JPH0686355U - Complementary metal-oxide semiconductor device - Google Patents

Complementary metal-oxide semiconductor device

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Publication number
JPH0686355U
JPH0686355U JP036605U JP3660593U JPH0686355U JP H0686355 U JPH0686355 U JP H0686355U JP 036605 U JP036605 U JP 036605U JP 3660593 U JP3660593 U JP 3660593U JP H0686355 U JPH0686355 U JP H0686355U
Authority
JP
Japan
Prior art keywords
transistor
diode
input terminal
full
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP036605U
Other languages
Japanese (ja)
Inventor
エル セイド メレイス ハナフィ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
AT&T Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AT&T Corp filed Critical AT&T Corp
Publication of JPH0686355U publication Critical patent/JPH0686355U/en
Pending legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • H01L27/092Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
    • H01L27/0927Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors comprising a P-well only in the substrate

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Rectifiers (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)

Abstract

(57)【要約】 【目的】 本考案は、相補型CMOS技術を用いた集積
回路デバイスに形成された全波整流器に関し、特に、従
来実現が困難であったCMOS全波整流器を提供するこ
とを目的とする。 【構成】 本件考案は、通常全波整流器に用いられる4
個のダイオードのうちの2個をNMOSトランジスタで
置き換え、当該トランジスタがダイオードスイッチとし
て機能するように接続して動作させることを特徴とし、
寄生トランジスタに起因する接地への短絡電流の問題を
解消することで、集積回路デバイスに形成された全波整
流器を提供することが可能となる。
(57) [Summary] [Object] The present invention relates to a full-wave rectifier formed in an integrated circuit device using complementary CMOS technology, and in particular, to provide a CMOS full-wave rectifier that has been difficult to realize in the past. To aim. [Structure] The present invention is commonly used in full-wave rectifiers.
Characterized in that two of the diodes are replaced by NMOS transistors, and the transistors are connected and operated so as to function as a diode switch.
By eliminating the problem of short circuit current to ground due to parasitic transistors, it is possible to provide a full wave rectifier formed in an integrated circuit device.

Description

【考案の詳細な説明】[Detailed description of the device]

【0001】[0001]

【本考案の分野】[Field of the Invention]

本考案は相補型金属−酸化物−半導体(CMOS)技術を用いた集積回路(I C)デバイスに形成された全波整流器に係る。 The present invention relates to a full-wave rectifier formed in an integrated circuit (IC) device using complementary metal-oxide-semiconductor (CMOS) technology.

【0002】[0002]

【本考案の背景】[Background of the invention]

CMOS全波整流器は実現が困難である。その理由は従来全波整流器を規定す るために用いられたダイオードは、寄生トランジスタ動作を通して、チップ基板 を通して、接地への短絡電流を流し、回路機能を妨げる働きがあるからである。 CMOS full wave rectifiers are difficult to implement. The reason is that the diode conventionally used to define the full-wave rectifier has a function of passing a short-circuit current to the ground through the chip substrate through the operation of the parasitic transistor and hindering the circuit function.

【0003】[0003]

【本考案の簡単な記述】[Simple description of the invention]

基板を通した接地への短絡電流の問題は、通常全波整流に用いられる4個のダ イオードの2個をNMOSトランジスタで置き換え、2個のトランジスタが“ダ イオード”ターン・オン及びターン・オフとして機能するように、それらを接続 及び動作させることにより避けられる。実施例において、トランジスタのゲート 電極はパワー源間に接続され、基板は電気的に浮いたままに保たれ、“ダイオー ド”の“ソース”は負荷への接続のため、相互接続される。 The problem of short-circuit current to ground through the substrate is that two of the four diodes normally used for full-wave rectification are replaced by NMOS transistors, the two transistors being "diode" turn-on and turn-off. They are avoided by connecting and operating them so that they function as. In an embodiment, the gate electrode of the transistor is connected between the power sources, the substrate is kept electrically floating, and the "source" of the "diode" is interconnected for connection to the load.

【0004】[0004]

【詳細な記述】[Detailed description]

図1は従来技術の全波整流器の概略回路ダイアグラム10を示す。ダイアグラ ムはノード16、17、18及び19間に接続された4個のダイオード11、1 2、13及び14の通常のブリッジ構成を示す。負荷抵抗20がノード16及び 18間に接続される。信号源21がノード17及び19間に接続される。従来技 術の全波整流器の動作については、よく知られており、ここではこれ以上議論し ない。 FIG. 1 shows a schematic circuit diagram 10 of a prior art full wave rectifier. The diagram shows a conventional bridge configuration of four diodes 11, 12, 13 and 14 connected between nodes 16, 17, 18 and 19. A load resistor 20 is connected between nodes 16 and 18. A signal source 21 is connected between nodes 17 and 19. The operation of conventional full-wave rectifiers is well known and will not be discussed further here.

【0005】 そのような動作は、CMOS ICチップでは現在実現することができない。 この理由について、図2に関連して述べる。図2はCMOS ICチップの一部 の断面を示す。チップは表面51に隣接した二つのP形及び二つのN形拡散領域 を有する電圧VDDに保たれたN形基板50を有し、N形領域はP−タブ52中に 形成されている。拡散領域は、図1中に示されたようなダイオードを規定し、図 のような極性にある。Such operations are currently not achievable with CMOS IC chips. The reason for this will be described with reference to FIG. FIG. 2 shows a cross section of a part of the CMOS IC chip. The chip has an N-type substrate 50 held at a voltage V DD having two P-type and two N-type diffusion regions adjacent a surface 51, the N-type region being formed in a P-tab 52. The diffusion region defines the diode as shown in FIG. 1 and has the polarity as shown.

【0006】 図2の構造は寄生NPNトランジスタ60及び63が存在するため、全波整流 器としては動作させられない。たとえばダイオード13が順方向バイアスされた 時、電流は(負荷)抵抗20ではなく基本的には基板を通ってトランジスタ60 中に流れ全波整流を妨げる。同様のトランジスタ動作は、ダイオード14が寄生 トランジスタ63を経て順方向にバイアスされた時起る。The structure of FIG. 2 cannot operate as a full-wave rectifier because of the presence of parasitic NPN transistors 60 and 63. For example, when diode 13 is forward biased, current flows essentially through the substrate rather than (load) resistor 20 into transistor 60, impeding full wave rectification. Similar transistor operation occurs when diode 14 is forward biased through parasitic transistor 63.

【0007】 図3はCMOS技術に改良できる全波整流器70の概略図を示す。図3のダイ オード71及び72はそれぞれ図1のダイオード11及び12に対応し、トラン ジスタ73及び74はダイオード14及び13に対応する。信号源78は図1の 信号源21に対応する。FIG. 3 shows a schematic diagram of a full wave rectifier 70 that can be modified to CMOS technology. Diodes 71 and 72 of FIG. 3 correspond to diodes 11 and 12 of FIG. 1, respectively, and transistors 73 and 74 correspond to diodes 14 and 13, respectively. The signal source 78 corresponds to the signal source 21 in FIG.

【0008】 図1のノード16、17、18及び19はそれぞれ図3のノード82、83、 84及び85に対応する。トランジスタ74のゲート電極は、ノード85に接続 され、トランジスタ73のゲート電極は、ノード83に接続されていることに注 意すべきである。トランジスタ73及び74のソースは、対照的にそれぞれノー ド85及び83に接続され、ドレインはノード84に接続されている。ノード8 3及び85は回路の入力端子と考えられ、ノード82及び84は出力端子と考え られる。The nodes 16, 17, 18 and 19 of FIG. 1 correspond to the nodes 82, 83, 84 and 85 of FIG. 3, respectively. It should be noted that the gate electrode of transistor 74 is connected to node 85 and the gate electrode of transistor 73 is connected to node 83. The sources of transistors 73 and 74, by contrast, are connected to nodes 85 and 83, respectively, and the drains are connected to node 84. Nodes 83 and 85 are considered input terminals of the circuit, and nodes 82 and 84 are considered output terminals.

【0009】 図4は図3の回路を改良したICの一部の断面を示す。この部分はN形基板か ら成り、その中に二つのP−タブ領域101及び102が形成されている。N 形拡散領域104、105、106、107は、それぞれそれらの間に、図3の トランジスタ74及び73を規定する。FIG. 4 shows a partial cross-section of an IC which is an improvement of the circuit of FIG. This part consists of an N-type substrate in which two P-tub regions 101 and 102 are formed. The N + -type diffusion regions 104, 105, 106, 107 respectively define between them the transistors 74 and 73 of FIG.

【0010】 各種の領域は図3に概略的に示されるように、相互接続されている。たとえば 、領域105及び106は、負荷抵抗90に接続するため、ノード84で電気的 に相互接続されている(図3)。図2のトランジスタ60及び63の動作と等価 な寄生動作をする寄生トランジスタは存在しない。The various areas are interconnected as shown schematically in FIG. For example, regions 105 and 106 are electrically interconnected at node 84 to connect to load resistor 90 (FIG. 3). There is no parasitic transistor that has a parasitic operation equivalent to that of the transistors 60 and 63 in FIG.

【0011】 動作中、ノード85が信号源78により、正に駆動された時、電流はダイオー ド71を通って、負荷90に流れる。また、トランジスタ74はゲート・オンさ れ、そのため電流はトランジスタを通って信号源78に流れる。トランジスタ7 3には電流は流れない。ノード83が正に駆動された時、トランジスタ73はゲ ート・オンされる。その結果、電流はトランジスタ73及びダイオード72を経 て、負荷90中に流れる。このようにして、全波整流が実現される。 チップ基板を通して電流を流す図1及び図2の装置における寄生トランジスタ動 作は、動作の各周期の適当な位相において、ゲート・オフされたトランジスタを 用いることにより避けられる。In operation, when node 85 is driven positive by signal source 78, current flows through diode 71 to load 90. Also, transistor 74 is gated on, so that current flows through it to signal source 78. No current flows through the transistor 73. When node 83 is driven positive, transistor 73 is gated on. As a result, current flows through transistor 73 and diode 72 into load 90. In this way, full-wave rectification is achieved. Parasitic transistor behavior in the devices of FIGS. 1 and 2 which draw current through the chip substrate is avoided by using gated off transistors at the appropriate phase of each cycle of operation.

【0012】 動作はAC源及び負荷間の別の完全な電流路を形成すると考えてよい。各完全 な電流路は、ソース及び負荷間に、第1または第2の部分を添加することにより 、形成される。この場合、各部分はダイオード及びトランジスタを含み、それぞ れが即座には使用されないダイオードを含む第1または第2の部分の反対の側に あるトランジスタのみのゲートを駆動させるのに適している。Operation may be considered to form another complete current path between the AC source and the load. Each complete current path is formed by adding a first or second portion between the source and the load. In this case, each part comprises a diode and a transistor, each of which is suitable for driving the gate of only the transistor on the opposite side of the first or second part, which contains a diode which is not used immediately.

【図面の簡単な説明】[Brief description of drawings]

【図1】従来技術の全波整流器の回路構成図である。FIG. 1 is a circuit configuration diagram of a conventional full-wave rectifier.

【図2】図1中の回路構成を示すCMOSチップの一部
の断面図である。
FIG. 2 is a partial cross-sectional view of a CMOS chip showing the circuit configuration in FIG.

【図3】本考案に従う全波整流器の回路構成図である。FIG. 3 is a circuit configuration diagram of a full-wave rectifier according to the present invention.

【図4】図3の回路構成を示すCMOSチップの一部の
断面図である。
FIG. 4 is a cross-sectional view of a part of a CMOS chip showing the circuit configuration of FIG.

【符号の説明】[Explanation of symbols]

第1の入力端子・・・・・85、 第2の入力端子・・・・・83、負荷・・・・・90、 第1の出力端子・・・・・84、 第2の出力端子・・・・・82、 第1のダイオード・・・・・72、 第2のダイオード・・・・・71、 第1のトランジスタ・・・・・73、 第2のトランジスタ・・・・・74、 第1の伝導形・・・・・N、第2の伝導形・・・・・P、 第1のタブ・・・・・102、第2のタブ・・・・・101、 表面領域・・・・・106−107;104−105、 領域・・・・・71、72。 First input terminal ... 85, Second input terminal ... 83, Load ... 90, First output terminal ... 84, Second output terminal ... 82, first diode ... 72, second diode ... 71, first transistor ... 73, second transistor ... 74, First conductivity type N, second conductivity type P, first tab 102, second tab 101, surface region ... ... 106-107; 104-105, areas ... 71, 72.

─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成5年8月4日[Submission date] August 4, 1993

【手続補正1】[Procedure Amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】実用新案登録請求の範囲[Name of item to be amended] Scope of utility model registration request

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【実用新案登録請求の範囲】[Scope of utility model registration request]

Claims (2)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】 AC源への接続のための第1(たとえば
85)及び第2(たとえば83)の入力端子と、負荷
(たとえば90)への整流された出力を供給するための
第1(たとえば84)及び第2(たとえば82)の出力
端子と、第1(たとえば72)及び第2(たとえば7
1)のダイオードと、第1(たとえば73)及び第2
(たとえば74)のトランジスタと、前記第1(たとえ
ば85)の入力端子から、前記第1(たとえば73)の
トランジスタを経て、前記第1(たとえば84)の出力
端子へ延びる第1の導電路と、前記第2(たとえば8
3)の入力端子から前記第1(たとえば72)のダイオ
ードを経て、前記第2(たとえば82)出力端子へ延び
る第2の導電路と、前記第2(たとえば83)の入力端
子から前記第2(たとえば74)のトランジスタを通っ
て、前記第1(たとえば84)の出力端子まで延びる第
3の導電路と、前記第1(たとえば85)の入力端子か
ら、前記第2(たとえば71)のダイオードを通って、
前記第2(たとえば82)の出力端子に延びる第4の導
電路とを含み、前記第1のトランジスタ(たとえば7
3)のゲートは前記第2(たとえば83)の入力端子に
接続され、第2(たとえば74)のトランジスタのゲー
トは、第1(たとえば85)の入力端子に接続され、前
記第1及び第2のダイオードはAC信号の相対する位相
中、導電性となるような極性であることを特徴とする相
補型金属−酸化物半導体デバイス。
1. A first (eg 85) and second (eg 83) input terminal for connection to an AC source and a first (for providing rectified output to a load (eg 90)). For example 84) and second (eg 82) output terminals and first (eg 72) and second (eg 7) output terminals.
1) diode and first (eg 73) and second diode
A (eg, 74) transistor and a first conductive path extending from the first (eg, 85) input terminal, through the first (eg, 73) transistor, to the first (eg, 84) output terminal. , The second (eg 8
3) a second conductive path extending from the input terminal of 3) to the second (eg 82) output terminal through the first (eg 72) diode, and the second (eg 83) input terminal to the second A third conductive path extending through the (eg, 74) transistor to the first (eg, 84) output terminal and the second (eg, 71) diode from the first (eg, 85) input terminal. Through
A fourth conductive path extending to the second (eg, 82) output terminal, and the first transistor (eg, 7).
The gate of 3) is connected to the second (eg 83) input terminal, the gate of the second (eg 74) transistor is connected to the first (eg 85) input terminal, and the first and second The complementary metal-oxide semiconductor device is characterized in that the diode is polarized so that it becomes conductive during the opposite phases of the AC signal.
【請求項2】 請求項1に記載された半導体デバイスに
おいて、前記デバイスは第1(たとえばN)の伝導形の
半導体基板を含み前記基板は第2(たとえばP)の伝導
形の第1(たとえば102)及び第2(たとえば10
1)のタブを含み、前記第1及び第2のタブの各々は前
記第1(たとえば73)及び第2(たとえば74)のト
ランジスタをそれぞれ間に規定する第1(たとえばN)
の伝導形の空間的に分離された表面領域(たとえば、そ
れぞれ106−107および104−105)を含み、
前記基板はまた後側をあわせて相互接続された前記第1
(たとえば72)及び第2(たとえば71)のダイオー
ドを規定する第2(たとえばP)の伝導形の空間的に分
離された領域(たとえば71、72)を含むことを特徴
とする相補型金属−酸化物半導体デバイス。
2. A semiconductor device according to claim 1, wherein the device comprises a semiconductor substrate of a first (eg N) conductivity type and the substrate is a first (eg P) conductivity type. 102) and the second (eg 10)
1) tabs, each of the first and second tabs defining a first (eg 73) and a second (eg 74) transistor therebetween, respectively (first (eg N)).
Of spatially separated surface regions of conductive type (eg, 106-107 and 104-105, respectively),
The substrates are also interconnected back to back with the first
A complementary metal, characterized in that it comprises (eg 72) and a second (eg P) conductivity type spatially separated region (eg 71, 72) defining a second (eg 71) diode. Oxide semiconductor device.
JP036605U 1983-08-08 1993-07-05 Complementary metal-oxide semiconductor device Pending JPH0686355U (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/521,059 USH64H (en) 1983-08-08 1983-08-08 Full-wave rectifier for CMOS IC chip
US521059 1983-08-08

Publications (1)

Publication Number Publication Date
JPH0686355U true JPH0686355U (en) 1994-12-13

Family

ID=24075163

Family Applications (2)

Application Number Title Priority Date Filing Date
JP59165045A Pending JPS6057961A (en) 1983-08-08 1984-08-08 Complementary metal-oxide semiconductor device
JP036605U Pending JPH0686355U (en) 1983-08-08 1993-07-05 Complementary metal-oxide semiconductor device

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP59165045A Pending JPS6057961A (en) 1983-08-08 1984-08-08 Complementary metal-oxide semiconductor device

Country Status (2)

Country Link
US (1) USH64H (en)
JP (2) JPS6057961A (en)

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TWI545882B (en) * 2015-03-20 2016-08-11 漢磊科技股份有限公司 Two chips integrtated bridge rectifier

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JPS57113262A (en) * 1980-12-30 1982-07-14 Seiko Epson Corp Voltage dividing system for semiconductor integrated circuit
JPS57119674A (en) * 1980-11-26 1982-07-26 Itt Monolithic integrated rectifying bridge

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JPS57119674A (en) * 1980-11-26 1982-07-26 Itt Monolithic integrated rectifying bridge
JPS57113262A (en) * 1980-12-30 1982-07-14 Seiko Epson Corp Voltage dividing system for semiconductor integrated circuit

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006115579A (en) * 2004-10-13 2006-04-27 Renesas Technology Corp Semiconductor integrated circuit device, noncontact electronic equipment, and portable information terminal
JP4521598B2 (en) * 2004-10-13 2010-08-11 ルネサスエレクトロニクス株式会社 Semiconductor integrated circuit device, non-contact electronic device, and portable information terminal
JP2009506734A (en) * 2005-08-23 2009-02-12 フリボ モバイル パワー ゲーエムベーハー Switching mode power supply input circuit

Also Published As

Publication number Publication date
USH64H (en) 1986-05-06
JPS6057961A (en) 1985-04-03

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