JPH0726361Y2 - 蒸着装置の基板反転機構 - Google Patents

蒸着装置の基板反転機構

Info

Publication number
JPH0726361Y2
JPH0726361Y2 JP3528489U JP3528489U JPH0726361Y2 JP H0726361 Y2 JPH0726361 Y2 JP H0726361Y2 JP 3528489 U JP3528489 U JP 3528489U JP 3528489 U JP3528489 U JP 3528489U JP H0726361 Y2 JPH0726361 Y2 JP H0726361Y2
Authority
JP
Japan
Prior art keywords
substrate
vapor deposition
rotation
jig
rotary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP3528489U
Other languages
English (en)
Japanese (ja)
Other versions
JPH02125968U (enrdf_load_stackoverflow
Inventor
勇人 天久
真一 山辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinmaywa Industries Ltd
Original Assignee
Shinmaywa Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinmaywa Industries Ltd filed Critical Shinmaywa Industries Ltd
Priority to JP3528489U priority Critical patent/JPH0726361Y2/ja
Publication of JPH02125968U publication Critical patent/JPH02125968U/ja
Application granted granted Critical
Publication of JPH0726361Y2 publication Critical patent/JPH0726361Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP3528489U 1989-03-27 1989-03-27 蒸着装置の基板反転機構 Expired - Lifetime JPH0726361Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3528489U JPH0726361Y2 (ja) 1989-03-27 1989-03-27 蒸着装置の基板反転機構

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3528489U JPH0726361Y2 (ja) 1989-03-27 1989-03-27 蒸着装置の基板反転機構

Publications (2)

Publication Number Publication Date
JPH02125968U JPH02125968U (enrdf_load_stackoverflow) 1990-10-17
JPH0726361Y2 true JPH0726361Y2 (ja) 1995-06-14

Family

ID=31540500

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3528489U Expired - Lifetime JPH0726361Y2 (ja) 1989-03-27 1989-03-27 蒸着装置の基板反転機構

Country Status (1)

Country Link
JP (1) JPH0726361Y2 (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006058473A (ja) * 2004-08-18 2006-03-02 Oyokoden Lab Co Ltd 誘電体多層膜フィルタ及びその製造方法
CN115216738A (zh) * 2022-07-20 2022-10-21 聚灿光电科技（宿迁）有限公司 一种可旋转镀环的镀锅机构及蒸镀机

Also Published As

Publication number Publication date
JPH02125968U (enrdf_load_stackoverflow) 1990-10-17

Similar Documents

Publication Publication Date Title
US4284033A (en) Means to orbit and rotate target wafers supported on planet member
US4222345A (en) Vacuum coating apparatus with rotary motion assembly
CN111206225B (zh) 3d蒸镀的公自转镀锅结构
JPH0726361Y2 (ja) 蒸着装置の基板反転機構
TWI664305B (zh) 3d蒸鍍之公自轉鍍鍋結構
JPH01184277A (ja) 基板回転装置
JPH11323550A (ja) 真空成膜装置用回転テーブル
JPH0382762A (ja) 基板の反転装置
CN110423993A (zh) 一种镀膜治具
JPH10287976A (ja) 真空成膜装置
JP3319813B2 (ja) Ｘ線装置用ゴニオメータ
JPH0526755Y2 (enrdf_load_stackoverflow)
JPH0925574A (ja) 基体保持装置
JPS6360275A (ja) スパツタリング装置
JPH0718757Y2 (ja) 蒸着装置用プラネタリ治具
JPH04165073A (ja) 真空蒸着装置用治具
JPH0765159B2 (ja) 真空蒸着装置
JPS63300857A (ja) 研摩装置
JPH07138756A (ja) 薄膜蒸着装置
JPH0226935Y2 (enrdf_load_stackoverflow)
JPH0238567A (ja) 真空蒸着装置のプラネタリ回転治具
JP4209576B2 (ja) 修正方法及び修正装置
JP2972866B2 (ja) 研磨装置
JPH0663106B2 (ja) 自公転装置
JPH11121596A (ja) 基板回転保持装置および回転式基板処理装置