JPH07176595A - Board conveyer - Google Patents
Board conveyerInfo
- Publication number
- JPH07176595A JPH07176595A JP5345149A JP34514993A JPH07176595A JP H07176595 A JPH07176595 A JP H07176595A JP 5345149 A JP5345149 A JP 5345149A JP 34514993 A JP34514993 A JP 34514993A JP H07176595 A JPH07176595 A JP H07176595A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- cassette
- arm
- support
- pressing member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、半導体ウエハ、フォト
マスク用のガラス基板、液晶表示装置用のガラス基板、
光ディスク用の基板などの基板を、カセットから取り出
して支持し、各種の処理装置や測定装置などに搬送する
ために使用する基板搬送装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor wafer, a glass substrate for a photomask, a glass substrate for a liquid crystal display device,
The present invention relates to a substrate transfer device used to transfer a substrate such as a substrate for an optical disk from a cassette, support it, and transfer it to various processing devices, measuring devices, and the like.
【0002】[0002]
【従来の技術】この種の基板搬送装置としては、従来一
般に、基板を載置支持するアームに真空吸着孔を設け、
基板を真空吸着によって保持するものがあったが、その
真空吸着の吸着面が基板に密着するために基板の裏面に
パーティクルが付着する問題があった。そのため、真空
吸着によらずに基板を保持できるように構成することが
考えられ、従来、実公平3−18435号公報に開示さ
れているものが知られている。2. Description of the Related Art As a substrate transfer apparatus of this type, generally, a vacuum suction hole is provided in an arm for mounting and supporting a substrate,
Some substrates hold the substrate by vacuum suction, but there is a problem that particles adhere to the back surface of the substrate because the suction surface of the vacuum suction adheres to the substrate. Therefore, it is conceivable that the substrate can be held without using vacuum suction, and the one disclosed in Japanese Utility Model Publication No. 3-18435 is conventionally known.
【0003】この従来例によれば、一対のグリッパーそ
れぞれの先端に固定の第1の押え部が設けられ、一方、
他方のグリッパーがプッシュロッドによって進退自在
に、かつ、スプリングによって押圧力を付与可能な状態
で設けられ、そのグリッパーに第2の押え部が設けら
れ、基板の外周面に2つの第1の押え部と第2の押え部
とを接触させるとともに、スプリングによって与えられ
る接触圧力により、基板を3点で支持する状態で保持
し、基板の表裏両面に接触しない状態で位置決めして基
板を保持することにより、塵埃の付着を回避するように
構成されている。According to this conventional example, a fixed first pressing portion is provided at the tip of each of the pair of grippers, while
The other gripper is provided so that it can be moved back and forth by a push rod and a pressing force can be applied by a spring, the gripper is provided with a second pressing portion, and the two first pressing portions are provided on the outer peripheral surface of the substrate. And the second pressing portion are brought into contact with each other, and the substrate is held in a state of being supported at three points by the contact pressure given by the spring, and the substrate is held by being positioned so as not to contact both front and back surfaces of the substrate. It is configured to avoid the adhesion of dust.
【0004】また、本願出願人が、先に提案した、発塵
によるパーティクルの付着を極力抑制できながら位置決
め状態で基板を支持できるようにした技術もある(特願
平5−95293号)。There is also a technique proposed by the applicant of the present application to support the substrate in a positioned state while suppressing the adhesion of particles due to dust generation as much as possible (Japanese Patent Application No. 5-95293).
【0005】この提案例では、互いに対向してその対向
間隔を変更可能に支持部材を配置し、この支持部材それ
ぞれに、基板の外周縁側の底面を載置支持する底面支持
体と、基板の外周面に当接して基板の底面に沿った方向
の位置を規制する外縁支持体とを備えさせ、かつ、両支
持部材の対向間隔を調整するときに、外縁支持体が基板
に対して所定の遊びを持って作用するように構成し、基
板の外周面に外縁支持体が作用するときに、慣性力と基
板下面での摩擦力とに抗して移動させられるだけのわず
かな力で済むようにして、基板外周面との当接による発
塵を回避するように構成している。また、搬送の最中に
おいても、基板の外周面と外縁支持体との間の遊びによ
り基板の外周面に大きな力を加えないようにして発塵を
回避するように構成している。In this proposed example, support members are arranged so as to be opposed to each other so that the distance between the support members can be changed, and a bottom surface support for mounting and supporting the bottom surface of the substrate on the outer peripheral edge side and an outer periphery of the substrate are arranged on the support members. An outer edge support body that contacts the surface and regulates the position in the direction along the bottom surface of the substrate, and when adjusting the facing interval between both support members, the outer edge support body plays a predetermined play with respect to the substrate. So that when the outer edge support acts on the outer peripheral surface of the substrate, only a small force that can be moved against the inertial force and the frictional force on the lower surface of the substrate is sufficient. It is configured to avoid dust generation due to contact with the outer peripheral surface of the substrate. Further, even during the conveyance, the play between the outer peripheral surface of the substrate and the outer edge support does not apply a large force to the outer peripheral surface of the substrate to avoid dust generation.
【0006】[0006]
【発明が解決しようとする課題】しかしながら、基板を
上下方向に多段に収容したカセットでは、カセット搬送
時の振動などに起因して、基板の一部が傾いた姿勢で収
容され、それに起因して基板の取り出し側、即ち、カセ
ットの開口側で上下に隣接した基板間の隙間が小さくな
っている場合があり、このようなカセットから基板を取
り出すときに、上述のような従来例や提案例のもので
は、その基板の下部の空間が狭い場合に、厚みのある押
え部や外縁支持体を基板の下方に挿入しづらかったり、
挿入できなかったりするなど、実用上未だ改善の余地が
あった。However, in a cassette in which substrates are stored in multiple stages in the vertical direction, a part of the substrates is accommodated in an inclined posture due to vibrations during cassette transport, which causes There is a case where the space between the vertically adjacent substrates on the substrate take-out side, that is, the opening side of the cassette is small. However, if the space under the board is narrow, it is difficult to insert a thick presser section or outer edge support below the board,
There was still room for improvement in practical use, such as when it could not be inserted.
【0007】本発明は、このような事情に鑑みてなされ
たものであって、カセット内への基板の収容姿勢のいか
んにかかわらず、基板の下方にアームを容易に挿入で
き、かつアーム上で位置決めした状態で基板を取り出す
ことができるようにすることを目的とする。The present invention has been made in view of the above circumstances, and the arm can be easily inserted under the substrate regardless of the accommodation posture of the substrate in the cassette, and the arm can be easily attached on the arm. The object is to enable the substrate to be taken out in a positioned state.
【0008】[0008]
【課題を解決するための手段】本発明の基板搬送装置
は、上述のような目的を達成するために、基板を支持す
る基板支持アームを水平方向および上下方向に移動可能
に設け、基板支持アームをカセット内に収容されている
基板間に挿入して基板を上昇させ、その下方の基板との
間隙を大にした状態で間隙内に挿入する副アームを水平
方向に移動可能に設け、副アームの先端に基板の端面に
押圧する押圧部材を設けるとともに、その押圧部材の厚
みを前記間隙よりも小に構成したことを特徴としてい
る。In order to achieve the above-mentioned object, a substrate transfer apparatus of the present invention is provided with a substrate support arm that supports a substrate so as to be movable in horizontal and vertical directions. Is inserted between the substrates housed in the cassette to raise the substrate, and a sub-arm that is inserted into the gap with the gap below the substrate being enlarged is provided so as to be movable in the horizontal direction. A pressing member that presses against the end face of the substrate is provided at the tip of, and the thickness of the pressing member is smaller than the gap.
【0009】[0009]
【作用】本発明の基板搬送装置の構成によれば、カセッ
ト内に収容され、かつ、これから取り出そうとする基板
の取り出し側端部の下方に基板支持アームを水平方向へ
の移動により挿入し、次いで、上方への移動により基板
を上昇させ、その基板と下方の基板との間隙を大にし、
その大きくした間隙内に副アームを挿入し、基板支持ア
ームを下降するなどにより押圧部材を基板の端面に作用
可能な位置にし、副アームを挿入方向とは反対側に移動
することにより、押圧部材で基板の端面を押圧しながら
カセットから基板を取り出すことができる。According to the structure of the substrate transfer apparatus of the present invention, the substrate support arm is horizontally moved and inserted below the take-out side end of the substrate to be taken out from the cassette, and the substrate is then moved. , By moving upward, raise the substrate, widen the gap between the substrate and the lower substrate,
The sub-arm is inserted into the enlarged gap, the substrate support arm is lowered to bring the pressing member to a position where it can act on the end surface of the substrate, and the sub-arm is moved to the side opposite to the insertion direction, thereby pressing the pressing member. The substrate can be taken out from the cassette while pressing the end face of the substrate.
【0010】[0010]
【実施例】次に、本発明の実施例を図面に基づいて詳細
に説明する。Embodiments of the present invention will now be described in detail with reference to the drawings.
【0011】図1は本発明に係る第1実施例の基板搬送
装置を用いた基板処理装置を示す全体概略斜視図であ
る。FIG. 1 is an overall schematic perspective view showing a substrate processing apparatus using a substrate transfer apparatus according to a first embodiment of the present invention.
【0012】基板処理装置は、半導体ウエハ等の円弧状
の外周面を有する基板Wに対してフォトレジスト液を塗
布処理するとともに乾燥処理するための装置であり、大
きく分けて、未処理基板や処理済み基板を保管する部分
(以下、インデクサーモジュールと称する)1と、基板
Wを処理する基板処理部2とから構成されている。The substrate processing apparatus is an apparatus for applying a photoresist solution to a substrate W having an arc-shaped outer peripheral surface such as a semiconductor wafer and performing a drying process. It is composed of a portion (hereinafter, referred to as an indexer module) 1 for storing the used substrate and a substrate processing unit 2 for processing the substrate W.
【0013】インデクサーモジュール1は、固定の基台
3上に一列状態に載置された4個のカセットC…と、そ
れらのカセットC…に対して基板Wを搬入・搬出する基
板搬送装置4とよりなる。インデクサーモジュール1と
基板処理部2との間での基板Wの受け渡しは、所定の基
板受渡し位置Pにおいて、基板搬送装置4と基板処理部
2の基板搬送手段10(後述する)との間で行われる。
基板搬送装置4は、基板処理部2へ搬送すべき基板Wを
カセットCから取り出して基板受渡し位置Pへ搬送し、
また基板受渡し位置Pで基板搬送手段10から受け取っ
た基板Wを搬送してカセットCへ収納する。The indexer module 1 includes four cassettes C ... Mounted in a line on a fixed base 3, and a substrate transfer device 4 for loading / unloading substrates W into / from these cassettes C. And consists of. The substrate W is transferred between the indexer module 1 and the substrate processing section 2 at a predetermined substrate transfer position P between the substrate transfer device 4 and the substrate transfer means 10 (described later) of the substrate processing section 2. Done.
The substrate transfer device 4 takes out the substrate W to be transferred to the substrate processing section 2 from the cassette C and transfers it to the substrate delivery position P,
At the substrate transfer position P, the substrate W received from the substrate transfer means 10 is transferred and stored in the cassette C.
【0014】前記カセットC…それぞれの側壁には、上
下に所定の間隔で複数の基板支持溝(後述する)が形成
され、各溝に1枚の基板Wを挿入して、基板Wを上下方
向に多段に収納できるようになっている。A plurality of substrate supporting grooves (to be described later) are formed on the respective side walls of the cassette C at upper and lower sides at predetermined intervals, and one substrate W is inserted into each groove to vertically move the substrate W. It can be stored in multiple stages.
【0015】基板処理部2は、例えば、 120℃などの所
定温度で基板Wを加熱処理して水分などを除去する第1
の基板加熱ユニット5と、その下方に設けられて加熱処
理後の基板Wを、例えば、23℃などの所定温度まで冷却
して常温に戻す第1の基板除熱ユニット6と、基板Wを
保持して回転させながらその表面にフォトレジスト液を
塗布する基板回転式フォトレジスト処理ユニット7と、
フォトレジスト液を塗布した基板Wを、例えば、 100℃
などの所定温度で基板Wを加熱処理して溶剤成分を揮発
させ、フォトレジスト膜を基板Wに密着させる第2の基
板加熱ユニット8と、その下方に設けられて加熱処理後
の基板Wを、例えば、23℃などの所定温度まで冷却して
常温に戻す第2の基板除熱ユニット9とを備えて構成さ
れている。The substrate processing unit 2 heats the substrate W at a predetermined temperature such as 120 ° C. to remove water and the like.
The substrate heating unit 5 and the first substrate heat removal unit 6 provided below the substrate heating unit 5 for cooling the substrate W after the heat treatment to a predetermined temperature such as 23 ° C. and returning the temperature to room temperature, and holding the substrate W. A substrate rotation type photoresist processing unit 7 for applying a photoresist solution to the surface of the substrate while rotating the substrate;
The substrate W coated with the photoresist solution is, for example, 100 ° C.
A second substrate heating unit 8 that heats the substrate W at a predetermined temperature such as to volatilize the solvent component to bring the photoresist film into close contact with the substrate W, and the substrate W after the heat treatment that is provided below the second substrate heating unit 8. For example, it is provided with a second substrate heat removal unit 9 that is cooled to a predetermined temperature such as 23 ° C. and returned to room temperature.
【0016】また、基板処理部2には基板搬送手段10
が備えられ、基板受渡し位置Pから給排される基板W
を、第1および第2基板加熱ユニット5,8、第1およ
び第2基板除熱ユニット6,9、基板回転式フォトレジ
スト処理ユニット7それぞれの間で任意の順序で搬入・
搬出するように構成されている。Further, the substrate transfer means 10 is provided in the substrate processing section 2.
And a substrate W which is provided and discharged from the substrate transfer position P.
Are carried in between the first and second substrate heating units 5 and 8, the first and second substrate heat removal units 6 and 9, and the substrate rotating photoresist processing unit 7 in any order.
It is configured to be shipped.
【0017】基板搬送装置4において、図2の斜視図に
示すように、基台3に固定される取付台11に、第1の
電動モータ12によって正逆転される第1のネジ軸13
と第1のガイド14とによって水平方向に移動可能に第
1の支持台15が設けられている。この第1の支持台1
5の移動方向は、基台3上に載置されたカセットCの列
に沿った方向である。In the substrate transfer device 4, as shown in the perspective view of FIG. 2, a first screw shaft 13 that is normally and reversely rotated by a first electric motor 12 is attached to a mounting base 11 fixed to a base 3.
A first support 15 is provided so as to be horizontally movable by the first guide 14 and the first guide 14. This first support 1
The moving direction of 5 is a direction along the row of the cassettes C mounted on the base 3.
【0018】第1の支持台15に、第2の電動モータ1
6によって正逆転される第2のネジ軸17と第2のガイ
ド18とによって上下方向に移動可能に第2の支持台1
9が設けられている。The second electric motor 1 is mounted on the first support base 15.
The second support base 1 is movable up and down by the second screw shaft 17 and the second guide 18 which are rotated in the forward and reverse directions by 6.
9 is provided.
【0019】第2の支持台19に、正逆転可能な第3の
電動モータ20によって往復移動可能な第1のベルト2
1と第3のガイド22,22とによって、前記第1の支
持台15の移動方向に直交する水平方向に移動可能に、
基板Wを水平姿勢で支持する基板支持アーム23,23
が設けられている。A first belt 2 reciprocally movable on a second support 19 by a third electric motor 20 capable of forward and reverse rotation.
By the first and third guides 22, 22, it is possible to move in the horizontal direction orthogonal to the moving direction of the first support base 15,
Substrate support arms 23, 23 for supporting the substrate W in a horizontal posture
Is provided.
【0020】基板支持アーム23は薄い板状部材で構成
され、その基板支持アーム23の基端側上面に、平面視
で円弧状のガイド面Fを有する位置決めガイド24が、
そのガイド面Fを基板支持アーム23の先端側に向けて
一体的に設けられている。The substrate support arm 23 is composed of a thin plate member, and a positioning guide 24 having an arc-shaped guide surface F in a plan view is provided on the upper surface of the substrate support arm 23 at the base end side.
The guide surface F is integrally provided so as to face the front end side of the substrate support arm 23.
【0021】また、第2の支持台19に、正逆転可能な
第4の電動モータ25によって往復移動可能な第2のベ
ルト26と第4のガイド27,27とによって、前記一
対の基板支持アーム23,23間で前記第1の支持台1
5の移動方向に直交する水平方向に移動可能にエアシリ
ンダ28が設けられ、そのエアシリンダ28によって昇
降可能に副アーム29が設けられるとともに、その副ア
ーム29の先端上面に、カセットC内に収容された基板
Wの奥側外周端面に作用して基板Wを押圧する押圧部材
30が設けられている。Further, the pair of substrate support arms is provided on the second support base 19 by the second belt 26 reciprocally movable by the fourth electric motor 25 capable of forward and reverse rotation and the fourth guides 27, 27. The first support base 1 between 23 and 23
5, an air cylinder 28 is provided so as to be movable in the horizontal direction orthogonal to the moving direction of 5, and a sub arm 29 is provided so as to be able to move up and down by the air cylinder 28, and is housed in the cassette C on the upper end surface of the sub arm 29. A pressing member 30 that acts on the outer peripheral end surface of the back side of the substrate W to press the substrate W is provided.
【0022】次に、以上の構成による基板搬送装置4を
用いてカセットCから所定の基板Wを取り出す動作につ
き、図面に基づいて説明する。先ず、図3の(a)の平
面図、および、図3の(b)の側面図に示すように、基
板支持アーム23および副アーム29を所定のカセット
Cの前まで移動させてから、基板支持アーム23を所定
の高さまで上昇させ、その後に、図4の(a)の平面
図、および、図4の(b)の側面図に示すように、基板
支持アーム23をカセットC側に移動して取り出そうと
する基板Wの下方に挿入する。Next, the operation of taking out a predetermined substrate W from the cassette C using the substrate transfer device 4 having the above-mentioned structure will be described with reference to the drawings. First, as shown in the plan view of FIG. 3A and the side view of FIG. 3B, the substrate support arm 23 and the sub arm 29 are moved to the front of a predetermined cassette C, and then the substrate is moved. The support arm 23 is lifted to a predetermined height, and then the substrate support arm 23 is moved to the cassette C side as shown in the plan view of FIG. 4A and the side view of FIG. Then, it is inserted below the substrate W to be taken out.
【0023】基板支持アーム23を所定位置まで挿入し
た後、第2の電動モータ16を駆動して第2の支持台1
9を上昇させ、基板支持アーム23を上昇させて、基板
WをカセットCの基板支持溝(後述する)の上面から持
ち上げ、取り出そうとする基板Wとそれよりも下方の基
板W1との間隙Sを大にする。しかる後に、図5の
(a)の平面図、および、図5の(b)の側面図に示す
ように、その大にした間隙内に副アーム29を挿入す
る。After inserting the substrate support arm 23 to a predetermined position, the second electric motor 16 is driven to drive the second support base 1.
9 to raise the substrate support arm 23 to raise the substrate W from the upper surface of a substrate support groove (described later) of the cassette C, and to set a gap S between the substrate W to be taken out and the substrate W1 below it. Make big Then, as shown in the plan view of FIG. 5A and the side view of FIG. 5B, the sub arm 29 is inserted into the enlarged gap.
【0024】その後、図6の(a)の平面図、および、
図6の(b)の側面図に示すように、エアシリンダ28
を伸長して副アーム29を上昇させ、押圧部材30を基
板Wの奥側外周端面に作用する位置まで上昇させてか
ら、第4の電動モータ25を駆動してその押圧部材30
をカセットCの基板取り出し側に移動して基板Wを押圧
し、その他方の外周端面を位置決めガイド24の円弧状
のガイド面Fに当接させて位置決めし、しかる後に、第
3および第4の電動モータ20,25を同調駆動し、押
圧部材30と位置決めガイド24とによって位置決めし
た状態で基板支持アーム23および副アーム29をカセ
ットC外に移動し、基板WをカセットCから取り出す。
位置決めガイド24のガイド面Fは基板Wの外周と一致
する円弧状の形状をしているので、基板Wは基板支持ア
ーム23の基端−先端方向だけでなく、それに直交する
方向でも所定位置に位置決めされる。なお、上述の押圧
部材30による位置決めを、基板Wの最大直径に対して
若干の遊びがある程度とすれば、基板Wに位置決めのた
めの力がかかり続けることはない。Then, the plan view of FIG. 6A and
As shown in the side view of FIG. 6B, the air cylinder 28
Is extended to raise the sub arm 29 to raise the pressing member 30 to a position where it acts on the outer peripheral end surface of the substrate W, and then the fourth electric motor 25 is driven to drive the pressing member 30.
Is moved to the substrate taking-out side of the cassette C to press the substrate W, and the other outer peripheral end face is brought into contact with the arc-shaped guide face F of the positioning guide 24 for positioning, and thereafter, the third and fourth The electric motors 20 and 25 are synchronously driven, and the substrate support arm 23 and the sub arm 29 are moved out of the cassette C while being positioned by the pressing member 30 and the positioning guide 24, and the substrate W is taken out from the cassette C.
Since the guide surface F of the positioning guide 24 has an arcuate shape that matches the outer periphery of the substrate W, the substrate W is located at a predetermined position not only in the base end-tip direction of the substrate support arm 23 but also in the direction orthogonal thereto. Positioned. It should be noted that if the positioning by the pressing member 30 described above has some play with respect to the maximum diameter of the substrate W, the force for positioning is not continuously applied to the substrate W.
【0025】カセットCから取り出した後には、基板支
持アーム23を基板受渡し位置Pに移動して基板搬送手
段10に基板Wを受け渡す。基板受渡し位置Pからカセ
ットCに基板Wを搬送して収容する場合は、押圧部材3
0を下方側に移動させた状態で、基板受渡し位置Pにお
いて基板搬送手段10から基板支持アーム23に基板W
を受け取り、その後、副アーム29を上昇させ、続いて
基板支持アーム23の基端側に移動させて、押圧部材3
0と位置決めガイド24のガイド面Fによって基板Wの
位置決めを行う。その後、基板支持アーム23、副アー
ム29を所定のカセットCの前に移動させ、第3および
第4の電動モータ20,25を同調駆動して基板支持ア
ーム23、副アーム29をカセットC内に挿入し、基板
Wを基板支持溝(後述する)の支持面から離間した高さ
に挿入する。そして、基板Wを基板支持アーム23によ
ってその高さに支持し、その下側の基板との間を広く保
った状態で、第4の電動モータ25を駆動して押圧部材
30を基板外周端面から離間させ、続いてエアシリンダ
28を短縮させるよう作動して副アーム29、押圧部材
30を下降させ、さらに第4の電動モータ25を駆動し
てそれらをカセットC外へ移動させる。副アーム29、
押圧部材30をカセットC外へ移動させた後、第2の電
動モータ16を駆動して基板支持アーム23を下降さ
せ、基板Wを基板支持アーム23からカセットCの基板
支持溝の支持面の上に受け渡しし、しかる後に第3の電
動モータ20を駆動して基板支持アーム23をカセット
C外に移動させる。After being taken out from the cassette C, the substrate support arm 23 is moved to the substrate transfer position P to transfer the substrate W to the substrate transfer means 10. When the substrate W is transferred from the substrate transfer position P to the cassette C and accommodated therein, the pressing member 3 is used.
0 in the downward direction, the substrate W is transferred from the substrate transfer means 10 to the substrate support arm 23 at the substrate transfer position P.
And then the sub-arm 29 is lifted and then moved to the base end side of the substrate support arm 23 to push the pressing member 3
The substrate W is positioned by 0 and the guide surface F of the positioning guide 24. After that, the substrate support arm 23 and the sub arm 29 are moved in front of the predetermined cassette C, and the third and fourth electric motors 20 and 25 are synchronously driven to move the substrate support arm 23 and the sub arm 29 into the cassette C. Then, the substrate W is inserted at a height apart from the supporting surface of the substrate supporting groove (described later). Then, the substrate W is supported by the substrate support arm 23 at that height, and the fourth electric motor 25 is driven to keep the pressing member 30 from the substrate outer peripheral end surface while keeping a wide space between the substrate W and the substrate therebelow. Then, the sub-arm 29 and the pressing member 30 are moved downward by moving the air cylinder 28 away from the cassette C, and the fourth electric motor 25 is driven to move them outside the cassette C. Sub arm 29,
After moving the pressing member 30 out of the cassette C, the second electric motor 16 is driven to lower the substrate support arm 23, and the substrate W is moved from the substrate support arm 23 onto the support surface of the substrate support groove of the cassette C. Then, the third electric motor 20 is driven to move the substrate support arm 23 to the outside of the cassette C.
【0026】図7は第2実施例の基板搬送装置を示す平
面図、そして、図8はその側面図であり、第1実施例と
異なるところは次の通りである。すなわち、第2の支持
台19上に、正逆転可能な第5の電動モータ32によっ
て往復移動可能な第3のベルト33と第5のガイド3
4,34とによって、前記第1の支持台15の移動方向
に直交する水平方向に移動可能に基板支持アーム23の
支持部材35が設けられ、この支持部材35に、第6の
電動モータ36によって正逆転される第3のネジ軸37
と第6のガイド38とによって、一対の基板支持アーム
23,23間で前記第1の支持台15の移動方向に直交
する水平方向に移動可能にエアシリンダ39が設けら
れ、そのエアシリンダ39によって昇降可能に副アーム
29が設けられるとともに、その副アーム29の先端
に、カセットC内に収容された基板Wの奥側外周端面に
作用して押圧する押圧部材30が設けられている。他の
構成ならびに動作は第1実施例と同じであり、その説明
は省略する。FIG. 7 is a plan view showing a substrate transfer device according to the second embodiment, and FIG. 8 is a side view thereof. The differences from the first embodiment are as follows. That is, the third belt 33 and the fifth guide 3 which can be reciprocally moved by the fifth electric motor 32 capable of rotating in the forward and reverse directions are provided on the second support base 19.
4 and 34, a support member 35 of the substrate support arm 23 is provided so as to be movable in the horizontal direction orthogonal to the moving direction of the first support base 15. The support member 35 is provided with a sixth electric motor 36. The third screw shaft 37 that is rotated in the normal direction
And a sixth guide 38, an air cylinder 39 is provided between the pair of substrate supporting arms 23, 23 so as to be movable in a horizontal direction orthogonal to the moving direction of the first supporting base 15, and by the air cylinder 39. A sub-arm 29 is provided so as to be able to move up and down, and a pressing member 30 is provided at the tip of the sub-arm 29 to act on and press the back side outer peripheral end surface of the substrate W accommodated in the cassette C. Other configurations and operations are the same as those in the first embodiment, and the description thereof will be omitted.
【0027】この第2実施例による場合、押圧部材30
により、位置決めガイド24との間で基板Wを位置決め
支持した後、第5の電動モータ32を駆動するだけで、
第1実施例におけるような2個の第3および第4の電動
モータ20,25の同調駆動を不要にできる利点があ
る。In the case of this second embodiment, the pressing member 30
Thus, after the substrate W is positioned and supported between the positioning guide 24 and the fifth electric motor 32,
There is an advantage that the synchronized driving of the two third and fourth electric motors 20 and 25 as in the first embodiment can be eliminated.
【0028】上述第1および第2実施例による場合、カ
セットCの基板Wの取り出し方向に直交する水平方向に
一対の基板支持アーム23,23を設け、それらの基板
支持アーム23,23間に位置するように、先端に押圧
部材30を備えた副アーム29を設けているため、オリ
エンテーションフラットを備えた基板WをカセットCか
ら取り出す場合に一層好適に使用できる利点を有してい
る。In the case of the first and second embodiments described above, a pair of substrate support arms 23, 23 are provided in the horizontal direction orthogonal to the direction of taking out the substrate W from the cassette C, and the substrate support arms 23, 23 are positioned between them. As described above, since the sub arm 29 having the pressing member 30 at the tip thereof is provided, there is an advantage that it can be used more suitably when the substrate W having the orientation flat is taken out from the cassette C.
【0029】すなわち、基板支持溝31,31に挿入さ
れて支持された基板Wにおいて、そのオリエンテーショ
ンフラット部分と円弧状の外周面との交点部分が基板支
持溝31に点接触状態で支持されたような場合に、基板
Wの取り出し側の前縁が下方に位置するように傾斜し、
図9の(a)に二点鎖線で示すように、基板Wとその下
方の基板W1との間隙Sが中央側で狭くなる。このよう
な場合でも、先ず、図9の(a)に示すように、カセッ
トCの中央部分における間隙S1よりも広い、基板支持
溝31,31に近い側の間隙S2の箇所で基板支持アー
ム23,23それぞれを挿入することができるのであ
る。その後、図9の(b)に示すように、基板支持アー
ム23,23を上昇して基板Wを持ち上げ、その下方の
間隙Sを広くしてから、押圧部材30を先端に備えた副
アーム29を挿入し、しかる後、図9の(c)に示すよ
うに、押圧部材30を基板Wの奥側外周端面に作用する
位置まで副アーム29を上昇させ、押圧部材30を作用
させて基板WをカセットCから取り出すことができる。
したがって、基板支持アーム23を基板支持溝31,3
1間の中央側に挿入する場合に比べて、基板Wと干渉せ
ずに基板支持アーム23を挿入しやすい利点があり、し
かも、基板Wを持ち上げた状態で副アーム29を挿入す
るので、先端に基板Wを位置決めできるほどの厚みを有
する押圧部材30が取り付けられた副アーム29を円滑
に挿入することができる。なお、図9において、基板W
は視点から見て手前側の端縁のみを描いてある。That is, in the substrate W inserted into and supported by the substrate supporting grooves 31, 31, the intersection of the orientation flat portion and the arcuate outer peripheral surface is supported by the substrate supporting groove 31 in a point contact state. In this case, the front edge on the take-out side of the substrate W is inclined so that it is located below,
As shown by the chain double-dashed line in FIG. 9A, the gap S between the substrate W and the substrate W1 below it becomes narrower on the central side. Even in such a case, first, as shown in (a) of FIG. 9, the substrate support arm 23 is first located at a gap S2 that is wider than the gap S1 in the central portion of the cassette C and is closer to the substrate support grooves 31 and 31. , 23 can be inserted respectively. After that, as shown in FIG. 9B, the substrate support arms 23, 23 are raised to raise the substrate W, and the gap S below the substrate W is widened, and then the sub arm 29 having the pressing member 30 at the tip thereof. Then, as shown in FIG. 9C, the sub arm 29 is raised to a position where the pressing member 30 acts on the inner peripheral surface of the back side of the substrate W, and the pressing member 30 is acted to act the substrate W. Can be removed from the cassette C.
Therefore, the substrate support arm 23 is attached to the substrate support grooves 31, 3
As compared with the case of inserting the substrate supporting arm 23 in the center side between the first and second substrates, there is an advantage that the substrate supporting arm 23 can be easily inserted without interfering with the substrate W. Moreover, since the sub arm 29 is inserted while the substrate W is being lifted, It is possible to smoothly insert the sub arm 29 to which the pressing member 30 having a thickness enough to position the substrate W is attached. In FIG. 9, the substrate W
Shows only the front edge from the viewpoint.
【0030】前記押圧部材30の厚みとしては、前述し
たように、基板Wの取り出し側端部を持ち上げて間隙S
を広くしたときに、その下方の基板W1が傾斜していた
としても、その基板W1に干渉せずに間隙S内に挿入で
きるように、下方の基板W1の最大傾斜状態を勘案して
間隙Sの最小量よりも小に設定すれば良い。As for the thickness of the pressing member 30, as described above, the end portion on the take-out side of the substrate W is lifted to form the gap S.
Even if the lower substrate W1 is tilted when the width is widened, the gap S can be inserted in consideration of the maximum tilt state of the lower substrate W1 so that the substrate W1 can be inserted into the gap S without interfering with the substrate W1. It should be set smaller than the minimum amount of.
【0031】上記実施例では、位置決めガイド24を基
板支持アーム23に一体的に設けているが、本発明とし
ては、位置決めガイド24を基板支持アーム23とは別
体で設け、基板支持アーム23だけをカセットCに挿脱
させ、カセットCから取り出した位置において、押圧部
材30の押圧により摺動移動した基板Wを受け止めて位
置決めできるように設けるものでも良い。In the above embodiment, the positioning guide 24 is provided integrally with the substrate support arm 23. However, according to the present invention, the positioning guide 24 is provided separately from the substrate support arm 23, and only the substrate support arm 23 is provided. It may be provided so that the substrate W slidably moved by the pressing of the pressing member 30 can be received and positioned at a position where the substrate is inserted into and removed from the cassette C and taken out from the cassette C.
【0032】上記実施例では、基板支持アーム23,2
3および副アーム29に基板Wを載置支持するように構
成しているが、本発明としては、次のような構成を採用
しても良い。 (1)基板支持アーム23によっては基板Wの取り出し
側前端部のみを持ち上げ、副アーム29に基板Wを載置
支持する。 (2)基板支持アーム23のみで基板Wを載置支持す
る。In the above embodiment, the substrate supporting arms 23, 2
Although the substrate W is mounted and supported on the third arm 3 and the sub arm 29, the following structure may be adopted as the present invention. (1) Depending on the substrate support arm 23, only the front end of the substrate W on the take-out side is lifted, and the substrate W is placed and supported on the sub arm 29. (2) The substrate W is placed and supported only by the substrate support arm 23.
【0033】本発明は、ノッチやオリエンテーションフ
ラットを備えた円弧状の外周面を有する円形基板に限ら
ず、角型基板にも適用でき、その場合、位置決めガイド
24によって角型基板の角部を受け止めるように、その
ガイド面Fを直角形状に構成すれば良い。The present invention can be applied not only to a circular substrate having an arcuate outer peripheral surface having a notch or an orientation flat, but also to a rectangular substrate. In this case, the positioning guide 24 receives the corner portion of the rectangular substrate. Thus, the guide surface F may be formed in a right angle shape.
【0034】[0034]
【発明の効果】以上説明したように、本発明の基板搬送
装置によれば、カセット内に振動などによって傾斜姿勢
で基板が収容され、その基板の取り出し側において、取
り出そうとする基板の下方の空間が狭くなっていても、
基板支持アームによってこれから取り出そうとする基板
の取り出し側端部を上昇させて下方の基板との間隙を大
にし、その大きくした間隙内にアームを挿入し、押圧部
材で基板の端面を押圧しながらカセットから基板を取り
出すから、カセット内への基板の収容姿勢のいかんにか
かわらず、基板の下方にアームを容易に挿入でき、しか
も基板をアーム上で位置決めした状態で取り出すことが
できる。また、このために、各種の処理装置のカセット
載置部などにカセットを搬入するときに、基板の姿勢が
水平になるように調整したりせずに済み、その取り扱い
が容易で処理効率を向上できる。As described above, according to the substrate transfer apparatus of the present invention, a substrate is accommodated in a cassette in an inclined posture due to vibration or the like, and a space below the substrate to be taken out on the take-out side of the substrate. Even if the
The substrate support arm raises the take-out side end of the substrate to be taken out to widen the gap with the lower substrate, inserts the arm into the enlarged gap, and presses the end face of the substrate with the pressing member while cassette Since the substrate is taken out from the substrate, the arm can be easily inserted below the substrate, and the substrate can be taken out in a state of being positioned on the arm, regardless of the attitude of housing the substrate in the cassette. For this reason, when the cassette is carried into the cassette placement part of various processing devices, it is not necessary to adjust the substrate posture so that it is horizontal, and its handling is easy and processing efficiency is improved. it can.
【図1】本発明に係る第1実施例の基板搬送装置を用い
た基板処理装置を示す全体概略斜視図である。FIG. 1 is an overall schematic perspective view showing a substrate processing apparatus using a substrate transfer apparatus according to a first embodiment of the present invention.
【図2】基板搬送装置の斜視図である。FIG. 2 is a perspective view of a substrate transfer device.
【図3】動作説明に供する図であり、(a)は平面図、
(b)は側面図である。FIG. 3 is a diagram for explaining the operation, (a) is a plan view,
(B) is a side view.
【図4】動作説明に供する図であり、(a)は平面図、
(b)は側面図である。FIG. 4 is a diagram for explaining the operation, (a) is a plan view,
(B) is a side view.
【図5】動作説明に供する図であり、(a)は平面図、
(b)は側面図である。FIG. 5 is a diagram for explaining the operation, (a) is a plan view,
(B) is a side view.
【図6】動作説明に供する図であり、(a)は平面図、
(b)は側面図である。FIG. 6 is a diagram for explaining the operation, (a) is a plan view,
(B) is a side view.
【図7】第2実施例の平面図である。FIG. 7 is a plan view of the second embodiment.
【図8】図7の側面図である。FIG. 8 is a side view of FIG. 7.
【図9】動作説明に供する正面図である。FIG. 9 is a front view for explaining the operation.
4…基板搬送装置 23…基板支持アーム 29…副アーム 30…押圧部材 C…カセット S…間隙 W…基板 4 ... Substrate transfer device 23 ... Substrate support arm 29 ... Sub arm 30 ... Pressing member C ... Cassette S ... Gap W ... Substrate
Claims (1)
向および上下方向に移動可能に設け、前記基板支持アー
ムをカセット内に収容されている前記基板間に挿入して
前記基板を上昇させ、その下方の基板との間隙を大にし
た状態で前記間隙内に挿入する副アームを水平方向に移
動可能に設け、前記副アームの先端に前記基板の端面に
押圧する押圧部材を設けるとともに、前記押圧部材の厚
みを前記間隙よりも小に構成したことを特徴とする基板
搬送装置。1. A substrate support arm for supporting a substrate is provided so as to be movable in a horizontal direction and a vertical direction, and the substrate support arm is inserted between the substrates accommodated in a cassette to raise the substrate, and A sub-arm that is inserted into the gap is provided so as to be movable in the horizontal direction with a large gap between the lower substrate and a pushing member that pushes the end face of the substrate at the tip of the sub-arm. A substrate transfer device, wherein the thickness of the member is smaller than the gap.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5345149A JP2801140B2 (en) | 1993-12-20 | 1993-12-20 | Substrate transfer device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5345149A JP2801140B2 (en) | 1993-12-20 | 1993-12-20 | Substrate transfer device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH07176595A true JPH07176595A (en) | 1995-07-14 |
JP2801140B2 JP2801140B2 (en) | 1998-09-21 |
Family
ID=18374617
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5345149A Expired - Fee Related JP2801140B2 (en) | 1993-12-20 | 1993-12-20 | Substrate transfer device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2801140B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002251791A (en) * | 2001-02-23 | 2002-09-06 | Orient Sokki Computer Kk | Disk transfer tray for disk printing |
CN100462292C (en) * | 2006-02-06 | 2009-02-18 | 友达光电股份有限公司 | Conveyer |
JP2016175159A (en) * | 2015-03-20 | 2016-10-06 | リンテック株式会社 | Transport device and transport method |
CN114284191A (en) * | 2022-03-02 | 2022-04-05 | 华芯半导体研究院(北京)有限公司 | Film box, bearing device, taking and placing device and semiconductor processing equipment |
-
1993
- 1993-12-20 JP JP5345149A patent/JP2801140B2/en not_active Expired - Fee Related
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002251791A (en) * | 2001-02-23 | 2002-09-06 | Orient Sokki Computer Kk | Disk transfer tray for disk printing |
CN100462292C (en) * | 2006-02-06 | 2009-02-18 | 友达光电股份有限公司 | Conveyer |
JP2016175159A (en) * | 2015-03-20 | 2016-10-06 | リンテック株式会社 | Transport device and transport method |
CN114284191A (en) * | 2022-03-02 | 2022-04-05 | 华芯半导体研究院(北京)有限公司 | Film box, bearing device, taking and placing device and semiconductor processing equipment |
CN114284191B (en) * | 2022-03-02 | 2022-08-02 | 华芯半导体研究院(北京)有限公司 | Film box, bearing device, taking and placing device and semiconductor processing equipment |
Also Published As
Publication number | Publication date |
---|---|
JP2801140B2 (en) | 1998-09-21 |
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