JPH075526Y2 - 露光用マスク - Google Patents
露光用マスクInfo
- Publication number
- JPH075526Y2 JPH075526Y2 JP1989092485U JP9248589U JPH075526Y2 JP H075526 Y2 JPH075526 Y2 JP H075526Y2 JP 1989092485 U JP1989092485 U JP 1989092485U JP 9248589 U JP9248589 U JP 9248589U JP H075526 Y2 JPH075526 Y2 JP H075526Y2
- Authority
- JP
- Japan
- Prior art keywords
- exposure
- mask
- pattern
- groove
- exposure mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 claims description 12
- 229910000859 α-Fe Inorganic materials 0.000 claims description 11
- 239000013078 crystal Substances 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 238000005530 etching Methods 0.000 description 5
- 229910000702 sendust Inorganic materials 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989092485U JPH075526Y2 (ja) | 1989-08-08 | 1989-08-08 | 露光用マスク |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989092485U JPH075526Y2 (ja) | 1989-08-08 | 1989-08-08 | 露光用マスク |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0331736U JPH0331736U (enrdf_load_stackoverflow) | 1991-03-27 |
| JPH075526Y2 true JPH075526Y2 (ja) | 1995-02-08 |
Family
ID=31641908
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989092485U Expired - Lifetime JPH075526Y2 (ja) | 1989-08-08 | 1989-08-08 | 露光用マスク |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH075526Y2 (enrdf_load_stackoverflow) |
-
1989
- 1989-08-08 JP JP1989092485U patent/JPH075526Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0331736U (enrdf_load_stackoverflow) | 1991-03-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS62138819A (ja) | 走査型レ−ザ顕微鏡 | |
| JPH075526Y2 (ja) | 露光用マスク | |
| JPS5873012A (ja) | 薄膜ヘツド傾斜縁食刻形成法 | |
| JPS59160144A (ja) | ホトマスク | |
| JPS6311729Y2 (enrdf_load_stackoverflow) | ||
| JPS60205879A (ja) | 磁気ヘツド負圧スライダ−の製造方法 | |
| JPH04324175A (ja) | 磁気ヘッドの製造方法 | |
| JPH0664705B2 (ja) | 磁気記録ヘツドの加工方法 | |
| JPS5979526A (ja) | 電子ビ−ム露光方法 | |
| JPH0518758Y2 (enrdf_load_stackoverflow) | ||
| JPS61260628A (ja) | 電子線露光装置 | |
| JPS61190940A (ja) | パタ−ン形成法 | |
| JPH0389530A (ja) | 半導体集積回路装置の製造方法 | |
| JPH03127818A (ja) | レティクルの製造方法 | |
| JPH01173308A (ja) | 薄膜磁気ヘッドの製造方法 | |
| JPH0466094B2 (enrdf_load_stackoverflow) | ||
| JPH08262686A (ja) | フォトリソグラフィ方法 | |
| JPS6218559A (ja) | 露光用マスク | |
| JPS59121837A (ja) | 電子ビ−ム露光方法 | |
| JPS63304625A (ja) | 目合せパタ−ン | |
| JPS6020512A (ja) | パタ−ン形成方法 | |
| JPS6192411A (ja) | 磁気ヘツドの製造方法 | |
| JPH03283528A (ja) | 半導体集積回路装置 | |
| JPS61125132A (ja) | 半導体装置の製造方法 | |
| JPS5898876A (ja) | 負圧利用磁気ヘツドスライダの製造方法 |