JPH06154715A - Washing device - Google Patents
Washing deviceInfo
- Publication number
- JPH06154715A JPH06154715A JP30689092A JP30689092A JPH06154715A JP H06154715 A JPH06154715 A JP H06154715A JP 30689092 A JP30689092 A JP 30689092A JP 30689092 A JP30689092 A JP 30689092A JP H06154715 A JPH06154715 A JP H06154715A
- Authority
- JP
- Japan
- Prior art keywords
- tank
- cleaning
- liquid crystal
- washing
- cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、液晶セルもしくはその
基板等の洗浄に用いられる洗浄装置に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning device used for cleaning a liquid crystal cell or its substrate.
【0002】[0002]
【従来の技術】例えば液晶表示素子に用いられる液晶セ
ルは、表示用の透明電極および配向膜等を形成した一対
の透明基板を液晶封入領域を囲む枠状のシール材を介し
て接着しセル本体を組立て、このセル本体内(両基板間
の間隙)に前記シール材の一部にあらかじめ形成してお
いた液晶注入口から真空注入法によって液晶を充填した
後、前記液晶注入口を封止して製造されており、製造さ
れた液晶セルは、これを洗浄した後に液晶表示素子の組
立てライン(液晶セルの両面に偏光板を接着するライ
ン)に送られている。2. Description of the Related Art A liquid crystal cell used in, for example, a liquid crystal display device is constructed by adhering a pair of transparent substrates on which transparent electrodes for display and an alignment film are formed through a frame-shaped sealing material surrounding a liquid crystal enclosing region. After assembling, the inside of the cell (the gap between the two substrates) was filled with liquid crystal by a vacuum injection method from a liquid crystal injection port that was previously formed in a part of the sealing material, and then the liquid crystal injection port was sealed. The manufactured liquid crystal cell is sent to an assembly line for liquid crystal display elements (a line for adhering polarizing plates to both surfaces of the liquid crystal cell) after cleaning the liquid crystal cell.
【0003】また、上記液晶セルの一対の基板は、ガラ
ス板等からなっており、この基板上に設けられる透明電
極や配向膜等は、その形成前にその基板を洗浄してから
形成され、また透明電極および配向膜等を形成した基板
は、これを洗浄した後にセル本体の組立てラインに送ら
れている。上記液晶セルやその基板等の洗浄は、ディッ
プ式の洗浄装置によって行なわれている。Further, the pair of substrates of the liquid crystal cell is made of a glass plate or the like, and the transparent electrodes, the alignment film and the like provided on the substrate are formed by cleaning the substrate before its formation, The substrate on which the transparent electrodes and the alignment film are formed is washed and then sent to the cell body assembly line. The liquid crystal cell, the substrate thereof, and the like are cleaned by a dip-type cleaning device.
【0004】図2は液晶セルやその基板等の洗浄に用い
られている従来の洗浄装置の側面図であり、この洗浄装
置は、洗浄部10と、この洗浄部10の手前に設けられ
た予洗槽20とからなっている。FIG. 2 is a side view of a conventional cleaning device used for cleaning a liquid crystal cell, a substrate thereof, and the like. This cleaning device includes a cleaning unit 10 and a pre-cleaning unit provided in front of the cleaning unit 10. It consists of a tank 20.
【0005】上記洗浄部10は、洗浄槽11、第1すす
ぎ槽12、第2すすぎ槽13、揮発溶剤槽14および乾
燥槽15からなっており、これら各槽11〜15は順に
並べて配置されている。The cleaning unit 10 comprises a cleaning tank 11, a first rinsing tank 12, a second rinsing tank 13, a volatile solvent tank 14 and a drying tank 15, and these tanks 11 to 15 are arranged in order. There is.
【0006】上記洗浄槽11には、純水に洗剤を溶解さ
せた洗剤溶液が満たされている。また、第1および第2
のすすぎ槽12,13にはそれぞれ純水が満たされてお
り、第1すすぎ槽12内の純水は図示しないヒータによ
って加熱されて数十℃の温水とされている。なお、第2
すすぎ槽13内の純水の温度は室温である。The cleaning tank 11 is filled with a detergent solution prepared by dissolving detergent in pure water. Also, the first and second
The rinsing tanks 12 and 13 are filled with pure water, and the pure water in the first rinsing tank 12 is heated by a heater (not shown) to be hot water of several tens of degrees Celsius. The second
The temperature of pure water in the rinsing tank 13 is room temperature.
【0007】また、上記揮発溶剤槽14には、IPA
(イソ・プロピル・アルコール)等の水溶性揮発溶剤が
満たされており、乾燥槽15には槽内に温風を送風する
送風機(図示せず)が設けられている。Further, the volatile solvent tank 14 contains IPA.
It is filled with a water-soluble volatile solvent such as (iso-propyl-alcohol), and the drying tank 15 is provided with a blower (not shown) for blowing warm air into the tank.
【0008】一方、上記予洗槽20には予洗洗浄水(純
水)が満たされており、この予洗槽20の後端部(洗浄
部10側の端部)の底部には、予洗槽20内の洗浄水に
超音波振動を与える超音波振動子21が設けられてい
る。On the other hand, the prewash tank 20 is filled with prewash cleaning water (pure water), and the bottom of the rear end of the prewash tank 20 (the end on the cleaning unit 10 side) has the inside of the prewash tank 20. An ultrasonic oscillator 21 that applies ultrasonic vibration to the cleaning water is provided.
【0009】また、図2において、30は予洗槽20お
よび洗浄部10の上方に設けられた被洗浄物搬送機構で
あり、この搬送機構30は、被洗浄物を予洗槽20およ
び洗浄部10の各槽11〜15に順次搬送する。Further, in FIG. 2, reference numeral 30 denotes an object-to-be-cleaned transfer mechanism provided above the prewash tank 20 and the cleaning section 10. The transfer mechanism 30 transfers the object to be cleaned to the prewash tank 20 and the cleaning section 10. It is sequentially conveyed to each tank 11-15.
【0010】この洗浄装置による被洗浄物の洗浄を、液
晶セルの洗浄を例にとって説明すると、被洗浄物である
液晶セル1は、複数枚ずつキャリヤラック2に保持され
てセルカセットAとされ、カセット搬送機構30によっ
て予洗槽20の上に搬送されてくる。The cleaning of the object to be cleaned by this cleaning apparatus will be described by taking the cleaning of the liquid crystal cell as an example. A plurality of liquid crystal cells 1 as the object to be cleaned are held on the carrier rack 2 to form a cell cassette A. The cassette is transferred onto the prewash tank 20 by the cassette transfer mechanism 30.
【0011】なお、上記キャリヤラック2は、周側面お
よび上下面が開放する枠体からなっており、各液晶セル
1は、垂直に立てた状態で互いに間隔をおいて前後に並
べられ、その下縁部および両側縁部をキャリヤラック2
に保持されている。The carrier rack 2 is composed of a frame body whose peripheral side surfaces and upper and lower surfaces are open. The liquid crystal cells 1 are arranged vertically at a distance from each other in a vertically standing state. Carrier rack 2 on both edges and both edges
Held in.
【0012】そして、予洗槽20の上に搬送されてきた
セルカセットAは、予洗槽20内の前端部に下げ降ろさ
れて洗浄水中に浸漬され、その後、予洗槽20内を水平
に間欠搬送されながら、その間に各液晶セル1が予洗さ
れる。The cell cassette A, which has been conveyed onto the prewash tank 20, is lowered to the front end of the prewash tank 20 and immersed in the wash water. After that, the cell cassette A is intermittently conveyed horizontally within the prewash tank 20. Meanwhile, each liquid crystal cell 1 is prewashed in the meantime.
【0013】なお、この予洗槽20は、液晶セル1の予
洗時間を十分にとるために、洗浄部10の各槽11〜1
5の槽長(セルカセット搬送方向の長さ)に比べて数倍
(図では約3倍)の槽長をもつ大型槽とされており、こ
の予洗槽20内でのセルカセットAの水平搬送は、洗浄
部10の各槽11〜15にセルカセットAを順次搬送す
るタイミングで行なわれる。The pre-washing tank 20 is provided with each of the tanks 11 to 1 of the washing section 10 in order to ensure a sufficient pre-washing time of the liquid crystal cell 1.
It is a large tank with a tank length several times (about 3 times in the figure) compared to the tank length of 5 (length in the cell cassette transfer direction), and the horizontal transfer of the cell cassette A in this pre-wash tank 20 is performed. Is performed at the timing of sequentially transporting the cell cassette A to the tanks 11 to 15 of the cleaning unit 10.
【0014】また、予洗槽20内をその後端部まで水平
搬送されてきたセルカセットAは、予洗槽20から引上
げられて洗浄部10に送られ、まず洗浄槽11に浸漬さ
れて洗剤溶液により各液晶セル1が本洗浄される。The cell cassette A, which has been horizontally conveyed in the pre-wash tank 20 to the rear end thereof, is pulled up from the pre-wash tank 20 and sent to the washing section 10. First, the cell cassette A is immersed in the wash tank 11 and washed with a detergent solution. The liquid crystal cell 1 is subjected to main cleaning.
【0015】次に、セルカセットAは、第1および第2
のすすぎ槽12,13に順次浸漬され、各液晶セル1を
温水と純水によってすすぎ洗いされた後、揮発溶剤槽1
4に浸漬される。この揮発溶剤槽14にセルカセットA
を浸漬すると、各液晶セル1に付着しているすすぎ水を
水溶性揮発溶剤中に溶解する。Next, the cell cassette A has the first and second cell cassettes.
After being successively immersed in the rinsing tanks 12 and 13, each liquid crystal cell 1 was rinsed with warm water and pure water, the volatile solvent tank 1
4 is immersed. The cell cassette A is placed in the volatile solvent tank 14.
When immersed in, the rinse water adhering to each liquid crystal cell 1 is dissolved in the water-soluble volatile solvent.
【0016】次に、セルカセットAは、乾燥槽15内に
送られて各液晶セル1を温風乾燥され、この後、乾燥槽
15から引上げられて、液晶表示素子の組立てラインに
送られる。Next, the cell cassette A is sent into the drying tank 15 to dry each liquid crystal cell 1 with warm air, and then the cell cassette A is pulled up from the drying tank 15 and sent to the assembly line of the liquid crystal display element.
【0017】なお、ここでは液晶セル1の洗浄について
説明したが、上記洗浄装置は、液晶セルに用いる基板等
の洗浄にも利用されており、この基板等の洗浄も上記と
同様にして行なわれている。Although the cleaning of the liquid crystal cell 1 has been described here, the cleaning device is also used for cleaning the substrate and the like used for the liquid crystal cell, and the cleaning of the substrate and the like is performed in the same manner as described above. ing.
【0018】すなわち、上記洗浄装置は、被洗浄物を予
洗槽20において予洗した後に、この被洗浄物を洗浄部
10に搬送して本洗浄および乾燥を行なうものであり、
このように被洗浄物を予洗してから本洗浄すれば、被洗
浄物を効果的に洗浄することができる。That is, the above-mentioned cleaning device pre-cleans an object to be cleaned in the pre-cleaning tank 20 and then conveys the object to be cleaned to the cleaning section 10 for main cleaning and drying.
By prewashing the object to be cleaned and then performing the main cleaning in this way, the object to be cleaned can be effectively cleaned.
【0019】[0019]
【発明が解決しようとする課題】しかしながら、上記従
来の洗浄装置は、予洗槽20での被洗浄物の洗浄力が弱
く、そのため、被洗浄物が十分に予洗されないまま洗浄
部10に送られてしまうという問題をもっていた。However, in the above-mentioned conventional cleaning device, the cleaning power of the object to be cleaned in the pre-cleaning tank 20 is weak, and therefore the object to be cleaned is sent to the cleaning section 10 without being sufficiently pre-cleaned. I had the problem of being lost.
【0020】すなわち、従来の洗浄装置では、予洗槽2
0に槽内の洗浄水に超音波振動を与える超音波振動子2
1を設けてはいるが、予洗槽20は上述したように槽長
の長い大型槽とされているため、超音波振動子21から
遠い箇所では洗浄水がほとんど振動せず、したがって被
洗浄物は、単に水中に漬かっている状態で予洗槽20を
移動し、超音波振動子21の付近にきたときのみ超音波
洗浄によって表面の汚れが除去されるだけである。That is, in the conventional cleaning device, the prewash tank 2
Ultrasonic transducer 2 that applies ultrasonic vibration to the cleaning water in the tank
However, since the pre-washing tank 20 is a large tank having a long tank length as described above, the washing water hardly vibrates at a position far from the ultrasonic vibrator 21, and thus the object to be washed is The surface cleaning is only removed by moving the pre-cleaning tank 20 while being immersed in water, and only when it comes near the ultrasonic transducer 21 by ultrasonic cleaning.
【0021】そして、従来の洗浄装置では、被洗浄物が
十分に予洗されないまま予洗槽20から洗浄部10に送
られてしまうため、被洗浄物を十分に洗浄するには、洗
浄部10の洗浄槽11での洗浄時間を長くとらなければ
ならず、したがって洗浄効率が悪くなる。In the conventional cleaning apparatus, the object to be cleaned is sent from the pre-cleaning tank 20 to the cleaning section 10 without being sufficiently pre-cleaned. Therefore, in order to sufficiently clean the object to be cleaned, the cleaning section 10 is cleaned. The cleaning time in the tank 11 must be long, so that the cleaning efficiency becomes poor.
【0022】本発明は、予洗槽での被洗浄物の洗浄力を
高くし、十分に予洗された被洗浄物を洗浄部に送って効
率の良い洗浄を行なうことができる洗浄装置を提供する
ことを目的としたものである。The present invention provides a cleaning device capable of enhancing the cleaning power of an object to be cleaned in a pre-cleaning tank and sending a sufficiently pre-cleaned object to a cleaning section to perform efficient cleaning. It is intended for.
【0023】[0023]
【課題を解決するための手段】本発明は、洗浄槽を備え
た洗浄部の手前に予洗槽を設けてなり、被洗浄物を前記
予洗槽において予洗した後、この被洗浄物を前記洗浄部
の洗浄槽に搬入して本洗浄する洗浄装置において、前記
予洗槽に、この予洗槽内の洗浄水に超音波振動を与える
超音波振動子と、前記洗浄水中に気体を噴出する給気手
段とを設けたことを特徴とするものである。According to the present invention, a pre-washing tank is provided in front of a washing section having a washing tank, and the article to be washed is pre-washed in the pre-washing tank, and then the article to be washed is put into the washing section. In the cleaning device for carrying into the cleaning tank and performing main cleaning, an ultrasonic vibrator for applying ultrasonic vibration to the cleaning water in the pre-cleaning tank, and an air supply unit for ejecting a gas into the cleaning water in the pre-cleaning tank. Is provided.
【0024】[0024]
【作用】すなわち、本発明は、予洗槽内の洗浄水に超音
波振動を与えるだけでなく、この洗浄水中に気体を噴出
して洗浄水を泡立てやるようにしたものであり、このよ
うにすれば、被洗浄物が超音波振動子の付近にきたとき
に超音波洗浄によって表面の汚れを除去されるととも
に、洗浄水が泡立てられている箇所にきたときに、気泡
の衝突による衝撃を受けて表面の汚れを除去される。That is, according to the present invention, not only ultrasonic vibration is applied to the cleaning water in the pre-cleaning tank, but also a gas is jetted into the cleaning water to bubble the cleaning water. For example, when the object to be cleaned comes near the ultrasonic vibrator, the surface is cleaned by ultrasonic cleaning, and when it comes to the place where the cleaning water is foamed, it is impacted by the collision of bubbles. The dirt on the surface is removed.
【0025】[0025]
【実施例】以下、本発明の一実施例を図1を参照して説
明する。なお、図1において、図2に示した従来の洗浄
装置に対応するものには同符号を付し、重複する説明は
省略する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT An embodiment of the present invention will be described below with reference to FIG. In FIG. 1, parts corresponding to those of the conventional cleaning device shown in FIG. 2 are designated by the same reference numerals, and duplicate description will be omitted.
【0026】この実施例の洗浄装置は、洗浄部10の手
前に設けられる予洗槽20に、この予洗槽内の洗浄水に
超音波振動を与える超音波振動子21と、前記洗浄水中
に気体を噴出する給気手段22とを設けたものであり、
この実施例では、予洗槽20の槽長を洗浄部10の各槽
11〜15(ただし、図1では乾燥槽15は省略してい
る)の槽長の約4倍とし、予洗槽20の後端部の底部に
超音波振動子21を配置し、給気手段22を予洗槽20
の前端側に設けている。In the cleaning apparatus of this embodiment, an ultrasonic vibrator 21 for ultrasonically vibrating the cleaning water in the precleaning tank 20 provided in front of the cleaning unit 10 and a gas in the cleaning water. And an air supply means 22 for jetting are provided,
In this embodiment, the tank length of the pre-wash tank 20 is set to about 4 times the tank length of each of the tanks 11 to 15 of the cleaning unit 10 (however, the drying tank 15 is omitted in FIG. 1), and after the pre-wash tank 20. An ultrasonic transducer 21 is arranged at the bottom of the end, and the air supply means 22 is connected to the prewash tank 20.
It is provided on the front end side of.
【0027】上記給気手段22は、エアーポンプ23
と、このエアーポンプ23から供給される空気を予洗槽
20内に噴出するエアーノズル24と、予洗槽20内へ
の空気噴出および噴出量を制御するバルブ25とからな
っており、前記エアーノズル24は、予洗槽20内を水
平に間欠搬送される被洗浄物の停止位置に対向させて、
予洗槽20の底部に設けられている。The air supply means 22 is an air pump 23.
And an air nozzle 24 for ejecting the air supplied from the air pump 23 into the prewash tank 20, and a valve 25 for controlling the air jet into the prewash tank 20 and the jet amount thereof. Faces the stop position of the article to be cleaned horizontally and intermittently conveyed in the pre-wash tank 20,
It is provided at the bottom of the prewash tank 20.
【0028】上記予洗槽20における被洗浄物の予洗
を、液晶セル1の洗浄を例にとって説明すると、被洗浄
物である液晶セル1は、従来の洗浄装置と同様に複数枚
ずつキャリヤラック2に保持されてセルカセットAとさ
れ、カセット搬送機構30によって予洗槽20の上に搬
送されてくる。The precleaning of the object to be cleaned in the precleaning tank 20 will be described by taking the cleaning of the liquid crystal cell 1 as an example. The cell cassette A is held and transferred to the pre-wash tank 20 by the cassette transfer mechanism 30.
【0029】そして、予洗槽20の上に搬送されてきた
セルカセットAは、予洗槽20内の前端部に下げ降ろさ
れて洗浄水中に浸漬され、その後、予洗槽20内を水平
に搬送されて、まずエアーノズル24の上方で停止す
る。The cell cassette A transferred to the prewash tank 20 is lowered to the front end of the prewash tank 20 and immersed in the wash water, and then horizontally transferred in the prewash tank 20. First, stop above the air nozzle 24.
【0030】一方、給気手段22は、エアーノズル24
の上方にセルカセットAが停止している時間中バルブ2
5を開き、予洗槽20の洗浄水中にエアーノズル24か
ら気体を噴出する。このように洗浄水中に気体を噴出す
ると、洗浄水が泡立てられてその気泡aがセルカセット
Aの各液晶セル1の表面に衝突し、その衝撃により各液
晶セル1の表面の汚れが除去される。On the other hand, the air supply means 22 has an air nozzle 24.
Valve 2 while cell cassette A is stopped above
5 is opened, and gas is jetted from the air nozzle 24 into the wash water in the prewash tank 20. When the gas is ejected into the wash water in this way, the wash water is bubbled and the bubbles a collide with the surface of each liquid crystal cell 1 of the cell cassette A, and the impact removes the dirt on the surface of each liquid crystal cell 1. .
【0031】また、この泡立て洗浄により各液晶セル1
を洗浄されたセルカセットAは、予洗槽20内をさらに
間欠搬送され、予洗槽20の後端部で停止したとき、つ
まり超音波振動子21の付近にきたときに超音波洗浄に
よってセル表面の汚れが除去される。なお、予洗槽20
内をそ後端部まで搬送されたセルカセットAは、従来の
洗浄装置と同様に洗浄部10の洗浄槽11に搬入されて
本洗浄される。Further, each of the liquid crystal cells 1 is washed by the foaming cleaning.
The cell cassette A, which has been cleaned, is further intermittently transported in the pre-cleaning tank 20 and stopped at the rear end of the pre-cleaning tank 20, that is, when the vicinity of the ultrasonic transducer 21 is reached, the cell cassette A is cleaned by ultrasonic cleaning. Dirt is removed. In addition, the prewash tank 20
The cell cassette A, which has been conveyed to the rear end thereof, is carried into the cleaning tank 11 of the cleaning unit 10 and is subjected to main cleaning, as in the conventional cleaning device.
【0032】すなわち、上記洗浄装置は、予洗槽20に
超音波振動子21と給気手段22とを設けることによ
り、予洗槽内の洗浄水に超音波振動を与えるだけでな
く、この洗浄水中に気体を噴出して洗浄水を泡立てやる
ようにしたものであり、このようにすれば、被洗浄物が
超音波振動子21の付近にきたときに超音波洗浄によっ
て表面の汚れを除去されるとともに、洗浄水が泡立てら
れている箇所にきたときに、気泡aの衝突による衝撃を
受けて表面の汚れが除去される。That is, in the above cleaning apparatus, by providing the pre-wash tank 20 with the ultrasonic vibrator 21 and the air supply means 22, not only the wash water in the pre-wash tank is subjected to ultrasonic vibration, but also the pre-wash tank is immersed in the wash water. The gas is ejected to bubble the cleaning water. By doing so, when the object to be cleaned comes in the vicinity of the ultrasonic vibrator 21, the surface cleaning is removed by the ultrasonic cleaning. When the cleaning water comes to a location where it is foamed, the surface dirt is removed by the impact of the collision of the bubbles a.
【0033】このため、この洗浄装置によれば、予洗槽
20での被洗浄物の洗浄力を高くし、十分に予洗された
被洗浄物を洗浄部10に送って効率の良い洗浄を行なう
ことができる。Therefore, according to this cleaning apparatus, the cleaning power of the object to be cleaned in the pre-cleaning tank 20 is enhanced, and the sufficiently pre-cleaned object is sent to the cleaning section 10 for efficient cleaning. You can
【0034】なお、上記実施例では、予洗槽20の後端
部に超音波振動子21を配置し、予洗槽20の前端側に
給気手段22を設けているが、これらの配置位置は任意
でよい。また、本発明の洗浄装置は液晶セル1に限ら
ず、例えば液晶セルに用いる基板等の洗浄等にも利用す
ることができる。In the above embodiment, the ultrasonic transducer 21 is arranged at the rear end portion of the prewash tank 20 and the air supply means 22 is provided at the front end side of the prewash tank 20, but these arrangement positions are arbitrary. Good. Further, the cleaning apparatus of the present invention can be used not only for the liquid crystal cell 1 but also for cleaning a substrate or the like used in the liquid crystal cell.
【0035】[0035]
【発明の効果】本発明の洗浄装置は、予洗槽に、この予
洗槽内の洗浄水に超音波振動を与える超音波振動子と、
前記洗浄水中に気体を噴出する給気手段とを設けたもの
であるから、予洗槽での被洗浄物の洗浄力を高くし、十
分に予洗された被洗浄物を洗浄部に送って効率の良い洗
浄を行なうことができる。The cleaning apparatus of the present invention comprises a prewash tank, an ultrasonic vibrator for applying ultrasonic vibration to the wash water in the prewash tank,
Since it is provided with an air supply means for ejecting a gas into the cleaning water, the cleaning power of the object to be cleaned in the pre-cleaning tank is increased, and the sufficiently pre-cleaned object is sent to the cleaning unit to improve efficiency. Good cleaning can be done.
【図1】本発明の一実施例による洗浄装置の側面図。FIG. 1 is a side view of a cleaning device according to an embodiment of the present invention.
【図2】従来の洗浄装置の側面図。FIG. 2 is a side view of a conventional cleaning device.
1…液晶セル(被洗浄物) 2…キャリヤラック A…セルカセット 10…洗浄部 11…洗浄槽 12,13…すすぎ槽 20…予洗層 21…超音波振動子 22…給気手段 23…エアーポンプ 24…エアーノズル 25…バルブ a…気泡 30…搬送機構 DESCRIPTION OF SYMBOLS 1 ... Liquid crystal cell (object to be cleaned) 2 ... Carrier rack A ... Cell cassette 10 ... Cleaning part 11 ... Cleaning tank 12, 13 ... Rinse tank 20 ... Prewash layer 21 ... Ultrasonic vibrator 22 ... Air supply means 23 ... Air pump 24 ... Air nozzle 25 ... Valve a ... Bubble 30 ... Conveyance mechanism
Claims (1)
けてなり、被洗浄物を前記予洗槽において予洗した後、
この被洗浄物を前記洗浄部の洗浄槽に搬入して本洗浄す
る洗浄装置において、前記予洗槽に、この予洗槽内の洗
浄水に超音波振動を与える超音波振動子と、前記洗浄水
中に気体を噴出する給気手段とを設けたことを特徴とす
る洗浄装置。1. A prewash tank is provided in front of a washing section provided with a wash tank, and after prewashing an object to be washed in the prewash tank,
In the cleaning device for carrying in the cleaning object of the cleaning section and carrying out the main cleaning, in the pre-cleaning tank, an ultrasonic vibrator for applying ultrasonic vibration to the cleaning water in the pre-cleaning tank, and in the cleaning water. A cleaning device provided with an air supply means for ejecting gas.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30689092A JPH06154715A (en) | 1992-11-17 | 1992-11-17 | Washing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30689092A JPH06154715A (en) | 1992-11-17 | 1992-11-17 | Washing device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH06154715A true JPH06154715A (en) | 1994-06-03 |
Family
ID=17962491
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30689092A Pending JPH06154715A (en) | 1992-11-17 | 1992-11-17 | Washing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06154715A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010125436A (en) * | 2008-12-01 | 2010-06-10 | Mitsubishi Electric Corp | Cleaning device and cleaning method for object to be cleaned using the cleaning device |
CN105366585A (en) * | 2015-11-30 | 2016-03-02 | 苏州林信源自动化科技有限公司 | Lifting mechanism in ultrasonic cleaner |
CN105363733A (en) * | 2015-11-30 | 2016-03-02 | 苏州林信源自动化科技有限公司 | Ultrasonic washer |
-
1992
- 1992-11-17 JP JP30689092A patent/JPH06154715A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010125436A (en) * | 2008-12-01 | 2010-06-10 | Mitsubishi Electric Corp | Cleaning device and cleaning method for object to be cleaned using the cleaning device |
CN105366585A (en) * | 2015-11-30 | 2016-03-02 | 苏州林信源自动化科技有限公司 | Lifting mechanism in ultrasonic cleaner |
CN105363733A (en) * | 2015-11-30 | 2016-03-02 | 苏州林信源自动化科技有限公司 | Ultrasonic washer |
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