agent, quantum dots and high molecular polymer in a solvent. Wherein, the concentration of the quantum dots in the mixed solution is 10-50mg/ml, and specifically, the concentration of the quantum dot material can be 10mg/ml, 20mg/ml, 30mg/ml, 40mg/ml, 50mg/ml etc., the dispersion effect of quantum dots is better at this concentration; the mass ratio of the high molecular polymer and the quantum dots in the mixed solution is (0.5-10): 100, specifically, the high molecular polymer and quantum The mass ratio of the dot material can be 0.5:100, 1:100, 4:100, 5:100, 10:100, etc. Under this mass ratio, the quantum dots can be better stacked and arranged into regular quantum dots Point film.
对于倒置结构的量子点发光二极管的制备方法,在阴极基板上制备含量子点和交联剂的量子点发光层的步骤包括:将含有交联剂和量子点的混合溶液沉积在所述阴极基板上,进行退火处理。具体混合溶液的配制以及退火条件与正置结构的量子点发光二极管的制备方法相同。For the preparation method of quantum dot light-emitting diode with inverted structure, the step of preparing a quantum dot light-emitting layer containing quantum dots and a cross-linking agent on a cathode substrate includes: depositing a mixed solution containing a cross-linking agent and quantum dots on the cathode substrate , perform annealing treatment. The preparation of the specific mixed solution and the annealing conditions are the same as the preparation method of the quantum dot light-emitting diode with the vertical structure.
进一步地,在一些实施例中,所述混合溶液还含有高分子聚合物,所述退火处理的温度≥所述高分子聚合物的玻璃化转变温度。具体地,将含有交联剂、量子点和高分子聚合物的混合溶液沉积在上述阴极基板上,进行退火处理得到量子点发光层,因该退火处理的过程中,退火处理的温度≥高分子聚合物的玻璃化转变温度,具体地,当退火处理的温度等于高分子聚合物的玻璃化转变温度时,高分子聚合物程高弹态,当退火处理的温度大于高分子聚合物的玻璃化转变温度时,高分子聚合物程粘流态,上述情况均可以使高分子聚合物的分子结构更加松弛,从而使量子点发光层中的量子点位置重排,在高分子聚合物中堆积紧密、排布规整,形成平整的量子点薄膜;同时,后续紫外光照条件下与空穴功能层表面的含苄基的有机材料进行交联反应形成稳定的界面接触,这样的制备方法得到的量子点发光层可以显著提高器件的电光效率和寿命。对于高分子聚合物的选择、具体的玻璃化转变温度和退火处理的温度、以及混合溶液中量子点的浓度、高分子聚合物和量子点的质量比可以和正置结构的量子点发光二极管的制备方法相同。Further, in some embodiments, the mixed solution further contains a high-molecular polymer, and the temperature of the annealing treatment is greater than or equal to the glass transition temperature of the high-molecular polymer. Specifically, a mixed solution containing a cross-linking agent, quantum dots and a high molecular polymer is deposited on the cathode substrate, and annealed to obtain a quantum dot light-emitting layer, because during the annealing process, the annealing temperature is greater than or equal to the polymer The glass transition temperature of the polymer, specifically, when the temperature of the annealing treatment is equal to the glass transition temperature of the polymer, the polymer has a high elastic state, and when the temperature of the annealing treatment is greater than the glass transition temperature of the polymer At the transition temperature, the polymer is in a viscous fluid state. All the above conditions can make the molecular structure of the polymer more relaxed, so that the positions of the quantum dots in the light-emitting layer of the quantum dots are rearranged and packed tightly in the polymer. , and the arrangement is regular to form a flat quantum dot film; at the same time, under the condition of subsequent ultraviolet irradiation, the cross-linking reaction is carried out with the organic material containing the benzyl group on the surface of the hole functional layer to form a stable interface contact. The quantum dots obtained by such a preparation method The light-emitting layer can significantly improve the electro-optical efficiency and lifetime of the device. The selection of high molecular polymers, the specific glass transition temperature and the temperature of annealing treatment, the concentration of quantum dots in the mixed solution, the mass ratio of high molecular polymer and quantum dots can be compared with the preparation of quantum dot light-emitting diodes with upright structure The method is the same.
对于基板为阴极基板时,步骤E02中:在所述量子点发光层表面制备空穴功能层,然后进行紫外光照进行交联反应之后,还包括在所述空穴功能层上制备阳极。这样得到的量子点发光二极管,包括阳极、阴极以及位于阳极和阴极之间的量子点发光层,阳极与量子点发光层之间设置有空穴功能层;空穴功能层的材料为含苄基的有机材料,量子点发光层含有量子点和交联剂,且量子点发光层与所述空穴功能层界面交联。更进一步地,该阴极基板上依次层叠设置有电子功能层和所述有含量子点和交联剂的量子点发光层。When the substrate is a cathode substrate, in step E02: preparing a hole functional layer on the surface of the quantum dot light-emitting layer, and then performing a cross-linking reaction with ultraviolet light, further comprising preparing an anode on the hole functional layer. The quantum dot light-emitting diode thus obtained comprises an anode, a cathode and a quantum dot light-emitting layer between the anode and the cathode, and a hole functional layer is arranged between the anode and the quantum dot light-emitting layer; the material of the hole functional layer is benzyl-containing The organic material of the quantum dot light-emitting layer contains quantum dots and a cross-linking agent, and the quantum dot light-emitting layer and the hole functional layer interface are cross-linked. Further, on the cathode substrate, an electronic functional layer and the quantum dot light-emitting layer containing quantum dots and a cross-linking agent are stacked in sequence.
另一方面,本申请实施例还提供了一种量子点发光二极管,包括阳极、阴极以及位于所述阳极和所述阴极之间的量子点发光层,所述阳极与所述量子点发光层之间设置有空穴功能层;所述空穴功能层的材料为含苄基的有机材料,所述量子点发光层含有量子点和交联剂,且所述量子点发光层与所述空穴功能层界面交联。On the other hand, an embodiment of the present application also provides a quantum dot light-emitting diode, comprising an anode, a cathode, and a quantum dot light-emitting layer located between the anode and the cathode, the anode and the quantum dot light-emitting layer are A hole functional layer is arranged between; the material of the hole functional layer is an organic material containing a benzyl group, the quantum dot light-emitting layer contains quantum dots and a cross-linking agent, and the quantum dot light-emitting layer and the hole Functional layer interface cross-linking.
本申请实施例提供的量子点发光二极管可以稳固量子点发光层和空穴功能层的界面接触,从而减少界面缺陷产生的非辐射复合,提高量子点发光二极管的电光效率和寿命。The quantum dot light-emitting diode provided by the embodiment of the present application can stabilize the interface contact between the quantum dot light-emitting layer and the hole functional layer, thereby reducing the non-radiative recombination caused by interface defects, and improving the electro-optical efficiency and life of the quantum dot light-emitting diode.
具体地,本申请实施例所述的量子点发光二极管由本申请实施例所述的制备方法制备得到。本申请实施例提供的量子点发光二极管由本申请实施例特有的制备方法得到,这样的量子点发光二极管可以稳固量子点发光层和空穴功能层的界面接触,从而减少界面缺陷产生的非辐射复合,提高量子点发光二极管的电光效率和寿命。Specifically, the quantum dot light-emitting diodes described in the embodiments of the present application are prepared by the preparation methods described in the embodiments of the present application. The quantum dot light-emitting diodes provided in the embodiments of the present application are obtained by the unique preparation methods of the embodiments of the present application. Such quantum dot light-emitting diodes can stabilize the interface contact between the quantum dot light-emitting layer and the hole functional layer, thereby reducing the non-radiative recombination caused by interface defects. , to improve the electro-optical efficiency and lifespan of quantum dot light-emitting diodes.
具体地,所述交联剂选自二苯甲酮和二苯甲酮衍生物中的至少一种;所述含苄基的有机材料选自聚(9-乙烯基咔唑)、聚[(9,9-二正辛基芴基-2,7-二基) -alt- (4,4′-(N-(4-正丁基)苯基)-二苯胺)]、聚[(9,9-二正辛基芴基-2,7-亚苯基乙撑)-alt-(2-甲氧基-5-(2-乙基己氧基)-1,4二基)]、聚(9,9-二辛基芴-2,7-二基)-alt-(N,N’-二苯基联苯胺-N,N’-二基)、聚(9,9-二正辛基芴基-2,7-二基)、聚[(N,N’-(4-正丁基苯基)-N,N’-二苯基-1,4-苯二胺)-alt-(9,9-二正辛基芴基-2,7-二基)]、聚[9-(1-辛基壬基)-9H-咔唑]、聚[2-甲氧基-5-(2-乙基己氧基)-1,4-苯乙炔]、聚[2-甲氧基-5-(2-乙基己氧基)-1,4-苯乙炔]、聚[(9,9-二辛基芴基-2,7-二基)-co-并噻吩]和聚[(9,9-二辛基芴基-2,7-二基)-alt-(苯并[2,1,3]噻二唑-4,8-二基)]中的至少一种;所述交联剂与所述量子点的质量比为(0.5-5):100。具体地,交联剂和量子点材料的质量比可以为0.5:100、1:100、2:100、4:100、5:100等。Specifically, the crosslinking agent is selected from at least one of benzophenone and benzophenone derivatives; the benzyl group-containing organic material is selected from poly(9-vinylcarbazole), poly[(( 9,9-Di-n-octylfluorenyl-2,7-diyl)-alt-(4,4′-(N-(4-n-butyl)phenyl)-diphenylamine)], poly[(9 ,9-Di-n-octylfluorenyl-2,7-phenyleneethylene)-alt-(2-methoxy-5-(2-ethylhexyloxy)-1,4diyl)], Poly(9,9-dioctylfluorene-2,7-diyl)-alt-(N,N'-diphenylbenzidine-N,N'-diyl), poly(9,9-dinormal Octylfluorenyl-2,7-diyl), poly[(N,N'-(4-n-butylphenyl)-N,N'-diphenyl-1,4-phenylenediamine)-alt -(9,9-Di-n-octylfluorenyl-2,7-diyl)], poly[9-(1-octylnonyl)-9H-carbazole], poly[2-methoxy-5-( 2-ethylhexyloxy)-1,4-phenylacetylene], poly[2-methoxy-5-(2-ethylhexyloxy)-1,4-phenylacetylene], poly[(9, 9-dioctylfluorenyl-2,7-diyl)-co-thiophene] and poly[(9,9-dioctylfluorenyl-2,7-diyl)-alt-(benzo[2 ,1,3] at least one of thiadiazole-4,8-diyl)]; the mass ratio of the crosslinking agent to the quantum dots is (0.5-5):100. Specifically, the mass ratio of the crosslinking agent and the quantum dot material may be 0.5:100, 1:100, 2:100, 4:100, 5:100, and the like.
进一步地,所述量子点发光层还含有高分子聚合物,且所述量子点发光层退火成膜时的退火温度≥所述高分子聚合物的玻璃化转变温度。具体地,所述高分子聚合物和所述量子点的质量比为(0.5-10):100;具体地,高分子聚合物和量子点材料的质量比可以为0.5:100、1:100、4:100、5:100、10:100等。进一步地,所述高分子聚合物选自乙烯基类聚合物、丙烯基类聚合物、酰胺类聚合物、苯基类聚合物和碳酸酯基类聚合物中的至少一种。Further, the quantum dot light-emitting layer further contains a high molecular polymer, and the annealing temperature when the quantum dot light-emitting layer is annealed to form a film is greater than or equal to the glass transition temperature of the high molecular polymer. Specifically, the mass ratio of the high molecular polymer and the quantum dots is (0.5-10): 100; 4:100, 5:100, 10:100, etc. Further, the high molecular polymer is selected from at least one of vinyl-based polymers, acryl-based polymers, amide-based polymers, phenyl-based polymers and carbonate-based polymers.
在一些实施例中,上述空穴功能层为空穴传输层,上述空穴功能材料为含苄基的空穴传输材料。In some embodiments, the hole functional layer is a hole transport layer, and the hole functional material is a benzyl group-containing hole transport material.
进一步地,所述阴极与所述量子点发光层之间设置有电子功能层。如电子传输层,或层叠的电子注入层和电子传输层,其中电子注入层与阴极相邻。Further, an electronic functional layer is disposed between the cathode and the quantum dot light-emitting layer. Such as an electron transport layer, or a stacked electron injection layer and electron transport layer, wherein the electron injection layer is adjacent to the cathode.
在一个优选的实施例中,空穴功能层材料选用聚[(N,N'-(4-正丁基苯基)-N,N'-二苯基-1,4-苯二胺)-ALT-(9,9-二正辛基芴基-2,7-二基)](TFB),在空穴功能层之上形成量子点发光层,量子点发光层的制备溶液是添加了3%聚(α-腈基丙烯酸丁酯)(占量子点的质量分数)的含有2%的双二苯甲酮(占量子点的质量分数)的绿色量子点溶液,后续使用365nm紫外固化灯照射10min与TFB发生自由基耦合交联反应以获得紧密连接的界面层,通过100℃退火,进行发光层中量子点位置重排,制备的器件外量子效率(EQE)为18.9%,寿命T95@1000nit为1294h。In a preferred embodiment, the hole functional layer material is selected from poly[(N,N'-(4-n-butylphenyl)-N,N'-diphenyl-1,4-phenylenediamine)- ALT-(9,9-di-n-octylfluorenyl-2,7-diyl)](TFB), a quantum dot light-emitting layer is formed on the hole functional layer, and the preparation solution of the quantum dot light-emitting layer is added with 3 % poly(α-butyl cyanoacrylate) (mass fraction of quantum dots) in green quantum dot solution containing 2% bisbenzophenone (mass fraction of quantum dots), followed by irradiation with a 365nm UV curing lamp After 10 minutes, radical coupling and cross-linking reaction with TFB was carried out to obtain a tightly connected interface layer. After annealing at 100 °C, the positions of quantum dots in the light-emitting layer were rearranged. The prepared device had an external quantum efficiency (EQE) of 18.9% and a lifetime of T95@1000nit. is 1294h.
本申请实施例提供的量子点发光二极管包括正置结构和倒置结构。正置结构的量子点发光二极管由图1所示的制备方法得到,倒置结构的量子点发光二极管由图2所示的制备方法得到。The quantum dot light-emitting diode provided by the embodiments of the present application includes an upside-down structure and an upside-down structure. The quantum dot light emitting diode with the upright structure is obtained by the preparation method shown in FIG. 1 , and the quantum dot light emitting diode with the inverted structure is obtained by the preparation method shown in FIG. 2 .
在一种实施方式中,正置结构量子点发光二极管包括相对设置的阳极和阴极的层叠结构,设置在所述阳极和所述阴极之间的量子点发光层,设置在所述阳极和所述量子点发光层之间的空穴传输层,且所述阳极设置在衬底上。进一步的,所述阳极和所述量子点发光层之间还可以设置空穴注入层、电子阻挡层等空穴功能层;在所述阴极和所述量子点发光层之间还可以设置电子传输层、电子注入层和空穴阻挡层等电子功能层。在一些正置结构器件的实施例中,所述量子点发光二极管包括衬底,设置在所述衬底表面的阳极,设置在阳极表面的所述空穴注入层,设置在所述空穴注入层表面的空穴传输层,设置在所述空穴传输层表面的量子点发光层,设置在量子点发光层表面的电子传输层和设置在电子传输层表面的阴极。In one embodiment, the upright structure quantum dot light-emitting diode comprises a stacked structure of oppositely disposed anode and cathode, a quantum dot light-emitting layer disposed between the anode and the cathode, disposed between the anode and the cathode A hole transport layer between the quantum dot light-emitting layers, and the anode is disposed on the substrate. Further, a hole functional layer such as a hole injection layer and an electron blocking layer can also be arranged between the anode and the quantum dot light-emitting layer; an electron transport layer can also be arranged between the cathode and the quantum dot light-emitting layer. layer, electron injection layer and hole blocking layer and other electronic functional layers. In some upside structure device embodiments, the quantum dot light-emitting diode includes a substrate, an anode disposed on the surface of the substrate, the hole injection layer disposed on the surface of the anode, and the hole injection layer disposed on the surface of the anode. A hole transport layer on the surface of the layer, a quantum dot light-emitting layer provided on the surface of the hole transport layer, an electron transport layer provided on the surface of the quantum dot light-emitting layer, and a cathode provided on the surface of the electron transport layer.
在一种实施方式中,倒置结构量子点发光二极管包括相对设置的阳极和阴极的叠层结构,设置在所述阳极和所述阴极之间的量子点发光层,设置在所述阳极和所述量子点发光层之间的空穴传输层,且所述阴极设置在衬底上。进一步的,所述阳极和所述量子点发光层之间还可以设置空穴注入层、电子阻挡层等空穴功能层;在所述阴极和所述量子点发光层之间还可以设置电子传输层、电子注入层和空穴阻挡层等电子功能层。在一些倒置结构器件的实施例中,所述量子点发光二极管包括衬底,设置在所述衬底表面的阴极,设置在阴极表面的所述电子传输层,设置在所述电子传输层表面的量子点发光层,设置在所述量子点发光层表面的空穴传输层,设置在空穴传输层表面的空穴注入层和设置在空穴注入层表面的阳极。In one embodiment, an inverted-structure quantum dot light-emitting diode includes a stacked structure of an anode and a cathode disposed opposite to each other, a quantum dot light-emitting layer disposed between the anode and the cathode, and disposed between the anode and the cathode. A hole transport layer between the quantum dot light-emitting layers, and the cathode is disposed on the substrate. Further, a hole functional layer such as a hole injection layer and an electron blocking layer can also be arranged between the anode and the quantum dot light-emitting layer; an electron transport layer can also be arranged between the cathode and the quantum dot light-emitting layer. layer, electron injection layer and hole blocking layer and other electronic functional layers. In some embodiments of the inverted structure device, the quantum dot light-emitting diode comprises a substrate, a cathode disposed on the surface of the substrate, the electron transport layer disposed on the surface of the cathode, and an electron transport layer disposed on the surface of the electron transport layer. A quantum dot light-emitting layer, a hole transport layer provided on the surface of the quantum dot light-emitting layer, a hole injection layer provided on the surface of the hole transport layer, and an anode provided on the surface of the hole injection layer.
衬底包括钢性、柔性衬底,具体包括玻璃、硅晶片、聚碳酸酯、聚甲基丙烯酸甲酯、聚对苯二甲酸乙二醇酯、聚萘二甲酸乙二醇酯、聚酰胺、聚醚砜、或其组合。Substrates include rigid, flexible substrates, specifically glass, silicon wafers, polycarbonate, polymethyl methacrylate, polyethylene terephthalate, polyethylene naphthalate, polyamide, Polyethersulfone, or a combination thereof.
阳极包括金属或其合金例如镍、铂、钒、铬、铜、锌、或金;导电金属氧化物例如氧化锌、氧化铟、氧化锡、氧化铟锡(ITO)、氧化铟锌(IZO)、或氟掺杂的氧化锡;或者金属和氧化物的组合例如ZnO和Al或者SnO 2和Sb,但是不限于此,可以为以上任意两种或两种以上组合。 Anodes include metals or alloys thereof such as nickel, platinum, vanadium, chromium, copper, zinc, or gold; conductive metal oxides such as zinc oxide, indium oxide, tin oxide, indium tin oxide (ITO), indium zinc oxide (IZO), or fluorine-doped tin oxide; or a combination of metals and oxides such as ZnO and Al or SnO 2 and Sb, but not limited thereto, any two or more of the above may be combined.
空穴注入层包括导电化合物,包括聚噻吩、聚苯胺、聚吡咯、聚(对亚苯基)、聚芴、聚(3 ,4-亚乙基二氧噻吩)、聚(3 ,4-亚乙基二氧噻吩)聚磺苯乙烯(PEDOT:PSS)、MoO 3、WoO 3、NiO、HATCN、CuO、V 2O 5、CuS、或其组合。 The hole injection layer includes conductive compounds, including polythiophene, polyaniline, polypyrrole, poly(p-phenylene), polyfluorene, poly(3,4-ethylenedioxythiophene), poly(3,4-ethylenediene) ethyldioxythiophene) polystyrene sulfonate (PEDOT: PSS), MoO 3 , WoO 3 , NiO, HATCN, CuO, V 2 O 5 , CuS, or a combination thereof.
空穴传输层的含苄基的有机材料选自聚(9-乙烯基咔唑)、聚[(9,9-二正辛基芴基-2,7-二基) -alt- (4,4′-(N-(4-正丁基)苯基)-二苯胺)]、聚[(9,9-二正辛基芴基-2,7-亚苯基乙撑)-alt-(2-甲氧基-5-(2-乙基己氧基)-1,4二基)]、聚(9,9-二辛基芴-2,7-二基)-alt-(N,N’-二苯基联苯胺-N,N’-二基)、聚(9,9-二正辛基芴基-2,7-二基)、聚[(N,N’-(4-正丁基苯基)-N,N’-二苯基-1,4-苯二胺)-alt-(9,9-二正辛基芴基-2,7-二基)]、聚[9-(1-辛基壬基)-9H-咔唑]、聚[2-甲氧基-5-(2-乙基己氧基)-1,4-苯乙炔]、聚[2-甲氧基-5-(2-乙基己氧基)-1,4-苯乙炔]、聚[(9,9-二辛基芴基-2,7-二基)-co-并噻吩]和聚[(9,9-二辛基芴基-2,7-二基)-alt-(苯并[2,1,3]噻二唑-4,8-二基)]中的至少一种。The benzyl-containing organic material of the hole transport layer is selected from poly(9-vinylcarbazole), poly[(9,9-di-n-octylfluorenyl-2,7-diyl)-alt-(4, 4′-(N-(4-n-butyl)phenyl)-diphenylamine)], poly[(9,9-di-n-octylfluorenyl-2,7-phenylethylene)-alt-( 2-methoxy-5-(2-ethylhexyloxy)-1,4diyl)], poly(9,9-dioctylfluorene-2,7-diyl)-alt-(N, N'-diphenylbenzidine-N,N'-diyl), poly(9,9-di-n-octylfluorenyl-2,7-diyl), poly[(N,N'-(4- n-butylphenyl)-N,N'-diphenyl-1,4-phenylenediamine)-alt-(9,9-di-n-octylfluorenyl-2,7-diyl)], poly[ 9-(1-Octylnonyl)-9H-carbazole], poly[2-methoxy-5-(2-ethylhexyloxy)-1,4-phenylethyne], poly[2-methoxyl -5-(2-ethylhexyloxy)-1,4-phenylacetylene], poly[(9,9-dioctylfluorenyl-2,7-diyl)-co-thiophene] and poly[ At least one of (9,9-dioctylfluorenyl-2,7-diyl)-alt-(benzo[2,1,3]thiadiazole-4,8-diyl)].
量子点发光层中的量子点为II-VI族的CdS、CdSe、CdTe、ZnS、ZnSe、ZnTe、ZnO、HgS、HgSe、HgTe、CdSeS、CdSeTe、CdSTe、ZnSeS、ZnSeTe、ZnSTe、HgSeS、HgSeTe、HgSTe、CdZnS、CdZnSe、CdZnTe、CdHgS、CdHgSe、CdHgTe、HgZnS、HgZnSe、HgZnTe、CdZnSeS、CdZnSeTe、CdZnSTe、CdHgSeS、CdHgSeTe、CdHgSTe、HgZnSeS、HgZnSeTe、HgZnSTe;或III-V族的GaN、GaP、GaAs、GaSb、AlN、AlP、AlAs、AlSb、InN、InP、InAs、InSb、GaNP、GaNAs、GaNSb、GaPAs、GaPSb、AlNP、AlNAs、AlNSb、AlPAs、AlPSb、InNP、InNAs、InNSb、InPAs、InPSb、GaAlNP、GaAlNAs、GaAlNSb、GaAlPAs、GaAlPSb、GaInNP、GaInNAs、GaInNSb、GaInPAs、GaInPSb、InAlNP、InAlNAs、InAlNSb、InAlPAs、InAlPSb;或IV-VI族的SnS、SnSe、SnTe、PbS、PbSe、PbTe、SnSeS、SnSeTe、SnSTe、PbSeS、PbSeTe、PbSTe、SnPbS、SnPbSe、SnPbTe、SnPbSSe、SnPbSeTe、SnPbSTe;或者以上任意一种或多种的组合。The quantum dots in the quantum dot light-emitting layer are group II-VI CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe; or III-V GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb; or SnS, SnSe, SnTe, PbS, PbSe, PbTe, SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, SnPbSSe, SnPbSeTe, SnPbSTe; or a combination of any one or more of the above.
其中,量子点发光层中的交联剂选自二苯甲酮和二苯甲酮衍生物中的至少一种,其中的所述二苯甲酮衍生物选自2,4-二硝基二苯甲酮、2-羟基-4-甲氧基二苯甲酮和2-羟基-4-正辛氧基二苯甲酮中的至少一种。进一步地,量子点发光层还含有高分子聚合物,所述高分子聚合物选自乙烯基类聚合物、丙烯基类聚合物、酰胺类聚合物、苯基类聚合物和碳酸酯基类聚合物中的至少一种。Wherein, the crosslinking agent in the quantum dot light-emitting layer is selected from at least one of benzophenone and benzophenone derivatives, wherein the benzophenone derivatives are selected from 2,4-dinitrodi At least one of benzophenone, 2-hydroxy-4-methoxybenzophenone, and 2-hydroxy-4-n-octyloxybenzophenone. Further, the quantum dot light-emitting layer also contains a high molecular polymer, and the high molecular polymer is selected from vinyl-based polymers, acryl-based polymers, amide-based polymers, phenyl-based polymers and carbonate-based polymers at least one of them.
电子传输层材料为ZnO、TiO 2、Alq 3、SnO 2、ZrO、AlZnO、ZnSnO、BCP、TAZ、PBD、TPBI、Bphen、CsCO 3中的一种或多种。 The material of the electron transport layer is one or more of ZnO, TiO 2 , Alq 3 , SnO 2 , ZrO, AlZnO, ZnSnO, BCP, TAZ, PBD, TPBI, Bphen, and CsCO 3 .
阴极包括金属或其合金例如镁、钙、钠、钾、钛、铟、钇、锂、钆、铝、银、锡、铅、铯、或钡;多层结构材料包括碱金属卤化物、碱土金属卤化物、碱金属氧化物、或其组合的第一层、和金属层的结构,其中所述金属层包括碱土金属、13族金属、或其组合。例如LiF/Al、LiO 2/Al、LiF/Ca、Liq/Al、和BaF 2/Ca,但是不限于此。 Cathodes include metals or their alloys such as magnesium, calcium, sodium, potassium, titanium, indium, yttrium, lithium, gadolinium, aluminum, silver, tin, lead, cesium, or barium; multilayer construction materials include alkali metal halides, alkaline earth metals A structure of a first layer of halide, alkali metal oxide, or a combination thereof, and a metal layer, wherein the metal layer comprises an alkaline earth metal, a Group 13 metal, or a combination thereof. For example, LiF/Al, LiO 2 /Al, LiF/Ca, Liq/Al, and BaF 2 /Ca, but not limited thereto.
在一个具体的实施方式中,正置结构量子点发光二极管中,阳极选自铟锡氧化物(ITO),空穴注入层为PEDOT:PSS,空穴传输层为TFB,量子点发光层为掺杂2%的双二苯甲酮的红色量子点材料,电子传输层为ZnO,阴极为Al。In a specific embodiment, in the upright structure quantum dot light-emitting diode, the anode is selected from indium tin oxide (ITO), the hole injection layer is PEDOT:PSS, the hole transport layer is TFB, and the quantum dot light-emitting layer is doped The red quantum dot material containing 2% bisbenzophenone, the electron transport layer is ZnO, and the cathode is Al.
在一个具体的实施方式中,阳极的厚度为20 ~ 200 nm;空穴注入层的厚度为20 ~ 200 nm;空穴传输层的厚度为30 ~ 180 nm;量子点发光层的总厚度为30 ~ 180 nm;电子传输层的厚度为10 ~ 180 nm;阴极的厚度为40 ~ 190 nm。In a specific embodiment, the thickness of the anode is 20-200 nm; the thickness of the hole injection layer is 20 nm. ~ 200 nm; the thickness of the hole transport layer is 30 ~ 180 nm; the total thickness of the quantum dot light-emitting layer is 30 ~ 180 nm; the thickness of the electron transport layer is 10 ~ 180 nm; the thickness of the cathode is 40 nm ~190 nm.
本申请先后进行过多次试验,现举一部分试验结果作为参考对申请进行进一步详细描述,下面结合具体实施例进行详细说明。The application has been subjected to several tests successively, and now a part of the test results are taken as a reference to further describe the application in detail.
实施例1Example 1
本实施例提供一种QLED器件,其结构如图3所示,该QLED器件从下而上依次包括衬底1、阳极2、空穴注入层3、空穴传输层4、量子点发光层5、电子传输层6、阴极7。其中,衬底1的材料为玻璃片,阳极2的材料为ITO基板,空穴注入层3的材料为PEDOT:PSS,空穴传输层4的材料为TFB,量子点发光层5的材料包括CdZnSe/ZnSe/ZnS绿色量子点和双二苯甲酮,电子传输层6的材料为ZnO,阴极7的材料为Al。This embodiment provides a QLED device, the structure of which is shown in FIG. 3 , the QLED device includes a substrate 1 , an anode 2 , a hole injection layer 3 , a hole transport layer 4 , and a quantum dot light-emitting layer 5 in order from bottom to top , electron transport layer 6 , cathode 7 . The material of substrate 1 is glass sheet, the material of anode 2 is ITO substrate, the material of hole injection layer 3 is PEDOT:PSS, the material of hole transport layer 4 is TFB, the material of quantum dot light-emitting layer 5 is CdZnSe /ZnSe/ZnS green quantum dots and bisbenzophenone, the material of the electron transport layer 6 is ZnO, and the material of the cathode 7 is Al.
该器件的制备方法包括如下步骤:The preparation method of the device includes the following steps:
在阳极ITO上旋涂空穴注入层PEDOT:PSS材料,然后100℃退火15min;然后在空穴注入层上形成TFB空穴传输层,100℃退火15min;在作为承载的空穴传输层上形成含有质量比为2:3:100的双二苯甲酮、聚(α-腈基丙烯酸丁酯)和CdZnSe/ZnSe/ZnS绿色量子点的量子点发光层;并在365nm紫外灯下照射10min,使量子点发光层底部的双二苯甲酮与空穴传输层表面的TFB发生自由基耦合进行交联反应;在量子点发光层上制作ZnO的乙醇溶液,得到电子传输层;最后通过蒸镀Al阴极电极层,封装形成电致发光器件。A hole injection layer PEDOT:PSS material was spin-coated on the anode ITO, and then annealed at 100 °C for 15 min; then a TFB hole transport layer was formed on the hole injection layer, and annealed at 100 °C for 15 min; A quantum dot light-emitting layer containing bisbenzophenone, poly(α-butyl cyanoacrylate) and CdZnSe/ZnSe/ZnS green quantum dots with a mass ratio of 2:3:100; and irradiated under a 365nm UV lamp for 10min, The bisbenzophenone at the bottom of the quantum dot light-emitting layer and the TFB on the surface of the hole transport layer are subjected to radical coupling for cross-linking reaction; an ethanol solution of ZnO is prepared on the quantum dot light-emitting layer to obtain an electron transport layer; Al cathode electrode layer, encapsulated to form an electroluminescent device.
实施例2Example 2
本实施例提供一种QLED器件,其结构如图3所示,该QLED器件从下而上依次包括衬底1、阳极2、空穴注入层3、空穴传输层4、量子点发光层5、电子传输层6、阴极7。其中,衬底1的材料为玻璃片,阳极2的材料为ITO基板,空穴注入层3的材料为PEDOT:PSS,空穴传输层4的材料为TFB,量子点发光层5的材料包括CdZnSe/ZnSe/ZnS绿色量子点和2,4-二硝基二苯甲酮,电子传输层6的材料为ZnO,阴极7的材料为Al。This embodiment provides a QLED device, the structure of which is shown in FIG. 3 , the QLED device includes a substrate 1 , an anode 2 , a hole injection layer 3 , a hole transport layer 4 , and a quantum dot light-emitting layer 5 in order from bottom to top , electron transport layer 6 , cathode 7 . The material of substrate 1 is glass sheet, the material of anode 2 is ITO substrate, the material of hole injection layer 3 is PEDOT:PSS, the material of hole transport layer 4 is TFB, the material of quantum dot light-emitting layer 5 is CdZnSe /ZnSe/ZnS green quantum dots and 2,4-dinitrobenzophenone, the material of the electron transport layer 6 is ZnO, and the material of the cathode 7 is Al.
该器件的制备方法包括如下步骤:The preparation method of the device includes the following steps:
在阳极ITO上旋涂空穴注入层PEDOT:PSS材料,然后100℃退火15min;然后在空穴注入层上形成TFB空穴传输层,100℃退火15min;在作为承载的空穴传输层上形成含有质量比为1.5:100的2,4-二硝基二苯甲酮和CdZnSe/ZnSe/ZnS绿色量子点的量子点发光层;并在365nm紫外灯下照射10min,使量子点发光层底部的2,4-二硝基二苯甲酮与空穴传输层表面的TFB发生自由基耦合进行交联反应;在量子点发光层上旋涂ZnO的乙醇溶液,得到电子传输层;最后通过蒸镀Al阴极电极层,封装形成电致发光器件。A hole injection layer PEDOT:PSS material was spin-coated on the anode ITO, and then annealed at 100 °C for 15 min; then a TFB hole transport layer was formed on the hole injection layer, and annealed at 100 °C for 15 min; The quantum dot light-emitting layer containing 2,4-dinitrobenzophenone and CdZnSe/ZnSe/ZnS green quantum dots with a mass ratio of 1.5:100; 2,4-dinitrobenzophenone and TFB on the surface of the hole transport layer undergo free radical coupling for cross-linking reaction; spin-coat ZnO ethanol solution on the quantum dot light-emitting layer to obtain an electron transport layer; finally, by evaporation Al cathode electrode layer, encapsulated to form an electroluminescent device.
实施例3Example 3
本实施例提供一种QLED器件,其结构如图3所示,该QLED器件从下而上依次包括衬底1、阳极2、空穴注入层3、空穴传输层4、量子点发光层5、电子传输层6、阴极7。其中,衬底1的材料为玻璃片,阳极2的材料为ITO基板,空穴注入层3的材料为PEDOT:PSS,空穴传输层4的材料为聚(9-乙烯基咔唑),量子点发光层5的材料包括CdZnSe/ZnSe/ZnS绿色量子点和2-羟基-4-甲氧基二苯甲酮,电子传输层6的材料为ZnO,阴极7的材料为Al。This embodiment provides a QLED device, the structure of which is shown in FIG. 3 , the QLED device includes a substrate 1 , an anode 2 , a hole injection layer 3 , a hole transport layer 4 , and a quantum dot light-emitting layer 5 in order from bottom to top , electron transport layer 6 , cathode 7 . The material of the substrate 1 is a glass sheet, the material of the anode 2 is an ITO substrate, the material of the hole injection layer 3 is PEDOT:PSS, the material of the hole transport layer 4 is poly(9-vinylcarbazole), the quantum The material of the point light-emitting layer 5 includes CdZnSe/ZnSe/ZnS green quantum dots and 2-hydroxy-4-methoxybenzophenone, the material of the electron transport layer 6 is ZnO, and the material of the cathode 7 is Al.
该器件的制备方法包括如下步骤:The preparation method of the device includes the following steps:
在阳极ITO上旋涂空穴注入层PEDOT:PSS材料,然后100℃退火15min;然后在空穴注入层上形成聚(9-乙烯基咔唑)空穴传输层,100℃退火15min;在作为承载的空穴传输层上形成含有质量比为5:100的2-羟基-4-甲氧基二苯甲酮和CdZnSe/ZnSe/ZnS绿色量子点的量子点发光层;并在365nm紫外灯下照射10min,使量子点发光层底部的2-羟基-4-甲氧基二苯甲酮与空穴传输层表面的聚(9-乙烯基咔唑)发生自由基耦合进行交联反应;在量子点发光层上旋涂ZnO的乙醇溶液,得到电子传输层;最后通过蒸镀Al阴极电极层,封装形成电致发光器件。A hole injection layer PEDOT:PSS material was spin-coated on the anode ITO, and then annealed at 100 °C for 15 min; then a poly(9-vinylcarbazole) hole transport layer was formed on the hole injection layer, annealed at 100 °C for 15 min; A quantum dot light-emitting layer containing 2-hydroxy-4-methoxybenzophenone and CdZnSe/ZnSe/ZnS green quantum dots with a mass ratio of 5:100 was formed on the supported hole transport layer; and under a 365 nm UV lamp Irradiate for 10 min, so that the 2-hydroxy-4-methoxybenzophenone at the bottom of the quantum dot light-emitting layer and the poly(9-vinylcarbazole) on the surface of the hole transport layer undergo free radical coupling for cross-linking reaction; An ethanol solution of ZnO is spin-coated on the spot light-emitting layer to obtain an electron transport layer; finally, an electroluminescent device is formed by evaporating an Al cathode electrode layer by encapsulation.
对比例1Comparative Example 1
本对比例的量子点发光二极管器件除了量子点发光层材料仅为CdZnSe/ZnSe/ZnS绿色量子点外,其他均与实施例1相同。The quantum dot light-emitting diode device of this comparative example is the same as that of Example 1 except that the material of the quantum dot light-emitting layer is only CdZnSe/ZnSe/ZnS green quantum dots.
对比例2Comparative Example 2
本对比例的量子点发光二极管器件除了量子点发光层材料仅为CdZnSe/ZnSe/ZnS绿色量子点外,其他均与实施例3相同。The quantum dot light-emitting diode device of this comparative example is the same as that of Example 3 except that the material of the quantum dot light-emitting layer is only CdZnSe/ZnSe/ZnS green quantum dots.
性能测试Performance Testing
对上述实施例和对比例的量子点发光二极管器件的光电性能和寿命进行了测试,测试结果如表1和图4-8所示。The photoelectric properties and lifespan of the quantum dot light-emitting diode devices of the above examples and comparative examples were tested, and the test results are shown in Table 1 and FIGS. 4-8 .
器件的寿命测试采用广州新视界公司定制的128路寿命测试系统。系统架构为恒压恒流源驱动QLED,测试电压或电流的变化;光电二极管探测器和测试系统,测试QLED的亮度(光电流)变化;亮度计测试校准QLED的亮度(光电流)。The life test of the device adopts the 128-channel life test system customized by Guangzhou New Vision Company. The system architecture is to drive the QLED with a constant voltage and constant current source, and test the change of voltage or current; the photodiode detector and test system test the change of the brightness (photocurrent) of the QLED; the luminance meter tests and calibrates the brightness (photocurrent) of the QLED.
表1Table 1
Figure dest_path_image001
Figure dest_path_image001
通过表1的数据可知:本申请实施例的器件量子点发光层,使用的绿色量子点材料中因含有可与空穴传输层发生界面交联反应的二苯甲酮或二苯甲酮衍生物,可稳固量子点发光层和空穴功能层的界面接触,减少界面缺陷产生的非辐射复合,因此提高了量子点发光二极管的电光效率和寿命。实施例1和2相对于对比例1,电流效率有近3倍的提升,且因量子点发光层和空穴传输层界面的优化,器件的寿命有5-8倍的提高;同样的结论与实施例3和对比例2的实验结果一致。From the data in Table 1, it can be seen that the quantum dot light-emitting layer of the device in the embodiment of the present application contains benzophenone or benzophenone derivative that can undergo interfacial cross-linking reaction with the hole transport layer in the green quantum dot material used. , which can stabilize the interface contact between the quantum dot light-emitting layer and the hole functional layer, reduce the non-radiative recombination caused by interface defects, and thus improve the electro-optical efficiency and life of the quantum dot light-emitting diode. Compared with Comparative Example 1, Examples 1 and 2 have a nearly 3 times improvement in current efficiency, and due to the optimization of the interface between the quantum dot light-emitting layer and the hole transport layer, the life of the device is improved by 5-8 times; the same conclusion is as follows: The experimental results of Example 3 and Comparative Example 2 are consistent.
以上仅为本申请的可选实施例而已,并不用于限制本申请。对于本领域的技术人员来说,本申请可以有各种更改和变化。凡在本申请的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本申请的权利要求范围之内。The above are only optional embodiments of the present application, and are not intended to limit the present application. Various modifications and variations of this application are possible for those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of this application shall be included within the scope of the claims of this application.

Claims (20)

  1. 一种量子点发光二极管的制备方法,其特征在于,包括如下步骤: A method for preparing a quantum dot light-emitting diode, comprising the following steps:
    提供阳极基板,所述阳极基板上设置有空穴功能层,所述空穴功能层的材料为含苄基的有机材料;An anode substrate is provided, a hole functional layer is provided on the anode substrate, and the material of the hole functional layer is an organic material containing a benzyl group;
    在所述空穴功能层表面制备含量子点和交联剂的量子点发光层,然后紫外光照进行交联反应;A quantum dot light-emitting layer containing quantum dots and a cross-linking agent is prepared on the surface of the hole functional layer, and then the cross-linking reaction is carried out by ultraviolet light;
    或者,or,
    提供阴极基板,所述阴极基板上设置有含量子点和交联剂的量子点发光层;A cathode substrate is provided, and a quantum dot light-emitting layer containing quantum dots and a cross-linking agent is provided on the cathode substrate;
    在所述量子点发光层表面制备空穴功能层,然后紫外光照进行交联反应;其中,所述空穴功能层的材料为含苄基的有机材料。A hole functional layer is prepared on the surface of the quantum dot light-emitting layer, and then cross-linking reaction is performed by ultraviolet light; wherein, the material of the hole functional layer is an organic material containing a benzyl group.
  2. 如权利要求1所述的量子点发光二极管的制备方法,其特征在于,所述交联剂选自二苯甲酮和二苯甲酮衍生物中的至少一种。 The method for preparing a quantum dot light-emitting diode according to claim 1, wherein the crosslinking agent is selected from at least one of benzophenone and benzophenone derivatives.
  3. 如权利要求1所述的量子点发光二极管的制备方法,其特征在于,所述含苄基的有机材料选自聚(9-乙烯基咔唑)、聚[(9,9-二正辛基芴基-2,7-二基) -alt- (4,4′-(N-(4-正丁基)苯基)-二苯胺)]、聚[(9,9-二正辛基芴基-2,7-亚苯基乙撑)-alt-(2-甲氧基-5-(2-乙基己氧基)-1,4二基)]、聚(9,9-二辛基芴-2,7-二基)-alt-(N,N’-二苯基联苯胺-N,N’-二基)、聚(9,9-二正辛基芴基-2,7-二基)、聚[(N,N’-(4-正丁基苯基)-N,N’-二苯基-1,4-苯二胺)-alt-(9,9-二正辛基芴基-2,7-二基)]、聚[9-(1-辛基壬基)-9H-咔唑]、聚[2-甲氧基-5-(2-乙基己氧基)-1,4-苯乙炔]、聚[2-甲氧基-5-(2-乙基己氧基)-1,4-苯乙炔]、聚[(9,9-二辛基芴基-2,7-二基)-co-并噻吩]和聚[(9,9-二辛基芴基-2,7-二基)-alt-(苯并[2,1,3]噻二唑-4,8-二基)]中的至少一种。 The method for preparing a quantum dot light-emitting diode according to claim 1, wherein the benzyl-containing organic material is selected from the group consisting of poly(9-vinylcarbazole), poly[(9,9-di-n-octyl) Fluorenyl-2,7-diyl)-alt-(4,4′-(N-(4-n-butyl)phenyl)-diphenylamine)], poly[(9,9-di-n-octylfluorene) (2,7-phenylethylene)-alt-(2-methoxy-5-(2-ethylhexyloxy)-1,4diyl)], poly(9,9-dioctyl) Fluorene-2,7-diyl)-alt-(N,N'-diphenylbenzidine-N,N'-diyl), poly(9,9-di-n-octylfluorenyl-2,7 -diyl), poly[(N,N'-(4-n-butylphenyl)-N,N'-diphenyl-1,4-phenylenediamine)-alt-(9,9-di-n-butylphenyl)- Octylfluorenyl-2,7-diyl)], poly[9-(1-octylnonyl)-9H-carbazole], poly[2-methoxy-5-(2-ethylhexyloxy) -1,4-phenylacetylene], poly[2-methoxy-5-(2-ethylhexyloxy)-1,4-phenylacetylene], poly[(9,9-dioctylfluorenyl- 2,7-Diyl)-co-thiophene] and poly[(9,9-dioctylfluorenyl-2,7-diyl)-alt-(benzo[2,1,3]thiadiazole -4,8-diyl)] at least one.
  4. 如权利要求1所述的量子点发光二极管的制备方法,其特征在于,所述紫外光照的波长为200-410nm;和/或, The method for preparing a quantum dot light-emitting diode according to claim 1, wherein the wavelength of the ultraviolet light is 200-410 nm; and/or,
    所述紫外光照的时间为5-15min。The time of the ultraviolet irradiation is 5-15min.
  5. 如权利要求1所述的量子点发光二极管的制备方法,其特征在于,在所述空穴功能层表面制备含量子点和交联剂的量子点发光层的步骤包括:将含有交联剂和量子点的混合溶液沉积在所述空穴功能层表面,进行退火处理。 The method for preparing a quantum dot light-emitting diode according to claim 1, wherein the step of preparing a quantum dot light-emitting layer containing quantum dots and a cross-linking agent on the surface of the hole functional layer comprises: adding a cross-linking agent and a cross-linking agent. The mixed solution of quantum dots is deposited on the surface of the hole functional layer and annealed.
  6. 如权利要求5所述的量子点发光二极管的制备方法,其特征在于,所述混合溶液中,量子点的浓度为10-50mg/ml:和/或, The method for preparing a quantum dot light-emitting diode according to claim 5, wherein, in the mixed solution, the concentration of quantum dots is 10-50 mg/ml: and/or,
    所述混合溶液中,所述交联剂与所述量子点的质量比为(0.5-5):100。In the mixed solution, the mass ratio of the crosslinking agent to the quantum dots is (0.5-5):100.
  7. 如权利要求5所述的量子点发光二极管的制备方法,其特征在于,所述退火处理的温度为50-250℃;和/或, The method for preparing a quantum dot light-emitting diode according to claim 5, wherein the temperature of the annealing treatment is 50-250°C; and/or,
    所述退火处理的温度为 10-30min 。The temperature of the annealing treatment is 10-30min.
  8. 如权利要求5所述的量子点发光二极管的制备方法,其特征在于,所述混合溶液还含有高分子聚合物,所述退火处理的温度≥所述高分子聚合物的玻璃化转变温度。 The method for preparing a quantum dot light-emitting diode according to claim 5, wherein the mixed solution further contains a high molecular polymer, and the temperature of the annealing treatment is greater than or equal to the glass transition temperature of the high molecular polymer.
  9. 如权利要求8所述的量子点发光二极管的制备方法,其特征在于,所述高分子聚合物和所述量子点的质量比为(0.5-10):100;和/或, The method for preparing a quantum dot light-emitting diode according to claim 8, wherein the mass ratio of the high molecular polymer and the quantum dot is (0.5-10): 100; and/or,
    所述高分子聚合物的玻璃化转变温度为50-150℃,所述退火处理的温度为120-180℃。The glass transition temperature of the high molecular polymer is 50-150°C, and the temperature of the annealing treatment is 120-180°C.
  10. 如权利要求8所述的量子点发光二极管的制备方法,其特征在于,所述高分子聚合物选自乙烯基类聚合物、丙烯基类聚合物、酰胺类聚合物、苯基类聚合物和碳酸酯基类聚合物中的至少一种。 The method for preparing a quantum dot light-emitting diode according to claim 8, wherein the high molecular polymer is selected from the group consisting of vinyl-based polymers, acryl-based polymers, amide-based polymers, phenyl-based polymers and At least one of carbonate-based polymers.
  11. 如权利要求10所述的量子点发光二极管的制备方法,其特征在于,所述乙烯基类聚合物选自聚乙烯醇、聚乙烯基咔唑、聚醋酸乙烯酯、聚四氟乙烯、聚偏二氟乙烯和聚氯乙烯中的至少一种;和/或, The method for preparing a quantum dot light-emitting diode according to claim 10, wherein the vinyl-based polymer is selected from the group consisting of polyvinyl alcohol, polyvinyl carbazole, polyvinyl acetate, polytetrafluoroethylene, polyvinylidene at least one of vinylidene fluoride and polyvinyl chloride; and/or,
    所述丙烯基类聚合物选自聚丙烯酸、聚甲基丙烯酸甲酯、聚(α-腈基丙烯酸丁酯)、聚丙烯酰胺和聚丙烯腈中的至少一种;和/或,The acryl-based polymer is selected from at least one of polyacrylic acid, polymethyl methacrylate, poly(α-butyl cyanoacrylate), polyacrylamide and polyacrylonitrile; and/or,
    所述酰胺类聚合物选自聚亚癸基甲酰胺和聚癸二酰乙二胺中的至少一种;和/或,The amide polymer is selected from at least one of polydecylidene formamide and polyethylene sebacate; and/or,
    所述苯基类聚合物选自聚苯硫醚和聚对苯二甲酸乙二酯中的至少一种;和/或,The phenyl-based polymer is selected from at least one of polyphenylene sulfide and polyethylene terephthalate; and/or,
    所述碳酸酯类聚合物选自聚碳酸酯二醇和溴化聚碳酸酯中的至少一种。The carbonate-based polymer is selected from at least one of polycarbonate diol and brominated polycarbonate.
  12. 一种量子点发光二极管,包括阳极、阴极以及位于所述阳极和所述阴极之间的量子点发光层,所述阳极与所述量子点发光层之间设置有空穴功能层;其特征在于,所述空穴功能层的材料为含苄基的有机材料,所述量子点发光层含有量子点和交联剂,且所述量子点发光层与所述空穴功能层界面交联。 A quantum dot light-emitting diode, comprising an anode, a cathode and a quantum dot light-emitting layer located between the anode and the cathode, and a hole functional layer is arranged between the anode and the quantum dot light-emitting layer; it is characterized in that The material of the hole function layer is an organic material containing benzyl groups, the quantum dot light-emitting layer contains quantum dots and a cross-linking agent, and the quantum dot light-emitting layer and the hole function layer interface are cross-linked.
  13. 如权利要求12所述的量子点发光二极管,其特征在于,所述交联剂选自二苯甲酮和二苯甲酮衍生物中的至少一种。 The quantum dot light-emitting diode of claim 12, wherein the cross-linking agent is selected from at least one of benzophenone and benzophenone derivatives.
  14. 如权利要求12所述的量子点发光二极管,其特征在于,所述含苄基的有机材料选自聚(9-乙烯基咔唑)、聚[(9,9-二正辛基芴基-2,7-二基) -alt- (4,4′-(N-(4-正丁基)苯基)-二苯胺)]、聚[(9,9-二正辛基芴基-2,7-亚苯基乙撑)-alt-(2-甲氧基-5-(2-乙基己氧基)-1,4二基)]、聚(9,9-二辛基芴-2,7-二基)-alt-(N,N’-二苯基联苯胺-N,N’-二基)、聚(9,9-二正辛基芴基-2,7-二基)、聚[(N,N’-(4-正丁基苯基)-N,N’-二苯基-1,4-苯二胺)-alt-(9,9-二正辛基芴基-2,7-二基)]、聚[9-(1-辛基壬基)-9H-咔唑]、聚[2-甲氧基-5-(2-乙基己氧基)-1,4-苯乙炔]、聚[2-甲氧基-5-(2-乙基己氧基)-1,4-苯乙炔]、聚[(9,9-二辛基芴基-2,7-二基)-co-并噻吩]和聚[(9,9-二辛基芴基-2,7-二基)-alt-(苯并[2,1,3]噻二唑-4,8-二基)]中的至少一种。 The quantum dot light-emitting diode of claim 12, wherein the benzyl-containing organic material is selected from the group consisting of poly(9-vinylcarbazole), poly[(9,9-di-n-octylfluorenyl- 2,7-Diyl)-alt-(4,4′-(N-(4-n-butyl)phenyl)-diphenylamine)], poly[(9,9-di-n-octylfluorenyl-2 ,7-Phenyleneethylene)-alt-(2-methoxy-5-(2-ethylhexyloxy)-1,4diyl)], poly(9,9-dioctylfluorene- 2,7-diyl)-alt-(N,N'-diphenylbenzidine-N,N'-diyl), poly(9,9-di-n-octylfluorenyl-2,7-diyl) ), poly[(N,N'-(4-n-butylphenyl)-N,N'-diphenyl-1,4-phenylenediamine)-alt-(9,9-di-n-octylfluorene (2,7-diyl)], poly[9-(1-octylnonyl)-9H-carbazole], poly[2-methoxy-5-(2-ethylhexyloxy)-1, 4-phenylacetylene], poly[2-methoxy-5-(2-ethylhexyloxy)-1,4-phenylacetylene], poly[(9,9-dioctylfluorenyl-2,7 -diyl)-co-thiophene] and poly[(9,9-dioctylfluorenyl-2,7-diyl)-alt-(benzo[2,1,3]thiadiazole-4, 8-diyl)] at least one.
  15. 如权利要求12所述的量子点发光二极管,其特征在于,所述交联剂与所述量子点的质量比为(0.5-5):100。 The quantum dot light-emitting diode according to claim 12, wherein the mass ratio of the crosslinking agent to the quantum dots is (0.5-5):100.
  16. 如权利要求12所述的量子点发光二极管,其特征在于,所述量子点发光层还含有高分子聚合物,且所述量子点发光层退火成膜时的退火温度≥所述高分子聚合物的玻璃化转变温度。 The quantum dot light-emitting diode according to claim 12, wherein the quantum dot light-emitting layer further contains a high molecular polymer, and the annealing temperature of the quantum dot light-emitting layer during annealing to form a film is greater than or equal to the high molecular polymer the glass transition temperature.
  17. 如权利要求16所述的量子点发光二极管,其特征在于,所述高分子聚合物和所述量子点的质量比为(0.5-10):100。 The quantum dot light-emitting diode according to claim 16, wherein the mass ratio of the high molecular polymer and the quantum dot is (0.5-10):100.
  18. 如权利要求16所述的量子点发光二极管,其特征在于,所述高分子聚合物选自乙烯基类聚合物、丙烯基类聚合物、酰胺类聚合物、苯基类聚合物和碳酸酯基类聚合物中的至少一种。 The quantum dot light-emitting diode of claim 16, wherein the high molecular polymer is selected from the group consisting of vinyl-based polymers, acryl-based polymers, amide-based polymers, phenyl-based polymers and carbonate-based polymers at least one of the polymers.
  19. 如权利要求18所述的量子点发光二极管,其特征在于,所述乙烯基类聚合物选自聚乙烯醇、聚乙烯基咔唑、聚醋酸乙烯酯、聚四氟乙烯、聚偏二氟乙烯和聚氯乙烯中的至少一种;和/或, The quantum dot light-emitting diode of claim 18, wherein the vinyl-based polymer is selected from the group consisting of polyvinyl alcohol, polyvinylcarbazole, polyvinyl acetate, polytetrafluoroethylene, and polyvinylidene fluoride and at least one of polyvinyl chloride; and/or,
    所述丙烯基类聚合物选自聚丙烯酸、聚甲基丙烯酸甲酯、聚(α-腈基丙烯酸丁酯)、聚丙烯酰胺和聚丙烯腈中的至少一种;和/或,The acryl-based polymer is selected from at least one of polyacrylic acid, polymethyl methacrylate, poly(α-butyl cyanoacrylate), polyacrylamide and polyacrylonitrile; and/or,
    所述酰胺类聚合物选自聚亚癸基甲酰胺和聚癸二酰乙二胺中的至少一种;和/或,The amide polymer is selected from at least one of polydecylidene formamide and polyethylene sebacate; and/or,
    所述苯基类聚合物选自聚苯硫醚和聚对苯二甲酸乙二酯中的至少一种;和/或,The phenyl-based polymer is selected from at least one of polyphenylene sulfide and polyethylene terephthalate; and/or,
    所述碳酸酯类聚合物选自聚碳酸酯二醇和溴化聚碳酸酯中的至少一种。The carbonate-based polymer is selected from at least one of polycarbonate diol and brominated polycarbonate.
  20. 如权利要求12所述的量子点发光二极管,其特征在于,所述阴极与所述量子点发光层之间设置有电子功能层。 The quantum dot light-emitting diode according to claim 12, wherein an electronic functional layer is disposed between the cathode and the quantum dot light-emitting layer.
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