JPH0371530A - Manufacture of plasma display panel - Google Patents

Manufacture of plasma display panel

Info

Publication number
JPH0371530A
JPH0371530A JP1205960A JP20596089A JPH0371530A JP H0371530 A JPH0371530 A JP H0371530A JP 1205960 A JP1205960 A JP 1205960A JP 20596089 A JP20596089 A JP 20596089A JP H0371530 A JPH0371530 A JP H0371530A
Authority
JP
Japan
Prior art keywords
dielectric layer
black dielectric
conductive film
transparent
glass substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1205960A
Other languages
Japanese (ja)
Inventor
Yoshiyuki Hasegawa
長谷川 芳之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP1205960A priority Critical patent/JPH0371530A/en
Publication of JPH0371530A publication Critical patent/JPH0371530A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To easily manufacture a frontal substrate on which the position of a transparent electrode coincides with that of a black dielectric by using the black dielectric itself as a mask after it is formed, and by patterning the transparent electrode. CONSTITUTION:A material for black dielectric is printed on a frontal glass substrate 1 by screen-printing. It is then baked at a predetermined temperature so as to form a black dielectric layer 4, after which the frontal glass substrate 1 on which the black dielectric layer 4 is formed is transferred into an electric furnace, and is heated and moved to an evaporation chamber, while ternary chloride antimony is added to binary di-methyl tin and is heated and vaporized, and by transferring the vapor generated in the process into the evaporation chamber, along with heated air, a transparent conductive film 2 is obtained. On the transparent conductive film 2, a photo resist is applied, and is exposed with the black dielectric layer 4 formed prior thereto as a mask, and the transparent conductive film 2 on the black dielectric layer 4 is etched off, so as to form a transparent electrode 3 which is perfectly overlapped with the black dielectric layer 4.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、プラズマディスプレイパネルの製造方法に関
し、特に前面基板の形成方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for manufacturing a plasma display panel, and particularly to a method for forming a front substrate.

〔従来の技術〕[Conventional technology]

プラズマディスプレイパネルは、前面ガラス基板に形成
した電極と、後面ガラス基板に形成した電極とを、放電
可能な希ガスを介して相対向させ、それぞれの電極に印
加する電圧によって生ずる放電発光を表示に利用したデ
イスプレィである。この中でもX、Y電極から成るドツ
トマトリック2ACリフレツシユ形FDPは、表示品位
に優れ、高いコントラスト比を有する等の特徴の故に、
その用途はますます広がりつつある。さて、ACリフレ
ッシュ形PDPの前面基板側には、Sn○2等の透明電
極が用いられ、この透明電極の間隙には、パネルのコン
トラストを向上するために、黒色の誘電体層が透明電極
と平行にストライブ状に形成されている。
In a plasma display panel, an electrode formed on a front glass substrate and an electrode formed on a rear glass substrate are opposed to each other via a rare gas that can be discharged, and the discharge light produced by the voltage applied to each electrode is displayed. This is the display I used. Among these, the dot matrix 2AC refresh type FDP consisting of X and Y electrodes has excellent display quality and high contrast ratio.
Its uses are becoming increasingly widespread. Now, a transparent electrode such as Sn○2 is used on the front substrate side of an AC refresh type PDP, and a black dielectric layer is placed between the transparent electrode and the transparent electrode in order to improve the contrast of the panel. They are formed in parallel stripes.

従来、かかる黒色誘電体層及び透明電極は、第3図に示
す方法により形成されていた。従来の形成方法につき第
3図を用いて説明する。まず、第3図(a)に示すよう
に、前面ガラス基板1上に、ガラス基板1の軟化点70
0 ’C以下の温度で、すなわち600℃〜650 ’
Cの温度に加熱して透明導電[2を全面にわたって被着
させる。次にフォトリソグラフィの手法により透明導電
膜2の不要な部分をエツチングし、第3図(b)に示す
透明電極3を形成する。しかる後、パネル表示面のコン
トラスト比を上げるために透明電極3の電極間隙に、黒
色の誘電体材料を用いてスクリーン印刷し、これを焼成
することにより第3図(C)に示す黒色誘電体層4を形
成していた。
Conventionally, such a black dielectric layer and transparent electrode have been formed by the method shown in FIG. A conventional forming method will be explained using FIG. 3. First, as shown in FIG. 3(a), on the front glass substrate 1,
At temperatures below 0'C, i.e. 600°C to 650'
The transparent conductor [2] is coated over the entire surface by heating to a temperature of C. Next, unnecessary portions of the transparent conductive film 2 are etched by photolithography to form the transparent electrode 3 shown in FIG. 3(b). Thereafter, in order to increase the contrast ratio of the panel display surface, a black dielectric material is screen printed on the electrode gap of the transparent electrode 3, and this is fired to form a black dielectric material as shown in FIG. 3(C). It formed layer 4.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

ところが、表示パターンが高密度、高精細なものになる
と、上述した従来の方法によって黒色誘電体層を形成す
る場合には、ガラス基板上の透明電極パターンと印刷し
ようとする黒色誘電体層パターンの位置合わせに多大の
時間を必要としていた。又、第3図(d)に示すように
全体的なズレ、又は局部的なズレが発生して透明電極3
と黒色誘電体層との重なりが発生し、表示ドツトが実質
的に縮小してしまい点灯発光時の光量が減少し暗く見え
ることがあるという欠点があった。この原因は、透明電
極形成時比較的高い温度(600℃〜650℃)にて基
板を処理したときのガラス基板の不均一な伸縮によって
生じる透明電極の不均一な伸縮を解消するためフォトリ
ソグラフィによって透明電極をバターニングしているが
、この時パターンフィルムを使用しての露光時にガラス
基板のセツティング位置に若干のズレが生じることがあ
るためである。高密度、高精細になればなる程、この傾
向が強くなるため、極端な場合には、ガラス基板−枚毎
に誘電体層印刷位置を透明電極パターンに合わせて調整
する作業が必要であった。従って、第3図(d’ )に
示すようなズレによる重なりか見過されることもしばし
ばあり、ひどい場合は明るさが規格を満足せず大量の不
良品が作り込まれることもあった。
However, as display patterns become denser and more precise, when forming a black dielectric layer using the conventional method described above, there is a difference between the transparent electrode pattern on the glass substrate and the black dielectric layer pattern to be printed. It took a lot of time to align. In addition, as shown in FIG. 3(d), overall or local misalignment occurs and the transparent electrode 3
There is a problem in that the display dots are overlapped with the black dielectric layer, the display dots are substantially reduced, and the amount of light during lighting is reduced, resulting in a dark appearance. The reason for this is that photolithography is used to eliminate uneven expansion and contraction of the transparent electrode caused by uneven expansion and contraction of the glass substrate when the substrate is processed at relatively high temperatures (600°C to 650°C) during transparent electrode formation. This is because although the transparent electrode is patterned, a slight deviation may occur in the setting position of the glass substrate during exposure using a patterned film. This tendency becomes stronger as the density and definition increase, so in extreme cases, it was necessary to adjust the printing position of the dielectric layer on each glass substrate to match the transparent electrode pattern. . Therefore, overlaps due to misalignment as shown in FIG. 3(d') are often overlooked, and in severe cases, the brightness does not meet the standard and a large number of defective products are manufactured.

〔課題を解決するための手段〕[Means to solve the problem]

本発明によるプラズマディスプレイパネルの前面基板の
製造方法は、透明ガラス基板上に黒色誘電体材料をあら
かじめスクリーン印刷法などにより所定のパターン(形
成したい透明電極パターンの反転したパターンとする)
にて形成し、焼成し誘電体層を作る工程と、ガラス基板
全面に透明導電膜を形成し、更に透明導電膜の表面にフ
ォトレジストを塗布する工程と、この塗布面の裏側より
黒色誘電体層をマスクとして露光しエツチングすること
により、光のあたらなかった黒色誘電体層のパターン形
状の透明導電膜を除去して黒色誘電体層の間に透明電極
を形成する工程とを有している。
The method for manufacturing a front substrate of a plasma display panel according to the present invention is to apply a black dielectric material to a transparent glass substrate in advance using a screen printing method or the like in a predetermined pattern (a pattern that is the inverse of the desired transparent electrode pattern).
The first step is to form a transparent conductive film on the entire surface of the glass substrate, and then apply a photoresist to the surface of the transparent conductive film. By exposing and etching the layer as a mask, the pattern-shaped transparent conductive film of the black dielectric layer that has not been exposed to light is removed, and a transparent electrode is formed between the black dielectric layers. .

〔実施例〕〔Example〕

次に、本発明について図面を参照して説明する。第1図
(a)〜(c)は、本発明の第1の実施例の形成工程を
示す断面図である。まず、第1図(a)に示すように、
675±10℃の焼成温度で使用するペースト状にした
黒色誘電体材料をスクリーン印刷にて前面ガラス基板1
上へプリントする。このプリントパターンは所望の透明
電極3のパターンの反転パターンとする。次に焼成温度
(675±10″C)で焼成し黒色誘電体層4を形成す
る。しかる後、第1図(b)に示すように黒色誘電体層
4を形成した前面ガラス基板1を電気炉に送入し、60
0℃〜650℃の温度まで加熱して蒸着室に移送すると
ともに、二塩化ジメチル錫に1.5%程度の三塩化アン
チモンを混合して加熱気化させ、これらの蒸気を加熱空
気と共に蒸着室に送り込むことにより、第1図(b)の
透明導電膜2を得ることができる。続いて透明導電M2
」ユにフォトレジストを塗布し、先に形成してあった黒
色誘電体層4をマスクとして露光し、黒色誘電体N4上
の透明導電IIQ2をエツチングによって除去し、第1
図(C)に示すように黒色誘電体N4と完全に位置が合
った透明電極3を形成することができた。
Next, the present invention will be explained with reference to the drawings. FIGS. 1(a) to 1(c) are cross-sectional views showing the formation process of the first embodiment of the present invention. First, as shown in Figure 1(a),
Front glass substrate 1 is made by screen printing a paste-like black dielectric material used at a firing temperature of 675±10°C.
Print on top. This printed pattern is an inverse pattern of the desired pattern of the transparent electrode 3. Next, the black dielectric layer 4 is formed by firing at a firing temperature (675±10"C). Thereafter, as shown in FIG. 1(b), the front glass substrate 1 with the black dielectric layer 4 formed thereon is heated Pour into the furnace and heat at 60
At the same time, it is heated to a temperature of 0°C to 650°C and transferred to the vapor deposition chamber, and about 1.5% antimony trichloride is mixed with dimethyltin dichloride, heated and vaporized, and these vapors are transferred to the vapor deposition chamber together with heated air. By feeding, the transparent conductive film 2 shown in FIG. 1(b) can be obtained. Next, transparent conductive M2
A photoresist is applied to the surface of the first layer, exposed using the previously formed black dielectric layer 4 as a mask, and the transparent conductive IIQ2 on the black dielectric layer N4 is removed by etching.
As shown in Figure (C), a transparent electrode 3 perfectly aligned with the black dielectric N4 could be formed.

第2図(a)〜(c)は、本発明の第2の実施例の誘電
体層及び透明電極の形成工程を示す断面図である。まず
、第2図(a)に示すように675±10°Cの焼成温
度で使用するペースト上にした黒色誘電体材料をスクリ
ーン印刷にて透明ガラス基板1」ニへプリントし、黒色
誘電体層4を形成する。このプリントパターンは所望の
透明電極3のパターンの反転パターンとする。これを乾
燥後、更に黒色誘電体材料とAg2O3粉末を混合し、
ペースト状としたものをスクリーン印刷にて30〜15
0μm程度の厚さで先のパターンに重ねてプリントし、
チャンネル5を形成する。このプリン)・パターンはス
トライブ状とし、先にプリントされた黒色誘電体層4よ
り細くなっていてプリントだれが考慮されている。この
後焼成<675±10℃)で焼成する。しかる後は第1
の実施例と同じなので説明を省略する。この実施例では
、従来最終工程で形成される放電セル間の隔壁及び放電
ギャップを出すためのチャンネルが最初の工程で形成さ
れてしまうため以降の焼成工程での基板の伸び縮みの影
響を受けることがなく透明電極に対して位置の完全に合
ったチャンネルを形成できる利点を有する。又、従来チ
ャンネルは電極と直角に交差するよう形成されていたか
、本実施例のように電極と平行にすることにより前面ガ
ラス基板と後面ガラス基板の組立時の位置合わせも簡単
になっていて位置合わせ工数が低減できる利点を有する
FIGS. 2(a) to 2(c) are cross-sectional views showing the steps of forming a dielectric layer and a transparent electrode in a second embodiment of the present invention. First, as shown in Fig. 2(a), a black dielectric material made into a paste to be used at a firing temperature of 675±10°C is printed onto a transparent glass substrate 1'' by screen printing, and a black dielectric layer is formed. form 4. This printed pattern is an inverse pattern of the desired pattern of the transparent electrode 3. After drying this, further mix black dielectric material and Ag2O3 powder,
30-15 by screen printing paste
Print over the previous pattern with a thickness of about 0 μm,
Form channel 5. This print pattern is in the form of a stripe and is thinner than the black dielectric layer 4 printed previously, so that printing sag is taken into consideration. This is followed by firing at <675±10°C). After that, the first
Since this is the same as the embodiment, the explanation will be omitted. In this example, the barrier ribs between the discharge cells and the channel for creating the discharge gap, which are conventionally formed in the final process, are formed in the first process, so they are affected by the expansion and contraction of the substrate in the subsequent firing process. It has the advantage that it is possible to form a channel perfectly aligned with the transparent electrode without any interference. In addition, conventionally the channels were formed to intersect the electrodes at right angles, but by making them parallel to the electrodes as in this example, it is easier to align the front and rear glass substrates when assembling them. It has the advantage of reducing the number of man-hours required for alignment.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明は、従来透明電極形成後に透
明電極の間隙に黒色誘電体層をスクリーン印刷していた
のに対し黒色誘電体層を形成後に黒色誘電体層自体をマ
スクとして使用し、フォトリソグラフィの手法により透
明電極をバターニングすることにより、透明電極と黒色
誘電体との位置が完全に一致したプラズマデイスプレィ
用前面基板を簡単に製造できる効果がある。
As explained above, the present invention uses the black dielectric layer itself as a mask after forming the black dielectric layer, whereas conventionally a black dielectric layer was screen printed in the gap between the transparent electrodes after forming the transparent electrode. By patterning the transparent electrode using photolithography, it is possible to easily manufacture a front substrate for a plasma display in which the positions of the transparent electrode and the black dielectric material are completely aligned.

従って、位置合わせ時間が必要でないためコス1−低減
が実現できかつ、透明電極と黒色誘電体の重なりは全く
なくなるため、光量の安定した、すなわち品質の向上し
たプラズマディスプレイパネルを提供できる効果がある
Therefore, since alignment time is not required, cost reduction can be achieved, and since there is no overlap between the transparent electrode and the black dielectric material, it is possible to provide a plasma display panel with stable light intensity, that is, with improved quality. .

【図面の簡単な説明】[Brief explanation of drawings]

第1図(a)〜(c)は本発明の第1の実施例の製造工
程を示す断面図、第2図<a)〜(C)は本発明の第2
の実施例の製造工程を示す断面図、第3図(a)〜(d
)は、従来のプラズマディスプレイパネルの前面基板製
造工程を示す断面図である。 1・・・前面ガラス基板、2・・・透明導電膜(ネサ膜
)、3・・・透明電極、4・・・黒色誘電体層、5・・
・チ“71″・     1.ユ7、;fj−J!Lt
: nい 。 第7図 第2図
FIGS. 1(a) to (c) are cross-sectional views showing the manufacturing process of the first embodiment of the present invention, and FIGS.
FIGS. 3(a) to 3(d) are cross-sectional views showing the manufacturing process of the example.
) is a sectional view showing a manufacturing process of a front substrate of a conventional plasma display panel. DESCRIPTION OF SYMBOLS 1... Front glass substrate, 2... Transparent conductive film (NESA film), 3... Transparent electrode, 4... Black dielectric layer, 5...
・CH “71”・ 1. Yu7, ;fj-J! Lt.
: n. Figure 7 Figure 2

Claims (1)

【特許請求の範囲】[Claims] 多数の互いに平行な帯状の透光性かつ導電性のあるX電
極群と該X電極個々の間に形成された遮光性かつ絶縁性
のある互いに平行な帯状の誘電体層とを有する透明ガラ
スを基板とした前面基板と、多数の互いに平行な線状の
Y電極群を有する後面基板とを、前記X電極群とY電極
群とが相対向し所定の放電ギャップを得るように気密封
止し、内部に放電可能な希ガスを封入してなり、前記X
電極群と前記Y電極群の交差部分が放電空間となるプラ
ズマディスプレイパネルの製造方法において、前記前面
基板は、透明ガラスの基板上に遮光性かつ絶縁性のある
誘電体材料を前記X電極群のパターンの反転パターンの
形状でスクリーン印刷し、焼成し誘電体層を形成する工
程と、前記誘電体層の形成されたガラス基板の全面に透
明導電膜を形成し、更に該透明導電膜上にフォトレジス
トを塗布する工程と、すでに形成されている遮光性のあ
る前記誘電体層自体をマスクとして用い、前記ガラス基
板の裏側より露光した後エッチングすることにより、前
記誘電体層の間に透明電極を形成する工程とにより形成
されたことを特徴とするプラズマディスプレイパネルの
製造方法。
A transparent glass having a large number of mutually parallel strip-shaped light-transmitting and conductive X electrodes and a mutually parallel strip-shaped dielectric layer having light-shielding and insulating properties formed between each of the X electrodes. A front substrate used as a substrate and a rear substrate having a large number of linear Y electrode groups parallel to each other are hermetically sealed so that the X electrode groups and Y electrode groups face each other to obtain a predetermined discharge gap. , a dischargeable rare gas is sealed inside, and the X
In the method for manufacturing a plasma display panel in which the intersection of the electrode group and the Y electrode group is a discharge space, the front substrate is formed by disposing a light-shielding and insulating dielectric material on a transparent glass substrate. A process of screen printing in the shape of an inverted pattern and baking to form a dielectric layer, forming a transparent conductive film on the entire surface of the glass substrate on which the dielectric layer is formed, and then photocoating the transparent conductive film on the transparent conductive film. A transparent electrode is formed between the dielectric layers by applying a resist and using the already formed dielectric layer itself as a mask to expose the glass substrate to light from the back side and then etching it. 1. A method of manufacturing a plasma display panel, characterized in that the plasma display panel is formed by a step of forming.
JP1205960A 1989-08-08 1989-08-08 Manufacture of plasma display panel Pending JPH0371530A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1205960A JPH0371530A (en) 1989-08-08 1989-08-08 Manufacture of plasma display panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1205960A JPH0371530A (en) 1989-08-08 1989-08-08 Manufacture of plasma display panel

Publications (1)

Publication Number Publication Date
JPH0371530A true JPH0371530A (en) 1991-03-27

Family

ID=16515557

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1205960A Pending JPH0371530A (en) 1989-08-08 1989-08-08 Manufacture of plasma display panel

Country Status (1)

Country Link
JP (1) JPH0371530A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000003763A (en) * 1998-06-29 2000-01-25 김영환 Method for forming transparent electrode of plasma display panel
EP1041600A1 (en) 1995-08-25 2000-10-04 Fujitsu Limited A surface discharge plasma display panel and a manufacturing method therefor
JP4691834B2 (en) * 2001-06-12 2011-06-01 パナソニック株式会社 Electrode and manufacturing method thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1041600A1 (en) 1995-08-25 2000-10-04 Fujitsu Limited A surface discharge plasma display panel and a manufacturing method therefor
EP1041600B1 (en) * 1995-08-25 2010-10-13 Hitachi Plasma Patent Licensing Co., Ltd. Method for Manufacturing a surface discharge plasma display panel
KR20000003763A (en) * 1998-06-29 2000-01-25 김영환 Method for forming transparent electrode of plasma display panel
JP4691834B2 (en) * 2001-06-12 2011-06-01 パナソニック株式会社 Electrode and manufacturing method thereof

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