JPH0576129B2 - - Google Patents
Info
- Publication number
- JPH0576129B2 JPH0576129B2 JP61311802A JP31180286A JPH0576129B2 JP H0576129 B2 JPH0576129 B2 JP H0576129B2 JP 61311802 A JP61311802 A JP 61311802A JP 31180286 A JP31180286 A JP 31180286A JP H0576129 B2 JPH0576129 B2 JP H0576129B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- converging lens
- lens
- converging
- current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61311802A JPS63276856A (ja) | 1986-12-27 | 1986-12-27 | 電界放射電子源を有した電子線装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61311802A JPS63276856A (ja) | 1986-12-27 | 1986-12-27 | 電界放射電子源を有した電子線装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63276856A JPS63276856A (ja) | 1988-11-15 |
JPH0576129B2 true JPH0576129B2 (enrdf_load_stackoverflow) | 1993-10-22 |
Family
ID=18021608
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61311802A Granted JPS63276856A (ja) | 1986-12-27 | 1986-12-27 | 電界放射電子源を有した電子線装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63276856A (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08138600A (ja) * | 1994-11-04 | 1996-05-31 | Shimadzu Corp | 荷電粒子光学系 |
JP2006059513A (ja) | 2004-07-22 | 2006-03-02 | Kuresutetsuku:Kk | 電子ビーム照射装置および描画装置 |
JP6344078B2 (ja) * | 2014-06-19 | 2018-06-20 | 株式会社島津製作所 | 電子ビーム装置並びに電子ビーム装置の制御装置及び制御方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5531986B2 (enrdf_load_stackoverflow) * | 1973-01-19 | 1980-08-22 | ||
JPS58146344U (ja) * | 1982-03-26 | 1983-10-01 | 日本電子株式会社 | 荷電粒子源 |
-
1986
- 1986-12-27 JP JP61311802A patent/JPS63276856A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS63276856A (ja) | 1988-11-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US10410828B2 (en) | Charged particle beam system and methods | |
US8604430B2 (en) | Method and an apparatus of an inspection system using an electron beam | |
JP3323021B2 (ja) | 走査形電子顕微鏡及びそれを用いた試料像観察方法 | |
US4588891A (en) | Scanning type electron microscope | |
US4084095A (en) | Electron beam column generator for the fabrication of semiconductor devices | |
US4097740A (en) | Method and apparatus for focusing the objective lens of a scanning transmission-type corpuscular-beam microscope | |
US20040256556A1 (en) | Multiple electron beam device | |
JP2001052642A (ja) | 走査型電子顕微鏡及び微細パターン測定方法 | |
US5747814A (en) | Method for centering a lens in a charged-particle system | |
US6815677B2 (en) | Scanning electron microscope and method of controlling the same | |
US6657193B2 (en) | Scanning electron microscope | |
JPH0576129B2 (enrdf_load_stackoverflow) | ||
EP0780878B1 (en) | Scanning electron microscope | |
JP3524776B2 (ja) | 走査電子顕微鏡 | |
JPH01220352A (ja) | 走査電子顕微鏡及びその類似装置 | |
US4786922A (en) | Electron beam recording and reproducing apparatus | |
JPH0156501B2 (enrdf_load_stackoverflow) | ||
JP3351647B2 (ja) | 走査電子顕微鏡 | |
JPH07105888A (ja) | 走査電子顕微鏡 | |
JPH0619960B2 (ja) | 熱電界放射型電子源を有した電子線装置 | |
JPH11135052A (ja) | 走査電子顕微鏡 | |
JP2559434B2 (ja) | 電子ビーム露光装置および露光方法 | |
JP3112541B2 (ja) | 電子ビーム装置における非点補正方法 | |
JPH10321173A (ja) | ビーム位置補正装置 | |
JP3194986B2 (ja) | マーク検出方法および装置並びにそれを用いた電子線描画方法およびその装置 |