JPH0725224Y2 - 蒸発気体定量取出装置 - Google Patents
蒸発気体定量取出装置Info
- Publication number
- JPH0725224Y2 JPH0725224Y2 JP1989019187U JP1918789U JPH0725224Y2 JP H0725224 Y2 JPH0725224 Y2 JP H0725224Y2 JP 1989019187 U JP1989019187 U JP 1989019187U JP 1918789 U JP1918789 U JP 1918789U JP H0725224 Y2 JPH0725224 Y2 JP H0725224Y2
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- liquid
- gas
- pipe
- sealed chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000605 extraction Methods 0.000 title claims description 10
- 239000002994 raw material Substances 0.000 claims description 88
- 239000007788 liquid Substances 0.000 claims description 74
- 239000007789 gas Substances 0.000 claims description 32
- 238000010438 heat treatment Methods 0.000 claims description 21
- 239000011261 inert gas Substances 0.000 claims description 7
- 238000001704 evaporation Methods 0.000 claims description 2
- 230000008020 evaporation Effects 0.000 claims description 2
- 239000011344 liquid material Substances 0.000 claims description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 21
- 239000004065 semiconductor Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 8
- 239000012159 carrier gas Substances 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 230000005587 bubbling Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000008016 vaporization Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
Landscapes
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989019187U JPH0725224Y2 (ja) | 1989-02-20 | 1989-02-20 | 蒸発気体定量取出装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989019187U JPH0725224Y2 (ja) | 1989-02-20 | 1989-02-20 | 蒸発気体定量取出装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02112326U JPH02112326U (enrdf_load_stackoverflow) | 1990-09-07 |
JPH0725224Y2 true JPH0725224Y2 (ja) | 1995-06-07 |
Family
ID=31234479
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1989019187U Expired - Lifetime JPH0725224Y2 (ja) | 1989-02-20 | 1989-02-20 | 蒸発気体定量取出装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0725224Y2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7457522B2 (ja) * | 2020-02-20 | 2024-03-28 | 株式会社堀場エステック | 気化システム |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5264047A (en) * | 1975-11-21 | 1977-05-27 | Hitachi Zosen Corp | Method of heat exchange |
JPS5645748U (enrdf_load_stackoverflow) * | 1979-09-18 | 1981-04-24 | ||
JPS6044702A (ja) * | 1983-08-19 | 1985-03-09 | 新菱冷熱工業株式会社 | 表面気化による蒸気発生方法およびその装置 |
JPS61254286A (ja) * | 1985-05-01 | 1986-11-12 | Seiichi Tan | 純粋蒸気又は高純度蒸溜水の小型製造装置 |
-
1989
- 1989-02-20 JP JP1989019187U patent/JPH0725224Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH02112326U (enrdf_load_stackoverflow) | 1990-09-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |