JP3861537B2 - Vacuum lamination method of adhesive film - Google Patents

Vacuum lamination method of adhesive film Download PDF

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Publication number
JP3861537B2
JP3861537B2 JP34371099A JP34371099A JP3861537B2 JP 3861537 B2 JP3861537 B2 JP 3861537B2 JP 34371099 A JP34371099 A JP 34371099A JP 34371099 A JP34371099 A JP 34371099A JP 3861537 B2 JP3861537 B2 JP 3861537B2
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Japan
Prior art keywords
film
resin composition
adhesive film
base film
composition layer
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JP34371099A
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JP2000228581A5 (en
JP2000228581A (en
Inventor
茂雄 中村
清敬 古田
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Ajinomoto Co Inc
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Ajinomoto Co Inc
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Description

【0001】
【産業上の利用分野】
本発明は、導体回路層と絶縁層とを交互に積み上げたビルドアップ方式の多層プリント配線板の製造法において、フィルム状接着剤を内層回路パターンに真空積層する方法に関するものである。
【0002】
【従来の技術】
近年内層回路板の導体層上に有機絶縁層を交互に積み上げていくビルドアップ方式の多層プリント配線板の製造技術が注目されている。特開平8ー64960には、下塗り接着剤を塗布、仮乾燥後フィルム状アディティブ接着剤を貼り合わせて加熱硬化させ、アルカリ性酸化剤で粗化、導体層をメッキにより形成し多層プリント配線板を製造する方法が知られている。また、本発明者らも特願平9ー357420において内層回路パターンの被覆と表面ビアホール及び/又はスルーホール内の樹脂充填を同時に一括して行うことのできる多層プリント配線板用層間接着フィルム、及びこれを用いた多層プリント配線板の製造法を開示している。この接着フィルムを耐熱ゴムを挟んで加熱、加圧条件下真空積層する場合、内層回路への接着剤の埋め込み性に優れ、下塗り工程不要のため生産性にも優れる利点があるものの、耐熱ゴムが内層回路に追従する特性上接着剤が回路パターンに沿って凹凸を生じ表面平滑性が悪化するため、後の部品実装工程で不具合が発生するという問題があった。
【0003】
【発明が解決しようとする課題】
上記問題点を顧みて、本発明者らは支持ベースフィルムとその表面に積層され、これとほぼ同じ面積を有する熱流動性、常温固形の樹脂組成物層からなる接着フィルムを回路基板の内層回路パターンに真空積層する方法において、該樹脂組成物層であるフィルム状接着層の支持ベースフィルムとの接触面の表面平滑性に優れた真空積層法を開発することにある。
【0004】
【課題を解決するための手段】
本発明は支持ベースフィルムとその表面に積層された、熱流動性、常温固形の樹脂組成物層からなる接着フィルムの該樹脂組成物層をパターン加工された回路基板上に加熱及び加圧条件下で真空積層する多層プリント配線板の製造方法において、
)耐熱ゴムを介して、支持ベースフィルム側より加熱及び加圧し、接着フィルムを真空積層する工
及び
2)該真空積層する工程に引き続いて、該支持ベースフィルムからプレス用金属板を用いて加熱及び加圧し、支持ベースフィルムと接する樹脂組成物層表面を平滑化する工程を行うこと、さらに該樹脂組成物層表面を平滑化する工程において、該支持ベースフィルム上に、該接着フィルムよりも大きい面積の表面平滑は保護フィルムを戴置した後、該保護フィルムの上からプレス金属板を用いて加熱及び加圧し支持ベースフィルムに接する該樹脂組成物表面を平滑化することを特徴とする多層プリント配線板の製造法である。
【0005】
【発明の実施の形態】
本発明に用いられる接着フィルムは支持ベースフィルムを支持体として所定の有機溶剤に溶解した樹脂ワニスを塗布後、加熱及び/又は熱風吹き付けにより溶剤を乾燥させて熱流動性、常温固形の樹脂組成物層を公知慣用の方法で作製することができる。接着フィルムは、そのまま又は樹脂組成物の他の面に離形フィルムをさらに積層し、ロール状に巻きとって貯蔵される。
【0006】
熱流動性、常温固形の樹脂組成物としては、熱硬化性樹脂及び/又は高分子を主成分としてなり、加熱により軟化し、かつフィルム形成能のある樹脂組成物であって、さらに熱硬化により耐熱性、電気特性など層間絶縁材に要求される特性を満足するものであれば特に限定されるものではない。例えば、エポキシ樹脂系、アクリル樹脂系、ポリイミド樹脂系、ポリアミドイミド樹脂系、ポリシアネート樹脂系、ポリエステル樹脂系、熱硬化型ポリフェニレンエーテル樹脂系等が挙げられ、これらを2種以上組み合わせて使用したり、多層構造を有する接着フィルム層とすることも可能である。中でも、層間絶縁材として信頼性とコスト的に優れたエポキシ樹脂系においては、特願平9ー357420記載のエポキシ樹脂組成物が好ましい。
【0007】
熱流動性、常温固形の樹脂組成物を支持ベースフィルム上に積層して形成する、樹脂組成物層の厚みはラミネートされる内層回路基板の導体厚以上で、導体厚+(10〜120)μmの範囲であるのが一般的である。
【0008】
支持ベースフィルムとしては、ポリエチレン、ポリ塩化ビニル等のポリオレフィン、ポリエチレンテレフタレート等のポリエステル、ポリカーボネート、さらには離型紙や銅箔、アルミニウム箔の如き金属箔などが挙げられる。支持ベースフィルムの厚みとしては10〜150μmが一般的である。なお、支持フィルムにはマッド処理、コロナ処理の他、離型処理を施してあってもよい。
【0009】
接着フィルムの支持ベースフィルム側より耐熱ゴムを介して加熱、加圧し回路基板上に接着フィルムの該樹脂組成物層を真空積層するには、ニチゴー・モートン(株)製バキュームアップリケーター、(株)名機製作所製真空加圧式ラミネーターや大成ラミネーター(株)製真空ラミネーター等市販の真空積層機を使用することができる。これらの機械は耐熱ゴムを挟んだ状態で積層する構造が一般的である。積層に際しては、接着フィルムが予め回路基板と同程度の面積サイズで枚葉された回路基板を投入し、支持ベースフィルム側から熱流動性、常温固形の樹脂組成物層を加熱、加圧しラミネートするか、又はロール状接着フィルムを真空ラミネーターの基材ロールにセットした状態で支持ベースフィルム側から熱流動性、常温固形の樹脂組成物層を加熱、加圧しラミネートした後所定のサイズでカットする。ラミネート時の樹脂流れが内層回路の導体厚以上である条件でラミネートすることにより、内層回路パターンの被覆が良好に行われるが、耐熱ゴムが柔軟性があり内層回路の導体の凹凸形状にに追従する特性上、熱流動性、常温固形の樹脂組成物層と回路基板は密着されるものの、該樹脂組成物層の支持ベースフィルムとの接触面の表面平滑性が損なわれる。
【0010】
この問題を解決するために、接着フィルムが真空積層された該回路基板を、該接着フィルムよりも大きい面積の保護用フィルムをプレス用金属板及び/又はラミネート用金属ロールとの間に挟んだ状態で加熱、加圧し接着フィルムを平滑化する。機械としては、熱盤式プレス機や加熱加圧式ラミネーター等市販の積層機を使用することができる。図1に金属板での簡単な模式図を、図2に金属ロールでの簡単な模式図を示す。平滑化に際しては、接着フィルムが真空積層された回路基板を保護用フィルム及び支持ベースフィルム側から常温固形の樹脂組成物を加熱、加圧する。真空積層での条件と同等以上の加熱、加圧条件でプレス及び/又はラミネートすることにより、該樹脂組成物層の支持ベースフィルムとの接触面を平滑化することができる。
【0011】
保護用フィルムはポリエチレン、ポリプロピレン等のポリオレフィン、ポリエチレンテレフタレート等のポリエステル、ポリカーボネート、さらには離型紙やアルミニウム箔の如き金属箔などが挙げられる。保護用フィルムは金属板及び/又は金属ロールが異物で傷付いたり、接着剤のシミだしによる汚れを防止する目的で使用するものであり、表面が平滑でその厚みは5〜100μmの範囲が好ましい。
【0012】
本発明の接着フィルムの真空積層法は、
1)回路基板のパターン部より大きい面積を有する耐熱ゴムを介して、支持ベースフィルム側より加熱及び加圧し、接着フィルムを支持ベースフィルム/該樹脂組成物層/回路基板のパターン部の順に真空積層する第1工程及び
2)接着フィルムが真空積層された該回路基板の支持ベースフィルム上に、プレス用金属板又はラミネート用金属ロールを載置し、加熱及び加圧し接着フィルムを平滑化する第2工程があり、第1工程で真空状態にしたままで第2工程に進行することもできる。また、接着フィルムが真空積層された該回路基板を第1工程と第2工程の間に一度大気中に取り出すこともある。この様な場合、第2工程では、再度真空状態にして行うか、また真空状態にせずそのまま大気状態下で行うことができる。これらの場合、マッド処理及び/又はエンボス加工を有する支持ベースフィルム又は/及び保護用フィルムは有効である。支持ベースフィルムと保護用フィルムの接触面の内、少なくとも一方がマッド処理及び/又はエンボス加工されていると、保護用フィルムと支持ベースフィルム間の空気抜けがよく平滑化工程の生産性が向上する。また、保護用フィルムは複数枚重ねて使用することもできる。
【0013】
本発明に用いる接着フィルムをパターン加工された回路基板上に真空積層する方法は、ビルドアップ用層間接着フィルムとして使用した場合に限定されるものではなく、熱流動性を有する接着フィルム全般、例えばソルダーレジスト等のドライフィルムにも適用可能であることは言うまでもない。
【0014】
【実施例】
以下実施例を示して本発明を具体的に説明するが、本発明はこれに限定されるものではない。
【0015】
【接着フィルム製造例】
液状ビスフェノールA型エポキシ樹脂(油化シェルエポキシ(株)製エピコート828EL)20部、臭素化ビスフェノールA型エポキシ樹脂(東都化成(株)製YDBー500)20部、クレゾールノボラック型エポキシ樹脂(エポキシ当量215、軟化点78℃、大日本インキ化学(株)製エピクロンNー673)20部、末端エポキシ化ポリブタジエンゴム(ナガセ化成工業(株)製デナレックスR−45EPT)15部とをMEKに攪拌しながら加熱溶解させ、そこへ臭素化フェノキシ樹脂ワニス(不揮発分40重量%、臭素含有量25重量%、溶剤組成、キシレン:メトキシプロパノール:メチルエチルケトン=5:2:8、東都化成(株)製YPBー40ーPXM40)50部、エポキシ硬化剤として2、4ージアミノー6ー(2ーメチルー1ーイミダゾリルエチル)ー1、3、5ートリアジン・イソシアヌル酸付加物4部、さらに微粉砕シリカ2部、三酸化アンチモン4部、炭酸カルシウム5部を添加し樹脂組成物ワニスを作製した。そのワニスを厚さ25μmのポリエチレンテレフタレートフィルム上に、乾燥後の樹脂厚みが70μmとなるようにダイコーターにて塗布、80〜120℃で乾燥した後、幅507mmにスリットしロール状接着フィルムを得た。
【0016】
【比較実施例1】
パターン加工された510x340mmのガラスエポキシ内層回路基板に(導体厚35μm)、製造例で得られたロール状接着フィルムを、ソマール(株)製オートカットラミネーターを使用して幅507x336mmのサイズで基板両面に枚葉した。条件は仮付け部分の温度70℃、5秒圧着、ラミネートロールは室温、荷重無しで行った。次にモートン・インターナショナル・インコーポレーティド製バキューム・アプリケータ725により温度80℃、6秒プレスで両面同時にラミネートした。室温付近まで放冷した後ポリエチレンテレフタレートフィルムを剥離し、ライン/スペース=320/320μm上の接着剤表面を(株)東京精密製表面粗さ測定器にて測定したところ、最大高さ8μmであった。
【0017】
【比較実施例2】
製造例で得られたロール状接着フィルムを、大成ラミネーター(株)製真空ラミネーターの両基材ロールにセットし、パターン加工された510x340mmのガラスエポキシ内層回路基板(導体厚35μm)を横長に投入し、温度120℃、圧力3kg/cm、30cm/分で両面同時にラミネートした。接着フィルムをカット後ポリエチレンテレフタレートフィルムを剥離し、ライン/スペース=320/320μm上の接着剤表面を表面粗さ測定器にて測定したところ、最大高さ6μmであった。
【0018】
【実施例1】
比較実施例1と全く同様に、パターン加工された510x340mmのガラスエポキシ内層回路基板(導体厚35μm)に接着フィルムをラミネートした。その後、熱盤式プレス機にて両金属面に保護用フィルムとして幅600mm、厚さ15μmの両面マッド処理ポリプロピレンフィルム(最大高さ3.5μm)をセットした状態で、プレス用金属面の中央付近に該基板を投入し、温度90℃、圧5kg/cm2、20秒プレスした。室温付近まで放冷した後ポリエチレンテレフタレートフィルムを剥離し、ライン/スペース=320/320μm上の接着剤表面を表面粗さ測定器にて測定したところ、最大高さは2μm未満であった。
【0019】
【実施例2】
比較実施例2と全く同様に、パターン加工された510x340mmのガラスエポキシ内層回路基板(導体厚35μm)に接着フィルムをラミネートした。その後クロムメッキ金属ロール式ラミネーターの両基材ロールに保護用フィルムとして幅600mm、厚さ25μmの両面マッド処理ポリエチレンテレフタレートフィルム(最大高さ5μm)をセットした状態で、保護用フィルムの中央付近から該基板を投入し、温度135℃、圧力3kg/cm、50cm/分で平滑化処理した。室温付近まで放冷した後ポリエチレンテレフタレートフィルムを剥離し、ライン/スペース=320/320μm上の接着剤表面を表面粗さ測定器にて測定したところ、最大高さは2μm未満であった。
【0020】
比較実施例1乃至2の結果より、市販の真空積層機を用いて従来通りに接着フィルムを積層していたのでは、接着剤の表面平滑性に限界があった。実施例1、2の結果から明らかなように、本発明の方法に従えば熱流動性を有する接着フィルムを、非常に平滑な状態で積層することが可能である。
【0021】
【発明の効果】
本発明の方法に従うと、熱流動性を有する接着フィルムを非常に優れた表面平滑性を持った状態で、簡便に積層することが可能である。
【図面の簡単な説明】
【図1】接着フィルムが真空積層された該回路基板上に、該接着フィルムよりも大きい保護用フィルムをプレス用金属板との間に挟んだ状態で加熱、加圧し接着フィルムを平滑化する簡単な模式図を示す。
【図2】接着フィルムが真空積層された該回路基板上に、該接着フィルムよりも大きい保護用フィルムをラミネート用金属ロールとの間に挟んだ状態で加熱、加圧し接着フィルムを平滑化する簡単な模式図を示す。
【符号の説明】
1 プレス用金属板
2 マッド処理後及び/又はエンボス加工された保護フィルム
3 接着フィルムが真空積層された内層回路基板
4 ラミネート用金属ロール
[0001]
[Industrial application fields]
The present invention relates to a method for vacuum-laminating a film adhesive on an inner layer circuit pattern in a method for manufacturing a multilayer printed wiring board of a build-up system in which conductor circuit layers and insulating layers are alternately stacked.
[0002]
[Prior art]
2. Description of the Related Art In recent years, attention has been paid to a build-up type multilayer printed wiring board manufacturing technique in which organic insulating layers are alternately stacked on a conductor layer of an inner circuit board. In JP-A-8-64960, an undercoat adhesive is applied, and after temporary drying, a film-like additive adhesive is bonded and heat-cured, roughened with an alkaline oxidizing agent, and a conductor layer is formed by plating to produce a multilayer printed wiring board. How to do is known. In addition, in the Japanese Patent Application No. Hei 9-357420, the present inventors can simultaneously coat the inner layer circuit pattern and fill the resin in the surface via hole and / or through hole at the same time, and an interlayer adhesive film for a multilayer printed wiring board, and The manufacturing method of the multilayer printed wiring board using this is disclosed. When this adhesive film is laminated with heat-resistant rubber under vacuum under heat and pressure conditions, it is excellent in embedding of the adhesive into the inner layer circuit and has the advantage of excellent productivity because it does not require an undercoating process. Due to the characteristic of following the inner layer circuit, the adhesive has irregularities along the circuit pattern and the surface smoothness is deteriorated, which causes a problem in the subsequent component mounting process.
[0003]
[Problems to be solved by the invention]
In view of the above problems, the present inventors have formed an adhesive film comprising a support base film and a heat-flowable, room-temperature solid resin composition layer laminated on the surface of the support base film and the surface thereof, as an inner layer circuit of a circuit board. In the method of vacuum laminating on a pattern, the object is to develop a vacuum laminating method excellent in surface smoothness of the contact surface of the film-like adhesive layer which is the resin composition layer with the support base film.
[0004]
[Means for Solving the Problems]
The present invention provides a heating and pressurizing condition on a patterned circuit board of an adhesive film comprising a support base film and a heat-flowable, room-temperature solid resin composition layer laminated on the surface thereof. In the manufacturing method of the multilayer printed wiring board that is vacuum laminated under,
1) via the resistance heat rubber, heat and pressure than the supporting base film side, higher engineering you vacuum laminating an adhesive film and 2) said vacuum subsequently emptied stack to process, press the metal from the supporting base film side heating and pressurizing have use a plate, to perform a more Engineering you smooth the resin composition layer surface in contact with the supporting base film, in the step of further smoothing the resin composition layer surface, to the support base film after the surface smoothness of the larger area than the adhesive film that the placing of the protective film, the resin composition surface in contact with the heating and pressing the support base film using a pressing metal plate from the top of the protective film smoothness A method for producing a multilayer printed wiring board .
[0005]
DETAILED DESCRIPTION OF THE INVENTION
The adhesive film used in the present invention is a resin composition which is a heat fluidity, solid at room temperature by applying a resin varnish dissolved in a predetermined organic solvent using a support base film as a support and then drying the solvent by heating and / or hot air blowing. The layer can be prepared by a known and conventional method. The adhesive film is stored as it is or by further laminating a release film on the other surface of the resin composition, and wound into a roll.
[0006]
The heat fluidity and room temperature solid resin composition includes a thermosetting resin and / or a polymer as a main component, and is a resin composition that is softened by heating and has a film-forming ability, and further heat-cured. There is no particular limitation as long as it satisfies the characteristics required for the interlayer insulating material such as heat resistance and electrical characteristics. For example, an epoxy resin system, an acrylic resin system, a polyimide resin system, a polyamideimide resin system, a polycyanate resin system, a polyester resin system, a thermosetting polyphenylene ether resin system, and the like can be used. An adhesive film layer having a multilayer structure can also be used. Among these, an epoxy resin composition described in Japanese Patent Application No. 9-357420 is preferable in an epoxy resin system having excellent reliability and cost as an interlayer insulating material.
[0007]
The resin composition layer is formed by laminating a resin composition of heat fluidity and room temperature solid on the support base film. The thickness of the resin composition layer is equal to or greater than the conductor thickness of the laminated inner circuit board, and the conductor thickness + (10 to 120) μm. Generally, it is in the range.
[0008]
Examples of the supporting base film include polyolefins such as polyethylene and polyvinyl chloride, polyesters such as polyethylene terephthalate, polycarbonate, and metal foils such as release paper, copper foil, and aluminum foil. The thickness of the support base film is generally 10 to 150 μm. The support film may be subjected to a mold release treatment in addition to the mud treatment and the corona treatment.
[0009]
A vacuum applicator manufactured by Nichigo-Morton Co., Ltd. is used to heat and press the heat-resistant rubber from the support base film side of the adhesive film and vacuum laminate the resin composition layer of the adhesive film on the circuit board. Commercially available vacuum laminating machines such as a vacuum pressurizing laminator manufactured by Meiko Seisakusho and a vacuum laminator manufactured by Taisei Laminator Co., Ltd. can be used. These machines generally have a structure in which heat-resistant rubber is sandwiched between them. When laminating, a circuit board in which the adhesive film is preliminarily sheeted with the same area size as the circuit board is put in, and the heat fluidity, room temperature solid resin composition layer is heated and pressed from the support base film side to laminate. Alternatively, in a state where the roll-shaped adhesive film is set on the base roll of a vacuum laminator, the heat fluidity, room temperature solid resin composition layer is heated and pressed from the support base film side, and then cut to a predetermined size. By laminating under the condition that the resin flow during laminating is equal to or greater than the conductor thickness of the inner layer circuit, the inner layer circuit pattern is covered well, but the heat resistant rubber is flexible and follows the uneven shape of the conductor of the inner layer circuit. Although the heat fluidity and room temperature solid resin composition layer and the circuit board are in close contact with each other, the surface smoothness of the contact surface of the resin composition layer with the support base film is impaired.
[0010]
In order to solve this problem, the circuit board on which the adhesive film is vacuum-laminated is sandwiched between a protective film having a larger area than the adhesive film and a metal plate for pressing and / or a metal roll for laminating. Heat and press at to smooth the adhesive film. As the machine, a commercially available laminating machine such as a hot plate press or a heating and pressurizing laminator can be used. FIG. 1 shows a simple schematic diagram with a metal plate, and FIG. 2 shows a simple schematic diagram with a metal roll. At the time of smoothing, the circuit board on which the adhesive film is vacuum-laminated is heated and pressurized with a room-temperature solid resin composition from the protective film and support base film side. By pressing and / or laminating under the heating and pressurizing conditions equivalent to or higher than the conditions in vacuum lamination, the contact surface of the resin composition layer with the support base film can be smoothed.
[0011]
Examples of the protective film include polyolefin such as polyethylene and polypropylene, polyester such as polyethylene terephthalate, polycarbonate, and metal foil such as release paper and aluminum foil. The protective film is used for the purpose of preventing the metal plate and / or the metal roll from being damaged by a foreign substance or preventing the stain due to the stain of the adhesive, and the surface is smooth and the thickness is preferably in the range of 5 to 100 μm. .
[0012]
The vacuum lamination method of the adhesive film of the present invention is
1) Heat and pressure are applied from the support base film side through a heat-resistant rubber having a larger area than the pattern part of the circuit board, and the adhesive film is vacuum laminated in the order of support base film / the resin composition layer / pattern part of the circuit board. The first step and 2) placing the pressing metal plate or laminating metal roll on the support base film of the circuit board on which the adhesive film is vacuum-laminated, and heating and pressurizing to smooth the adhesive film. There is a process, and it is possible to proceed to the second process while keeping the vacuum state in the first process. Further, the circuit board on which the adhesive film is vacuum-laminated may be taken out into the atmosphere once between the first step and the second step. In such a case, the second step can be performed again in a vacuum state, or can be performed in an atmospheric state without being in a vacuum state. In these cases, a supporting base film or / and a protective film having a mud treatment and / or embossing is effective. When at least one of the contact surfaces of the support base film and the protective film is mud-treated and / or embossed, air is easily removed between the protective film and the support base film, and the productivity of the smoothing process is improved. . Also, a plurality of protective films can be used in a stacked manner.
[0013]
The method of vacuum laminating the adhesive film used in the present invention on the patterned circuit board is not limited to the case where the adhesive film is used as an interlayer adhesive film for build-up. Needless to say, the present invention can also be applied to a dry film such as a resist.
[0014]
【Example】
EXAMPLES Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited thereto.
[0015]
[Example of adhesive film production]
20 parts of liquid bisphenol A type epoxy resin (Epicoat 828EL manufactured by Yuka Shell Epoxy Co., Ltd.), 20 parts of brominated bisphenol A type epoxy resin (YDB-500 manufactured by Toto Kasei Co., Ltd.), cresol novolac type epoxy resin (epoxy equivalent) 215, softening point 78 ° C., Dainippon Ink Chemical Co., Ltd. Epiklon N-673) 20 parts, terminal epoxidized polybutadiene rubber (Nagase Kasei Kogyo Co., Ltd. Denarex R-45EPT) 15 parts while stirring in MEK Heat-dissolved, brominated phenoxy resin varnish (non-volatile content 40% by weight, bromine content 25% by weight, solvent composition, xylene: methoxypropanol: methyl ethyl ketone = 5: 2: 8, YPB-40 manufactured by Toto Kasei Co., Ltd. -PXM40) 50 parts, 2,4-diamino-6- ( -Methyl-1 over imidazolylethyl) over 1,3,5 chromatography triazine isocyanuric acid adduct 4 parts finely divided silica, 2 parts of antimony trioxide 4 parts, to produce the added resin composition varnish and 5 parts of calcium carbonate. The varnish was coated on a 25 μm thick polyethylene terephthalate film with a die coater so that the resin thickness after drying was 70 μm, dried at 80 to 120 ° C., and then slit to a width of 507 mm to obtain a roll-shaped adhesive film. It was.
[0016]
[Comparative Example 1]
On the patterned glass epoxy inner layer circuit board of 510x340mm (conductor thickness 35μm), roll-like adhesive film obtained in the production example is used on both sides of the board with the size of 507x336mm in width using the auto cut laminator made by Somaru It was a sheet. The conditions were as follows: the temperature at the temporary attachment part was 70 ° C. and the pressure was applied for 5 seconds, and the laminate roll was at room temperature and no load. Next, both sides were laminated simultaneously with a vacuum applicator 725 manufactured by Morton International Inc. at a temperature of 80 ° C. for 6 seconds. After cooling to near room temperature, the polyethylene terephthalate film was peeled off, and the adhesive surface on the line / space = 320/320 μm was measured with a surface roughness measuring instrument manufactured by Tokyo Seimitsu Co., Ltd., and the maximum height was 8 μm. It was.
[0017]
[Comparative Example 2]
The roll-shaped adhesive film obtained in the production example was set on both base rolls of a vacuum laminator manufactured by Taisei Laminator Co., Ltd., and a patterned 510 × 340 mm glass epoxy inner layer circuit board (conductor thickness 35 μm) was introduced horizontally. The two surfaces were laminated simultaneously at a temperature of 120 ° C., a pressure of 3 kg / cm, and 30 cm / min. After cutting the adhesive film, the polyethylene terephthalate film was peeled off, and when the surface of the adhesive on line / space = 320/320 μm was measured with a surface roughness measuring instrument, the maximum height was 6 μm.
[0018]
[Example 1]
Just as in Comparative Example 1, an adhesive film was laminated on a patterned 510 × 340 mm glass epoxy inner layer circuit board (conductor thickness 35 μm). After that, with a hot-plate press, a double-sided mud-treated polypropylene film (maximum height of 3.5 μm) with a width of 600 mm and a thickness of 15 μm is set as a protective film on both metal surfaces. The substrate was put in and pressed at a temperature of 90 ° C. and a pressure of 5 kg / cm 2 for 20 seconds. After cooling to near room temperature, the polyethylene terephthalate film was peeled off, and when the surface of the adhesive on line / space = 320/320 μm was measured with a surface roughness meter, the maximum height was less than 2 μm.
[0019]
[Example 2]
Just as in Comparative Example 2, an adhesive film was laminated to a patterned 510 × 340 mm glass epoxy inner layer circuit board (conductor thickness 35 μm). Thereafter, a double-sided mud-treated polyethylene terephthalate film (maximum height of 5 μm) having a width of 600 mm and a thickness of 25 μm is set as a protective film on both base rolls of a chrome-plated metal roll laminator, and the protective film is placed from the vicinity of the center. The substrate was put in and smoothed at a temperature of 135 ° C., a pressure of 3 kg / cm, and 50 cm / min. After cooling to near room temperature, the polyethylene terephthalate film was peeled off, and when the surface of the adhesive on line / space = 320/320 μm was measured with a surface roughness meter, the maximum height was less than 2 μm.
[0020]
From the results of Comparative Examples 1 and 2, when the adhesive film was laminated as usual using a commercially available vacuum laminator, the surface smoothness of the adhesive was limited. As is clear from the results of Examples 1 and 2, the adhesive film having heat fluidity can be laminated in a very smooth state according to the method of the present invention.
[0021]
【The invention's effect】
According to the method of the present invention, an adhesive film having heat fluidity can be easily laminated in a state having very excellent surface smoothness.
[Brief description of the drawings]
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a simple process for smoothing an adhesive film by heating and pressing a protective film larger than the adhesive film between press circuit plates on the circuit board on which the adhesive film is vacuum laminated. A schematic diagram is shown.
[Fig. 2] A simple method of smoothing an adhesive film by heating and pressurizing a protective film larger than the adhesive film between the circuit board on which the adhesive film is vacuum laminated and sandwiched between metal rolls for lamination. A schematic diagram is shown.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Metal plate for press 2 Protective film 3 after mud treatment and / or embossing 3 Inner layer circuit board on which adhesive film is vacuum laminated 4 Metal roll for laminating

Claims (3)

支持ベースフィルムとその表面に積層された熱流動性、常温固形の樹脂組成物層からなる接着フィルムの該樹脂組成物層を回路基板上に加熱及び加圧条件下真空積層する多層プリント配線板の製造法において、
)耐熱ゴムを介して、支持ベースフィルム側より加熱及び加圧し、接着フィルムを回路基板上に真空積層する工
及び
2)該支持ベースフィルムからプレス用金属板を用いて加熱及び加圧し、支持ベースフィルムに接する樹脂組成物層表面を平滑化する工程を行うことを特徴とする多層プリント配線板の製造法。
Supporting base film and the thermal fluidity laminated on the surface, the multilayer printed wiring board to heat and pressure conditions vacuum laminating the resin composition layer of the adhesive film comprising the resin composition layer of the solid state at room temperature to circuitry on the board In the manufacturing method of
1) via the resistance heat rubber, heat and pressure than the supporting base film side, Engineering more and 2 you vacuum laminating an adhesive film on the circuit board) and have use the press metal plate from the support base film side heating and pressure method for producing a multilayer printed wiring board and performing as engineering you smooth the resin composition layer surface in contact with the supporting base film.
前記樹脂組成物層を平滑化する工程は、前記接着フィルムよりも大きい面積の表面平滑な保護フィルムをプレス用金属板との間に挟んだ状態で加熱及び加圧し、前記支持ベースフィルムに接する該樹脂組成物層表面を平滑化する工程であることを特徴とする請求項1記載の多層プリント配線板の製造方法 A step of smoothing the resin composition layer, said heating and pressing while sandwiched between the press metal plate surface smooth protective film of greater area than the adhesive film in contact with the supporting base film The method for producing a multilayer printed wiring board according to claim 1, which is a step of smoothing the surface of the resin composition layer. 前記支持ベースフィルムと前記保護用フィルムとの接触面の内、少なくとも一方の面がマッド処理及び/又はエンボス加工されていることを特徴とする請求項2記載の多層プリント配線板の製造方法 The support base film and of the contact surface between the protective film, at least one surface The process of claim 2 wherein the multi-layer printed wiring board, characterized by being mud treatment and / or embossing.
JP34371099A 1998-12-02 1999-12-02 Vacuum lamination method of adhesive film Expired - Lifetime JP3861537B2 (en)

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JP10-342413 1998-12-02
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JP4577613B2 (en) * 2005-06-22 2010-11-10 株式会社名機製作所 Lamination molding apparatus and lamination molding method for laminating a buildup substrate
CN101803483B (en) * 2007-09-11 2012-10-24 味之素株式会社 Process for producing multilayer printed wiring board
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