JPH0582475B2 - - Google Patents
Info
- Publication number
- JPH0582475B2 JPH0582475B2 JP59503497A JP50349784A JPH0582475B2 JP H0582475 B2 JPH0582475 B2 JP H0582475B2 JP 59503497 A JP59503497 A JP 59503497A JP 50349784 A JP50349784 A JP 50349784A JP H0582475 B2 JPH0582475 B2 JP H0582475B2
- Authority
- JP
- Japan
- Prior art keywords
- fluid
- passageway
- wall member
- substrate
- outlet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000012530 fluid Substances 0.000 description 88
- 239000000758 substrate Substances 0.000 description 36
- 238000000034 method Methods 0.000 description 15
- 239000000376 reactant Substances 0.000 description 14
- 239000011521 glass Substances 0.000 description 12
- 239000000203 mixture Substances 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 230000007423 decrease Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 230000000087 stabilizing effect Effects 0.000 description 2
- 239000000443 aerosol Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- -1 vapors Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45502—Flow conditions in reaction chamber
- C23C16/45504—Laminar flow
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45582—Expansion of gas before it reaches the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45585—Compression of gas before it reaches the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45587—Mechanical means for changing the gas flow
- C23C16/45591—Fixed means, e.g. wings, baffles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45595—Atmospheric CVD gas inlets with no enclosed reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Chemical Vapour Deposition (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Surface Treatment Of Glass (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US535798 | 1983-09-26 | ||
| US06/535,798 US4504526A (en) | 1983-09-26 | 1983-09-26 | Apparatus and method for producing a laminar flow of constant velocity fluid along a substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60502259A JPS60502259A (ja) | 1985-12-26 |
| JPH0582475B2 true JPH0582475B2 (US06168776-20010102-C00041.png) | 1993-11-19 |
Family
ID=24135810
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59503497A Granted JPS60502259A (ja) | 1983-09-26 | 1984-09-17 | 膜を塗布するための方法及び装置 |
Country Status (11)
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4994301A (en) * | 1986-06-30 | 1991-02-19 | Nihon Sinku Gijutsu Kabusiki Kaisha | ACVD (chemical vapor deposition) method for selectively depositing metal on a substrate |
| DE3751756T2 (de) * | 1986-06-30 | 1996-08-01 | Ulvac Corp | Verfahren zum Abscheiden aus der Gasphase |
| US4793282A (en) * | 1987-05-18 | 1988-12-27 | Libbey-Owens-Ford Co. | Distributor beam for chemical vapor deposition on glass |
| GB9511841D0 (en) * | 1995-06-10 | 1995-08-09 | Pilkington Glass Ltd | Mirrors and their production |
| US6103015A (en) * | 1998-01-19 | 2000-08-15 | Libbey-Owens-Ford Co. | Symmetrical CVD coater with lower upstream exhaust toe |
| JP3806537B2 (ja) * | 1999-03-10 | 2006-08-09 | 株式会社カイジョー | 超音波洗浄機及びそれを具備するウエット処理ノズル |
| US6521295B1 (en) | 2001-04-17 | 2003-02-18 | Pilkington North America, Inc. | Chemical vapor deposition of antimony-doped metal oxide and the coated article made thereby |
| ES2467161T3 (es) * | 2004-08-18 | 2014-06-12 | Calyxo Gmbh | Deposición química en fase vapor a presión atmosférica |
| JP5270345B2 (ja) * | 2005-08-30 | 2013-08-21 | ピルキントン グループ リミテッド | 太陽電池に用いられる光線透過率を最適化する被覆されたガラス物品及びその製造方法 |
| MY152036A (en) * | 2008-12-08 | 2014-08-15 | Calyxo Gmbh | Thin-film deposition and recirculation of a semi-conductor material |
| JP5599823B2 (ja) | 2009-02-02 | 2014-10-01 | ピルキントン グループ リミテッド | 導電性酸化チタンコーティングの堆積方法 |
| FI9160U1 (fi) * | 2010-01-04 | 2011-04-14 | Beneq Oy | Pinnoituslaite |
| US20110207301A1 (en) * | 2010-02-19 | 2011-08-25 | Kormanyos Kenneth R | Atmospheric pressure chemical vapor deposition with saturation control |
| DE102010028277B4 (de) | 2010-04-27 | 2013-04-18 | Calyxo Gmbh | Verfahren und Vorrichtung zur Herstellung einer mit einem Halbleitermaterial beschichteten Glasscheibe und nach dem Verfahren erhältliche Solarzelle oder Solarmodul |
| WO2012158443A2 (en) | 2011-05-13 | 2012-11-22 | Sheperak Thomas J | Plasma directed electron beam wound care system apparatus and method |
| US20150122319A1 (en) | 2011-07-28 | 2015-05-07 | David A. Strickler | Apcvd of doped titanium oxide and the coated article made thereby |
| WO2015121632A1 (en) | 2014-02-11 | 2015-08-20 | Pilkington Group Limited | Coated glass article and display assembly made therewith |
| CN104451601B (zh) * | 2014-12-02 | 2017-02-22 | 浙江大学 | 一种常压化学气相沉积镀膜反应器 |
| CN104561938B (zh) * | 2015-01-09 | 2017-04-19 | 浙江大学 | 一种浮法在线常压化学气相沉积镀膜反应器 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3805736A (en) * | 1971-12-27 | 1974-04-23 | Ibm | Apparatus for diffusion limited mass transport |
| JPS5843508A (ja) * | 1981-09-09 | 1983-03-14 | Fuji Electric Corp Res & Dev Ltd | 量産型成膜装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3790404A (en) * | 1972-06-19 | 1974-02-05 | Ibm | Continuous vapor processing apparatus and method |
| GB1524326A (en) * | 1976-04-13 | 1978-09-13 | Bfg Glassgroup | Coating of glass |
| US4462333A (en) * | 1982-10-27 | 1984-07-31 | Energy Conversion Devices, Inc. | Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus |
-
1983
- 1983-09-26 US US06/535,798 patent/US4504526A/en not_active Expired - Lifetime
-
1984
- 1984-09-14 CA CA000463186A patent/CA1252369A/en not_active Expired
- 1984-09-17 EP EP84903521A patent/EP0156857B1/en not_active Expired
- 1984-09-17 WO PCT/US1984/001460 patent/WO1985001522A1/en active IP Right Grant
- 1984-09-17 BR BR8407050A patent/BR8407050A/pt not_active IP Right Cessation
- 1984-09-17 AU AU34348/84A patent/AU575349B2/en not_active Ceased
- 1984-09-17 JP JP59503497A patent/JPS60502259A/ja active Granted
- 1984-09-17 DE DE8484903521T patent/DE3484059D1/de not_active Expired - Lifetime
- 1984-09-25 MX MX202824A patent/MX163477B/es unknown
- 1984-09-25 IT IT48896/84A patent/IT1178436B/it active
- 1984-09-25 ES ES536212A patent/ES8606910A1/es not_active Expired
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3805736A (en) * | 1971-12-27 | 1974-04-23 | Ibm | Apparatus for diffusion limited mass transport |
| JPS5843508A (ja) * | 1981-09-09 | 1983-03-14 | Fuji Electric Corp Res & Dev Ltd | 量産型成膜装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| AU575349B2 (en) | 1988-07-28 |
| WO1985001522A1 (en) | 1985-04-11 |
| EP0156857A1 (en) | 1985-10-09 |
| EP0156857A4 (en) | 1986-07-30 |
| MX163477B (es) | 1992-05-19 |
| BR8407050A (pt) | 1985-08-13 |
| IT8448896A0 (it) | 1984-09-25 |
| CA1252369A (en) | 1989-04-11 |
| ES536212A0 (es) | 1986-05-16 |
| US4504526A (en) | 1985-03-12 |
| JPS60502259A (ja) | 1985-12-26 |
| ES8606910A1 (es) | 1986-05-16 |
| DE3484059D1 (de) | 1991-03-07 |
| EP0156857B1 (en) | 1991-01-30 |
| IT1178436B (it) | 1987-09-09 |
| AU3434884A (en) | 1985-04-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0582475B2 (US06168776-20010102-C00041.png) | ||
| US4834020A (en) | Atmospheric pressure chemical vapor deposition apparatus | |
| FI97731B (fi) | Menetelmä ja laite ohutkalvojen valmistamiseksi | |
| TWI531675B (zh) | 半導體處理反應器及其零件 | |
| JP5927679B2 (ja) | Ａｌｄコーティングシステム | |
| JP2790437B2 (ja) | ガスを面に吐出するための単体インジェクタ | |
| KR20130094785A (ko) | 비접촉식으로 기판들을 전진시키기 위한 장치 및 방법 | |
| US6572705B1 (en) | Method and apparatus for growing thin films | |
| KR20020021619A (ko) | 연속 공급 코터 | |
| RU1838261C (ru) | Устройство дл нанесени покрыти на поверхность гор чей ленты стекла | |
| JPH04310543A (ja) | コーティング膜形成ノズル | |
| US4880163A (en) | Gas feeding nozzle for a chemical vapor deposition apparatus | |
| JP5005353B2 (ja) | 処理液での被処理物処理のためのノズル配列、及び同ノズル配列を含む機器、並びに方法 | |
| JP2001011636A (ja) | ガス供給装置 | |
| CN1018541B (zh) | 玻璃的涂覆 | |
| JP2017534746A (ja) | 原子層堆積装置およびその装置を使用した基板処理方法 | |
| JP2745316B2 (ja) | 化学蒸着反応器用ガス注入装置 | |
| JPS5934231B2 (ja) | Ｃｖｄ装置の吐出装置 | |
| KR101728765B1 (ko) | 성막 장치 및 성막 방법 | |
| EP3329033B1 (en) | Coating apparatus | |
| JPH11290748A (ja) | カ―テンコ―ティング装置 | |
| CN112313363B (zh) | 喷嘴头和设备 | |
| JPH06296901A (ja) | 基材表面に粉末固体を分配するための装置 | |
| KR20200012392A (ko) | 고효율 원자층 증착장치용 헤드 및 그것을 이용한 원자층 증착장치 | |
| KR20200012167A (ko) | 균일분사로를 갖는 원자층 증착장치용 헤드 및 그것을 이용한 원자층 증착장치 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |