JPH0584895B2 - - Google Patents

Info

Publication number
JPH0584895B2
JPH0584895B2 JP61275360A JP27536086A JPH0584895B2 JP H0584895 B2 JPH0584895 B2 JP H0584895B2 JP 61275360 A JP61275360 A JP 61275360A JP 27536086 A JP27536086 A JP 27536086A JP H0584895 B2 JPH0584895 B2 JP H0584895B2
Authority
JP
Japan
Prior art keywords
copolymer
mol
radiation
units
phenolic resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61275360A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63129340A (ja
Inventor
Minoru Matsuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Priority to JP27536086A priority Critical patent/JPS63129340A/ja
Publication of JPS63129340A publication Critical patent/JPS63129340A/ja
Publication of JPH0584895B2 publication Critical patent/JPH0584895B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP27536086A 1986-11-20 1986-11-20 放射線感応樹脂組成物 Granted JPS63129340A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27536086A JPS63129340A (ja) 1986-11-20 1986-11-20 放射線感応樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27536086A JPS63129340A (ja) 1986-11-20 1986-11-20 放射線感応樹脂組成物

Publications (2)

Publication Number Publication Date
JPS63129340A JPS63129340A (ja) 1988-06-01
JPH0584895B2 true JPH0584895B2 (enrdf_load_stackoverflow) 1993-12-03

Family

ID=17554387

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27536086A Granted JPS63129340A (ja) 1986-11-20 1986-11-20 放射線感応樹脂組成物

Country Status (1)

Country Link
JP (1) JPS63129340A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW211080B (enrdf_load_stackoverflow) * 1991-12-12 1993-08-11 American Telephone & Telegraph
US6537736B1 (en) 1999-03-12 2003-03-25 Matsushita Electric Industrial Co., Ltd. Patten formation method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0611791B2 (ja) * 1986-06-20 1994-02-16 チッソ株式会社 二酸化硫黄、アセチレン化合物およびビニル化合物の共重合体

Also Published As

Publication number Publication date
JPS63129340A (ja) 1988-06-01

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