JP2002367509A - Electrode and its manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a high reliability electrode which is formed from a laminated metal film, used in a plasma display device and free from misalignment or any warp of the edges, and provide a manufacturing device for such electrodes. SOLUTION: An electrode pattern as a first layer including a black layer is formed on a transparent substrate, and a positive type photosensitive conductive film, is applied onto the electrode pattern, and the entire surface is exposed from the rear face of the substrate.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a plasma display device used for a display device and the like, and more particularly to a method of manufacturing an electrode.

[0002]

2. Description of the Related Art Conventionally, among electrodes used in display devices such as a liquid crystal display and a plasma display, an electrode composed of a laminated metal film using a photosensitive material is often used. This is because it is possible to increase the definition of the pattern by including the photosensitive material in the metal material and manufacturing it using the exposure and development processes of the photosensitive material, and by laminating them. This is because a plurality of different functions can be given to the electrode.

FIG. 1 shows an example of a conventional method for manufacturing an electrode composed of a laminated metal film.

First, a photosensitive material containing, for example, ruthenium oxide is applied to the glass substrate 101 by a printing method or the like.
An electrode film 102 is formed (FIG. 1A). Next,
On the one electrode film, for example, a photosensitive material containing Ag or the like is applied by a printing method or the like to form a second electrode film 103 (FIG. 1).
(B)). Next, when an ultraviolet ray 104 is irradiated through an exposure mask 105, the first electrode film 102 and the second
An exposed portion 107 and a non-exposed portion 106 are formed on the electrode film 103 (FIG. 1C). Next, when development is performed with a developer containing an alkali or the like, only the exposed portions 107 remain on the substrate, and the electrode film 108 after development is formed (FIG. 1D). Next, when baking is performed, the electrode film after development remaining on the substrate shrinks to form a fired electrode film 109 (FIG. 1E). next,
The same material as that of the second electrode film is applied on the substrate on which the fired electrode film 109 is formed by a printing method or the like.
Is formed (FIG. 1F). Next, when ultraviolet rays 111 are irradiated through an exposure mask 112 having an electrode pattern having a line width narrower than that of the fired electrode film 109, an exposed portion 114 and a non-exposed portion 113 are formed in the third electrode film 110. 1 (g)). Next, when development is performed with a developer containing an alkali or the like, only the exposed portions 114 remain on the substrate, and the electrode film 115 after development is formed (FIG. 1H). Next, when baking is performed, the electrode film after development remaining on the substrate shrinks to form a fired electrode film 116 (FIG. 1 (i)).

The electrode thus formed plays a role of preventing the reflection of external light when viewed from the back side of the glass, because the first electrode film mainly composed of ruthenium oxide has a black color. Further, the second electrode film and the third electrode film containing silver having high conductivity as a main component play a role of lowering the overall resistance value. In addition, the reason for forming the third electrode film is to prevent a reduction in resistance value and disconnection. Note that there is a method in which the third electrode film is not formed because the function as an electrode is satisfied without forming the third electrode film.

[0006]

However, in an electrode composed of a laminated metal film, if the exposure is performed a plurality of times, the alignment between the mask and the substrate may be shifted.
A shift occurs between the pattern formed by the first exposure and the pattern formed by the second and subsequent exposures, and the line width of the electrode becomes large. In an extreme case, the first and second patterns are formed in different places. There was a case. In addition, since the exposure is performed from the surface of the electrode film, the cross-linking reaction proceeds from the surface of the electrode film, so that the developed electrode has an inverted trapezoidal shape in which the line width of the surface is large and the line width of the surface in contact with the substrate is small. In addition, there is also a phenomenon that the edge portion of the electrode warps due to the stress generated at the time of shrinking and shrinking at the time of firing, which causes a problem that the edge portion becomes a starting point and causes a breakdown voltage failure.

The present invention has been made in view of these disadvantages, and an object of the present invention is to provide a manufacturing method that does not cause misalignment and that provides a highly reliable electrode without warpage of an edge portion.

[0008]

A method of manufacturing an electrode according to the present invention is a method of manufacturing a multi-layered electrode having at least a black layer formed by using a photosensitive material as a lowermost layer. A step of forming a pattern of a first layer including a black layer, a step of applying a second layer conductive film, a step of exposing the whole surface of the transparent substrate from the back surface without using an exposure mask, a step of developing, and a step of baking It is characterized by including a process. That is, by performing exposure from the back surface, the black layer is used as a substitute for the exposure mask and only the upper portion of the black layer is patterned. Therefore, the exposure mask is not required, and the alignment is self-aligned. Therefore, an electrode with high pattern accuracy can be manufactured.

A method of manufacturing a multi-layered electrode having at least a black layer formed by using a photosensitive material as a lowermost layer, wherein a method of simultaneously forming an electrode and a black matrix is provided. A step of simultaneously forming a pattern of a black layer and a black matrix; and a step of selectively applying a second layer conductive film only to the electrode portion.
The method includes a step of exposing the entire surface of the transparent substrate without using an exposure mask, a step of developing, and a step of baking. That is, even when the black layer is used as a black matrix, by selectively applying the conductive layer only to the electrode portion, even when the entire surface is exposed from the back surface, the conductive layer is formed only at the electrode portion, and further self-alignment is performed. This makes it possible to manufacture an electrode with high pattern accuracy.

The black layer is a photosensitive material containing ruthenium oxide or a compound compound of ruthenium, and the conductive layer is a positive photosensitive material containing at least silver.

[0011] Further, the present invention is an electrode having a multilayer structure in which at least a black layer formed using a photosensitive material is the lowermost layer, wherein the width of the black layer in contact with the transparent substrate is larger than the uppermost layer width of the electrode. . That is, by exposing from the back surface, the exposure light causes scattering at the edge portion of the black layer serving as a mask,
The portion exposed to the exposure light is removed by development because it wraps around the edge near the edge of the black layer. The conductive layer of the positive type material has an inverted trapezoidal shape in which the line width decreases toward the electrode surface. Is formed. Therefore, warpage of the edge portion during firing can be suppressed, and a highly reliable electrode free from withstand voltage failure or the like can be obtained.

Further, the present invention is characterized in that it is a plasma display device manufactured by using the above-mentioned electrode and the method for manufacturing the electrode.

According to the present invention having the above-described features, it is possible to provide a highly reliable electrode without warpage of an edge portion by a manufacturing method in which no misalignment occurs.

[0014]

DESCRIPTION OF THE PREFERRED EMBODIMENTS (First Embodiment of the Invention) FIG.
It is the schematic of the cross section and side which show the principal part structure of the electrode which concerns on this Embodiment, and its manufacturing process.

First, a black negative photosensitive paste A containing ruthenium oxide particles is applied on a glass substrate 201 by using a screen printing method. Drying is performed by an IR furnace having a temperature profile that is maintained for a predetermined time to form a first electrode film 202 in which the solvent and the like are reduced from the photosensitive paste A (FIG. 2).
(A)).

Next, when the ultraviolet ray 204 is exposed through the exposure mask 203, a crosslinking reaction proceeds from the film surface of the first electrode film 202 to polymerize and polymerize, and an exposed portion 205 and a non-exposed portion 206 are formed. (B)). The exposure conditions at this time were illuminance 10 mW / cm ² , integrated light amount 300 mJ
/ Cm ² , and the distance between the mask and the substrate (hereinafter referred to as the proxy amount) is 100 μm.

Next, when development is performed with a developer containing 0.4% by weight of sodium carbonate, the non-exposed portions 206 are removed, and the patterned electrode film 207 remains (FIG. 2C).

Next, a positive type photosensitive paste B containing Ag particles is applied from above the electrode film 207 by using a screen printing method, and dried by an IR furnace having the above profile. A second electrode film 208 with reduced solvent and the like is formed (FIG. 2D).

Next, by irradiating the entire surface with ultraviolet rays 211 from the substrate side, the black first electrode film 207 becomes a substitute for an exposure mask, and a non-exposed portion 209 is formed on the first electrode film 207.
However, exposed portions 210 are respectively formed in the unpatterned portions of the first electrode film 207. The exposure conditions at this time were illuminance 10 mW / cm ² , integrated light amount 300 mJ
/ Cm ² (FIG. 2E).

Next, when development is performed with a developer containing 0.4% by weight of sodium carbonate, the exposed portion 210 is removed, and the patterned electrode film 212 remains (FIG. 2F).

Next, when firing is performed in a belt-type continuous firing furnace having a peak temperature of 593 ° C., the electrode film 21 remaining after development is
2 and the glass frit melts to reduce the line width and film thickness, and the electrode 213 is formed.
(G)).

Although it is possible to manufacture an electrode with no misalignment and no edge warpage by the above manufacturing method, a material similar to the second electrode film is formed on the electrode 213 in order to reduce the resistance value. The same effect can also be obtained by printing on a sheet and laminating it by the same method as the above method.

The reason why the misalignment does not occur and the reason why the edge does not warp when the electrodes having the laminated structure are formed in the above-described manner will be described. Regarding misalignment, self-alignment does not occur because the black layer, which is the first electrode film, substitutes for the exposure mask. Regarding the warpage of the edge, exposure from the back surface causes the exposure light to be scattered at the edge of the black layer serving as a mask, and to wrap around the vicinity of the edge of the black layer. The conductive layer of the positive-type material removed as a result has an inverted trapezoidal shape in which the line width decreases toward the electrode surface, and forms an electrode after development. Therefore, when the electrode shrinks during firing, the stress does not locally increase at the edge portion, and the warpage can be suppressed.

In the present embodiment, the photosensitive material may be a film material and the coating method may be a lamination method, and is not limited to the embodiment of the present invention.
Further, the photosensitive paste A does not have to be a negative type, and is not limited to the mode of the present invention. Further, the photosensitive pastes A and B may not contain ruthenium oxide and Ag, and are not limited to the mode of the present invention.
Further, the substrate on which the electrode film is formed may not be a glass substrate, and is not limited to the embodiment of the present invention. Further, a transparent electrode or the like may be formed in advance on a substrate such as glass. Further, the method of applying the photosensitive paste is not limited to the screen printing method, and is not limited to the embodiment of the present invention. Further, the number of layers to be stacked may not be two, and is not limited to the embodiment of the present invention. Drying after printing is performed at 90 ° C.
The temperature profile is not limited to the embodiment of the present invention, and may not be performed in the IR furnace. The exposure condition is an illuminance of 10 mW / c.
m ² , integrated light amount 300 mJ / cm ² , proxy amount 100μ
m is not necessary and is not limited to the mode of the present invention. Further, the developer does not need to contain 0.4% by weight of sodium carbonate, and is not limited to the embodiment of the present invention.
The firing after the development may not be performed in the peak temperature of 593 ° C. and the belt-type continuous firing furnace, and is not limited to this embodiment.

(Embodiment 2) FIG. 3 is a schematic cross-sectional and side view showing a main configuration of an electrode according to the present embodiment and a manufacturing process thereof.

First, a black negative photosensitive paste A containing ruthenium oxide particles is applied on a glass substrate 301 by using a screen printing method. Drying is performed by an IR furnace having a temperature profile that is maintained for a certain period of time to form a first electrode film 302 having reduced solvent and the like from the photosensitive paste A (FIG. 3).
(A)).

Next, the ultraviolet light 304 is applied to the exposure mask 3 which shares the pattern of the black matrix and the pattern of the electrode.
When exposed through No. 03, a crosslinking reaction proceeds from the film surface of the first electrode film 302 to polymerize and polymerize, and an exposed portion 305 of the electrode portion, an exposed portion 306 of the black matrix portion, and a non-exposed portion 307 are formed. (B)). At this time, the exposure conditions were as follows: illuminance: 10 mW / cm ²
0 mJ / cm ² , and the distance between the mask and the substrate (hereinafter referred to as a proxy amount) is 100 μm.

Next, when developed with a developing solution containing 0.4% by weight of sodium carbonate, the non-exposed portions 307 are removed, and the patterned electrode film 308 and the electrode film 309 serving as a black matrix remain (FIG. 3C). ).

Next, a positive photosensitive paste B containing Ag particles is selectively applied on the electrode film 308 and the electrode film 309 serving as a black matrix by using a screen printing method. , I of the profile
The second electrode film 310 in which the solvent and the like are reduced is formed from the positive photosensitive paste B by drying in an R furnace.
(D)). At this time, as a method of selectively applying the positive photosensitive paste B on the electrode film 308, the coating can be selectively applied by covering a portion not coated with an emulsion or the like on a printing screen to be used. . Note that the print screen has a problem that the alignment is shifted due to expansion and contraction as the number of times of use increases. However, in the case of the present embodiment, the print screen is not coated on the electrode film 309 serving as a black matrix but on the electrode film 308. Since it is sufficient that the electrodes are processed, there is sufficient time for the misalignment. Therefore, even if the number of times of the screen printing is increased, the electrodes can be formed without the problem of the alignment.

Next, by irradiating the entire surface with ultraviolet rays 313 from the substrate side, the black first electrode film 308 becomes a substitute for an exposure mask, and a non-exposed portion 312 is formed above the first electrode film 308.
However, the exposed portions 311 are formed in the unpatterned portions of the first electrode film 308, respectively. The exposure conditions at this time were illuminance 10 mW / cm ² , integrated light amount 300 mJ
/ Cm ² (FIG. 3E).

Next, when development is performed with a developer containing 0.4% by weight of sodium carbonate, the exposed portion 311 is removed, and the patterned electrode film 314 and the electrode film 309 serving as a black matrix remain on the glass substrate 301 (FIG. 3
(F)).

Next, when firing is performed in a belt-type continuous firing furnace having a peak temperature of 593 ° C., the electrode film 31 remaining after development is fired.
4 and the resin component in the electrode film 309 serving as a black matrix is vaporized and the glass frit is melted to reduce the line width and the film thickness.
16 are formed (FIG. 3G).

With the above-described manufacturing method, it is possible to manufacture simultaneously with the black matrix an electrode which does not cause misalignment and has no warpage of the edge. However, in order to reduce the resistance value, the same material as the second electrode film is used. Is selectively printed on the electrode 315 in the same manner, and the same effect can be obtained by laminating the electrodes by the same method as the above method.

In this embodiment, even if the photosensitive material is a film material and the coating method is a lamination method, the same effect can be obtained by the same manufacturing method as long as it can be selectively applied only on the electrodes.

In the present embodiment, the photosensitive paste A does not have to be a negative type, and is not limited to the embodiment of the present invention. In addition, photosensitive pastes A and B
May not contain ruthenium oxide and Ag, and is not limited to the mode of the present invention. Further, the substrate on which the electrode film is formed may not be a glass substrate, and is not limited to the embodiment of the present invention. Further, a transparent electrode or the like may be formed in advance on a substrate such as glass. Also,
The method for applying the photosensitive paste is not limited to the screen printing method, and is not limited to the embodiment of the present invention. Also,
The number of layers to be laminated does not have to be two and is not limited to the mode of the present invention. In addition, drying after printing is not limited to the embodiment of the present invention, and may not be performed in a temperature profile in which the temperature is linearly increased from room temperature to 90 ° C. and then maintained at 90 ° C. for a certain period of time and in an IR furnace. The exposure conditions are as follows: illuminance 10 mW / cm ² , integrated light amount 30
The present invention is not limited to 0 mJ / cm ² and the proxy amount is not limited to 100 μm. Further, the developer does not need to contain 0.4 wt% of sodium carbonate, and is not limited to the embodiment of the present invention. The firing after the development may not be performed in the belt-type continuous firing furnace with the peak temperature of 593 ° C., and is not limited to this embodiment.

[0036]

As described above, according to the electrode and the method of manufacturing the same according to the present invention, it is possible to form a high-quality electrode free from misalignment and warpage of edges.

[Brief description of the drawings]

FIG. 1 is a schematic view showing a conventional method for manufacturing an electrode.

FIG. 2 is a schematic diagram showing one of the manufacturing methods of the present invention according to the first embodiment.

FIG. 3 is a schematic view showing one of the manufacturing methods of the present invention according to the second embodiment.

[Explanation of symbols]

101, 201, 301 Front glass substrate 102, 202, 302 First electrode film 103, 208, 310 after printing Second electrode film 104, 111, 204, 211, 304, 313 after printing Ultraviolet light 105, 112, 203, 303 Exposure mask 107, 114, 205, 210, 311 Exposure part 106, 113, 206, 209, 307, 312 Non-exposure part 108, 115, 207, 212, 308, 314 Electrode film 109, 116, 213, after development 315 Electrode after firing 110 Third electrode film after printing 305 Exposure part of electrode part 306 Exposure part of black matrix part 309 Electrode film to be black matrix 316 Black matrix

 ──────────────────────────────────────────────────の Continued on the front page (72) Inventor Keisuke Sumita 1006 Kadoma Kadoma, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (72) Inventor Morio Fujitani 1006 Kadoma Kadoma City, Osaka Pref. Terms (reference) 5C027 AA02 5C040 GC19 GH07 MA23

Claims (6)

[Claims] 1. A method of manufacturing an electrode having a multilayer structure in which at least a black layer formed using a photosensitive material is a lowermost layer, comprising: forming a first layer pattern including a black layer on a transparent substrate; A step of applying a second layer conductive film, a step of exposing the entire surface of the transparent substrate from the back surface without using an exposure mask, a step of developing, and a step of baking. 2. A method of manufacturing an electrode having a multilayer structure in which at least a black layer formed using a photosensitive material is a lowermost layer, wherein the electrode and a black matrix are simultaneously formed. Simultaneously forming a black layer and a black matrix pattern, and selectively applying a second layer conductive film only to the electrode portion,
A method for manufacturing an electrode, comprising: a step of exposing the entire surface of a transparent substrate without using an exposure mask, a step of developing, and a step of baking. 3. The method for producing an electrode according to claim 1, wherein the black layer according to claim 1 is a photosensitive material containing ruthenium oxide or a ruthenium composite compound. 4. A method for producing an electrode, wherein the conductive layer according to claim 1 is a positive photosensitive material containing at least silver. 5. An electrode having a multilayer structure in which at least a black layer formed using a photosensitive material is a lowermost layer, wherein a width of the black layer in contact with the transparent substrate is larger than an uppermost layer width of the electrode. electrode. 6. A plasma display device using the electrode according to claim 5.