JPS6334225B2 - - Google Patents

Info

Publication number
JPS6334225B2
JPS6334225B2 JP15446183A JP15446183A JPS6334225B2 JP S6334225 B2 JPS6334225 B2 JP S6334225B2 JP 15446183 A JP15446183 A JP 15446183A JP 15446183 A JP15446183 A JP 15446183A JP S6334225 B2 JPS6334225 B2 JP S6334225B2
Authority
JP
Japan
Prior art keywords
space
target
targets
sputtering
rectangular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15446183A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6046369A (ja
Inventor
Masahiko Naoe
Yoichi Hoshi
Yoshihiko Ueda
Hironobu Muroi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OOSAKA SHINKU KIKI SEISAKUSHO KK
Original Assignee
OOSAKA SHINKU KIKI SEISAKUSHO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OOSAKA SHINKU KIKI SEISAKUSHO KK filed Critical OOSAKA SHINKU KIKI SEISAKUSHO KK
Priority to JP15446183A priority Critical patent/JPS6046369A/ja
Publication of JPS6046369A publication Critical patent/JPS6046369A/ja
Publication of JPS6334225B2 publication Critical patent/JPS6334225B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP15446183A 1983-08-23 1983-08-23 対向タ−ゲツト式スパツタ装置 Granted JPS6046369A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15446183A JPS6046369A (ja) 1983-08-23 1983-08-23 対向タ−ゲツト式スパツタ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15446183A JPS6046369A (ja) 1983-08-23 1983-08-23 対向タ−ゲツト式スパツタ装置

Publications (2)

Publication Number Publication Date
JPS6046369A JPS6046369A (ja) 1985-03-13
JPS6334225B2 true JPS6334225B2 (enrdf_load_stackoverflow) 1988-07-08

Family

ID=15584743

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15446183A Granted JPS6046369A (ja) 1983-08-23 1983-08-23 対向タ−ゲツト式スパツタ装置

Country Status (1)

Country Link
JP (1) JPS6046369A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3611492A1 (de) * 1986-04-05 1987-10-22 Leybold Heraeus Gmbh & Co Kg Verfahren und vorrichtung zum beschichten von werkzeugen fuer die zerspanungs- und umformtechnik mit hartstoffschichten
JPH0778275B2 (ja) * 1986-12-03 1995-08-23 住友電気工業株式会社 スパツタリング装置
JPS63270461A (ja) * 1986-12-26 1988-11-08 Teijin Ltd 対向ターゲット式スパッタ装置

Also Published As

Publication number Publication date
JPS6046369A (ja) 1985-03-13

Similar Documents

Publication Publication Date Title
US5902466A (en) Sputtering apparatus with magnetic orienting device for thin film deposition
KR920000912B1 (ko) 강자성 타겟의 분사를 위한 자전관 음극
KR19980032987A (ko) 복합 스퍼터링 캐소드 및 그 캐소드를 이용한 스퍼터링 장치
JPS6334225B2 (enrdf_load_stackoverflow)
JPS5855566A (ja) 対向タ−ゲツト式スパツタ装置
JPH0234780A (ja) マグネトロンスパッタ用磁気回路
JP2755776B2 (ja) 高速成膜スパッタリング装置
JPS61246367A (ja) マグネトロン型スパツタリング装置
JPS6233764A (ja) スパツタリング装置
JPH03243763A (ja) スパッタリング装置
JP3151031B2 (ja) マグネトロンスパッタ装置
JPH03243761A (ja) スパッタリング装置
JPS63223173A (ja) 基板処理方法およびその装置
JPH06158311A (ja) スパッタリング装置
JPH03260067A (ja) スパッタリング装置
JP2906163B2 (ja) スパッタリング装置
JP2000345337A (ja) カソード電極装置及びスパッタリング装置
JPS63277758A (ja) マグネトロンスパッタリング装置
JPH0641736A (ja) スパッタリング電極
JPH0313575A (ja) 対向ターゲツトスパツタ装置
JPS63468A (ja) 対向タ−ゲツト式スパツタ装置
JPH02277771A (ja) マグネトロン型スパッタ装置
JPS6328986B2 (enrdf_load_stackoverflow)
JPS59116377A (ja) スパツタリング装置
JPS63140079A (ja) スパツタリング装置