JPS5913062A - 導電性基材上に気相熱分解炭素を析出させる方法 - Google Patents

導電性基材上に気相熱分解炭素を析出させる方法

Info

Publication number
JPS5913062A
JPS5913062A JP12229382A JP12229382A JPS5913062A JP S5913062 A JPS5913062 A JP S5913062A JP 12229382 A JP12229382 A JP 12229382A JP 12229382 A JP12229382 A JP 12229382A JP S5913062 A JPS5913062 A JP S5913062A
Authority
JP
Japan
Prior art keywords
base material
conductive
carbon
closed circuit
heating coil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12229382A
Other languages
English (en)
Japanese (ja)
Other versions
JPH059514B2 (cg-RX-API-DMAC7.html
Inventor
Takane Miyazaki
宮崎 高嶺
Kazushi Matsuura
松浦 一志
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Industries Ltd filed Critical Mitsubishi Chemical Industries Ltd
Priority to JP12229382A priority Critical patent/JPS5913062A/ja
Publication of JPS5913062A publication Critical patent/JPS5913062A/ja
Publication of JPH059514B2 publication Critical patent/JPH059514B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP12229382A 1982-07-14 1982-07-14 導電性基材上に気相熱分解炭素を析出させる方法 Granted JPS5913062A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12229382A JPS5913062A (ja) 1982-07-14 1982-07-14 導電性基材上に気相熱分解炭素を析出させる方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12229382A JPS5913062A (ja) 1982-07-14 1982-07-14 導電性基材上に気相熱分解炭素を析出させる方法

Publications (2)

Publication Number Publication Date
JPS5913062A true JPS5913062A (ja) 1984-01-23
JPH059514B2 JPH059514B2 (cg-RX-API-DMAC7.html) 1993-02-05

Family

ID=14832365

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12229382A Granted JPS5913062A (ja) 1982-07-14 1982-07-14 導電性基材上に気相熱分解炭素を析出させる方法

Country Status (1)

Country Link
JP (1) JPS5913062A (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006326487A (ja) * 2005-05-26 2006-12-07 Toshiba Corp 高温水中クラッドまたはイオンの除去方法および除去装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS573706A (en) * 1980-06-04 1982-01-09 Hitachi Chem Co Ltd Vapor-phase deposition

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS573706A (en) * 1980-06-04 1982-01-09 Hitachi Chem Co Ltd Vapor-phase deposition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006326487A (ja) * 2005-05-26 2006-12-07 Toshiba Corp 高温水中クラッドまたはイオンの除去方法および除去装置

Also Published As

Publication number Publication date
JPH059514B2 (cg-RX-API-DMAC7.html) 1993-02-05

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