JPH0573262B2 - - Google Patents
Info
- Publication number
- JPH0573262B2 JPH0573262B2 JP14234386A JP14234386A JPH0573262B2 JP H0573262 B2 JPH0573262 B2 JP H0573262B2 JP 14234386 A JP14234386 A JP 14234386A JP 14234386 A JP14234386 A JP 14234386A JP H0573262 B2 JPH0573262 B2 JP H0573262B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor substrate
- internal circuit
- recess
- microwave
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 230000017525 heat dissipation Effects 0.000 description 5
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000005219 brazing Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は半導体装置に関し、特にマイクロ波集
積回路を内蔵する半導体装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor device, and particularly to a semiconductor device incorporating a microwave integrated circuit.
従来、マイクロ波集積回路を内蔵する半導体装
置において、中出力、高出力の特性を得ようとす
るときには熱的制限が問題にされてきた。
Conventionally, thermal limitations have been a problem when attempting to obtain medium or high output characteristics in semiconductor devices incorporating microwave integrated circuits.
第2図は従来のマイクロ波集積回路の一例の断
面図である。 FIG. 2 is a cross-sectional view of an example of a conventional microwave integrated circuit.
GaAsなどの半導体基板1にマイクロ波用の内
部回路2が形成され、ボンデイングパツド3に引
出される。半導体基板を研磨等により200〜250μ
m程度にして、放熱性を良くする。このようにし
ても小出力のものしか得られなかつた。 An internal circuit 2 for microwaves is formed on a semiconductor substrate 1 such as GaAs, and is drawn out to a bonding pad 3. 200~250μ by polishing the semiconductor substrate, etc.
m to improve heat dissipation. Even with this method, only a small output could be obtained.
出力を大きくするために、半導体基板7を80〜
100μm程度にし、基板裏面にPHS(Plated Heat
Sink)と呼ばれるヒートシンクをAuめつきなど
で100μm程度の厚さに形成して放熱効果を改善
しようとしていたが、集積回路では面積が大きく
なり、コスト、信頼性などの点で実用的でなかつ
た。 In order to increase the output, the semiconductor substrate 7 is
The thickness is approximately 100 μm, and PHS (Plated Heat
Attempts were made to improve the heat dissipation effect by forming a heat sink (called a sink) with a thickness of approximately 100 μm using gold plating, etc., but this required a large area for integrated circuits, making it impractical in terms of cost and reliability. .
上述した従来の半導体装置において、半導体基
板にGaAsを使用すると、GaAsはSiに比べて熱
伝導性が悪く、内部回路を構成しているトランジ
スタ等から発生する熱の放散性が問題となる。従
つて、第2図に示したような構造では小出力のマ
イク波集積回路しか得られず、PHS構造にした
ものはチツプ面積が2mm□
〜4mm□
と大きくな
り、コストが高くなり、信頼性の下るという問題
があつた。
In the conventional semiconductor device described above, when GaAs is used for the semiconductor substrate, GaAs has poor thermal conductivity compared to Si, and the dissipation of heat generated from transistors and the like forming the internal circuit becomes a problem. Therefore, with the structure shown in Figure 2, only a small-output microwave integrated circuit can be obtained, and the PHS structure has a large chip area of 2 mm□ to 4 mm□, resulting in high cost and poor reliability. I had a problem with it coming down.
本発明の半導体装置は、半導体基板と、該半導
体基板の表面に集積化形成されたマイクロ波用内
部回路と、前記半導体基板の裏面から表面に向つ
て掘られ前記マイクロ波用内部回路の領域の厚さ
を薄くする凹部と、前記マイクロ波用内部回路の
周囲に設けられ前記凹部表面に達する空気孔と、
前記凹部の表面に設けられた金属層とを含んで構
成される。
The semiconductor device of the present invention includes a semiconductor substrate, a microwave internal circuit integrated and formed on the surface of the semiconductor substrate, and a region of the microwave internal circuit dug from the back surface of the semiconductor substrate toward the front surface. a recess for reducing the thickness; an air hole provided around the microwave internal circuit and reaching the surface of the recess;
and a metal layer provided on the surface of the recess.
次に、本発明の実施例について図面を用いて説
明する。
Next, embodiments of the present invention will be described using the drawings.
第1図a,bは本発明の一実施例の平面図及び
A−A′線断面図である。 FIGS. 1a and 1b are a plan view and a sectional view taken along the line A-A' of an embodiment of the present invention.
この実施例は、半導体基板1と、この半導体基
板1の表面に集積化形成されたマイクロ波用内部
回路2と、半導体基板1の裏面から表面に向つて
掘られマイクロ波用内部回路2の領域の厚さを薄
くする凹部5と、マイクロ波用内部回路2の周囲
に設けられ凹部5の表面に達する空気孔4と、凹
部5の表面に設けられた金属層6とを含んで構成
される。内部回路2が形成されている領域の基板
厚さは50〜80μmにする。空気孔4の形は円柱
形、円錐台形のいずれでもよい。 This embodiment includes a semiconductor substrate 1, a microwave internal circuit 2 integrated and formed on the surface of the semiconductor substrate 1, and a region of the microwave internal circuit 2 dug from the back surface of the semiconductor substrate 1 toward the front surface. , an air hole 4 provided around the microwave internal circuit 2 and reaching the surface of the recess 5 , and a metal layer 6 provided on the surface of the recess 5 . . The substrate thickness in the area where the internal circuit 2 is formed is 50 to 80 μm. The shape of the air hole 4 may be either cylindrical or truncated conical.
本発明では、半導体基板1の厚さは、製造開始
時の厚さのまま保つており、第2図で説明したよ
うに薄くするということはしない。チツプ周囲が
厚い方が機械的強度を高めるからである。凹部形
成は、ウエツトエツチ(化学エツチ)、ドライエ
ツチ(プラズマエツチ等)のいずれでも形成して
も良い。空気孔4は少くとも1個設けるものとす
る。この実施例では4個設けているが、6個ある
いは8個設けてもよい。 In the present invention, the thickness of the semiconductor substrate 1 is maintained at the same thickness at the start of manufacturing, and is not made thinner as explained in FIG. 2. This is because the thicker the chip periphery, the higher the mechanical strength. The recesses may be formed by either wet etching (chemical etching) or dry etching (plasma etching, etc.). At least one air hole 4 shall be provided. In this embodiment, four are provided, but six or eight may be provided.
このように作られた半導体チツプを容器にろう
材でマウントする。 The semiconductor chip thus produced is mounted in a container using a brazing material.
以上のような構造にすると、発熱部である内部
回路の部分の基板の厚さが薄いので、GaAsのよ
うに熱伝導度の悪い基板を用いても、発生した熱
は金属層6に速く伝えられ、金属層6及びろう材
を通して放散される。また金属層6からの放熱に
より熱せられた空気は空気孔4を通して上部へ逃
げて行く。これらのことから放熱性は格段に改善
される。 With the above structure, the thickness of the substrate in the internal circuit part that generates heat is thin, so even if a substrate with poor thermal conductivity such as GaAs is used, the generated heat can be quickly transferred to the metal layer 6. and is dissipated through the metal layer 6 and the brazing material. Furthermore, air heated by heat radiation from the metal layer 6 escapes to the upper part through the air holes 4. Due to these factors, heat dissipation performance is significantly improved.
以上説明したように、本発明は、発熱部の基板
厚さを他の部分より薄くした逆凹字形にし、凹部
内面に熱伝導の良い金属で被覆し、かつ発熱部の
周囲に空気孔を設けて熱せられた空気が逃げるよ
うにしたので、放熱性が格段に改善され、中出
力、高出力用の高周波用半導体装置が得られる効
果があり、また放熱性が改善されることにより信
頼性も向上するという効果がある。
As explained above, the present invention has an inverted concave shape in which the substrate thickness of the heat generating part is thinner than other parts, the inner surface of the recess is coated with a metal having good heat conduction, and air holes are provided around the heat generating part. Since the heated air is allowed to escape, the heat dissipation performance is greatly improved, which has the effect of providing high-frequency semiconductor devices for medium and high power outputs.The improved heat dissipation performance also improves reliability. It has the effect of improving.
第1図a,bは本発明の一実施例の平面図及び
断面図、第2図は従来のマイクロ波集積回路の一
例の断面図である。
1……半導体基板、2……内部回路、3……ボ
ンデイングパツド、4……空気孔、5……凹部、
6……金属層。
1A and 1B are a plan view and a sectional view of an embodiment of the present invention, and FIG. 2 is a sectional view of an example of a conventional microwave integrated circuit. DESCRIPTION OF SYMBOLS 1... Semiconductor substrate, 2... Internal circuit, 3... Bonding pad, 4... Air hole, 5... Recessed part,
6...Metal layer.
Claims (1)
形成されたマイクロ波用内部回路と、前記半導体
基板の裏面から表面に向つて掘られ前記マイクロ
波用内部回路の領域の厚さを薄くする凹部と、前
記マイクロ波用内部回路の周囲に設けられ前記凹
部表面に達する空気孔と、前記凹部の表面に設け
られた金属層とを含むことを特徴とする半導体装
置。1. A semiconductor substrate, a microwave internal circuit integrated and formed on the surface of the semiconductor substrate, and a recess that is dug from the back surface of the semiconductor substrate toward the front surface to reduce the thickness of the region of the microwave internal circuit. A semiconductor device comprising: an air hole provided around the microwave internal circuit and reaching the surface of the recess; and a metal layer provided on the surface of the recess.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14234386A JPS62298142A (en) | 1986-06-17 | 1986-06-17 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14234386A JPS62298142A (en) | 1986-06-17 | 1986-06-17 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62298142A JPS62298142A (en) | 1987-12-25 |
JPH0573262B2 true JPH0573262B2 (en) | 1993-10-14 |
Family
ID=15313153
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14234386A Granted JPS62298142A (en) | 1986-06-17 | 1986-06-17 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62298142A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01257355A (en) * | 1987-12-14 | 1989-10-13 | Mitsubishi Electric Corp | Microwave monolithic ic |
JP2710986B2 (en) * | 1989-05-23 | 1998-02-10 | 新光電気工業株式会社 | Electronic equipment |
-
1986
- 1986-06-17 JP JP14234386A patent/JPS62298142A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS62298142A (en) | 1987-12-25 |
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