JPH0580921B2 - - Google Patents

Info

Publication number
JPH0580921B2
JPH0580921B2 JP61298848A JP29884886A JPH0580921B2 JP H0580921 B2 JPH0580921 B2 JP H0580921B2 JP 61298848 A JP61298848 A JP 61298848A JP 29884886 A JP29884886 A JP 29884886A JP H0580921 B2 JPH0580921 B2 JP H0580921B2
Authority
JP
Japan
Prior art keywords
meth
acrylate
group
polymer
unsaturated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61298848A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63152603A (ja
Inventor
Eiichiro Takyama
Katsuhisa Morita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Highpolymer Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Highpolymer Co Ltd filed Critical Showa Highpolymer Co Ltd
Priority to JP29884886A priority Critical patent/JPS63152603A/ja
Publication of JPS63152603A publication Critical patent/JPS63152603A/ja
Publication of JPH0580921B2 publication Critical patent/JPH0580921B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
JP29884886A 1986-12-17 1986-12-17 光硬化可能な樹脂組成物 Granted JPS63152603A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29884886A JPS63152603A (ja) 1986-12-17 1986-12-17 光硬化可能な樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29884886A JPS63152603A (ja) 1986-12-17 1986-12-17 光硬化可能な樹脂組成物

Publications (2)

Publication Number Publication Date
JPS63152603A JPS63152603A (ja) 1988-06-25
JPH0580921B2 true JPH0580921B2 (en, 2012) 1993-11-10

Family

ID=17864987

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29884886A Granted JPS63152603A (ja) 1986-12-17 1986-12-17 光硬化可能な樹脂組成物

Country Status (1)

Country Link
JP (1) JPS63152603A (en, 2012)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0716804B2 (ja) * 1988-11-30 1995-03-01 スター精密株式会社 主軸摺動型自動旋盤およびこれを用いた加工方法
US5242468A (en) 1991-03-19 1993-09-07 Startec Ventures, Inc. Manufacture of high precision electronic components with ultra-high purity liquids
US5722442A (en) * 1994-01-07 1998-03-03 Startec Ventures, Inc. On-site generation of ultra-high-purity buffered-HF for semiconductor processing
US5785820A (en) * 1994-01-07 1998-07-28 Startec Ventures, Inc. On-site manufacture of ultra-high-purity hydrofluoric acid for semiconductor processing
US5496778A (en) * 1994-01-07 1996-03-05 Startec Ventures, Inc. Point-of-use ammonia purification for electronic component manufacture
US5846387A (en) * 1994-01-07 1998-12-08 Air Liquide Electronics Chemicals & Services, Inc. On-site manufacture of ultra-high-purity hydrochloric acid for semiconductor processing
US6350425B2 (en) 1994-01-07 2002-02-26 Air Liquide America Corporation On-site generation of ultra-high-purity buffered-HF and ammonium fluoride
US6001223A (en) * 1995-07-07 1999-12-14 Air Liquide America Corporation On-site ammonia purification for semiconductor manufacture
US6214173B1 (en) 1996-06-05 2001-04-10 Air Liquide Electronics Chemicals & Services, Inc. On-site manufacture of ultra-high-purity nitric acid
CN103627301B (zh) * 2013-11-12 2017-03-29 惠州市长润发涂料有限公司 一种相片uv固化罩光涂料

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51125475A (en) * 1975-03-04 1976-11-01 Fuji Photo Film Co Ltd Photo-polymerizable compositions
JPS61161248A (ja) * 1985-01-10 1986-07-21 Kanegafuchi Chem Ind Co Ltd アクリルアミド系オリゴマ−およびその製法

Also Published As

Publication number Publication date
JPS63152603A (ja) 1988-06-25

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