JPH059947B2 - - Google Patents

Info

Publication number
JPH059947B2
JPH059947B2 JP57229996A JP22999682A JPH059947B2 JP H059947 B2 JPH059947 B2 JP H059947B2 JP 57229996 A JP57229996 A JP 57229996A JP 22999682 A JP22999682 A JP 22999682A JP H059947 B2 JPH059947 B2 JP H059947B2
Authority
JP
Japan
Prior art keywords
substrate
solar cell
paper
amorphous silicon
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57229996A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59119878A (ja
Inventor
Hiroshi Imagawa
Minoru Fukuda
Setsu Akyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP57229996A priority Critical patent/JPS59119878A/ja
Publication of JPS59119878A publication Critical patent/JPS59119878A/ja
Publication of JPH059947B2 publication Critical patent/JPH059947B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • H10F77/169—Thin semiconductor films on metallic or insulating substrates
    • H10F77/1692—Thin semiconductor films on metallic or insulating substrates the films including only Group IV materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Photovoltaic Devices (AREA)
JP57229996A 1982-12-27 1982-12-27 太陽電池 Granted JPS59119878A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57229996A JPS59119878A (ja) 1982-12-27 1982-12-27 太陽電池

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57229996A JPS59119878A (ja) 1982-12-27 1982-12-27 太陽電池

Publications (2)

Publication Number Publication Date
JPS59119878A JPS59119878A (ja) 1984-07-11
JPH059947B2 true JPH059947B2 (enrdf_load_stackoverflow) 1993-02-08

Family

ID=16900963

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57229996A Granted JPS59119878A (ja) 1982-12-27 1982-12-27 太陽電池

Country Status (1)

Country Link
JP (1) JPS59119878A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4695850B2 (ja) * 2004-04-28 2011-06-08 本田技研工業株式会社 カルコパイライト型太陽電池
JP4969785B2 (ja) * 2005-02-16 2012-07-04 本田技研工業株式会社 カルコパイライト型太陽電池及びその製造方法
JP4681352B2 (ja) * 2005-05-24 2011-05-11 本田技研工業株式会社 カルコパイライト型太陽電池
JP4646724B2 (ja) * 2005-07-27 2011-03-09 本田技研工業株式会社 カルコパイライト型太陽電池

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS596074B2 (ja) * 1981-10-08 1984-02-08 太陽誘電株式会社 非晶質シリコン太陽電池

Also Published As

Publication number Publication date
JPS59119878A (ja) 1984-07-11

Similar Documents

Publication Publication Date Title
KR101389546B1 (ko) 표면 패시베이션이 향상된 결정성 실리콘 태양 전지의 제조 방법
JPS6228598B2 (enrdf_load_stackoverflow)
JP2012502450A (ja) へテロ太陽電池およびヘテロ太陽電池の製造方法
JPS5961077A (ja) アモルフアスシリコン太陽電池
TW201042065A (en) Methods for fabricating copper indium gallium diselenide (CIGS) compound thin films
JPS6150378A (ja) 非晶質太陽電池の製法
JPH059947B2 (enrdf_load_stackoverflow)
JPH059946B2 (enrdf_load_stackoverflow)
Banerjee et al. Fabrication of heterojunction solar cells by using microcrystalline hydrogenated silicon oxide film as an emitter
US5278015A (en) Amorphous silicon film, its production and photo semiconductor device utilizing such a film
JP3609147B2 (ja) 光電変換装置
Bauer et al. pi interface engineering and i-layer control of hot-wire a-Si: H based pin solar cells using in-situ ellipsometry
JPH0518271B2 (enrdf_load_stackoverflow)
JPS5815239A (ja) 半導体素子
JPH0518269B2 (enrdf_load_stackoverflow)
JPH0518270B2 (enrdf_load_stackoverflow)
JPH07263731A (ja) 多結晶シリコンデバイス
JPH0682855B2 (ja) 半導体デバイス及びその製造方法
Das et al. Interface hydrogen and passivation of amorphous silicon/crystalline silicon heterojunction
US5258207A (en) Amorphous silicon film, its production and photo semiconductor device utilizing such a film
JPH03160763A (ja) 光起電力装置の製造方法
JPH0550151B2 (enrdf_load_stackoverflow)
JP4485766B2 (ja) 光電変換装置および光電変換装置の製造方法
JPS6158989B2 (enrdf_load_stackoverflow)
Xu et al. Preparation of hydrogenated amorphous germanium nitrogen alloys by plasma enhanced chemical vapor deposition