JPS6213568A - 電子ビ−ム−直線形蒸着装置 - Google Patents

電子ビ−ム−直線形蒸着装置

Info

Publication number
JPS6213568A
JPS6213568A JP61113823A JP11382386A JPS6213568A JP S6213568 A JPS6213568 A JP S6213568A JP 61113823 A JP61113823 A JP 61113823A JP 11382386 A JP11382386 A JP 11382386A JP S6213568 A JPS6213568 A JP S6213568A
Authority
JP
Japan
Prior art keywords
electron beam
magnetic field
vapor deposition
pole piece
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61113823A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0582469B2 (enrdf_load_stackoverflow
Inventor
Noiman Manfureeto
マンフレート・ノイマン
Shireru Jiigufuriito
ジーグフリート・シレル
Morugunaa Henrii
ヘンリー・モルグナー
Ungentsu Peetaa
ペーター・ウンゲンツ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FUJI IND KK
Original Assignee
FUJI IND KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FUJI IND KK filed Critical FUJI IND KK
Publication of JPS6213568A publication Critical patent/JPS6213568A/ja
Publication of JPH0582469B2 publication Critical patent/JPH0582469B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP61113823A 1985-05-22 1986-05-20 電子ビ−ム−直線形蒸着装置 Granted JPS6213568A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DD23C/276578.3 1985-05-22
DD27657885A DD237526A1 (de) 1985-05-22 1985-05-22 Elektronenstrahl - linienverdampfer

Publications (2)

Publication Number Publication Date
JPS6213568A true JPS6213568A (ja) 1987-01-22
JPH0582469B2 JPH0582469B2 (enrdf_load_stackoverflow) 1993-11-19

Family

ID=5567996

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61113823A Granted JPS6213568A (ja) 1985-05-22 1986-05-20 電子ビ−ム−直線形蒸着装置

Country Status (2)

Country Link
JP (1) JPS6213568A (enrdf_load_stackoverflow)
DD (1) DD237526A1 (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01290194A (ja) * 1988-05-16 1989-11-22 Nec Corp 選択的連想記憶装置及びその制御方式
WO2003062486A1 (en) * 2002-01-22 2003-07-31 Yonsei University Linear or planar type evaporator for the controllable film thickness profile

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3639683A1 (de) * 1986-11-20 1988-05-26 Leybold Ag Verdampferanordnung mit einem rechteckigen verdampfertiegel und mehreren elektronenkanonen
DE4113364C1 (enrdf_load_stackoverflow) * 1991-04-24 1992-04-02 Forschungsgesellschaft Fuer Elektronenstrahl- Und Plasmatechnik Mbh, O-8051 Dresden, De
DE19523529A1 (de) * 1995-06-28 1997-01-02 Fraunhofer Ges Forschung Einrichtung zum Hochrate-Elektronenstrahlbedampfen breiter Substrate
DE102009057486A1 (de) * 2009-12-10 2011-06-16 Ferrotec Gmbh Ablenkvorrichtung für Elektronenstrahlen, magnetische Ablenkeinheit für eine solche Ablenkvorrichtung und Vorrichtung zum Bedampfen eines flächigen Substrates mit einer solchen Ablenkvorrichtung

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01290194A (ja) * 1988-05-16 1989-11-22 Nec Corp 選択的連想記憶装置及びその制御方式
WO2003062486A1 (en) * 2002-01-22 2003-07-31 Yonsei University Linear or planar type evaporator for the controllable film thickness profile
CN100340694C (zh) * 2002-01-22 2007-10-03 延世大学校 可控膜厚分布的线型或平面型蒸发器

Also Published As

Publication number Publication date
JPH0582469B2 (enrdf_load_stackoverflow) 1993-11-19
DD237526A1 (de) 1986-07-16

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