JPH0627944Y2 - 気相成長装置 - Google Patents
気相成長装置Info
- Publication number
- JPH0627944Y2 JPH0627944Y2 JP1987135553U JP13555387U JPH0627944Y2 JP H0627944 Y2 JPH0627944 Y2 JP H0627944Y2 JP 1987135553 U JP1987135553 U JP 1987135553U JP 13555387 U JP13555387 U JP 13555387U JP H0627944 Y2 JPH0627944 Y2 JP H0627944Y2
- Authority
- JP
- Japan
- Prior art keywords
- pipe
- raw material
- vacuum
- vapor phase
- phase growth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987135553U JPH0627944Y2 (ja) | 1987-09-07 | 1987-09-07 | 気相成長装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987135553U JPH0627944Y2 (ja) | 1987-09-07 | 1987-09-07 | 気相成長装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6441128U JPS6441128U (en, 2012) | 1989-03-13 |
JPH0627944Y2 true JPH0627944Y2 (ja) | 1994-07-27 |
Family
ID=31395282
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1987135553U Expired - Lifetime JPH0627944Y2 (ja) | 1987-09-07 | 1987-09-07 | 気相成長装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0627944Y2 (en, 2012) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06244120A (ja) * | 1993-02-19 | 1994-09-02 | Sony Corp | ウエハ処理装置におけるガス供給装置 |
JP3706685B2 (ja) * | 1996-06-10 | 2005-10-12 | キヤノン株式会社 | 半導体を作製する装置のガス供給方法 |
JP6814561B2 (ja) * | 2016-07-07 | 2021-01-20 | 昭和電工株式会社 | ガス配管システム、化学気相成長装置、成膜方法及びSiCエピタキシャルウェハの製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5748850A (en) * | 1980-09-08 | 1982-03-20 | Fujitsu Ltd | Carrier reproducing circuit |
-
1987
- 1987-09-07 JP JP1987135553U patent/JPH0627944Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS6441128U (en, 2012) | 1989-03-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5250092A (en) | Exhaust apparatus for epitaxial growth system | |
JP2797233B2 (ja) | 薄膜成長装置 | |
KR20040030063A (ko) | 일체형 블록, 화학약품 전달 시스템 및 초고순도화학약품의 전달 방법 | |
US7487806B2 (en) | Source liquid supply apparatus having a cleaning function | |
TW201546317A (zh) | 淨化cvd反應器中之廢氣的裝置及方法 | |
JP3360539B2 (ja) | ガス供給装置及び気相成長用設備 | |
US6345642B1 (en) | Method and apparatus for removing processing liquid from a processing liquid path | |
JPH0627944Y2 (ja) | 気相成長装置 | |
JPH07118459B2 (ja) | 気相成長装置のリークチェック方法 | |
US6536460B1 (en) | Process line purge system and method | |
CN205956645U (zh) | 一种mocvd尾气处理系统用的管道防结垢结构 | |
KR20010023921A (ko) | 일체형 필터를 갖는 앰플 | |
JPH03183693A (ja) | 気相成長装置のクリーニング方法及び装置 | |
JPH03235324A (ja) | 半導体成長装置 | |
JP2556625Y2 (ja) | 気相成長装置 | |
CN222250963U (zh) | 一种新型半导体设备尾气管道气流稳定装置 | |
JPH0758018A (ja) | 半導体結晶成長装置 | |
JPH05177126A (ja) | 有害液体供給装置 | |
JPS60875A (ja) | 超純水供給装置 | |
JPH01319929A (ja) | 結晶成長装置 | |
JPH05264000A (ja) | 超高純度窒素の分配設備及びその使用方法 | |
JP3079077B2 (ja) | 有機金属気相成長装置 | |
JPH01201916A (ja) | 気相成長装置における排気処理部及びその運転方法 | |
JPH10199814A (ja) | 半導体気相成長装置 | |
JPS6322173B2 (en, 2012) |