JPH11340625A - Method for vacuum lamination of adhesive film - Google Patents

Method for vacuum lamination of adhesive film

Info

Publication number
JPH11340625A
JPH11340625A JP11069995A JP6999599A JPH11340625A JP H11340625 A JPH11340625 A JP H11340625A JP 11069995 A JP11069995 A JP 11069995A JP 6999599 A JP6999599 A JP 6999599A JP H11340625 A JPH11340625 A JP H11340625A
Authority
JP
Japan
Prior art keywords
resin composition
adhesive film
composition layer
film
adhesive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11069995A
Other languages
Japanese (ja)
Inventor
Shigeo Nakamura
茂雄 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ajinomoto Co Inc
Original Assignee
Ajinomoto Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ajinomoto Co Inc filed Critical Ajinomoto Co Inc
Priority to JP11069995A priority Critical patent/JPH11340625A/en
Publication of JPH11340625A publication Critical patent/JPH11340625A/en
Pending legal-status Critical Current

Links

Landscapes

  • Laminated Bodies (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method for vacuum lamination of an adhesive sheet for making a build-up type multilayer printed wiring board, on which conductive circuit layers and insulating layers are laminated alternately to each other, by not having film-like adhesives seep out to internal layer circuit patterns. SOLUTION: Vacuum lamination of a holding film and a resin component material layer stacked thereon takes place at a high-temperature high-pressure condition on a patterned circuit substrate, wherein the resin component material layer is made of a resin component material of thermoplastic type and is solid at a room temperature. A method for vacuum lamination and equipment thereof are presented, wherein vacuum lamination using an adhesive film reduces seeping out of the resin component material by laminating with a seep-preventing sheet having small size of 1-8 mm from the edge of the resin component material and a height of more than that of the resin component material layer, and thus a method for vacuum lamination and an apparatus arise using an adhesive film which reduces seep out of the resin component material from the edge.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、導体回路層と絶縁層と
を交互に積み上げたビルドアップ方式の多層プリント配
線板の製造法において、フィルム状接着剤を内層回路パ
ターンに真空積層する方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a build-up type multilayer printed wiring board in which conductive circuit layers and insulating layers are alternately stacked, and a method of vacuum laminating a film adhesive on an inner circuit pattern. Things.

【0002】[0002]

【従来の技術】従来、多層プリント配線板の製造方法と
して、回路形成された内層回路板に絶縁接着層としてガ
ラスクロスにエポキシ樹脂を含浸しBステージ化したプ
リプレグシートを数枚介して積層プレスし、スルーホー
ルによって層間導通をとる方法が知られている。しか
し、本方法では積層プレスにて加熱、加圧成形を行うた
め大掛かりな設備と長時間を要しコスト高となる上、プ
リプレグシートに比較的誘電率の高いガラスクロスを用
いるため層間厚みの薄化に制限があるほか、スルーホー
ル間マイグレーシヨン(CAF)による絶縁性不安など
問題を抱えていた。
2. Description of the Related Art Conventionally, as a method of manufacturing a multilayer printed wiring board, a prepreg sheet in which glass cloth is impregnated with epoxy resin as an insulating adhesive layer on a circuit-formed inner layer circuit board and B-staged, is laminated and pressed through several sheets. In addition, a method of establishing interlayer conduction by using through holes is known. However, in this method, heating and pressure molding are performed by a laminating press, which requires large-scale equipment and a long time, resulting in high cost. In addition, since a glass cloth having a relatively high dielectric constant is used for the prepreg sheet, the interlayer thickness is small. In addition, there is a problem in that there is a limitation in terms of insulation, and insulation instability due to migration between through holes (CAF).

【0003】このような問題を解決する方法として、近
年内層回路板の導体層上に有機絶縁層を交互に積み上げ
ていくビルドアップ方式の多層プリント配線板の製造技
術が注目されている。特開平8ー64960には、下塗
り接着剤を塗布、仮乾燥後フィルム状アディティブ接着
剤を貼り合わせて加熱硬化させ、アルカリ性酸化剤で粗
化、導体層をメッキにより形成し多層プリント配線板を
製造する方法が知られている。また、特開平7ー202
418には、高分子量エポキシ樹脂と液状エポキシ樹脂
からなる接着剤層を銅箔上に形成した接着剤付き銅箔
を、内層回路板に貼り合わせて多層プリント配線板を製
造する方法が開示されている。一方、本発明者らも特願
平9ー357420において内層回路パターンの被覆と
表面ビアホール及び/又はスルーホール内の樹脂充填を
同時に一括して行うことのできる多層プリント配線板用
層間樹脂組成物層、及びこれを用いた生産性の高い多層
プリント配線板の製造法を開示している。これらの樹脂
組成物層を加熱、加圧条件下真空積層する場合、接着剤
が熱流動性を有している特性上、該樹脂組成物層端部か
ら接着剤のシミだしが発生しプレス面を汚すという問題
があった。本問題点を改善する方法として樹脂組成物層
の構造を両端あるいは片端に樹脂のない支持ベースフィ
ルム部分を5mm程度以上設けることにより接着剤のシ
ミだしを低減する方法を同じく特願平9ー357420
にて提案しているが、樹脂組成物層製造の生産性に劣る
という欠点を有していた。
As a method of solving such a problem, in recent years, a manufacturing technique of a build-up type multilayer printed wiring board in which organic insulating layers are alternately stacked on a conductor layer of an inner circuit board has attracted attention. JP-A-8-64960 discloses a multi-layer printed wiring board by applying an undercoat adhesive, temporarily drying, bonding a film-like additive adhesive, heating and curing, roughening with an alkaline oxidizing agent, and forming a conductive layer by plating. There are known ways to do this. Also, JP-A-7-202
No. 418 discloses a method of manufacturing a multilayer printed wiring board by bonding an adhesive copper foil in which an adhesive layer composed of a high molecular weight epoxy resin and a liquid epoxy resin is formed on a copper foil to an inner circuit board. I have. On the other hand, the present inventors have also disclosed in Japanese Patent Application No. 9-357420 an interlayer resin composition layer for a multilayer printed wiring board which can simultaneously cover the inner circuit pattern and fill the resin in the surface via holes and / or through holes simultaneously. And a method for manufacturing a multilayer printed wiring board having high productivity using the same. When these resin composition layers are vacuum-laminated under heating and pressure conditions, the adhesive has heat fluidity, so that the adhesive is stained from the edge of the resin composition layer and the press surface is pressed. There was a problem of soiling. As a method for solving this problem, Japanese Patent Application No. Hei 9-357420 discloses a method for reducing the spotting of the adhesive by providing a resin base layer having a structure of the resin composition layer at both ends or one end of a supporting base film portion having no resin at least about 5 mm.
However, there was a drawback that the productivity of resin composition layer production was poor.

【0004】[0004]

【発明が解決しようとする課題】加熱及び加圧可能な真
空積層装置を用いて、パターン加工された回路基盤上
に、支持ベースフィルムと樹脂組成物層で構成される接
着フィルムの樹脂組成物層面を積層する方法に於いて、
接着剤のシミだしを簡便に低減する方法を開発すること
にある。
SUMMARY OF THE INVENTION A resin composition layer surface of an adhesive film composed of a support base film and a resin composition layer on a patterned circuit board using a vacuum laminating apparatus capable of heating and pressing. In the method of laminating
It is an object of the present invention to develop a method for easily reducing stains of an adhesive.

【0005】[0005]

【問題を解決するための手段】接着剤のシミだしを防止
する方法を種々検討する中、真空積層装置の少なくとも
一つのプレス板と接着フィルムの支持ベースフィルム面
の間に該接着フィルム表面積より小さいシミだし防止シ
ートを設け、該シミだし防止シートが該接着フィルムの
表面周囲のいずれの点に於いても外側にはみ出すことの
ないように設置することで接着剤のシミだしを防止でき
ることを見いだし本発明を完成させた。
In examining various methods for preventing the adhesive from bleeding, between the at least one press plate of the vacuum laminating apparatus and the supporting base film surface of the adhesive film, the surface area of the adhesive film is smaller than that of the adhesive film. It is found that by providing a stain prevention sheet and installing the stain prevention sheet so that it does not protrude outside at any point around the surface of the adhesive film, it is possible to prevent the stain of the adhesive. Completed the invention.

【0006】すなわち本発明は加熱及び加圧可能で少な
くとも一つの可動可能なプレス板を有する真空積層装置
を用いて、 1)支持ベースフィルムとその表面に積層され、該支持
ベースフィルムと同じか又は小さい面積を有し、かつ温
度と溶融粘度との関係で添付図面、図1の斜線領域Sの
物性を有する熱流動性、常温固形の樹脂組成物層からな
る接着フィルムの該樹脂組成物層を、回路基板上の少な
くともパターン部分に覆い重ねた後、部分的にこれらを
仮接着する工程、 2)該プレス板と該接着フィルムの支持ベースフィルム
の上面に該樹脂組成物層の表面積より小さい面積で、か
つ厚さが接着フィルムの厚さより厚いシミだし防止シー
トを該接着フィルムの樹脂組成物層の表面周囲のいずれ
の点に於いても1乃至8mm内側に位置するように設置
する工程を有することを特徴とする接着フィルムの真空
積層法及び装置である。
That is, the present invention uses a vacuum laminating apparatus having at least one movable press plate which can be heated and pressurized, and 1) is laminated on a supporting base film and the surface thereof and is the same as or similar to the supporting base film. Attached drawing having a small area and having the physical properties of the hatched area S in FIG. 1 in relation to temperature and melt viscosity, the resin composition layer of the adhesive film composed of the resin composition layer at room temperature solid (2) a step of temporarily covering them at least partially after covering over at least the pattern portion on the circuit board; and (2) an area smaller than the surface area of the resin composition layer on the upper surfaces of the press plate and the supporting base film of the adhesive film. The anti-smudge sheet having a thickness greater than the thickness of the adhesive film is located 1 to 8 mm inside at any point around the surface of the resin composition layer of the adhesive film. A vacuum lamination method and apparatus of the adhesive film characterized by having a step of installing such.

【0007】[0007]

【発明の実施の形態】本発明に用いられる樹脂組成物層
は常温固形の熱流動性の樹脂組成物であり、熱硬化性樹
脂及び/又は高分子を主成分としており、加熱により軟
化し、かつフィルム形成能のある樹脂組成物であって、
さらに熱硬化により耐熱性、電気特性など層間絶縁材に
要求される特性を満足するものであれば特に限定される
ものではない。該樹脂組成物の厚みはラミネートされる
内層回路基板の導体厚以上で、導体厚+(10〜12
0)umの範囲であることが望ましい。
BEST MODE FOR CARRYING OUT THE INVENTION The resin composition layer used in the present invention is a heat-fluid resin composition which is a solid at room temperature and contains a thermosetting resin and / or a polymer as a main component. And a resin composition capable of forming a film,
Further, there is no particular limitation as long as the properties required for the interlayer insulating material such as heat resistance and electrical properties are satisfied by thermosetting. The thickness of the resin composition is equal to or greater than the conductor thickness of the inner circuit board to be laminated, and is equal to the conductor thickness + (10 to 12).
0) It is desirable to be in the range of um.

【0008】該樹脂組成物としては例えば、エポキシ樹
脂系、アクリル樹脂系、ポリイミド樹脂系、ポリアミド
イミド樹脂系、ポリシアネート樹脂系、ポリエステル樹
脂系、熱硬化型ポリフェニレンエーテル樹脂系等が挙げ
られ、これらを2種以上組み合わせて使用したり、多層
構造を有する樹脂組成物層層とすることも可能である。
中でも、層間絶縁材として信頼性とコスト的に優れたエ
ポキシ樹脂系においては、特願平9ー357420記載
のエポキシ樹脂組成物が好ましい。
Examples of the resin composition include an epoxy resin, an acrylic resin, a polyimide resin, a polyamideimide resin, a polycyanate resin, a polyester resin, and a thermosetting polyphenylene ether resin. May be used in combination of two or more, or a resin composition layer having a multilayer structure may be used.
Among them, an epoxy resin composition described in Japanese Patent Application No. 9-357420 is preferable for an epoxy resin system having excellent reliability and cost as an interlayer insulating material.

【0009】該樹脂組成物の好ましい物性は動的粘弾性
率を測定し、この温度と溶融粘度との関係で示すことが
でき、本願明細書添付図面、図1の斜線領域Sはこの樹
脂組成物の好ましい範囲である。動的粘弾性率測定は
(株)ユー・ビ−・エム社製型式Rhesol-G3000を用いて
おこなった。動的粘弾性率測定曲線の上限は平均乾燥温
度100℃で10分間、同じく動的粘弾性率測定曲線の
下限は平均乾燥温度100℃で5分間処理した樹脂組成
物層の物性を示している。実験的にこの曲線に挟まれる
領域で、かつ溶融粘度10万Poise以下及び溶融温度14
0℃以下の領域が本願はつめいの実施に好ましく用いら
れる樹脂組成物層の物性をあらわしている。溶融粘度1
0万Poise以上では樹脂組成物層が硬くなり本願発明の
接着フィルムの真空積層法を実施した場合、回路基板上
のパターンと該樹脂組成物層の密着性が劣る。140℃
以上の温度で製造すると得られた積層回路板は高温によ
る損傷を受けやすくなり好ましくない。
The preferred physical properties of the resin composition can be shown by measuring the dynamic viscoelastic modulus and showing the relationship between the temperature and the melt viscosity. The hatched area S in FIG. It is a preferable range of the product. The dynamic viscoelasticity was measured using a model Rhesol-G3000 manufactured by UBM Corporation. The upper limit of the dynamic viscoelasticity measurement curve is 10 minutes at an average drying temperature of 100 ° C., and the lower limit of the dynamic viscoelasticity measurement curve is the physical properties of the resin composition layer treated at an average drying temperature of 100 ° C. for 5 minutes. . Experimentally sandwiched by this curve, with a melt viscosity of 100,000 Poise or less and a melting temperature of 14
The range of 0 ° C. or lower represents the physical properties of the resin composition layer preferably used for the present invention. Melt viscosity 1
Above 10,000 Poise, the resin composition layer becomes hard, and when the vacuum lamination method of the adhesive film of the present invention is performed, the adhesion between the pattern on the circuit board and the resin composition layer is poor. 140 ° C
Manufacturing at the above temperature is not preferable because the obtained laminated circuit board is easily damaged by high temperature.

【0010】本願明細書添付図面、図1に示した動的粘
弾性率測定は昇温速度5℃/分で測定したが、昇温速度
が異なると曲線の形状も異なってくる。接着フィルム製
造例1で得られた樹脂組成物層について異なる昇温速度
で測定した動的粘弾率測定曲線を図2に示した。したが
って、該樹脂組成物層の好ましい物性の範囲は測定条件
をキチント合わせて動的粘弾率曲線を測定しなくてはな
らない。
The dynamic viscoelasticity measurement shown in the accompanying drawings of FIG. 1 of the present application and shown in FIG. 1 was measured at a heating rate of 5 ° C./min. FIG. 2 shows dynamic viscoelasticity measurement curves measured at different heating rates for the resin composition layer obtained in Adhesive Film Production Example 1. Therefore, as for the preferable range of the physical properties of the resin composition layer, the dynamic viscoelasticity curve must be measured by adjusting the measurement conditions to chitin.

【0011】本発明に用いるシミだし防止シートは真空
積層装置のプレス板に固定されていても又独立したシー
トであってもよい。真空積層装置に於けるプレス機構は
プレス板が一枚でこれが可動する方式、又プレス板が一
対で構成され双方が可動する形式でも良い。プレス板は
本発明にあってはその硬度が重要であり、固すぎること
は好ましくない。通常は材質として、耐熱ラバー材が用
いられる。シミだし防止シートの材質は例えば厚さ0.
1乃至1mmのPETフィルムや厚さ1乃至2mmの耐
熱ラバーが用いられる。
The stain preventing sheet used in the present invention may be fixed to a press plate of a vacuum laminating apparatus or may be an independent sheet. The press mechanism in the vacuum laminating apparatus may be of a type in which one press plate is movable, or a type in which one press plate is formed and both are movable. In the present invention, the hardness of the press plate is important, and it is not preferable that the press plate is too hard. Usually, a heat-resistant rubber material is used as the material. The material of the stain prevention sheet is, for example, a thickness of 0.
A PET film having a thickness of 1 to 1 mm or a heat-resistant rubber having a thickness of 1 to 2 mm is used.

【0012】支持ベースフィルムと樹脂組成物層で構成
される接着フィルムの樹脂組成物層を積層する回路基板
は片側又は両面共にパターン加工されていてもよい。両
面にパターン加工されている場合、回路基板両面に合わ
せて接着フィルム2枚用いれば、同時にパターン加工さ
れた回路基板上に、支持ベースフィルムと樹脂組成物層
で構成される接着フィルムの樹脂組成物層を回路基板両
面に同時に積層することができる。
The circuit board on which the resin composition layer of the adhesive film composed of the supporting base film and the resin composition layer is laminated may be patterned on one or both sides. When both sides are patterned, if two adhesive films are used in accordance with both sides of the circuit board, the resin composition of the adhesive film composed of the supporting base film and the resin composition layer on the patterned circuit board at the same time The layers can be laminated simultaneously on both sides of the circuit board.

【0013】本発明に用いる接着フィルムは支持ベース
フィルムと樹脂組成物層で構成される。さらに輸送、保
管時の汚染防止、品質保持の目的で樹脂組成物層の上に
保護フィルムで覆われている。支持ベースフィルムと樹
脂組成物層は同一面積を有する状態で互いに張り合わさ
れていても良いが、通常は回路基板上に接着フィルムが
積層された後、支持フィルムを取り除く際の作業性か
ら、支持フィルムが僅かに大きな面積を持つように設計
されており、この状態で互いに張り合わされている。
The adhesive film used in the present invention comprises a support base film and a resin composition layer. Further, the resin composition layer is covered with a protective film for the purpose of preventing contamination during transportation and storage and maintaining quality. The support base film and the resin composition layer may be bonded to each other in a state having the same area, but usually, after the adhesive film is laminated on the circuit board, the support film is removed from the workability when removing the support film. Are designed to have a slightly larger area and are stuck together in this state.

【0014】本発明に用いる接着フィルムの樹脂組成物
層は支持ベースフィルムを支持体として所定の有機溶剤
に溶解した樹脂ワニスを塗布後、加熱及び/又は熱風吹
き付けにより溶剤を乾燥させて常温固形の樹脂組成物と
する公知慣用の方法で作製することができる。この場
合、製造された接着フィルム中に残存する有機溶剤はほ
とんどなく、以後の積層方法の操作に於いて作業環境や
安全性に影響のない程度に除去されている。
The resin composition layer of the adhesive film used in the present invention is formed by applying a resin varnish dissolved in a predetermined organic solvent using a support base film as a support, and then drying the solvent by heating and / or blowing with hot air to obtain a solid at room temperature. The resin composition can be prepared by a known and commonly used method. In this case, almost no organic solvent remains in the produced adhesive film, and the organic solvent is removed to a degree that does not affect the working environment and safety in the operation of the subsequent laminating method.

【0015】本発明のに用いられる接着フィルムを構成
する支持ベースフィルムとしては、ポリエチレン、ポリ
塩化ビニル等のポリオレフィン、ポリエチレンテレフタ
レート等のポリエステル、ポリカーボネート、さらには
離型紙や銅箔、アルミニウム箔の如き金属箔などが挙げ
られる。支持ベースフィルムの厚みとしては10〜15
0μmが一般的である。なお、支持フィルムにはマッド
処理、コロナ処理の他、離型処理を施してあってもよ
い。常温固形の樹脂組成物の厚みはラミネートされる内
層回路基板の導体厚以上で、導体厚+(10〜120)
μmの範囲であるのが一般的である。常温固形の樹脂組
成物と支持ベースフィルムとからなる本発明の樹脂組成
物層は、そのまま又は樹脂組成物の他の面に保護フィル
ムをさらに積層し、ロール状に巻きとって貯蔵される。
Examples of the supporting base film constituting the adhesive film used in the present invention include polyolefins such as polyethylene and polyvinyl chloride, polyesters such as polyethylene terephthalate, polycarbonate, and metal such as release paper, copper foil and aluminum foil. Foil and the like. The thickness of the supporting base film is 10 to 15
0 μm is common. The support film may be subjected to a release treatment in addition to the mud treatment and the corona treatment. The thickness of the room temperature solid resin composition is not less than the conductor thickness of the inner layer circuit board to be laminated, and the conductor thickness + (10 to 120)
It is generally in the range of μm. The resin composition layer of the present invention comprising the resin composition at room temperature and the supporting base film is stored as it is or by further laminating a protective film on the other surface of the resin composition, winding it into a roll, and storing.

【0016】該接着フィルムの樹脂組成物層をパターン
加工された内層回路基板に真空積層する方法としては、
モートン・インターナショナル・インコーポレーティド
製バキューム・アプリケータ、(株)名機製作所製真空
プレス機、OPTEK製真空ラミネーター等市販の真空
積層機を使用することができる。積層に際しては、前記
保護フィルムが存在している場合には保護フィルムを除
去後、上記回路基板に接着フィルムの樹脂組成物層を載
せる。外側に位置する常温固形の樹脂組成物である支持
ベースフィルムを加熱、加圧しラミネートする。ラミネ
ート時の樹脂流れが内層回路の導体厚以上であるのでラ
ミネートすることにより、内層回路パターンの被覆が良
好に行われる。この時該シミだし防止シートの表面積が
接着フィルムの樹脂組成物層の表面積より大きいか又ほ
ぼ同程度の面積であるか、あるいわ小さい場合であって
も、シミだし防止シートが接着フィルムの樹脂組成物層
よりいずれかの点で外側に一している場合には、設定樹
脂組成物層端部からの接着剤のシミだしが生じ好ましく
ない。
The method of vacuum laminating the resin composition layer of the adhesive film on the patterned inner circuit board includes the following:
Vacuum applicators manufactured by Morton International, Inc., vacuum presses manufactured by Meiki Seisakusho, and vacuum laminators manufactured by OPTEK, such as vacuum laminators, can be used. In laminating, if the protective film is present, the protective film is removed, and then the resin composition layer of the adhesive film is placed on the circuit board. The supporting base film, which is a resin composition at room temperature and which is solid at room temperature, is heated, pressed, and laminated. Since the resin flow at the time of lamination is equal to or larger than the conductor thickness of the inner layer circuit, the lamination allows the inner layer circuit pattern to be covered well. At this time, even when the surface area of the spot prevention sheet is larger than or approximately the same as the surface area of the resin composition layer of the adhesive film, or in other words, even if it is small, the spot prevention sheet is formed of the resin of the adhesive film. If it is outside at any point from the composition layer, the adhesive is stained from the end of the set resin composition layer, which is not preferable.

【0017】そこで、該シミだし防止シートの表面積が
接着フィルムの樹脂組成物層の表面積より小さく、かつ
該シミだし防止シートの表面周囲が該接着フィルムの樹
脂組成物層の表面周囲よりいずれも点に於いても1乃至
8mm内側に位置するように設定することが好ましい。
該樹脂組成物層厚以上のシミだし防止シートをプレス板
に固定するか、又は積層時に樹脂組成物層と支持ベース
フィルムの間に挟み込むことによって、プレス時にフィ
ルム端部に充分な圧力がかからず樹脂組成物のシミだし
を低減することが可能となる。シミだし防止シートの大
きさが積層時の相接する接着フィルムの大きさよりいず
れの点でも1mm未満であればシミ出し量に変化が無い
し、8mmを越えて小さいと樹脂組成物層の有効面積が
小さくなる上に、フィルム端部にプレス面が接触しやす
くシミだし低減効果が無くなる。より好ましくは2〜5
mmの範囲である。シミだし防止シートの厚さに関して
は、接着剤の熱流動性の程度にもよるが少なくとも樹脂
組成物層の厚さ以上であって、0.3〜4mmの範囲に
あるのが好ましい。シミだし防止シート厚さがが樹脂組
成物層の厚さ未満であるとフィルム端部にプレス面が接
触してしまい効果が無い。プレス面にシミだし防止シー
トを形成するか又はこれと同等な機能を発現させるため
には、プレス面に溝部をザグリ形成するか、プレス面に
シート状材料を積層し形成してもよいが、後者の方が基
板サイズの変更が容易である。シート状材料の材質につ
いては、積層する基板に追従可能なものであれば特に限
定されるものではないが、支持ベースフィルムの如きフ
ィルム材やプレス面に使用される耐熱ラバー等が好まし
い。
Therefore, the surface area of the spot prevention sheet is smaller than the surface area of the resin composition layer of the adhesive film, and the surface periphery of the spot prevention sheet is smaller than the surface periphery of the resin composition layer of the adhesive film. In this case, it is preferable that the distance is set to be 1 to 8 mm inside.
By fixing the bleeding prevention sheet having a thickness of not less than the resin composition layer to the press plate, or by sandwiching the sheet between the resin composition layer and the supporting base film at the time of lamination, sufficient pressure is applied to the film end portion at the time of pressing. It becomes possible to reduce the stain of the resin composition. If the size of the stain prevention sheet is less than 1 mm at any point from the size of the adhesive film at the time of lamination, there is no change in the amount of stains, and if it exceeds 8 mm, the effective area of the resin composition layer is small. In addition to the above, the press surface is likely to come into contact with the end of the film, and the effect of reducing stains is lost. More preferably, 2 to 5
mm. The thickness of the stain prevention sheet depends on the degree of thermal fluidity of the adhesive, but is preferably at least the thickness of the resin composition layer, and is preferably in the range of 0.3 to 4 mm. If the thickness of the stain prevention sheet is less than the thickness of the resin composition layer, the pressed surface comes into contact with the end of the film, so that there is no effect. In order to form a stain prevention sheet on the press surface or to develop a function equivalent thereto, a groove may be formed on the press surface, or a sheet material may be laminated on the press surface, The latter is easier to change the substrate size. The material of the sheet material is not particularly limited as long as it can follow the substrate to be laminated, but a film material such as a support base film, a heat-resistant rubber used for a pressed surface, and the like are preferable.

【0018】本発明の樹脂組成物層をパターン加工され
た回路基板上に真空積層する方法は、ビルドアップ用層
間樹脂組成物層を使用した場合に限定されるものではな
く、熱流動性を有する樹脂組成物層全般、例えばソルダ
ーレジスト等のドライフィルムにも適用可能であること
は言うまでもない。
The method of vacuum laminating the resin composition layer of the present invention on a patterned circuit board is not limited to the case where the interlayer resin composition layer for build-up is used, and has a thermal fluidity. It goes without saying that the present invention can be applied to the entire resin composition layer, for example, a dry film such as a solder resist.

【0019】本願発明方法を実施するための装置はパタ
ーン加工された回路基板上に、支持ベースフィルムと樹
脂組成物層で構成される接着フィルムの樹脂組成物層を
積層するための装置であって、1)加熱及び加圧可能で
少なくとも一つの可動可能なプレス板によるプレス手
段、2)該プレス手段のプレス板に固定されたシミだし
防止シートによるシミ出し防止手段、3)該シミだし防
止シートの表面周囲が該接着フィルムの樹脂組成物層の
表面周囲よりいずれも点に於いても1乃至8mm内側に
位置するよう設定できる位置決め手段とを有することを
特徴とする。
An apparatus for carrying out the method of the present invention is an apparatus for laminating a resin composition layer of an adhesive film composed of a support base film and a resin composition layer on a circuit board subjected to pattern processing. 1) Press means using at least one movable press plate which can be heated and pressed, 2) Smear prevention means using a stain prevention sheet fixed to the press plate of the press means, 3) The stain prevention sheet And a positioning means which can be set so that the periphery of the surface of the resin composition layer of the adhesive film is located 1 to 8 mm inside at any point.

【0020】シミだし防止シートの表面積が接着フィル
ムの樹脂組成物層の表面積より小さく、かつシミだし防
止シートの厚さが接着フィルムの厚さより厚いことを特
徴とする。位置決め手段はプレス板の位置からこれに合
わせるように回路基板の位置を光センサー等で読み取れ
ば良い。読み取り手段は特に限定されるものではない。
It is characterized in that the surface of the spot prevention sheet is smaller than the surface area of the resin composition layer of the adhesive film, and the thickness of the spot prevention sheet is larger than the thickness of the adhesive film. The positioning means may read the position of the circuit board from the position of the press plate with an optical sensor or the like so as to match the position. The reading means is not particularly limited.

【0021】[0021]

【実施例】以下実施例を示して本発明を具体的に説明す
るが、本発明はこれに限定されるものではない。
EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples.

【0022】[0022]

【接着フィルム製造例】液状ビスフェノールA型エポキ
シ樹脂(油化シェルエポキシ(株)製エピコート828
EL)20部、臭素化ビスフェノールA型エポキシ樹脂
(東都化成(株)製YDBー500)20部、クレゾー
ルノボラック型エポキシ樹脂(エポキシ当量215、軟
化点78℃、大日本インキ化学(株)製エピクロンNー
673)20部、末端エポキシ化ポリブタジエンゴム
(ナガセ化成工業(株)製デナレックスR−45EP
T)15部とをMEKに攪拌しながら加熱溶解させ、そ
こへ臭素化フェノキシ樹脂ワニス(不揮発分40重量
%、臭素含有量25重量%、溶剤組成、キシレン:メト
キシプロパノール:メチルエチルケトン=5:2:8、
東都化成(株)製YPBー40ーPXM40)50部、
エポキシ硬化剤として2、4ージアミノー6ー(2ーメ
チルー1ーイミダゾリルエチル)ー1、3、5ートリア
ジン・イソシアヌル酸付加物4部、さらに微粉砕シリカ
2部、三酸化アンチモン4部、炭酸カルシウム5部を添
加し樹脂組成物ワニスを作製した。そのワニスを厚さ3
8μmのPETフィルム上に、乾燥後の厚みが42、7
2μmとなるようにローラーコーターにて塗布、80〜
120℃で乾燥し80、110μm厚の接着フィルムを
得た。上記の接着フィルムの樹脂組成物層の動的粘弾率
測定は、例えば(株)ユー・ビー・エム社製型式Rhesol
-G300を用いて測定出きる。図1は測定した動的粘弾性
率曲線であり、その測定曲線の上限は平均乾燥温度10
0℃で10分、同じく下限の曲線は平均乾燥温度100
℃で5分間処理した樹脂組成物の物性を示している。図
2は昇温速度を5℃/分、8℃/分及び20℃/分にした
時の動的粘弾性率測定曲線である。
[Production example of adhesive film] Liquid bisphenol A type epoxy resin (Epicoat 828 manufactured by Yuka Shell Epoxy Co., Ltd.)
EL) 20 parts, brominated bisphenol A type epoxy resin (YDB-500, manufactured by Toto Kasei Co., Ltd.), cresol novolak type epoxy resin (epoxy equivalent: 215, softening point: 78 ° C., Epicron manufactured by Dainippon Ink and Chemicals, Inc.) N-673) 20 parts, terminal epoxidized polybutadiene rubber (Denalex R-45EP manufactured by Nagase Kasei Kogyo Co., Ltd.)
T) and 15 parts thereof were dissolved in MEK by heating while stirring, and a brominated phenoxy resin varnish (nonvolatile content: 40% by weight, bromine content: 25% by weight, solvent composition, xylene: methoxypropanol: methyl ethyl ketone = 5: 2: 8,
50 parts of YPB-40-PXM40 manufactured by Toto Kasei Co., Ltd.
2,4 diamino-6- (2-methyl-1-imidazolylethyl) -1,3,5-triazine / isocyanuric acid adduct 4 parts as epoxy curing agent, further 2 parts of finely ground silica, 4 parts of antimony trioxide, 5 parts of calcium carbonate Was added to prepare a resin composition varnish. Apply the varnish to thickness 3
On a 8 μm PET film, the thickness after drying is 42, 7
Apply with a roller coater to 2 μm, 80 ~
After drying at 120 ° C., an adhesive film having a thickness of 80 and 110 μm was obtained. The measurement of the dynamic viscoelasticity of the resin composition layer of the adhesive film is performed, for example, using a model Rhesol manufactured by UBM Corporation.
-Measurement can be completed using G300. FIG. 1 shows the measured dynamic viscoelastic modulus curve, the upper limit of which is an average drying temperature of 10
0 ° C. for 10 minutes, and the lower curve is the average drying temperature of 100
It shows the physical properties of the resin composition treated at 5 ° C. for 5 minutes. FIG. 2 is a dynamic viscoelasticity measurement curve when the heating rate is 5 ° C./min, 8 ° C./min, and 20 ° C./min.

【0023】[0023]

【実施例1】パターン加工された510x340mmの
ガラスエポキシ内層回路基板に(導体厚18μm)、製
造例で得られた80μm及び110μm厚接着フィルム
を506x336mmのサイズで基板中央に両面に仮付
けした。次にシミだし防止シート(500x330mm
サイズで0.1〜1mm厚のPETフィルム)を接着フ
ィルム中央に両面に配し、樹脂組成物層端部よりいずれ
の位置に置いても少なくとも3mm内側に位置するよう
に設置した。モートン・インターナショナル・インコー
ポレーティド製バキューム・アプリケータ700により
温度80℃、5秒プレスで両面同時にラミネートした。
シミだし状況を目視観察した。比較例程度のシミだしを
「あり」、これより低減された場合を「低減」、シミだ
しを認めなかった場合を「なし」とし、結果を表1に示
した。
Example 1 An 80 μm and 110 μm thick adhesive film obtained in the production example was temporarily attached to the center of the substrate on both sides of a 510 × 340 mm glass epoxy inner layer circuit board (conductor thickness: 18 μm) in a size of 506 × 336 mm. Next, a stain prevention sheet (500 x 330 mm
A PET film having a size of 0.1 to 1 mm in thickness) was disposed on both sides at the center of the adhesive film, and was placed so that it was located at least 3 mm inside regardless of the position from the end of the resin composition layer. Both sides were simultaneously laminated by a press at a temperature of 80 ° C. for 5 seconds using a vacuum applicator 700 manufactured by Morton International Incorporated.
The spots were visually observed. The results are shown in Table 1, and the results are shown in Table 1. The results are shown in Table 1.

【0024】[0024]

【表1】 [Table 1]

【0025】[0025]

【比較例1】パターン加工された510x340mmの
ガラスエポキシ内層回路基板に(導体厚18μm)、製
造例で得られた80μm及び110μm厚樹脂組成物層
を506x336mmのサイズで基板中央に両面に仮付
けした。次にシミだし防止シート(500x330mm
サイズで0.1mm厚のPETフィルム)を樹脂組成物
層中央に両面に配し、樹脂組成物層端部よりいずれの位
置に置いても少なくとも3mm内側に位置するように設
置した。モートン・インターナショナル・インコーポレ
ーティド製バキューム・アプリケータ700により温度
80℃、5秒プレスで両面同時にラミネートした。シミ
だし状況を目視観察したがシミだし「あり」であった。
Comparative Example 1 A resin composition layer having a thickness of 506 x 336 mm was temporarily attached to both sides of a resin composition layer having a thickness of 506 x 336 mm on a patterned 510 x 340 mm glass epoxy inner layer circuit board (having a conductor thickness of 18 m). . Next, a stain prevention sheet (500 x 330 mm
A PET film having a size of 0.1 mm in thickness) was disposed on both sides at the center of the resin composition layer, and was disposed so as to be located at least 3 mm inside regardless of the position from the end of the resin composition layer. Both sides were simultaneously laminated by a press at a temperature of 80 ° C. for 5 seconds using a vacuum applicator 700 manufactured by Morton International Incorporated. The spots were visually observed, but the spots were "yes".

【0026】[0026]

【実施例2】パターン加工された510x340mmの
ガラスエポキシ内層回路基板(導体厚35μm)に、製
造例で得られた110μm厚樹脂組成物層を506x3
36mmのサイズで基板中央に両面に仮付けした。次に
樹脂組成物層端部からの距離を0〜10mmの範囲で小
さくした1.6mm厚耐熱ラバーを上下プレス面に配
し、バキューム・アプリケータ700により温度80
℃、5秒プレスで両面同時にラミネートした。結果を表
2に示した。
EXAMPLE 2 A 110 μm thick resin composition layer obtained in the production example was applied to a 510 × 340 mm glass epoxy inner layer circuit board (conductor thickness: 35 μm) which had been subjected to pattern processing.
Temporarily attached to both sides at the center of the substrate with a size of 36 mm. Next, a 1.6 mm thick heat-resistant rubber in which the distance from the end of the resin composition layer was reduced in the range of 0 to 10 mm was arranged on the upper and lower press surfaces, and the temperature was adjusted to 80 by a vacuum applicator 700.
The laminate was simultaneously laminated on both sides by pressing at 5 ° C. for 5 seconds. The results are shown in Table 2.

【0027】[0027]

【表2】 [Table 2]

【0028】[0028]

【比較例2】パターン加工された510x340mmの
ガラスエポキシ内層回路基板(導体厚35μm)に、製
造例で得られた110μm接着フィルムの厚樹脂組成物
層を506x336mmのサイズで基板中央からずらし
て両面に仮付けした。この場合樹脂組成物層表面周辺部
が1.6mm厚耐熱ラバーを上下プレス面に配したシミ
だし防止シートの表面周辺と一部で一致した(距離0m
m)。バキューム・アプリケータ700により温度80
℃、5秒プレスで両面同時にラミネートした。しみ出し
は「あり」であった。併せて結果を表2に示した。
Comparative Example 2 On a patterned 510 × 340 mm glass epoxy inner layer circuit board (conductor thickness 35 μm), the thick resin composition layer of the 110 μm adhesive film obtained in the production example was displaced from the center of the board at a size of 506 × 336 mm on both sides. Temporarily attached. In this case, the periphery of the surface of the resin composition layer partially coincided with the periphery of the spot prevention sheet in which heat-resistant rubber having a thickness of 1.6 mm was arranged on the upper and lower pressing surfaces (distance 0 m)
m). Temperature 80 by vacuum applicator 700
The laminate was simultaneously laminated on both sides by pressing at 5 ° C. for 5 seconds. Exudation was "Yes". The results are shown in Table 2.

【0029】[0029]

【比較例3】パターン加工された510x340mmの
ガラスエポキシ内層回路基板(導体厚35μm)に、製
造例で得られた110μm接着フィルムの厚樹脂組成物
層を506x336mmのサイズで基板中央に一致させ
て両面に仮付けした。この場合樹脂組成物層と1.6m
m厚耐熱ラバーを上下プレス面に配したシミだし防止シ
ートは同じ面積に一致させた。バキューム・アプリケー
タ700により温度80℃、5秒プレスで両面同時にラ
ミネートした。しみ出しは「あり」であった。
Comparative Example 3 A thick resin composition layer of a 110 μm adhesive film obtained in the production example was placed on a patterned 510 × 340 mm glass epoxy inner layer circuit board (conductor thickness 35 μm) in a size of 506 × 336 mm to coincide with the center of the substrate. Temporarily attached to. In this case, the resin composition layer and 1.6 m
The spot prevention sheet in which m-thick heat-resistant rubber was arranged on the upper and lower press surfaces was made to have the same area. Both sides were simultaneously laminated by a vacuum applicator 700 at a temperature of 80 ° C. for 5 seconds. Exudation was "Yes".

【0030】[0030]

【比較例4】パターン加工された510x340mmの
ガラスエポキシ内層回路基板(導体厚35μm)に、製
造例で得られた110μm厚樹脂組成物層を506x3
36mmのサイズで基板中央に両面に仮付けした。次に
樹脂組成物層端部からのいずれに於いても距離を10m
m小さくした1.6mm厚耐熱ラバーを上下プレス面に
配し、バキューム・アプリケータ700により温度80
℃、5秒プレスで両面同時にラミネートした。しみ出し
は「あり」であった。結果を表2に示した。
Comparative Example 4 A 110 μm thick resin composition layer obtained in the production example was 506 × 3 on a 510 × 340 mm glass epoxy inner layer circuit board (conductor thickness 35 μm) which had been subjected to pattern processing.
Temporarily attached to both sides at the center of the substrate with a size of 36 mm. Next, the distance was 10 m from any end of the resin composition layer.
The 1.6 mm thick heat-resistant rubber, which has been reduced by 1.6 m, is arranged on the upper and lower press surfaces, and the temperature is adjusted to 80 by a vacuum applicator 700.
The laminate was simultaneously laminated on both sides by pressing at 5 ° C. for 5 seconds. Exudation was "Yes". The results are shown in Table 2.

【0031】実施例1、2の結果から、本発明の方法に
従えば熱流動性を有する樹脂組成物層を、接着剤のシミ
だしが低減された状態で積層することが可能である。
From the results of Examples 1 and 2, according to the method of the present invention, it is possible to laminate a resin composition layer having heat fluidity in a state in which the stain of the adhesive is reduced.

【比較例5】接着フィルム製造例1により得られた樹脂
組成物層を平均乾燥温度100℃で2分、乾燥した樹脂
組成物層の動的粘弾性率測定曲線を図3に示した。明ら
かに図1で示された斜線領域Sの外側である。この樹脂
組成物層を支持ベースフィルム上にラミネートした接着
フィルムはラミネート工程は実施できたものの、次の熱
硬化工程で樹脂ダレが発生し、このために樹脂組成物層
に層厚が不均一となったため本発明の目的には使用でき
なかった。
Comparative Example 5 FIG. 3 shows a dynamic viscoelasticity measurement curve of the resin composition layer obtained in Preparation Example 1 of the adhesive film, which was dried at an average drying temperature of 100 ° C. for 2 minutes. This is clearly outside the shaded area S shown in FIG. The adhesive film obtained by laminating the resin composition layer on the supporting base film was able to carry out the laminating step, but resin dripping occurred in the next thermosetting step, and thus the resin composition layer had an uneven thickness. Therefore, it could not be used for the purpose of the present invention.

【0032】[0032]

【比較例6】接着フィルム製造例1により得られた樹脂
組成物層を平均乾燥温度100℃で15分、乾燥した樹
脂組成物層の動的粘弾性率測定曲線を図3に示した。明
らかに図1で示された斜線領域Sの外側で高粘度側にシ
フトした。この樹脂組成物層を支持ベースフィルム上に
ラミネートした接着フィルムの製造した。この接着フィ
ルムの樹脂組成物層を回路基板のパターン部分に積層す
ることを試みたがボイドなく積層できる条件を見出すこ
とができなかった。
Comparative Example 6 FIG. 3 shows the dynamic viscoelasticity measurement curve of the resin composition layer obtained in Preparation Example 1 of the adhesive film obtained by drying the resin composition layer at an average drying temperature of 100 ° C. for 15 minutes. Clearly, it shifted to the higher viscosity side outside the shaded area S shown in FIG. An adhesive film was produced by laminating the resin composition layer on a supporting base film. An attempt was made to laminate the resin composition layer of the adhesive film on the pattern portion of the circuit board, but could not find any conditions for laminating without voids.

【0033】[0033]

【発明の効果】本発明の方法に従うと、熱流動性を有す
る接着フィルムを非常に優れた表面平滑性を持った状態
で、簡便に積層することが可能である。
According to the method of the present invention, it is possible to easily laminate an adhesive film having thermal fluidity with very excellent surface smoothness.

【図面の簡単な説明】[Brief description of the drawings]

【図1】動的粘弾性率測定を示し,(株)ユー・ビー・
エム社製型式Rhesol-G3000を用いて測定した曲線であ
り、動的粘弾性率の上限の曲線(1)の平均乾燥温度10
0℃で10分、同じく下限の曲線(2)は平均乾燥温度1
00度Cで5分間処理した樹脂組成物の物性を示してい
る。測定条件は昇温速度は5℃/分、開始温度60℃、
測定温度間隔2.5℃、振動1Hz/degである。
FIG. 1 shows a dynamic viscoelastic modulus measurement.
This is a curve measured using a model Rhesol-G3000 manufactured by M Co., Ltd., and the average drying temperature of the curve (1) at the upper limit of the dynamic viscoelastic modulus is 10
At 0 ° C. for 10 minutes, the lower curve (2) also shows an average drying temperature of 1
It shows the physical properties of the resin composition treated at 00 ° C. for 5 minutes. The measurement conditions were as follows: heating rate 5 ° C / min, starting temperature 60 ° C,
The measurement temperature interval is 2.5 ° C and the vibration is 1 Hz / deg.

【図2】動的粘弾性率測定を示し,(株)ユー・ビー・
エム社製型式Rhesol-G3000を用いて測定した曲線であ
り、接着フィルム製造例1により得られた樹脂組成物層
を平均乾燥温度100℃で5分間処理した樹脂組成物の
物性を示している。昇温速度は5℃/分(曲線III)、1
0℃(曲線II)及び20℃(曲線I)である。測定条件
は開始温度60℃、測定温度間隔2.5℃、振動1Hz/d
egである。
FIG. 2 shows a dynamic viscoelastic modulus measurement, and is shown by U.B.
It is a curve measured using Model Rhesol-G3000 manufactured by M Corporation, and shows the physical properties of the resin composition obtained by treating the resin composition layer obtained in Adhesive Film Production Example 1 at an average drying temperature of 100 ° C. for 5 minutes. Heating rate 5 ° C / min (Curve III), 1
0 ° C. (curve II) and 20 ° C. (curve I). Measurement conditions are: starting temperature 60 ° C, measuring temperature interval 2.5 ° C, vibration 1Hz / d
eg.

【図3】動的粘弾性率測定を示し,(株)ユー・ビー・
エム社製型式Rhesol-G3000を用いて測定した曲線であ
り、接着フィルム製造例1により得られた樹脂組成物層
を平均乾燥温度100度Cで2分(曲線A)、8分(曲
線B)及び15分間(曲線C)で処理した樹脂組成物の
物性を示している。測定条件は昇温速度は5℃/分、開
始温度60℃、測定温度間隔2.5℃、振動1Hz/degで
ある。
FIG. 3 shows dynamic viscoelasticity measurement.
It is a curve measured using the model Rhesol-G3000 manufactured by M Co., Ltd., in which the resin composition layer obtained by the adhesive film production example 1 was dried at an average drying temperature of 100 ° C. for 2 minutes (curve A) and 8 minutes (curve B). And the physical properties of the resin composition treated for 15 minutes (curve C). The measurement conditions are as follows: a temperature rising rate is 5 ° C./min, a starting temperature is 60 ° C., a measuring temperature interval is 2.5 ° C., and a vibration is 1 Hz / deg.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】加熱及び加圧可能で少なくとも一つの可動
可能なプレス板を有する真空積層装置を用いて、 1)支持ベースフィルムとその表面に積層され、該支持
ベースフィルムと同じか又は小さい面積を有し、かつ温
度と溶融粘度との関係で添付図面、図1の斜線領域Sの
物性を有する熱流動性、常温固形の樹脂組成物層からな
る接着フィルムの該樹脂組成物層を、回路基板上の少な
くともパターン部分に覆い重ねた後、部分的にこれらを
仮接着する工程、 2)該プレス板と該接着フィルムの支持ベースフィルム
の上面に該樹脂組成物層の表面積より小さい面積で、か
つ厚さが接着フィルムの厚さより厚いシミだし防止シー
トを該接着フィルムの樹脂組成物層の表面周囲のいずれ
の点に於いても1乃至8mm内側に位置するように設置
する工程を有することを特徴とする接着フィルムの真空
積層法
1. A vacuum laminating apparatus having at least one movable press plate which can be heated and pressurized, and 1) a supporting base film and a surface which is laminated on the surface thereof and which is the same as or smaller than the supporting base film. In addition, the resin composition layer of the adhesive film consisting of a resin composition layer of a thermofluid, room temperature solid having the properties of the shaded region S in FIG. After covering at least the pattern portion on the substrate, partially temporarily bonding them, 2) an area smaller than the surface area of the resin composition layer on the upper surface of the support base film of the press plate and the adhesive film, In addition, the anti-smudge sheet having a thickness greater than the thickness of the adhesive film is disposed so as to be located 1 to 8 mm inside at any point around the surface of the resin composition layer of the adhesive film. Vacuum lamination of the adhesive film characterized by having a degree
【請求項2】パターン加工された回路基板上に、支持ベ
ースフィルムと樹脂組成物層で構成される接着フィルム
の樹脂組成物層を積層するための装置であって、1)加
熱及び加圧可能で少なくとも一つの可動可能なプレス板
によるプレス手段、2)該プレス手段のプレス板に固定
されたシミだし防止シートによるシミ出し防止手段、
3)該シミだし防止シートの表面周囲が該接着フィルム
の樹脂組成物層の表面周囲よりいずれも点に於いても1
乃至8mm内側に位置するよう設定できる位置決め手段
とを有することを特徴とする接着フィルムの真空積層装
2. An apparatus for laminating a resin composition layer of an adhesive film composed of a support base film and a resin composition layer on a patterned circuit board, and 1) capable of heating and pressing. Press means using at least one movable press plate; 2) means for preventing stains from being applied by a stain prevention sheet fixed to the press plate of the press means;
3) Regardless of the point around the surface of the resin film layer of the adhesive film, the point around the surface of the spot prevention sheet is 1
And a positioning means which can be set to be located within 8 to 8 mm inside.
【請求項3】シミだし防止シートの表面積が接着フィル
ムの樹脂組成物層の表面積より小さく、かつシミだし防
止シートの厚さが接着フィルムの厚さより厚いことを特
徴とする請求項2記載の接着フィルムの真空積層装置
3. The adhesive according to claim 2, wherein the surface of the spot prevention sheet is smaller than the surface area of the resin composition layer of the adhesive film, and the thickness of the spot prevention sheet is larger than the thickness of the adhesive film. Film vacuum laminating equipment
JP11069995A 1998-03-23 1999-03-16 Method for vacuum lamination of adhesive film Pending JPH11340625A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11069995A JPH11340625A (en) 1998-03-23 1999-03-16 Method for vacuum lamination of adhesive film

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP10-115862 1998-03-23
JP11586298 1998-03-23
JP11069995A JPH11340625A (en) 1998-03-23 1999-03-16 Method for vacuum lamination of adhesive film

Publications (1)

Publication Number Publication Date
JPH11340625A true JPH11340625A (en) 1999-12-10

Family

ID=26411166

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11069995A Pending JPH11340625A (en) 1998-03-23 1999-03-16 Method for vacuum lamination of adhesive film

Country Status (1)

Country Link
JP (1) JPH11340625A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001059023A1 (en) * 2000-02-08 2001-08-16 Ajinomoto Co., Inc. Adhesive film and method for manufacturing multilayer printed wiring board
WO2001097582A1 (en) * 2000-06-15 2001-12-20 Ajinomoto Co., Inc. Adhesive film and method for manufacturing multilayer printed wiring board comprising the same
US6739040B1 (en) * 1999-10-28 2004-05-25 Ajinomoto Co., Inc. Method of manufacturing multilayered printed wiring board using adhesive film

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6739040B1 (en) * 1999-10-28 2004-05-25 Ajinomoto Co., Inc. Method of manufacturing multilayered printed wiring board using adhesive film
WO2001059023A1 (en) * 2000-02-08 2001-08-16 Ajinomoto Co., Inc. Adhesive film and method for manufacturing multilayer printed wiring board
WO2001097582A1 (en) * 2000-06-15 2001-12-20 Ajinomoto Co., Inc. Adhesive film and method for manufacturing multilayer printed wiring board comprising the same

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