JPH0640472B2 - Method for manufacturing substrate for fluorescent display tube - Google Patents

Method for manufacturing substrate for fluorescent display tube

Info

Publication number
JPH0640472B2
JPH0640472B2 JP60229943A JP22994385A JPH0640472B2 JP H0640472 B2 JPH0640472 B2 JP H0640472B2 JP 60229943 A JP60229943 A JP 60229943A JP 22994385 A JP22994385 A JP 22994385A JP H0640472 B2 JPH0640472 B2 JP H0640472B2
Authority
JP
Japan
Prior art keywords
substrate
fluorescent display
display tube
layer
paste
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP60229943A
Other languages
Japanese (ja)
Other versions
JPS6290838A (en
Inventor
光明 森川
智彦 古川
Original Assignee
伊勢電子工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 伊勢電子工業株式会社 filed Critical 伊勢電子工業株式会社
Priority to JP60229943A priority Critical patent/JPH0640472B2/en
Publication of JPS6290838A publication Critical patent/JPS6290838A/en
Publication of JPH0640472B2 publication Critical patent/JPH0640472B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は蛍光表示管に用いられる基板の製造方法に関
し、特に絶縁層の形成を露光法により形成する蛍光表示
管の製造方法に関するものである。
Description: TECHNICAL FIELD The present invention relates to a method of manufacturing a substrate used for a fluorescent display tube, and more particularly to a method of manufacturing a fluorescent display tube in which an insulating layer is formed by an exposure method. .

〔従来の技術〕[Conventional technology]

従来、蛍光表示管用基板を作製する場合は、その概略工
程を第2図に示すように,絶縁基板としてのガラス基板
1上にA薄膜などの配線パターン2を形成し(同図
(a))、次にスクリーン印刷法10を用いて絶縁性ペー
スト9を所定の位置に塗布しペースト層9を形成する
(同図(b),(c))。このとき、前記ペースト層9は、配
線パターン2を含むガラス基板1上のほぼ全面を被覆す
ると共に、その配線パターン2の一部2aと後述する蛍
光面を形成すべき陽極パッド(セグメント電極)とを接
続するためのスルーホール6を残して選択的に形成され
る。
Conventionally, when manufacturing a substrate for a fluorescent display tube, a wiring pattern 2 such as an A thin film is formed on a glass substrate 1 serving as an insulating substrate (see the same figure), as shown in the schematic process thereof.
(a)) Next, the screen printing method 10 is used to apply an insulating paste 9 to predetermined positions to form a paste layer 9 (FIGS. 2B and 2C). At this time, the paste layer 9 covers substantially the entire surface of the glass substrate 1 including the wiring pattern 2, and a part 2a of the wiring pattern 2 and an anode pad (segment electrode) on which a fluorescent screen described later is to be formed. Are selectively formed, leaving a through hole 6 for connecting.

次に、このようにして形成されたペースト層9は560
℃程度の高温度で焼成し、ガラス基板1上に溶融、固着
して、絶縁層9aとなす(同図(d))。次いで、この絶
縁層9a上にそのスルーホール6を介して陽極パッド7
を導体層として形成し、この上に蛍光体層8を被着して
蛍光面を形成することにより(同図(e))、基板作製工
程が完了する。なお、第2図中,11はスクリーンメツ
シユ、12はスキージである。
Next, the paste layer 9 thus formed is 560
It is fired at a high temperature of about 0 ° C., melted and fixed on the glass substrate 1 to form the insulating layer 9a (FIG. 2 (d)). Then, the anode pad 7 is formed on the insulating layer 9a through the through hole 6.
Is formed as a conductor layer, and the phosphor layer 8 is deposited on the conductor layer to form a phosphor screen ((e) in the same figure), whereby the substrate manufacturing process is completed. In FIG. 2, 11 is a screen mesh and 12 is a squeegee.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

しかし、このような従来の方法では、配線パターン2が
粗い場合は問題はなかつたが、配線パターン2が高密
度,高精度になるにつれて絶縁層9aを所定の位置に設
計通り正しく印刷形成することが困難となつてきてお
り、正しい位置に印刷できない場合にはスルーホール6
が隣の配線パターンの上にもかかり、接触してしまう結
果となる。この原因は、スクリーン印刷に用いるスクリ
ーンメツシユ11が使用中に徐々に伸びるため、スルー
ホール6の位置がずれてしまうことに起因する場合が多
い。そこで従来は、スクリーンメッシュ11を頻繁に交
換し、スクリーンメッシュの伸び対策を行っていたが、
この場合にはスクリーンメッシュを交換する都度位置出
し作業を必要とし、非常に作業性を低下させていた。そ
の他スクリーンメッシュのパターン精度のバラツキによ
っても同様の問題が生ずることがあった。
However, in such a conventional method, when the wiring pattern 2 is rough, there is no problem, but as the wiring pattern 2 becomes higher in density and higher in accuracy, the insulating layer 9a is properly printed and formed at a predetermined position as designed. If it is difficult to print at the correct position, the through hole 6
On the adjacent wiring pattern, resulting in contact. This is often because the screen mesh 11 used for screen printing gradually expands during use, and the position of the through hole 6 is displaced. Therefore, in the past, the screen mesh 11 was frequently replaced to take measures against the elongation of the screen mesh.
In this case, positioning work is required every time the screen mesh is replaced, which greatly deteriorates workability. Similar problems may occur due to variations in the pattern accuracy of the screen mesh.

このように、従来のものではスルーホールのずれによる
歩留低下が大きな問題であつた。
As described above, the conventional method has a big problem that the yield is lowered due to the displacement of the through holes.

本発明は、かかる点に鑑みなされたもので、フオトリソ
グラフイー工程にてパターニングできる感光性絶縁ペー
ストを用いることにより、上記した従来の問題点を解消
した蛍光表示管用基板の製造方法を提供するものであ
る。
The present invention has been made in view of the above points, and provides a method of manufacturing a substrate for a fluorescent display tube that solves the above-mentioned conventional problems by using a photosensitive insulating paste that can be patterned in a photolithographic process. Is.

〔問題点を解決するための手段〕[Means for solving problems]

本発明の蛍光表示管用基板の製造方法は、絶縁基板の表
面にフォトエッチング法により配線パターンを形成する
工程と、前記基板面に低融点ガラス粉末と感光性液状体
を混合してなるペースト層を厚膜印刷にて形成する工程
と、スルーホールパターンが形成されたフォトマスクを
介して前記ペースト層を露光現像する工程と、基板を焼
成しペースト層の感光性液状体物質を熱分解するととも
に低融点ガラス粉末を溶融固着する工程と、陽極パッド
および蛍光体層を形成する工程よりなることを特徴とす
る。
The method for manufacturing a substrate for a fluorescent display of the present invention comprises a step of forming a wiring pattern on the surface of an insulating substrate by a photo-etching method, and a paste layer formed by mixing a low melting point glass powder and a photosensitive liquid on the surface of the substrate. A process of forming by thick film printing, a process of exposing and developing the paste layer through a photomask on which a through hole pattern is formed, and a process of baking a substrate to thermally decompose the photosensitive liquid substance of the paste layer and to reduce it. It is characterized by comprising a step of melting and fixing the melting point glass powder and a step of forming an anode pad and a phosphor layer.

〔作用〕[Action]

本発明においては、低融点ガラス粉末と感光性液体とを
混合してなる感光性の絶縁ペーストを用いて絶縁層を形
成することにより、この絶縁層は露光によりパターニン
グできるので、フオトマスクに忠実な絶縁層のパターン
形成ができる。
In the present invention, since an insulating layer is formed by using a photosensitive insulating paste formed by mixing a low-melting glass powder and a photosensitive liquid, the insulating layer can be patterned by exposure, so that an insulating film faithful to the photomask can be obtained. Layers can be patterned.

〔実施例〕〔Example〕

以下、本発明を第1図を参照して詳細に説明する。 Hereinafter, the present invention will be described in detail with reference to FIG.

第1図(a)乃至(e)は本発明に係る蛍光表示管用基板の一
実施例を示す基本的な工程断面図であり、同図において
第2図と同一符号は同一または相当部分を示している。
まずガラス基板1上に配線パターン2を形成し(同図
(a))、次に低融点ガラス粉末としてのフリツトガラス
と感光性液状体とを混合してなる感光性絶縁ペースト3
を印刷法あるいは他の方法により前記ガラス基板1上の
全面に塗布する(同図(b))。次いでこのペースト層3
を乾燥した後、光源よりの照射光4を所定のパターンを
もつたフオトマスク5を通して露光すると(同図
(c))、前記ペースト層3がネガ型感光性の場合は露光
部分が現像液に不溶となり、未露光部分は現像液に溶
け、第1図(d)に示すようなスルーホール6が形成され
る。また、前記ペースト層3がポジ型感光性の場合はネ
ガ型とは反対に露光部分が現像液に溶解し、未露光部分
は残存することとなり、同様にしてスルーホール6を形
成できる。
1 (a) to 1 (e) are basic process sectional views showing an embodiment of a fluorescent display tube substrate according to the present invention, in which the same reference numerals as those in FIG. 2 designate the same or corresponding parts. ing.
First, the wiring pattern 2 is formed on the glass substrate 1 (see FIG.
(a)) Next, a photosensitive insulating paste 3 obtained by mixing a fritted glass as a low melting point glass powder and a photosensitive liquid material.
Is applied to the entire surface of the glass substrate 1 by a printing method or another method ((b) of the same figure). Then this paste layer 3
After drying, the exposure light 4 from the light source is exposed through a photomask 5 having a predetermined pattern (see FIG.
(c)) When the paste layer 3 is negative-type photosensitive, the exposed portion becomes insoluble in the developing solution, and the unexposed portion dissolves in the developing solution, forming a through hole 6 as shown in FIG. 1 (d). To be done. When the paste layer 3 is positive-type photosensitive, the exposed part is dissolved in the developer and the unexposed part remains, contrary to the negative type, and the through hole 6 can be similarly formed.

次いで、このように露光法でスルーホール6を形成した
フリツトガラスを含むペースト層3を焼成した溶融,固
着させて絶縁層3aを形成した後(同図(d))、この絶
縁層3a上にそのスルーホール6を介して陽極パツド
7,蛍光体層8を形成することにより、蛍光表示管用基
板が作製される。
Next, after the paste layer 3 containing the fritted glass in which the through holes 6 have been formed by the exposure method as described above is baked and melted and fixed to form the insulating layer 3a (FIG. 2 (d)), the insulating layer 3a is formed on the insulating layer 3a. By forming the anode pad 7 and the phosphor layer 8 through the through holes 6, the fluorescent display tube substrate is manufactured.

このようにして作製された蛍光表示管用基板は、フオト
マスク5に忠実な絶縁層3aのパターン形成が可能とな
り、従来のようなスルーホールの位置ずれが全く無くな
る。
In the substrate for a fluorescent display tube manufactured in this manner, the insulating layer 3a can be formed in a pattern that is faithful to the photomask 5, and the conventional displacement of the through hole is completely eliminated.

つぎに本発明の実施態様を具体的に説明する。まずガラ
ス基板上にスパツタリング法によりA薄膜を1.5μm
厚に成膜し、これをフオトエツチング法にてパターニン
グして所定のA配線パターンを形成する。このA配
線パターンは線幅30μm,ピツチ60μmで、蛍光面
を形成すべき箇所は200×250μmのパツド形状と
した。次に、このA配線パターン上に、無機フリツト
ガラスと感光性液状体とを混合してなるネガ型感光性絶
縁ペーストをスクリーン印刷法にて基板全面に10μm
厚程度に印刷形成し、乾燥後所定のフオトマスクを用い
て露光する。この露光時の超高圧水銀灯の露光量は30
〜50mJ/cm2程度である。次に1−1−トリクロロエタ
ンを用いて室温にてスプレー現象を行うと、前記ペース
ト層の未露光部分が溶解し、その部分にスルーホールが
形成される。次いで560℃,30分間空気中にて焼成を
行うと、上記ペースト層形成部分が溶融,固着し、スル
ーホールを有する絶縁層の形成が完了する。しかる後、
陽極パツド,蛍光体層をそれぞれ形成し、蛍光表示管用
基板を作製した。
Next, embodiments of the present invention will be specifically described. First, deposit a thin film of 1.5 μm on the glass substrate by the sputtering method.
A thick film is formed, and this is patterned by a photo etching method to form a predetermined A wiring pattern. The A wiring pattern has a line width of 30 μm and a pitch of 60 μm, and the portion where the phosphor screen is to be formed has a pad shape of 200 × 250 μm. Next, a negative photosensitive insulating paste, which is a mixture of inorganic fritted glass and a photosensitive liquid material, is formed on the A wiring pattern by screen printing on the entire surface of the substrate by 10 μm.
It is formed by printing to a thickness, dried, and exposed using a predetermined photomask. The exposure amount of the ultra-high pressure mercury lamp during this exposure is 30
It is about 50 mJ / cm 2 . Then, a spray phenomenon is performed at room temperature using 1-1-trichloroethane, and the unexposed portion of the paste layer is dissolved and a through hole is formed in that portion. Then, by firing in air at 560 ° C. for 30 minutes, the paste layer forming portion is melted and fixed, and the formation of the insulating layer having a through hole is completed. After that,
An anode pad and a phosphor layer were respectively formed to prepare a substrate for a fluorescent display tube.

したがつて、このような基板の作製に際し,絶縁層形成
後そのパターン形状について測定したところ、フオトマ
スク寸法にはほぼ忠実なスルーホールが得られ、±10
μm程度の範囲で絶縁層のパターン形成が可能となり、
実用上,良好であつた。また、上記実施例のようにフリ
ツトガラスを含む感光性絶縁ペーストを用いて絶縁層を
形成した場合、フリツトガラス成分を含まない感光性絶
縁ペースト(以下、有機ペーストと称する)を用いたも
のに比べて,次のような問題がなく、蛍光表示管の製造
上有利となる。すなわち、前記有機ペーストで蛍光表示
管の熱工程に耐えられるものが現実には無く、現実にあ
る耐熱性有機ペースト,例えばポリイミド樹脂の耐熱性
は450℃程度したなく、使用に耐えない。仮に高耐熱性
有機ペーストが出来たとしても非常に高価が材料(ポリ
イミド系)を使うので、蛍光表示管には使いづらいもの
となる。また、蛍光表示管では蛍光面近傍の絶縁層が電
子による衝撃(要するに電子が若干当る)を受けやす
く、そのため有機ペースト層の結合手が切れ分解しやす
いので、ガス放出源となる。これは有機ペースト層が無
機フリツトより結合力が弱いことに起因するものであ
る。
Therefore, in manufacturing such a substrate, when the pattern shape was measured after the insulating layer was formed, a through hole almost faithful to the photomask dimension was obtained, and
Insulation layer pattern can be formed in the range of about μm,
Practically good. Further, when the insulating layer is formed by using the photosensitive insulating paste containing the fritted glass as in the above-mentioned example, compared with the one using the photosensitive insulating paste containing no fritted glass component (hereinafter referred to as an organic paste), The following problems do not occur, which is advantageous in manufacturing a fluorescent display tube. That is, none of the organic pastes can endure the heat process of the fluorescent display tube in reality, and the heat resistance of an actual heat-resistant organic paste, for example, a polyimide resin, does not reach about 450 ° C. and cannot be used. Even if a high heat resistant organic paste is produced, it is very expensive and a material (polyimide type) is used, which makes it difficult to use for a fluorescent display tube. Further, in the fluorescent display tube, the insulating layer near the fluorescent screen is easily impacted by electrons (in short, electrons are slightly hit), so that the bond of the organic paste layer is easily broken and decomposed, which serves as a gas emission source. This is because the organic paste layer has a weaker binding force than the inorganic frit.

〔発明の効果〕〔The invention's effect〕

以上説明したように本発明に係る蛍光表示管用基板の製
造方法によれば、フリツトガラスを含有する感光性絶縁
ペーストを用いて絶縁膜を形成するため、高い絶縁耐圧
を得るのに必要な所定膜厚の絶縁層の形成に形成容易な
厚膜印刷を用いることができ、その位置精度およびパタ
ーン形状はフォトマスクに忠実に形成できるので、従来
のようなスルーホールの位置ずれが全く無くなり、歩留
りを大幅に向上させることができる効果がある。
As described above, according to the method for manufacturing a fluorescent display tube substrate of the present invention, since the insulating film is formed using the photosensitive insulating paste containing the fritted glass, the predetermined film thickness required to obtain a high withstand voltage. Easy-to-form thick-film printing can be used to form the insulating layer, and its positional accuracy and pattern shape can be formed faithfully to the photomask, eliminating the conventional through-hole displacement and significantly increasing yield. There is an effect that can be improved.

【図面の簡単な説明】[Brief description of drawings]

第1図(a)乃至(e)は本発明に係る蛍光表示管用基板の一
実施例を示す基本的な工程断面図、第2図(a)乃至(e)は
従来による蛍光表示管用基板の一例を示す工程断面図で
ある。 1……ガラス基板、2……配線パターン、3……フリツ
トガラスを含む感光性絶縁ペースト、3a……絶縁層、
4……光、5……フオトマスク、6……スルーホール、
7……陽極パツド、8……蛍光体層。
1 (a) to 1 (e) are basic process cross-sectional views showing one embodiment of a substrate for a fluorescent display tube according to the present invention, and FIGS. 2 (a) to (e) are conventional substrate for a fluorescent display tube. It is process sectional drawing which shows an example. 1 ... glass substrate, 2 ... wiring pattern, 3 ... photosensitive insulating paste containing fritted glass, 3a ... insulating layer,
4 ... light, 5 ... photo mask, 6 ... through hole,
7 ... Anode pad, 8 ... Phosphor layer.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】絶縁基板の表面にフォトエッチング法によ
り配線パターンを形成する工程と、前記基板面に低融点
ガラス粉末と感光性液状体を混合してなるペースト層を
厚膜印刷にて形成する工程と、スルーホールパターンが
形成されたフォトマスクを介して前記ペースト層を露光
現像する工程と、基板を焼成しペースト層の感光性液状
体物質を熱分解するとともに低融点ガラス粉末を溶融固
着する工程と、陽極パッドおよび蛍光体層を形成する工
程よりなることを特徴とする蛍光表示管用基板の製造方
法。
1. A step of forming a wiring pattern on the surface of an insulating substrate by a photoetching method, and a paste layer formed by mixing a low melting point glass powder and a photosensitive liquid material on the surface of the substrate by thick film printing. A step of exposing and developing the paste layer through a photomask having a through-hole pattern formed therein, baking the substrate to thermally decompose the photosensitive liquid substance in the paste layer, and melt and fix the low melting point glass powder. A method of manufacturing a substrate for a fluorescent display tube, which comprises the steps of: forming an anode pad and a phosphor layer.
JP60229943A 1985-10-17 1985-10-17 Method for manufacturing substrate for fluorescent display tube Expired - Fee Related JPH0640472B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60229943A JPH0640472B2 (en) 1985-10-17 1985-10-17 Method for manufacturing substrate for fluorescent display tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60229943A JPH0640472B2 (en) 1985-10-17 1985-10-17 Method for manufacturing substrate for fluorescent display tube

Publications (2)

Publication Number Publication Date
JPS6290838A JPS6290838A (en) 1987-04-25
JPH0640472B2 true JPH0640472B2 (en) 1994-05-25

Family

ID=16900147

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60229943A Expired - Fee Related JPH0640472B2 (en) 1985-10-17 1985-10-17 Method for manufacturing substrate for fluorescent display tube

Country Status (1)

Country Link
JP (1) JPH0640472B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2700659B1 (en) * 1993-01-18 1995-03-24 Matra Sep Imagerie Inf Method for manufacturing multilayer circuits and circuits thus obtained.

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54124671A (en) * 1978-03-20 1979-09-27 Nec Corp Production of fluorescent display tube
JPS5936965B2 (en) * 1980-06-30 1984-09-06 ダイセル化学工業株式会社 Protein RBF-PM

Also Published As

Publication number Publication date
JPS6290838A (en) 1987-04-25

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