JPH07307548A - Method of processing flexible printed wiring board - Google Patents

Method of processing flexible printed wiring board

Info

Publication number
JPH07307548A
JPH07307548A JP12178494A JP12178494A JPH07307548A JP H07307548 A JPH07307548 A JP H07307548A JP 12178494 A JP12178494 A JP 12178494A JP 12178494 A JP12178494 A JP 12178494A JP H07307548 A JPH07307548 A JP H07307548A
Authority
JP
Japan
Prior art keywords
temperature
fpc
wiring board
printed wiring
flexible printed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12178494A
Other languages
Japanese (ja)
Inventor
Kayoko Morikawa
佳代子 森川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP12178494A priority Critical patent/JPH07307548A/en
Publication of JPH07307548A publication Critical patent/JPH07307548A/en
Pending legal-status Critical Current

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  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To obtain a flexible printed wiring board which less emits gas in a high-temperature environment by a method wherein the flexible printed wiring board is subjected to a thermal treatment at a prescribed temperature for a specific time and isolated from emitted gas even at the prescribed temperature. CONSTITUTION:Base adhesive agent 2 is applied onto a base film 1 and dried out, a copper foil is pasted on the base film 1 and subjected to a laminating process at a temperature of 180 deg.C for 15 minutes and then an etching process for the formation of a conductor circuit 3, adhesive agent 5 is applied onto an insulating/protecting coverlay film 4 and dried out, and holes are bored in a circuit section of the coverlay film 4. The coverlay film 4 is pasted on the base film 1 where a circuit is formed and pressed for lamination, adhesive agent 7 is applied onto a reinforcing Al plate 6 and dried out, and the Al plate 6 is pasted on the rear of the base film 1 for lamination. Therefore, a flexible printed wiring board is subjected to a thermal treatment at a temperature of 300 deg.C or below for 10 minutes or above and then isolated as kept at a temperature of 300 deg.C or below so as to previously remove residual solvent, so that the printed wiring board less emits gas even if it is used in a high-temperature environment such as in a hard disc drive.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、フレキシブル印刷配線
板(FPC)の処理方法に関するもので、特にハードデ
ィスクドライブ内などの高温環境下において、FPC構
成材からのガス発生量の改善に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for processing a flexible printed wiring board (FPC), and more particularly to improving the amount of gas generated from FPC constituents in a high temperature environment such as in a hard disk drive.

【0002】[0002]

【従来の技術】近年、種々の電子機器にFPCが広く使
用されており、その典型例として、ポリイミドフィルム
等のベースフィルムに接着剤を介して銅箔を貼り合わ
せ、この銅張フィルムに回路を形成し、さらに接着剤を
介してカバーレイフィルムを貼り合わせたものがある。
このように、FPCには種々の接着剤や樹脂が使用され
ているが、これらには様々な溶剤が含まれており、さら
に基板洗浄などにおいても溶剤は使用されている。FP
Cに使用されている接着剤や樹脂部分は、一般に加熱圧
着などで接着あるいは形成されているため、含まれてい
る溶剤の多くはこの時点で蒸発または揮発する。しか
し、通常、FPCの製造におけるプレスや加熱は効率化
を図るためにできる限り低温短時間で行われており、含
まれる溶剤は完全に除去され難い。
2. Description of the Related Art In recent years, FPCs have been widely used in various electronic devices. As a typical example, a copper foil is attached to a base film such as a polyimide film via an adhesive, and a circuit is formed on the copper clad film. There is one in which a cover lay film is formed and then bonded with an adhesive.
As described above, various adhesives and resins are used in the FPC, but these contain various solvents, and the solvents are also used in substrate cleaning and the like. FP
Since the adhesive or resin portion used for C is generally bonded or formed by thermocompression bonding, most of the contained solvent evaporates or volatilizes at this point. However, in general, pressing and heating in FPC production are carried out at the lowest possible temperature and in a short period of time in order to improve efficiency, and it is difficult to completely remove the contained solvent.

【0003】一方、FPCは光ディスクや磁気ディスク
など、ハードディスクのドライブにおける内部部品とし
ても使用されている。ハードディスクドライブ内では、
稼働中の温度が100℃近くに達することも考えられ、
このような環境下ではFPCに使用されている接着剤や
樹脂から残留溶剤などがガス化する。その結果、ハード
ディスク表面にガスが付着し、さらに付着ガスが粉塵な
どの異物の吸着を促進して、読み取り不良などの原因と
なる恐れがある。特に、ハードディスクの高密度化が進
む近年、ディスク表面と読み取りヘッドの間隔はより接
近する傾向にあり、上記のようなガス発生は一層重要な
問題として顕在化してきた。従って、本発明は高温環境
下においてもガス発生の少ないFPCを提供することを
目的とする。
On the other hand, the FPC is also used as an internal component in a hard disk drive such as an optical disk or a magnetic disk. In the hard disk drive,
It is possible that the temperature during operation will reach 100 ° C,
Under such an environment, the residual solvent or the like is gasified from the adhesive or resin used in the FPC. As a result, gas adheres to the surface of the hard disk, and the adhered gas promotes adsorption of foreign matter such as dust, which may cause reading failure. In particular, in recent years, as the density of hard disks increases, the distance between the disk surface and the read head tends to become closer, and the above-mentioned gas generation has become a more serious problem. Therefore, an object of the present invention is to provide an FPC that generates less gas even in a high temperature environment.

【0004】[0004]

【課題を解決するための手段】本発明はこのような目的
を達成するためになされたもので、その特徴は、FPC
に用いられた接着剤や樹脂の溶剤を予め除去しておくた
め、300℃以下で10分以上の熱処理を施すことにあ
る。この処理後、FPCを発生ガスから隔離する際に
は、熱処理温度をほぼ維持したまま行うことが好適であ
る。このような処理により、FPCが120℃の温度下
に5時間さらされた際のガス発生量を1000ppm以
下にでき、ハードディスクドライブなどの高温環境下で
用いても読み取り不良などの発生を抑制できる。
SUMMARY OF THE INVENTION The present invention has been made to achieve such an object, and is characterized by FPC.
In order to remove the solvent of the adhesive or resin used in the above in advance, the heat treatment is performed at 300 ° C. or lower for 10 minutes or longer. After this treatment, when the FPC is separated from the generated gas, it is preferable to perform it while keeping the heat treatment temperature substantially. By such a treatment, the amount of gas generated when the FPC is exposed to a temperature of 120 ° C. for 5 hours can be reduced to 1000 ppm or less, and the occurrence of read failures and the like can be suppressed even when used in a high temperature environment such as a hard disk drive.

【0005】[0005]

【作用】上記の熱処理は、一般に溶剤を含む接着剤や樹
脂を加熱硬化または圧着した後、もしくはハードディス
ク用FPCとして加工された後に行うことが好適であ
る。この際、乾燥機または真空乾燥機などの加熱処理装
置を用い、300℃以下の温度に、より好ましくは15
0℃以上200℃以下の温度に加熱する。300℃以下
としたのは、FPCの熱的損傷を考慮したからである。
また、150℃未満では残留溶剤を短期間で除去でき
ず、200℃を越えるとFPCの熱劣化を促進する恐れ
があるからである。
In general, it is preferable to carry out the above heat treatment after heat-curing or pressure-bonding an adhesive or resin containing a solvent, or after processing as an FPC for a hard disk. At this time, using a heat treatment device such as a dryer or a vacuum dryer, the temperature is set to 300 ° C. or lower, more preferably 15
Heat to a temperature of 0 ° C. or higher and 200 ° C. or lower. The reason why the temperature is 300 ° C. or less is that the thermal damage to the FPC is taken into consideration.
Further, if the temperature is lower than 150 ° C., the residual solvent cannot be removed in a short period of time, and if the temperature exceeds 200 ° C., thermal deterioration of the FPC may be accelerated.

【0006】加熱時間は、残留溶剤を十分除去できれば
よく、特に限定はないが、10分以上50時間以下が好
適である。高温であれば短時間でよいが、低温であれば
長時間処理が必要という傾向があり、FPCの熱的損傷
と加熱処理の所要時間あるいはFPCの構成の違いに基
づく接着剤使用量の多少などを考慮して適宜設定すれば
よい。加熱処理を行った後は、発生したガスが再度FP
Cに付着しないような方法で保管される必要がある。例
えば、ガス化した残留溶剤が再度凝結しないよう、加熱
温度のままFPCを取り出し、その後デシケータ中で保
管すること等が挙げられる。
The heating time is not particularly limited as long as the residual solvent can be sufficiently removed, but is preferably 10 minutes or more and 50 hours or less. If the temperature is high, it takes only a short time, but if the temperature is low, there is a tendency that a long treatment is required. Therefore, the amount of adhesive used depends on the thermal damage to the FPC and the time required for the heat treatment, or the difference in the FPC configuration. It may be set appropriately in consideration of the above. After the heat treatment, the generated gas is FP again.
It must be stored in such a way that it does not adhere to C. For example, FPC may be taken out at the heating temperature and then stored in a desiccator so that the gasified residual solvent does not condense again.

【0007】このような熱処理により、FPCが120
℃の温度下に5時間さらされた際のガス発生量を100
0ppm以下とできる。この温度環境とガス発生量は、
ハードディスクドライブなどの高温環境下におけるFP
Cの使用を想定したものである。即ち、この温度環境に
おいて、この程度のガス発生量であれば、ハードディス
ク表面への発生ガスの付着が少なく、付着したとしても
読み取り不良などの動作不良を抑制できると推測される
からである。なお、本発明処理方法の対象となるFPC
の構成,製造方法は特に限定されるものではない。
By such heat treatment, the FPC is 120
The amount of gas generated when exposed to a temperature of ℃ for 5 hours is 100
It can be 0 ppm or less. This temperature environment and the amount of gas generated are
FP under high temperature environment such as hard disk drive
It is assumed that C is used. That is, in this temperature environment, with such a gas generation amount, it is presumed that the generated gas adheres less to the hard disk surface, and even if the gas adheres, it is possible to suppress malfunction such as reading failure. In addition, the FPC that is the target of the processing method of the present invention
The structure and the manufacturing method are not particularly limited.

【0008】[0008]

【実施例】以下、本発明の実施例について説明する。 (FPCの製造工程)図1〜3に示すFPCを作製し
た。各FPCの製造工程は下記の通りである。 (1) 図1記載のFPC 可撓性絶縁フィルムからなるベースフィルム1に、ベ
ース用接着剤2を塗布して乾燥し、40μm厚の接着剤
層を形成する。 これに銅箔を貼り合わせ、180℃×15分間ラミネ
ートを行い、銅張フィルムを得る。 次に、銅箔部分にエッチング処理を行い、導体回路3
を形成する。 絶縁,保護用のカバーレイフィルム4に接着剤5を塗
布,乾燥して30μm厚とし、露出させたい回路部分に
対応する箇所を孔開け加する。 回路形成されたベースフィルム上に前記カバーレイフ
ィルムを貼り合わせ、150℃×10分間のプレスを行
って積層する。 さらに、補強用としてAl板6に接着剤7を塗布,乾
燥して40μm厚とし、これをベースフィルム1の裏面
に貼り合わせ、170℃×10分間のプレスを行って積
層した。
EXAMPLES Examples of the present invention will be described below. (FPC manufacturing process) The FPC shown in FIGS. The manufacturing process of each FPC is as follows. (1) The base adhesive 1 for the FPC flexible insulating film shown in FIG. 1 is coated with the base adhesive 2 and dried to form a 40 μm thick adhesive layer. A copper foil is attached to this and laminated at 180 ° C. for 15 minutes to obtain a copper clad film. Next, the copper foil portion is subjected to an etching treatment to form the conductor circuit 3
To form. An adhesive 5 is applied to the insulating and protective coverlay film 4, dried to a thickness of 30 μm, and a portion corresponding to a circuit portion to be exposed is perforated. The cover lay film is laminated on the circuit-formed base film, and pressed at 150 ° C. for 10 minutes to be laminated. Further, an adhesive 7 was applied to the Al plate 6 for reinforcement and dried to a thickness of 40 μm, which was attached to the back surface of the base film 1 and pressed at 170 ° C. for 10 minutes to be laminated.

【0009】(2) 図2記載のFPC 可撓性絶縁フィルムからなるベースフィルム1に、電
解によって直接銅を積層し、銅張フィルムを形成する。 以下、図1記載のFPCの製造工程(〜)に従っ
てFPCを形成する。
(2) Copper is directly laminated on the base film 1 made of the FPC flexible insulating film shown in FIG. 2 by electrolysis to form a copper clad film. Hereinafter, an FPC is formed according to the FPC manufacturing process (-) shown in FIG.

【0010】(3) 図3記載のFPC 図2記載のFPCと同様に、可撓性絶縁フィルムから
なるベースフィルム1に、電解によって直接銅を積層し
て銅張フィルムを形成し、これをエッチングして、導体
回路3を形成する。 回路が形成されたフィルム表面に樹脂を流延し、15
0℃×2時間の加熱処理を行ってポリイミドの絶縁層8
を形成する。 さらに、補強用としてAl板6をベースフィルム1の
裏面に接着剤7を介して貼り合わせ、FPCを構成す
る。
(3) FPC shown in FIG. 3 Similar to the FPC shown in FIG. 2, copper is directly laminated by electrolysis on the base film 1 made of a flexible insulating film to form a copper clad film, which is then etched. Then, the conductor circuit 3 is formed. Resin is cast on the surface of the film on which the circuit is formed.
Heat treatment at 0 ° C. for 2 hours is performed to obtain polyimide insulation layer 8
To form. Further, an Al plate 6 is attached to the back surface of the base film 1 for reinforcement by means of an adhesive 7 to form an FPC.

【0011】(FPCの構成材料) 上記のFPCに用いた構成材は次の通りである。 ベースフィルム1:ポリイミド,25μm厚 カバーレイフィルム4:ポリイミド,25μm厚 銅箔:圧延銅箔,35μm厚 ベース用接着剤2:AR-51 (日本ゼオン社製,商品
名)、エピコート828 (油化シェルエポキシ社製,商品
名)、YH-30 (油化シェルエポキシ社製,商品名)、キ
ュアゾール2MZ-A (四国化成(株)製,商品名)、キシ
レン、メチルエチルケトンからなる接着剤。 カバーレイ用接着剤5:アロンS-1511(東亜合成化学
(株)製,商品名)、SG-80 (帝国化学産業(株)製,
商品名)、コロネートL(日本ポリウレタン製,商品
名)、4、4 ジアミノジフェニルメタン(住友化学(株)
製,商品名)、トルエン300部、酢酸エチル150
部、メチルセロソルブ100部からなる接着剤。 Al板用接着剤7:SG-90 (帝国化学産業(株)製,
商品名)、エピコート1004(油化シェルエポキシ社製,
商品名)、4、4 ジアミノジフェニルメタン(住友化学
(株)製,商品名)、キュアゾール2PHZ(四国化成
(株)製,商品名)、トルエン、キシレン、メチルエチ
ルケトンからなる接着剤。 絶縁層8用樹脂:ユピコート(宇部興産製,商品名)
(Constituent Material of FPC) The constituent materials used in the above FPC are as follows. Base film 1: Polyimide, 25 μm thick Coverlay film 4: Polyimide, 25 μm thick Copper foil: Rolled copper foil, 35 μm thick Base adhesive 2: AR-51 (Nippon Zeon Co., Ltd., trade name), Epicoat 828 (Okaka) Adhesive consisting of Shell Epoxy, trade name), YH-30 (Okaka Shell Epoxy, trade name), Curezol 2MZ-A (Shikoku Kasei Co., trade name), xylene, methyl ethyl ketone. Coverlay Adhesive 5: Aron S-1511 (trade name, manufactured by Toagosei Co., Ltd.), SG-80 (manufactured by Teikoku Chemical Industry Co., Ltd.,
Product name), Coronate L (product name of Nippon Polyurethane, product name), 4,4 diaminodiphenylmethane (Sumitomo Chemical Co., Ltd.)
Made, trade name), toluene 300 parts, ethyl acetate 150
Part, an adhesive consisting of 100 parts of methyl cellosolve. Adhesive 7 for Al plate: SG-90 (manufactured by Teikoku Chemical Industry Co., Ltd.,
Trade name), Epicoat 1004 (made by Yuka Shell Epoxy Co.,
Product name), 4, 4 diaminodiphenylmethane (Sumitomo Chemical Co., Ltd., trade name), Curezol 2PHZ (Shikoku Kasei Co., Ltd. trade name), toluene, xylene, methyl ethyl ketone adhesive. Resin for insulating layer 8: Upicoat (manufactured by Ube Industries, trade name)

【0012】(熱処理)得られたFPCを100℃,1
20℃でそれぞれ24,76,200時間加熱し、15
0℃,170℃,190℃でそれぞれ1,5,10時間
加熱して、脱ガス処理を行った。そして、熱処理後、発
生したガスが再度FPCに付着しないよう、加熱温度の
ままFPCを取り出してデシケータ中で保管した。脱ガ
ス処理を行ったもののうち、図1記載のFPCを実施例
1,図2記載のFPCを実施例2,図3記載のFPCを
実施例3とする。また、このような熱処理を行わないも
のを比較例とし,図1記載のFPCを比較例1,図2記
載のFPCを比較例2,図3記載のFPCを比較例3と
した。
(Heat Treatment) The obtained FPC was heated at 100 ° C. for 1 hour.
Heat at 20 ℃ for 24, 76, 200 hours respectively, 15
Degassing was performed by heating at 0 ° C., 170 ° C. and 190 ° C. for 1, 5 and 10 hours, respectively. Then, after the heat treatment, the FPC was taken out at the heating temperature and stored in a desiccator so that the generated gas did not adhere to the FPC again. Among the degassed products, the FPC shown in FIG. 1 is referred to as Example 1, the FPC shown in FIG. 2 is referred to as Example 2, and the FPC shown in FIG. 3 is referred to as Example 3. In addition, a sample not subjected to such heat treatment was used as a comparative example, the FPC shown in FIG. 1 was used as a comparative example 1, the FPC shown in FIG. 2 was used as a comparative example 2, and the FPC shown in FIG. 3 was used as a comparative example 3.

【0013】(試験例)以上で得られた各FPCを22
mlのバイアル瓶に入れ、ゴム栓をしてその上からアル
ミ製のキャップで覆い、発生したガスが外部に漏れない
ようにした。そして、このバイアル瓶を150℃×5時
間加熱してガスを発生させ、発生ガスをシリンジで抜き
取ってそのままガスクロマトグラフィーに注入し、分析
してガスの定量化を行った。その結果を表1及び表2に
示す。
(Test Example) Each of the FPCs obtained above is
It was put in a vial bottle of ml, covered with a rubber stopper and covered with an aluminum cap from above to prevent the generated gas from leaking to the outside. Then, this vial was heated at 150 ° C. for 5 hours to generate a gas, the generated gas was extracted with a syringe, and the gas was directly injected into gas chromatography and analyzed to quantify the gas. The results are shown in Tables 1 and 2.

【0014】[0014]

【表1】 [Table 1]

【0015】[0015]

【表2】 [Table 2]

【0016】同表に示すように、加熱処理を行わなかっ
た比較例はいずれもガス発生量が多かったのに対し、脱
ガス処理を行った実施例はいずれも発生ガス量が少なく
なっていることが確認された。特に、150℃〜190
℃の熱処理を行ったものは、発生ガス量が極めて少なく
ハードディスクドライブ内など、高度なクリーン度が要
求される電子機器への利用に好適であるといえる。もち
ろん、ハードディスクに限らず、高温環境下において残
留溶剤のガスが問題とされるあらゆる電子機器への利用
が期待される。
As shown in the table, the comparative examples which did not undergo the heat treatment produced a large amount of gas, whereas the examples which carried out the degassing treatment produced a small amount of gas. It was confirmed. Particularly, 150 ° C to 190
It can be said that the one that has been subjected to the heat treatment at ℃ is suitable for use in an electronic device that requires a high degree of cleanliness, such as a hard disk drive, in which the amount of generated gas is extremely small. Of course, it is expected to be used not only for hard disks, but also for all electronic devices in which residual solvent gas is a problem under high temperature environments.

【0017】[0017]

【発明の効果】以上説明したように、本発明処理方法に
よりFPCを構成する接着剤や樹脂の残留溶剤を予め除
去しておくことで、ハードディスクドライブ内などの高
温環境下で使用しても発生ガス量を低減できる。また、
このような処理により、120℃の温度下に5時間さら
された際の発生ガス量が1000ppm以下のFPCを
得ることができる。従って、ハードディスクドライブな
どの高温環境下に使用した場合でも、読み取り不良など
の動作不良を抑制することができる。
As described above, by removing the residual solvent of the adhesive or resin constituting the FPC by the treatment method of the present invention in advance, it is generated even when used in a high temperature environment such as in a hard disk drive. The amount of gas can be reduced. Also,
By such a treatment, it is possible to obtain an FPC having a generated gas amount of 1000 ppm or less when exposed to a temperature of 120 ° C. for 5 hours. Therefore, even when used in a high temperature environment such as a hard disk drive, it is possible to suppress malfunctions such as reading defects.

【図面の簡単な説明】[Brief description of drawings]

【図1】ベースフィルムの上に接着剤を介して銅箔を積
層して得られたFPCの断面図である。
FIG. 1 is a cross-sectional view of an FPC obtained by laminating a copper foil on a base film via an adhesive.

【図2】ベースフィルムの上に直接銅を積層して得られ
たFPCの断面図である。
FIG. 2 is a cross-sectional view of an FPC obtained by directly laminating copper on a base film.

【図3】回路上に直接絶縁層を形成したFPCの断面図
である。
FIG. 3 is a cross-sectional view of an FPC in which an insulating layer is directly formed on a circuit.

【符号の説明】[Explanation of symbols]

1 ベースフィルム 2 ベース用接着剤 3 回路 4 カバーレイフィルム 5 カバーレイ用接着剤 6
Al板 7 Al板用接着剤 8 絶縁層
1 Base Film 2 Adhesive for Base 3 Circuit 4 Coverlay Film 5 Adhesive for Coverlay 6
Al plate 7 Adhesive for Al plate 8 Insulating layer

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 フレキシブル印刷配線板に、300℃以
下で10分以上の熱処理を施すことを特徴とするフレキ
シブル印刷配線板の処理方法。
1. A method for treating a flexible printed wiring board, which comprises subjecting the flexible printed wiring board to heat treatment at 300 ° C. or lower for 10 minutes or longer.
【請求項2】 請求項1記載の熱処理を施してガスを発
生させ、熱処理温度をほぼ維持したまま、フレキシブル
印刷配線板を発生ガスから隔離することを特徴とするフ
レキシブル印刷配線板の処理方法。
2. A method for treating a flexible printed wiring board, characterized in that the heat treatment according to claim 1 is performed to generate a gas, and the flexible printed wiring board is isolated from the generated gas while substantially maintaining the heat treatment temperature.
JP12178494A 1994-05-10 1994-05-10 Method of processing flexible printed wiring board Pending JPH07307548A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12178494A JPH07307548A (en) 1994-05-10 1994-05-10 Method of processing flexible printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12178494A JPH07307548A (en) 1994-05-10 1994-05-10 Method of processing flexible printed wiring board

Publications (1)

Publication Number Publication Date
JPH07307548A true JPH07307548A (en) 1995-11-21

Family

ID=14819813

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12178494A Pending JPH07307548A (en) 1994-05-10 1994-05-10 Method of processing flexible printed wiring board

Country Status (1)

Country Link
JP (1) JPH07307548A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002217519A (en) * 2001-01-16 2002-08-02 Matsushita Electric Ind Co Ltd Method for manufacturing printed wiring board
JP2010287781A (en) * 2009-06-12 2010-12-24 Fujikura Ltd Flexible printed board, and method of manufacturing the same
CN104244600A (en) * 2014-07-25 2014-12-24 昆山圆裕电子科技有限公司 Board surface flattening technology of flexible printed circuit board for notebook computer
CN104582283A (en) * 2014-12-31 2015-04-29 厦门市平大商贸有限公司 Selective sintering process of printed circuit
CN116056346A (en) * 2023-03-31 2023-05-02 深圳市常丰激光刀模有限公司 Preparation process and equipment of flexible circuit board

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002217519A (en) * 2001-01-16 2002-08-02 Matsushita Electric Ind Co Ltd Method for manufacturing printed wiring board
JP4639473B2 (en) * 2001-01-16 2011-02-23 パナソニック株式会社 Method for manufacturing printed wiring board
JP2010287781A (en) * 2009-06-12 2010-12-24 Fujikura Ltd Flexible printed board, and method of manufacturing the same
CN104244600A (en) * 2014-07-25 2014-12-24 昆山圆裕电子科技有限公司 Board surface flattening technology of flexible printed circuit board for notebook computer
CN104244600B (en) * 2014-07-25 2018-01-23 昆山圆裕电子科技有限公司 A kind of notebook computer FPC plate face flatness technique
CN104582283A (en) * 2014-12-31 2015-04-29 厦门市平大商贸有限公司 Selective sintering process of printed circuit
CN116056346A (en) * 2023-03-31 2023-05-02 深圳市常丰激光刀模有限公司 Preparation process and equipment of flexible circuit board

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