JPH0733572B2 - Laser vapor deposition equipment - Google Patents

Description

Description: TECHNICAL FIELD The present invention relates to a laser vapor deposition apparatus that vaporizes ceramics or the like on a metal substrate or the like by using laser light, for example.

[Conventional technology]

FIG. 2 is a configuration diagram showing a conventional laser vapor deposition apparatus disclosed in Japanese Patent Laid-Open No. 59-116373. In the figure, (1)
Is a laser beam emitted from a laser oscillator (not shown),
(2) is a first plane mirror, (3) is a condenser lens, (4) is a transmission window, (5) is a vacuum chamber, (6) is a second plane mirror,
(7) is an object to be irradiated such as ceramics, (8) is a metal substrate, and (9) is a preheating heater. First plane mirror (2), condenser lens (3), transmission window (4), and second
The plane mirror (6) constitutes an optical system that guides the laser light (1) emitted from the laser oscillator to the irradiation target (7).
In the figure, an arrow A indicates a radiation direction of the laser light (1), an arrow B indicates a rotation direction of the irradiation target (7), and an arrow C indicates a scattering direction of evaporated particles of the irradiation target (7). A parallel laser beam (1) emitted from a laser oscillator (not shown) is converted into a horizontal optical path by a first plane mirror (2), passes through a condenser lens (3), and then passes through a transmission window (4). Vacuum chamber (5)
After being guided to the inside and being redirected again by the second plane mirror (6), the ring-shaped irradiation target (7) is irradiated from the tangential direction of the outer peripheral surface of the ring. The condenser lens (3) should be focused near the irradiation point on the irradiation target (7).
The focal length and arrangement position are selected. In addition, the ring-shaped irradiation target (7) rotates at an arbitrary speed in the direction of the arrow B around the ring center axis, and further can swing in the ring center axis direction by the thickness of the irradiation target (7). A laser (1) for uniformly evaporating the entire outer periphery of the irradiation target (7)
By the irradiation of, the irradiation area on the outer periphery of the irradiation object (7) evaporates, and the evaporated particles fly out in the direction of the substrate (8) as shown by arrow C, evaporate and accumulate on the substrate (8). . If the object to be irradiated (7) is made of a material that is prone to thermal cracking, a preheat heater (9) is provided near the outer peripheral portion of the object to be irradiated (7) and the preheat heater (9) is used. The object to be irradiated (7) is preheated to prevent damage to the object to be irradiated (7).

[Problems to be solved by the invention]

Since the conventional laser deposition apparatus is configured as described above, the relative position between the laser beam (1) and the irradiation target (7) changes as the irradiation target (7) wears and becomes smaller. However, the irradiation position of the laser beam (1) on the irradiation target (7) must be adjusted, and this adjustment has a problem that the film characteristics and film forming speed of the deposited film are greatly affected.

The present invention has been made in order to solve the above-mentioned problems, and it is possible to automatically adjust the irradiation position of the laser beam onto the object to be irradiated so that it is always appropriate, so that the vapor deposition always has a stable quality. The purpose is to obtain the laser deposition position where the film is obtained.

[Means for solving problems]

A laser vapor deposition apparatus according to the present invention includes a vacuum chamber, an irradiation target placed in the vacuum chamber, an optical system for guiding laser light from a laser oscillator to the irradiation target, and vaporized particles of the irradiation target vaporized by the laser light. Of the substrate arranged at a predetermined position, a sensor for detecting the intensity of laser light passing through the irradiation target without irradiating the irradiation target among the laser beams emitted from the laser oscillator, A control device for generating a control signal for controlling the relative position of the object to be irradiated and the laser light to be irradiated to the object according to the output, and the relative of the object to be irradiated and the laser light to be irradiated by inputting this control signal. It is provided with an adjusting device for adjusting the position.

[Action]

The laser vapor deposition apparatus according to the present invention detects a laser beam generated due to the positional deviation of the object to be irradiated, and controls the relative position between the object to be irradiated and the laser beam according to the detected value, so that the proper state is always maintained. A stable vapor deposition film that can be maintained is obtained.

〔Example〕

An embodiment of the present invention will be described below with reference to the drawings. First
FIG. 1 is a configuration diagram showing a laser vapor deposition apparatus according to an embodiment of the present invention, and (1) to (9) show the same or corresponding portions as in the conventional case. (20) is an object (7) to be irradiated due to the position shift of the object (7) in the laser light emitted from the laser oscillator.
Is a sensor that detects the intensity of the laser light passing through without irradiating the laser beam, and is arranged, for example, inside the vacuum chamber (5) on an extension of the optical path for irradiating the irradiation target (7) with the laser light (1). . This sensor (20) has a large or small detection value depending on the size of the light receiving area of the laser light, and utilizes the photoelectric effect of converting light into electricity. However, one that converts light into heat and detects it may be used. Reference numeral (30) is an adjusting device for adjusting the relative position of the irradiation object (7) and the laser beam (1). For example, the movement of moving the irradiation object (7) in the direction perpendicular to the rotation axis as shown by arrow D. The mechanism (40) is a control device that generates a control signal according to the output of the sensor (20).
For example, a control signal for moving the moving mechanism (30) is generated so that the output of the sensor (20) reaches a predetermined set value. The moving mechanism (30) is connected to, for example, the rotating shaft of the irradiation target (7), and the irradiation target (7) moves the moving mechanism (3).
It is possible to move in the direction of arrow D integrally with 0).

As in the conventional case, the laser beam (1) emitted from the laser oscillator is arranged so that the laser beam (1) is focused on the irradiation object (7) near the irradiation point, and vapor deposition is performed. Laser light (1)
Is irradiated to the irradiation area on the outer periphery of the irradiation object (7), but a part of it is not hit by the irradiation object (5), but on the sensor (20) arranged on the extension of the irradiation optical path. Its intensity is detected. When the irradiation object (7) is consumed and the irradiation position of the laser beam (1) is far from the irradiation object (7), the area for receiving the laser beam becomes large, so that the detection by the sensor (20) is performed. The value becomes large, and on the contrary, when approaching,
The smaller the light receiving area, the smaller the detected value. The control device (40) outputs a control signal to the moving mechanism (30) so that the detection value of the sensor (20) becomes constant with an appropriate reference. Therefore, if the detected value of the sensor (20) is larger than the reference value,
The control device (40) moves the irradiation target (7) by the moving mechanism (30) so as to approach the irradiation position of the laser beam (1). Conversely, when the detection value is small, the irradiation target (7) is irradiated. ) Is moved away from the irradiation position of the laser beam (1). In this way, since the detection value of the sensor (20) is controlled so as to be the reference value, it is possible to automatically perform vapor deposition in an appropriate state automatically and obtain a vapor deposition film of stable quality. In addition, the conventional adjustment work becomes unnecessary, and there is a labor saving effect.

In the above embodiment, the irradiation object (7) is formed in a ring shape, but it is not limited to this and may be a rod shape. Further, the sensor (20) is not limited to the position of the above-mentioned embodiment, and may be arranged at a position capable of detecting the intensity change of the laser beam caused by the displacement of the irradiation object. At this time, instead of using one sensor, a plurality of ensembles may be used to detect the positional deviation between the relative positions of the laser light and the object to be irradiated. Further, the adjusting device for adjusting the relative position of the laser beam and the object to be irradiated may be one that moves the laser beam by changing the angle of the first plane mirror 2 or the angle or position of the second plane mirror 6, for example. Even if the irradiation object and the laser beam are both moved, the same effect as that of the above embodiment can be obtained.

〔The invention's effect〕

As described above, according to the present invention, the vacuum chamber, the irradiation target arranged in the vacuum chamber, the optical system for guiding the laser light from the laser oscillator to the irradiation target, and the evaporation of the irradiation target by the laser light. A substrate placed at the position where particles are deposited,
A sensor that detects the intensity of the laser light that passes through the laser beam emitted from the laser oscillator without irradiating the laser beam on the irradiation target due to the displacement of the irradiation target, and the irradiation target and the irradiation target depending on the output of this sensor. A control device that generates a control signal that controls the relative position of the laser light that irradiates the irradiation object, and an adjustment device that inputs this control signal and adjusts the relative position of the irradiation object and the laser light that irradiates it As a result, it is possible to provide a laser vapor deposition apparatus that can always maintain a proper state and can obtain a vapor deposition film of stable quality.

[Brief description of drawings]

FIG. 1 is a block diagram showing a laser vapor deposition apparatus according to an embodiment of the present invention, and FIG. 2 is a block diagram showing a conventional laser vapor deposition apparatus. (1) ... laser light, (2) ... first plane mirror, (3) ...
… Condenser lens, (4) …… Transparent window, (5) …… Vacuum chamber, (6) …… Second plane mirror, (7) …… Illuminated object,
(8) ... Board, (20) ... Sensor, (30) ... Adjusting device, (40) ... Control device. (The optical system is composed of the first plane mirror (2), the condenser lens (3), the transmission window (4), and the second plane mirror (6).) In the drawings, the same reference numerals indicate the same or corresponding portions. .

Claims (4)

[Claims] 1. A vacuum chamber, an object to be irradiated arranged in the vacuum chamber, an optical system for guiding a laser beam from a laser oscillator to the object to be irradiated, and vaporized particles of the object to be irradiated by the laser beam are deposited. A substrate arranged at a position, a sensor for detecting the intensity of laser light passing through the irradiation target without irradiating the irradiation target among the laser beams emitted from the laser oscillator, and the output of this sensor And a control device for generating a control signal for controlling a relative position of the irradiation target and a laser beam applied to the irradiation target, and the irradiation target and the laser beam for irradiating the control signal. Laser deposition apparatus having an adjusting device for adjusting the relative position of the. 2. The object to be irradiated is formed in a ring shape that rotates about an axis.
The laser vapor deposition device according to the item. 3. The laser vapor deposition apparatus according to claim 1, wherein the adjusting device has a moving mechanism for moving the object to be irradiated. 4. The laser according to claim 1, wherein the adjusting device has a moving mechanism for moving a laser beam for irradiating an irradiation object. Vapor deposition equipment.