JPH0581019B2 - - Google Patents

Info

Publication number
JPH0581019B2
JPH0581019B2 JP61202915A JP20291586A JPH0581019B2 JP H0581019 B2 JPH0581019 B2 JP H0581019B2 JP 61202915 A JP61202915 A JP 61202915A JP 20291586 A JP20291586 A JP 20291586A JP H0581019 B2 JPH0581019 B2 JP H0581019B2
Authority
JP
Japan
Prior art keywords
formula
alkyl group
group
aryl group
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61202915A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6358440A (ja
Inventor
Akinobu Koike
Yukio Abe
Koichi Kawamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP61202915A priority Critical patent/JPS6358440A/ja
Priority to DE87307544T priority patent/DE3788103T2/de
Priority to EP87307544A priority patent/EP0262788B1/en
Publication of JPS6358440A publication Critical patent/JPS6358440A/ja
Priority to US07/532,238 priority patent/US5064741A/en
Publication of JPH0581019B2 publication Critical patent/JPH0581019B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/675Compositions containing polyhalogenated compounds as photosensitive substances
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/12Nitrogen compound containing
    • Y10S430/121Nitrogen in heterocyclic ring

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP61202915A 1986-08-29 1986-08-29 感光性組成物 Granted JPS6358440A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP61202915A JPS6358440A (ja) 1986-08-29 1986-08-29 感光性組成物
DE87307544T DE3788103T2 (de) 1986-08-29 1987-08-26 Lichtempfindliche Zusammensetzung.
EP87307544A EP0262788B1 (en) 1986-08-29 1987-08-26 Light-sensitive composition
US07/532,238 US5064741A (en) 1986-08-29 1990-06-04 Positive working light-sensitive composition containing a free radical generator and a discoloring agent

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61202915A JPS6358440A (ja) 1986-08-29 1986-08-29 感光性組成物

Publications (2)

Publication Number Publication Date
JPS6358440A JPS6358440A (ja) 1988-03-14
JPH0581019B2 true JPH0581019B2 (en, 2012) 1993-11-11

Family

ID=16465273

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61202915A Granted JPS6358440A (ja) 1986-08-29 1986-08-29 感光性組成物

Country Status (4)

Country Link
US (1) US5064741A (en, 2012)
EP (1) EP0262788B1 (en, 2012)
JP (1) JPS6358440A (en, 2012)
DE (1) DE3788103T2 (en, 2012)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2661317B2 (ja) * 1990-03-27 1997-10-08 松下電器産業株式会社 パターン形成方法
JPH04296754A (ja) * 1991-03-26 1992-10-21 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
US5221592A (en) * 1992-03-06 1993-06-22 Hoechst Celanese Corporation Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
JPH05341522A (ja) * 1992-06-09 1993-12-24 Fuji Photo Film Co Ltd ネガ型フオトレジスト組成物
US5561029A (en) * 1995-04-28 1996-10-01 Polaroid Corporation Low-volatility, substituted 2-phenyl-4,6-bis (halomethyl)-1,3,5-triazine for lithographic printing plates
JP3872829B2 (ja) * 1995-08-30 2007-01-24 株式会社東芝 着色薄膜パターンの製造方法
KR0152497B1 (ko) * 1995-08-31 1998-10-01 박홍기 감광성 조성물
JPH0990621A (ja) * 1995-09-21 1997-04-04 Canon Inc レジスト組成物、同組成物を用いるパターン形成方法、および半導体デバイスの製造方法
JPH10195568A (ja) * 1997-01-10 1998-07-28 Konica Corp 平版印刷版用アルミニウム合金板
ATE439235T1 (de) 1999-05-21 2009-08-15 Fujifilm Corp Lichtempfindliche zusammensetzung und flachdruckplattenbasis damit
ATE497882T1 (de) 2000-11-30 2011-02-15 Fujifilm Corp Flachdruckplattenvorläufer
KR100795112B1 (ko) * 2001-02-05 2008-01-17 후지필름 가부시키가이샤 포지티브 레지스트 조성물
KR100846085B1 (ko) * 2001-10-31 2008-07-14 주식회사 동진쎄미켐 액정표시장치 회로용 포토레지스트 조성물
US20040067435A1 (en) 2002-09-17 2004-04-08 Fuji Photo Film Co., Ltd. Image forming material
EP1400856B1 (en) 2002-09-20 2011-11-02 FUJIFILM Corporation Method of making lithographic printing plate
JP2006058430A (ja) 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd 平版印刷版原版
JP4404734B2 (ja) 2004-09-27 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP4474296B2 (ja) 2005-02-09 2010-06-02 富士フイルム株式会社 平版印刷版原版
JP4404792B2 (ja) 2005-03-22 2010-01-27 富士フイルム株式会社 平版印刷版原版
EP1967803B1 (en) 2006-05-18 2016-09-28 FUJIFILM Corporation Method for drying a coated film
JP2009085984A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版原版
JP4890403B2 (ja) 2007-09-27 2012-03-07 富士フイルム株式会社 平版印刷版原版
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP4994175B2 (ja) 2007-09-28 2012-08-08 富士フイルム株式会社 平版印刷版原版、及びそれに用いる共重合体の製造方法
JP4790682B2 (ja) 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
EP2218519A4 (en) 2007-11-14 2012-03-21 Fujifilm Corp METHOD FOR DRYING A COATING FILM AND METHOD FOR PRODUCING A PRECURSOR FOR A LITHOGRAPHIC PRINTING PLATE
JP2009236355A (ja) 2008-03-26 2009-10-15 Fujifilm Corp 乾燥方法及び装置
JP5164640B2 (ja) 2008-04-02 2013-03-21 富士フイルム株式会社 平版印刷版原版
JP5183380B2 (ja) 2008-09-09 2013-04-17 富士フイルム株式会社 赤外線レーザ用感光性平版印刷版原版
JP2010237435A (ja) 2009-03-31 2010-10-21 Fujifilm Corp 平版印刷版原版
CN105082725B (zh) 2009-09-24 2018-05-04 富士胶片株式会社 平版印刷版原版
US8828648B2 (en) 2010-02-17 2014-09-09 Fujifilm Corporation Method for producing a planographic printing plate
JP5253433B2 (ja) 2010-02-19 2013-07-31 富士フイルム株式会社 平版印刷版の作製方法
US8846300B2 (en) 2010-03-31 2014-09-30 Fujifilm Corporation Developer for processing lithographic printing plate precursor, method for manufacturing lithographic printing plate by using the developer, and printing method
JP5490168B2 (ja) 2012-03-23 2014-05-14 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja) 2012-03-30 2014-06-04 富士フイルム株式会社 平版印刷版の作製方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL251799A (en, 2012) * 1959-05-19
US3954475A (en) * 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
US4164421A (en) * 1972-12-09 1979-08-14 Fuji Photo Film Co., Ltd. Photocurable composition containing an o-quinonodiazide for printing plate
DE2641100C2 (de) * 1976-09-13 1987-02-26 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Gemisch
DE2718259C2 (de) * 1977-04-25 1982-11-25 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliches Gemisch
JPS5495687A (en) * 1978-01-11 1979-07-28 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS6053300B2 (ja) * 1978-08-29 1985-11-25 富士写真フイルム株式会社 感光性樹脂組成物
DE3144480A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
JPS5978339A (ja) * 1982-10-28 1984-05-07 Fuji Photo Film Co Ltd 光重合性組成物
JPS5989303A (ja) * 1982-11-12 1984-05-23 Fuji Photo Film Co Ltd 光重合性組成物
DE3337024A1 (de) * 1983-10-12 1985-04-25 Hoechst Ag, 6230 Frankfurt Lichtempfindliche, trichlormethylgruppen aufweisende verbindungen, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch
JPH0629285B2 (ja) * 1983-10-14 1994-04-20 三菱化成株式会社 光重合性組成物
JPH0697339B2 (ja) * 1984-02-02 1994-11-30 富士写真フイルム株式会社 光重合性組成物
US4837128A (en) * 1986-08-08 1989-06-06 Fuji Photo Film Co., Ltd. Light-sensitive composition
GB8627059D0 (en) * 1986-11-12 1986-12-10 Cookson Group Plc Substituted trialine derivatives

Also Published As

Publication number Publication date
JPS6358440A (ja) 1988-03-14
EP0262788B1 (en) 1993-11-10
DE3788103D1 (de) 1993-12-16
EP0262788A3 (en) 1989-11-08
EP0262788A2 (en) 1988-04-06
US5064741A (en) 1991-11-12
DE3788103T2 (de) 1994-03-03

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