JPH059514B2 - - Google Patents

Info

Publication number
JPH059514B2
JPH059514B2 JP57122293A JP12229382A JPH059514B2 JP H059514 B2 JPH059514 B2 JP H059514B2 JP 57122293 A JP57122293 A JP 57122293A JP 12229382 A JP12229382 A JP 12229382A JP H059514 B2 JPH059514 B2 JP H059514B2
Authority
JP
Japan
Prior art keywords
closed circuit
conductive
base material
carbon
heating coil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57122293A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5913062A (ja
Inventor
Takane Myazaki
Kazushi Matsura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Industries Ltd filed Critical Mitsubishi Chemical Industries Ltd
Priority to JP12229382A priority Critical patent/JPS5913062A/ja
Publication of JPS5913062A publication Critical patent/JPS5913062A/ja
Publication of JPH059514B2 publication Critical patent/JPH059514B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP12229382A 1982-07-14 1982-07-14 導電性基材上に気相熱分解炭素を析出させる方法 Granted JPS5913062A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12229382A JPS5913062A (ja) 1982-07-14 1982-07-14 導電性基材上に気相熱分解炭素を析出させる方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12229382A JPS5913062A (ja) 1982-07-14 1982-07-14 導電性基材上に気相熱分解炭素を析出させる方法

Publications (2)

Publication Number Publication Date
JPS5913062A JPS5913062A (ja) 1984-01-23
JPH059514B2 true JPH059514B2 (cg-RX-API-DMAC7.html) 1993-02-05

Family

ID=14832365

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12229382A Granted JPS5913062A (ja) 1982-07-14 1982-07-14 導電性基材上に気相熱分解炭素を析出させる方法

Country Status (1)

Country Link
JP (1) JPS5913062A (cg-RX-API-DMAC7.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4805609B2 (ja) * 2005-05-26 2011-11-02 株式会社東芝 高温水中クラッドまたはイオンの除去方法および除去装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS573706A (en) * 1980-06-04 1982-01-09 Hitachi Chem Co Ltd Vapor-phase deposition

Also Published As

Publication number Publication date
JPS5913062A (ja) 1984-01-23

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