JPH069488Y2 - 反応管終端の気密シ−ル部冷却装置 - Google Patents
反応管終端の気密シ−ル部冷却装置Info
- Publication number
- JPH069488Y2 JPH069488Y2 JP1985184520U JP18452085U JPH069488Y2 JP H069488 Y2 JPH069488 Y2 JP H069488Y2 JP 1985184520 U JP1985184520 U JP 1985184520U JP 18452085 U JP18452085 U JP 18452085U JP H069488 Y2 JPH069488 Y2 JP H069488Y2
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- rubber packing
- ring
- water
- cavity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985184520U JPH069488Y2 (ja) | 1985-12-02 | 1985-12-02 | 反応管終端の気密シ−ル部冷却装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985184520U JPH069488Y2 (ja) | 1985-12-02 | 1985-12-02 | 反応管終端の気密シ−ル部冷却装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6292635U JPS6292635U (enExample) | 1987-06-13 |
| JPH069488Y2 true JPH069488Y2 (ja) | 1994-03-09 |
Family
ID=31132274
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985184520U Expired - Lifetime JPH069488Y2 (ja) | 1985-12-02 | 1985-12-02 | 反応管終端の気密シ−ル部冷却装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH069488Y2 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2671979B2 (ja) * | 1986-05-30 | 1997-11-05 | 東京エレクトロン株式会社 | 加熱装置 |
-
1985
- 1985-12-02 JP JP1985184520U patent/JPH069488Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6292635U (enExample) | 1987-06-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR0175070B1 (ko) | 열처리장치 | |
| US6232580B1 (en) | Apparatus for uniform gas and radiant heat dispersion for solid state fabrication processes | |
| CN114540947A (zh) | 工艺腔室和半导体工艺设备 | |
| JP4268069B2 (ja) | 縦型熱処理装置 | |
| JP2005503003A (ja) | 集積回路用の急速熱処理システム | |
| US6566630B2 (en) | Thermal processing apparatus for introducing gas between a target object and a cooling unit for cooling the target object | |
| US6284051B1 (en) | Cooled window | |
| CN113053785B (zh) | 半导体加工设备 | |
| JPH04243123A (ja) | 半導体製造装置 | |
| WO2001080291A1 (en) | Methods and apparatus for thermally processing wafers | |
| JP3958931B2 (ja) | 急速熱処理(rtp)システムのための膨張可能なエラストマエレメント | |
| JP4063661B2 (ja) | 半導体製造装置及び半導体の製造法 | |
| US7381926B2 (en) | Removable heater | |
| JP3498811B2 (ja) | 縦型熱処理装置 | |
| JPH0222460A (ja) | マイクロ波透過性ウィンドウ組立体及びマイクロ波プラズマ発生装置、並びにそれらを用いたエッチング方法及び堆積膜形成法 | |
| JPH0982656A (ja) | 縦型熱処理装置 | |
| JPH0930893A (ja) | 気相成長装置 | |
| JPH0628258B2 (ja) | 半導体ウエハー加熱装置及びその製造方法 | |
| KR101016063B1 (ko) | 고온 퍼니스 | |
| US7785419B2 (en) | Epitaxial apparatus | |
| JP3325384B2 (ja) | 熱処理炉用温度測定装置 | |
| KR20010046221A (ko) | 저압 화학 기상 증착용 수평로의 플랜지 냉각 장치 | |
| JPH05206048A (ja) | ランプアニール装置 | |
| JPS62262420A (ja) | 半導体加熱用耐熱管のシ−ル方法 | |
| JP2686465B2 (ja) | 熱処理装置 |