JPH0582469B2 - - Google Patents
Info
- Publication number
- JPH0582469B2 JPH0582469B2 JP61113823A JP11382386A JPH0582469B2 JP H0582469 B2 JPH0582469 B2 JP H0582469B2 JP 61113823 A JP61113823 A JP 61113823A JP 11382386 A JP11382386 A JP 11382386A JP H0582469 B2 JPH0582469 B2 JP H0582469B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- magnetic field
- magnetic
- magnetic pole
- pole pieces
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010894 electron beam technology Methods 0.000 claims description 44
- 238000001704 evaporation Methods 0.000 claims description 28
- 230000008020 evaporation Effects 0.000 claims description 27
- 230000005284 excitation Effects 0.000 claims description 12
- 238000007740 vapor deposition Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000002123 temporal effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000007786 electrostatic charging Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000009828 non-uniform distribution Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD23C/276578.3 | 1985-05-22 | ||
| DD27657885A DD237526A1 (de) | 1985-05-22 | 1985-05-22 | Elektronenstrahl - linienverdampfer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6213568A JPS6213568A (ja) | 1987-01-22 |
| JPH0582469B2 true JPH0582469B2 (enrdf_load_stackoverflow) | 1993-11-19 |
Family
ID=5567996
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61113823A Granted JPS6213568A (ja) | 1985-05-22 | 1986-05-20 | 電子ビ−ム−直線形蒸着装置 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS6213568A (enrdf_load_stackoverflow) |
| DD (1) | DD237526A1 (enrdf_load_stackoverflow) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3639683A1 (de) * | 1986-11-20 | 1988-05-26 | Leybold Ag | Verdampferanordnung mit einem rechteckigen verdampfertiegel und mehreren elektronenkanonen |
| JP2564890B2 (ja) * | 1988-05-16 | 1996-12-18 | 日本電気株式会社 | 選択的連想記憶装置及びその制御方法 |
| DE4113364C1 (enrdf_load_stackoverflow) * | 1991-04-24 | 1992-04-02 | Forschungsgesellschaft Fuer Elektronenstrahl- Und Plasmatechnik Mbh, O-8051 Dresden, De | |
| DE19523529A1 (de) * | 1995-06-28 | 1997-01-02 | Fraunhofer Ges Forschung | Einrichtung zum Hochrate-Elektronenstrahlbedampfen breiter Substrate |
| KR100467805B1 (ko) * | 2002-01-22 | 2005-01-24 | 학교법인연세대학교 | 박막두께분포를 조절 가능한 선형 및 평면형 증발원 |
| DE102009057486A1 (de) * | 2009-12-10 | 2011-06-16 | Ferrotec Gmbh | Ablenkvorrichtung für Elektronenstrahlen, magnetische Ablenkeinheit für eine solche Ablenkvorrichtung und Vorrichtung zum Bedampfen eines flächigen Substrates mit einer solchen Ablenkvorrichtung |
-
1985
- 1985-05-22 DD DD27657885A patent/DD237526A1/de not_active IP Right Cessation
-
1986
- 1986-05-20 JP JP61113823A patent/JPS6213568A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| DD237526A1 (de) | 1986-07-16 |
| JPS6213568A (ja) | 1987-01-22 |
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