JPH0699538A - Copper-plated laminated board and manufacture thereof - Google Patents

Copper-plated laminated board and manufacture thereof

Info

Publication number
JPH0699538A
JPH0699538A JP4251157A JP25115792A JPH0699538A JP H0699538 A JPH0699538 A JP H0699538A JP 4251157 A JP4251157 A JP 4251157A JP 25115792 A JP25115792 A JP 25115792A JP H0699538 A JPH0699538 A JP H0699538A
Authority
JP
Japan
Prior art keywords
copper
clad laminate
ceramic layer
weight
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4251157A
Other languages
Japanese (ja)
Other versions
JP2894105B2 (en
Inventor
Tokuo Okano
徳雄 岡野
Masami Arai
正美 新井
Hiroshi Hasegawa
寛士 長谷川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP4251157A priority Critical patent/JP2894105B2/en
Publication of JPH0699538A publication Critical patent/JPH0699538A/en
Application granted granted Critical
Publication of JP2894105B2 publication Critical patent/JP2894105B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Laminated Bodies (AREA)
  • Coating By Spraying Or Casting (AREA)

Abstract

PURPOSE:To provide a copper-plated laminated board and a method for manufacturing the same having small thermal expansion coefficient and excellent connecting reliability to a chip component. CONSTITUTION:A copper-plated laminated board is formed by arranging a flame sprayed ceramic layer 3 between a glass fiber-reinforced plastic layer 1 having 35wt.% or less of resin content and a copper foil 2. A method for manufacturing the board comprises the steps of forming the ceramic layer by flame spraying one side surface of the foil, so laminating a prepreg as to be brought into contact with the ceramic layer, and thermally press-molding it.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、プリント配線板に用い
られる銅張積層板及びその製造法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a copper clad laminate used for printed wiring boards and a method for producing the same.

【0002】[0002]

【従来の技術】最近、電子機器の小型化、高密度化が進
むにつれて、使用される電子部品は従来のリード付部品
からチップ部品に移行してきており、そのためプリント
配線板への実装方式も表面実装方式が主流になりつつあ
る。これに伴い、プリント配線板として用いられる銅張
積層板に対する種々の要求も厳しくなってきている。即
ち、チップ部品をプリント配線板に表面実装する場合、
その接続信頼性の点から熱膨張係数の整合が問題にな
る。ところがプリント配線板として一般に広く用いられ
ているガラス布基材エポキシ樹脂銅張積層板などの繊維
強化プラスチック系の基板の熱膨張係数は、チップ部品
のそれに比べてかなり大きい。そのためにチップ部品を
表面実装した場合、実用に耐える接続信頼性を確保する
ことができない。チップ部品との接続信頼性を向上させ
るためには、よりチップ部品に近い熱膨張係数の基板、
即ち低熱膨張係数を有する基板が必要になってくる。
2. Description of the Related Art Recently, as electronic devices have become smaller and higher in density, the electronic parts used are shifting from conventional leaded parts to chip parts. Therefore, the mounting method on a printed wiring board is also on the surface. The mounting method is becoming mainstream. Along with this, various requirements for copper-clad laminates used as printed wiring boards have become strict. That is, when the chip parts are surface-mounted on the printed wiring board,
From the viewpoint of connection reliability, matching of the coefficient of thermal expansion becomes a problem. However, the coefficient of thermal expansion of a fiber-reinforced plastic substrate such as a glass cloth-based epoxy resin copper-clad laminate that is widely used as a printed wiring board is considerably larger than that of a chip component. Therefore, when the chip components are surface-mounted, it is not possible to secure practically reliable connection reliability. In order to improve the connection reliability with chip components, a substrate with a thermal expansion coefficient closer to that of chip components,
That is, a substrate having a low coefficient of thermal expansion is needed.

【0003】[0003]

【発明が解決しようとする課題】熱膨張係数が低い基板
材料としては、上記の有機系基板とは異なったアルミナ
や窒化アルミニウムなどのセラミック基板、インバーや
42合金などの低熱膨張金属をコアとして用いた金属コ
ア基板が利用されている。ところがこれらについて見る
と、セラミック基板は非常に硬質なため有機系基板と同
様なドリル加工や切断加工などの機械加工ができない、
大型の基板ができない、回路加工や多層化の工程が煩雑
でコスト高になるなどの欠点がある。また、低熱膨張金
属を芯にした金属コア基板は、重量が重く軽量化に対応
できない、スルーホール形成時に金属芯の穴内に絶縁被
覆を施す必要があるなどの欠点がある。従って、従来の
有機系基板で熱膨張係数の低い基板の開発が望まれてい
る。
As a substrate material having a low coefficient of thermal expansion, a ceramic substrate such as alumina or aluminum nitride, which is different from the above organic substrates, or a low thermal expansion metal such as Invar or 42 alloy is used as a core. Previously used metal core substrates have been utilized. However, looking at these, because the ceramic substrate is very hard, it cannot be machined like drilling and cutting like the organic substrate,
There are drawbacks such as the inability to form a large-sized substrate, the complicated circuit processing and multi-layer process, and the high cost. Further, the metal core substrate having a low thermal expansion metal as a core has a drawback that it is heavy and cannot be reduced in weight, and it is necessary to provide an insulating coating in the hole of the metal core when forming the through hole. Therefore, development of a conventional organic substrate having a low coefficient of thermal expansion is desired.

【0004】低熱膨張の有機系基板としては、以前から
芳香族ポリアミド繊維や石英繊維などの低熱膨張基材を
用いたものが開発されているが、機械加工性に難点があ
り、実用化には至っていない。また、有機系基板の低熱
膨張化の方法として、低樹脂分化が有効であることは知
られているが、低樹脂分化に伴って基板内部にボイドが
発生し易くなり、耐湿熱性が低下してしまう。そのた
め、従来は樹脂分が35重量%以下の基板は実用に耐え
られないものであった。本発明は、上記した問題点を解
決し、有機系基板をベースにして、従来の銅張積層板と
同様な取扱いが可能で、しかもチップ部品を表面実装し
た場合、その接続信頼性に優れる銅張積層板及びその製
造法を提供するものである。
As a low thermal expansion organic substrate, a substrate using a low thermal expansion base material such as aromatic polyamide fiber or quartz fiber has been developed for a long time, but it has a difficulty in machinability and cannot be put to practical use. I haven't arrived. Further, it is known that low resin differentiation is effective as a method for reducing the thermal expansion of the organic substrate, but voids are likely to occur inside the substrate due to the low resin differentiation, and the wet heat resistance decreases. I will end up. Therefore, conventionally, a substrate having a resin content of 35% by weight or less cannot be practically used. The present invention solves the above-mentioned problems, and based on an organic substrate, it can be handled in the same way as a conventional copper-clad laminate, and when a chip component is surface-mounted, it has excellent connection reliability. Provided is a laminated laminate and a method for producing the same.

【0005】[0005]

【課題を解決するための手段】本発明は、樹脂分が35
重量%以下のガラス繊維強化プラスチック層と銅箔との
間に溶射セラミック層を配した銅張積層板及び銅箔の片
面に溶射によりセラミック層を形成し、該セラミック層
と接するようにプリプレグを積層載置して熱圧成形する
銅張積層板の製造法に関する。
The present invention has a resin content of 35.
A copper clad laminate in which a thermal sprayed ceramic layer is placed between a glass fiber reinforced plastic layer of less than or equal to wt% and a copper foil, and a ceramic layer is formed by thermal spraying on one side of the copper foil, and a prepreg is laminated so as to contact the ceramic layer. The present invention relates to a method for manufacturing a copper clad laminate which is placed and thermocompression-molded.

【0006】ガラス繊維強化プラスチック層に使用する
ガラスは、一般の銅張積層板に広く使われているEガラ
ス繊維を用いてもよいが、SiO2、Al23及びMgOの
含有率がそれぞれ60重量%以上、20重量%以上及び
15重量%以下で、かつこれら3成分の合計が97重量
%以上であるSガラス繊維又はTガラス繊維がEガラス
繊維に比べて熱膨張係数が低く好適である。ガラス繊維
強化プラスチック層に使用する樹脂としては、エポキシ
樹脂、ポリイミド樹脂、フェノール樹脂、不飽和ポリエ
ステル樹脂、ビニルエステル樹脂、メラミン樹脂などの
熱硬化性樹脂又はフッソ樹脂、ポリエチレン、ポリプロ
ピレン、ポリエーテルエーテルケトン、ポリスルホン、
ポリフェニレンオキサイドなどの熱可塑性樹脂が用いら
れる。ガラス繊維強化プラスチック層の樹脂分を35重
量%以下とするのは、低樹脂分化によりガラス繊維強化
プラスチック層を低熱膨張化するためである。
The glass used for the glass fiber reinforced plastic layer may be E glass fiber which is widely used for general copper clad laminates, but the contents of SiO 2 , Al 2 O 3 and MgO are different from each other. S glass fiber or T glass fiber having a content of 60% by weight or more, 20% by weight or more and 15% by weight or less, and a total of these three components being 97% by weight or more has a lower coefficient of thermal expansion than E glass fiber and is suitable. is there. The resin used for the glass fiber reinforced plastic layer is a thermosetting resin such as epoxy resin, polyimide resin, phenol resin, unsaturated polyester resin, vinyl ester resin, melamine resin or fluorine resin, polyethylene, polypropylene, polyether ether ketone. , Polysulfone,
A thermoplastic resin such as polyphenylene oxide is used. The reason why the resin content of the glass fiber reinforced plastic layer is 35% by weight or less is to reduce the thermal expansion of the glass fiber reinforced plastic layer due to the low resin differentiation.

【0007】ガラス繊維強化プラスチック層と銅箔との
間に配する溶射セラミック層は、銅箔の片面にプラズマ
溶射やガス溶射によりセラミックを溶射して得られる。
その後、ガラス繊維の基材及び樹脂からなるプリプレグ
とセラミック溶射銅箔とを、プリプレグとセラミック層
とが接するようにして積層載置し、熱圧成形することに
より銅張積層板を得る。溶射するセラミックはアルミ
ナ、チタニア、ジルコニア、マグネシア、ムライト、ス
ピネル、ジルコン、コージェライト、ステアタイト、フ
ォルステライト、チタン酸アルミニウムなどの電気絶縁
性のセラミックを用いることが出来るが、その中でも熱
膨張係数の低いコージェライトが好適である。溶射セラ
ミック層の厚さは特に制限はないが、25〜300μm
の範囲が好ましい。溶射セラミック層の厚さが薄いと、
吸湿時の耐熱性や表面の平滑性が失われると共に、溶射
セラミック層による低熱膨張効果が発揮されない。ま
た、厚過ぎるとドリル加工性などの機械加工性が低下す
るためである。熱圧成形の方法には制限がない。
The thermal sprayed ceramic layer provided between the glass fiber reinforced plastic layer and the copper foil is obtained by thermal spraying the ceramic on one surface of the copper foil by plasma spraying or gas spraying.
Then, a prepreg made of a glass fiber base material and a resin and a ceramic sprayed copper foil are laminated and placed so that the prepreg and the ceramic layer are in contact with each other, and thermocompression molding is performed to obtain a copper clad laminate. As the ceramic to be sprayed, an electrically insulating ceramic such as alumina, titania, zirconia, magnesia, mullite, spinel, zircon, cordierite, steatite, forsterite, and aluminum titanate can be used. Low cordierite is preferred. The thickness of the sprayed ceramic layer is not particularly limited, but is 25 to 300 μm.
Is preferred. If the thickness of the sprayed ceramic layer is thin,
The heat resistance during moisture absorption and the smoothness of the surface are lost, and the low thermal expansion effect of the sprayed ceramic layer is not exhibited. Further, if it is too thick, the machinability such as drilling workability is deteriorated. There is no limitation on the method of hot pressing.

【0008】[0008]

【作用】ガラス繊維強化プラスチックの表面を覆ってい
る溶射セラミック層は5〜20体積%の気孔を有する
が、その気孔は樹脂で封孔されているため耐湿熱性が良
好で、かつ殆ど水を吸わない。従って内部のガラス繊維
強化プラスチック層へは水は殆ど浸入できない。そのた
め、ガラス繊維強化プラスチック層の樹脂分を低くし、
内部にボイドが発生し易くなって耐湿熱性が低下して
も、銅張積層板の銅箔エッチング後の耐湿熱性は、従来
の樹脂分が約40重量%の積層板と比較して同等以上に
なる。更に、溶射セラミック層は熱膨張係数が小さいた
め、ガラス繊維強化プラスチック層の低熱膨張化と相俟
って銅張積層板の低熱膨張化をもたらす。
The sprayed ceramic layer covering the surface of the glass fiber reinforced plastic has pores of 5 to 20% by volume. Since the pores are sealed with resin, the resistance to moisture and heat is good and almost no water is absorbed. Absent. Therefore, almost no water can penetrate into the glass fiber reinforced plastic layer inside. Therefore, lower the resin content of the glass fiber reinforced plastic layer,
Even if voids are more likely to occur inside and the moisture and heat resistance is reduced, the moisture and heat resistance of the copper clad laminate after copper foil etching is equal to or more than that of the conventional laminate having a resin content of about 40% by weight. Become. Further, since the thermal sprayed ceramic layer has a low coefficient of thermal expansion, the thermal expansion coefficient of the glass-clad laminated board is reduced in combination with the thermal expansion coefficient of the glass fiber reinforced plastic layer.

【0009】[0009]

【実施例】次に本発明の実施例を説明する。ガラス繊維
として熱膨張係数が2.5×10-6/℃のSガラス(S
iO265重量%、Al2323重量%及びMgO11重量
%を含有、3成分の合計は99重量%)を用いたガラス
布(日東紡績製、ガラスクロスWTA−116F)にエ
ポキシ樹脂を含浸して、エポキシ樹脂分25重量%のガ
ラス布基材エポキシ樹脂のプリプレグを用意した。ま
た、厚さ35μmの電解銅箔(古河サーキットフォイル
製、TSA−35)の片面にメテコ製9MB型プラズマ
溶射ガンによりコージェライトを溶射して、厚さ150
μmのコージェライトの層を形成したもの2枚を用意し
た。前記のプリプレグを9枚重ね、これを挾んで両側に
溶射コージェライト層を内側にしてセラミック溶射銅箔
をプレスの金型に積層載置し、温度170℃、圧力40
kgf/cm2の条件で熱圧成形して、図1に示すようにガラ
ス布基材エポキシ樹脂層1の両側に溶射コージェライト
層3が接触し、外側に銅箔2が配された板厚1.0mmの
銅張積層板を得た。この銅張積層板の熱膨張係数は8.
0×10-6/℃であり、表面実装型チップ部品の熱膨張
係数とほぼ等しくなった。また、この銅張積層板の銅箔
をエッチングにより除去し、2時間の吸湿処理(121
℃、2気圧、水蒸気中)をした後288℃の半田層に2
0秒浸漬した結果、全く異常は無かった。
EXAMPLES Examples of the present invention will be described below. S glass with a thermal expansion coefficient of 2.5 × 10 -6 / ° C as glass fiber (S
A glass cloth (glass cloth WTA-116F, made by Nitto Boseki Co., Ltd., glass cloth WTA-116F) containing 65% by weight of iO 2, 23% by weight of Al 2 O 3 and 11% by weight of MgO and containing 99% by weight of the three components is impregnated with an epoxy resin. Then, a prepreg of a glass cloth base epoxy resin having an epoxy resin content of 25% by weight was prepared. Further, cordierite was sprayed on one surface of a 35 μm thick electrolytic copper foil (TSA-35 made by Furukawa Circuit Foil) by a Meteco 9MB type plasma spray gun to give a thickness of 150.
Two sheets with a layer of cordierite having a thickness of μm were prepared. Nine sheets of the above prepregs were stacked, and the ceramic sprayed copper foil was laminated on the press mold with the sprayed cordierite layers on both sides, and the temperature was 170 ° C and the pressure was 40 ° C.
Thermal compression molding under the condition of kgf / cm 2 , and as shown in FIG. 1, the thickness of the glass cloth base material epoxy resin layer 1 with the thermal sprayed cordierite layer 3 in contact with the copper foil 2 on the outside. A 1.0 mm copper clad laminate was obtained. The thermal expansion coefficient of this copper clad laminate is 8.
It was 0 × 10 −6 / ° C., which was almost equal to the coefficient of thermal expansion of the surface mount type chip part. Further, the copper foil of this copper-clad laminate is removed by etching, and a moisture absorption treatment (121
℃, 2 atm, in water vapor) and then 288 ℃ solder layer 2
As a result of soaking for 0 second, there was no abnormality at all.

【0010】比較例として、セラミック層がない以外は
前記実施例と同じ条件で銅張積層板を得た。この銅張積
層板の熱膨張係数は10×10-6/℃であり、一般的な
樹脂分のガラス布基材エポキシ樹脂銅張積層板の熱膨張
係数である14〜17×10-6/℃よりは低いものの、
前記実施例のものには及ばない。また、この銅張積層板
の銅箔をエッチングにより除去し、30分の吸湿処理
(121℃、2気圧、水蒸気中)をした後288℃の半
田層に20秒浸漬したところ、全面にふくれが発生し
た。
As a comparative example, a copper clad laminate was obtained under the same conditions as in the above example except that no ceramic layer was provided. The coefficient of thermal expansion of this copper-clad laminate is 10 × 10 −6 / ° C., which is the coefficient of thermal expansion of a glass cloth base material epoxy resin copper-clad laminate having a general resin content of 14 to 17 × 10 −6 /. Although lower than ℃,
It does not reach that of the above-mentioned embodiment. Further, the copper foil of this copper-clad laminate was removed by etching, subjected to a moisture absorption treatment for 30 minutes (121 ° C., 2 atmospheric pressure, in steam), and then dipped in a solder layer at 288 ° C. for 20 seconds. Occurred.

【0011】[0011]

【発明の効果】本発明によれば、従来のものより熱膨張
係数の小さい銅張積層板が得られる。この銅張積層板は
表面実装用チップ部品との熱膨張差が小さいから、チッ
プ部品を実装した場合の接続信頼性を大幅に向上させる
ことができる。
According to the present invention, a copper clad laminate having a smaller coefficient of thermal expansion than the conventional one can be obtained. Since this copper-clad laminate has a small difference in thermal expansion from the surface mounting chip component, it is possible to greatly improve the connection reliability when the chip component is mounted.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例になる銅張積層板の断面図であ
る。
FIG. 1 is a sectional view of a copper clad laminate according to an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1…ガラス布基材エポキシ樹脂層、2…銅箔、3…溶射
コージェライト層
1 ... Glass cloth base epoxy resin layer, 2 ... Copper foil, 3 ... Thermal sprayed cordierite layer

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 樹脂分が35重量%以下のガラス繊維強
化プラスチック層と銅箔との間に溶射セラミック層を配
した銅張積層板。
1. A copper-clad laminate having a thermally sprayed ceramic layer between a glass fiber reinforced plastic layer having a resin content of 35% by weight or less and a copper foil.
【請求項2】 ガラス繊維強化プラスチック層のガラス
のSiO2、Al23及びMgOの含有率がそれぞれ60重
量%以上、20重量%以上及び15重量%以下で、かつ
これら3成分の合計が97重量%以上である請求項1記
載の銅張積層板。
2. The glass of the glass fiber reinforced plastic layer has a content of SiO 2 , Al 2 O 3 and MgO of 60% by weight or more, 20% by weight or more and 15% by weight or less, respectively, and the total of these three components is The copper-clad laminate according to claim 1, which is 97% by weight or more.
【請求項3】 ガラス繊維強化プラスチック層の樹脂が
エポキシ樹脂である請求項1記載の銅張積層板。
3. The copper-clad laminate according to claim 1, wherein the resin of the glass fiber reinforced plastic layer is an epoxy resin.
【請求項4】 溶射セラミック層のセラミックがコージ
ェライトを主体とするものである請求項1記載の銅張積
層板。
4. The copper-clad laminate according to claim 1, wherein the ceramic of the thermal sprayed ceramic layer is mainly composed of cordierite.
【請求項5】 銅箔の片面に溶射によりセラミック層を
形成し、該セラミック層と接するようにプリプレグを積
層載置して熱圧成形することを特徴とする請求項1〜4
記載の銅張積層板の製造法。
5. A ceramic layer is formed on one surface of a copper foil by thermal spraying, and a prepreg is laminated and placed so as to be in contact with the ceramic layer and thermocompression-molded.
A method for producing the copper-clad laminate described.
JP4251157A 1992-09-21 1992-09-21 Copper clad laminate and method for producing the same Expired - Lifetime JP2894105B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4251157A JP2894105B2 (en) 1992-09-21 1992-09-21 Copper clad laminate and method for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4251157A JP2894105B2 (en) 1992-09-21 1992-09-21 Copper clad laminate and method for producing the same

Publications (2)

Publication Number Publication Date
JPH0699538A true JPH0699538A (en) 1994-04-12
JP2894105B2 JP2894105B2 (en) 1999-05-24

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10939563B2 (en) 2016-09-27 2021-03-02 At&S Austria Technologie & Systemtechnik Aktiengesellschaft Flame retardant structure for component carrier

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10939563B2 (en) 2016-09-27 2021-03-02 At&S Austria Technologie & Systemtechnik Aktiengesellschaft Flame retardant structure for component carrier

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JP2894105B2 (en) 1999-05-24

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