JPH057168B2 - - Google Patents

Info

Publication number
JPH057168B2
JPH057168B2 JP62218640A JP21864087A JPH057168B2 JP H057168 B2 JPH057168 B2 JP H057168B2 JP 62218640 A JP62218640 A JP 62218640A JP 21864087 A JP21864087 A JP 21864087A JP H057168 B2 JPH057168 B2 JP H057168B2
Authority
JP
Japan
Prior art keywords
wafer
adhesive
protective film
radiation
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62218640A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6461208A (en
Inventor
Katsuhisa Taguchi
Kazuyoshi Ebe
Toshio Minagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RINTETSUKU KK
Original Assignee
RINTETSUKU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RINTETSUKU KK filed Critical RINTETSUKU KK
Priority to JP21864087A priority Critical patent/JPS6461208A/ja
Publication of JPS6461208A publication Critical patent/JPS6461208A/ja
Publication of JPH057168B2 publication Critical patent/JPH057168B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Dicing (AREA)
JP21864087A 1987-09-01 1987-09-01 Cutting method of wafer Granted JPS6461208A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21864087A JPS6461208A (en) 1987-09-01 1987-09-01 Cutting method of wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21864087A JPS6461208A (en) 1987-09-01 1987-09-01 Cutting method of wafer

Publications (2)

Publication Number Publication Date
JPS6461208A JPS6461208A (en) 1989-03-08
JPH057168B2 true JPH057168B2 (enrdf_load_stackoverflow) 1993-01-28

Family

ID=16723116

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21864087A Granted JPS6461208A (en) 1987-09-01 1987-09-01 Cutting method of wafer

Country Status (1)

Country Link
JP (1) JPS6461208A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011054641A (ja) * 2009-08-31 2011-03-17 Nitto Denko Corp 被切断体からのダイシング表面保護テープの剥離除去方法
JP2011171688A (ja) * 2010-01-19 2011-09-01 Sony Chemical & Information Device Corp 接着フィルム付き電子部品の製造方法および実装体の製造方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0635473Y2 (ja) * 1989-10-30 1994-09-14 シャープ株式会社 半導体用保護シート
JP4353975B2 (ja) * 2006-11-29 2009-10-28 日東電工株式会社 粘着シートの貼付・剥離方法及び粘着シートの貼付装置並びに粘着シートの剥離装置
CN115178884A (zh) * 2022-09-13 2022-10-14 西北电子装备技术研究所(中国电子科技集团公司第二研究所) 一种晶片热分离方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61116504A (ja) * 1984-11-13 1986-06-04 山形日本電気株式会社 ダイシング方法
JPS6279649A (ja) * 1985-10-03 1987-04-13 Mitsui Toatsu Chem Inc 半導体ダイシング方法
JPS62153376A (ja) * 1985-12-27 1987-07-08 F S K Kk ウェハダイシング用粘着シート
JPS62153375A (ja) * 1985-12-27 1987-07-08 F S K Kk ウエハダイシング用粘着シート
JPS62216244A (ja) * 1986-03-17 1987-09-22 Fujitsu Ltd 半導体装置の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011054641A (ja) * 2009-08-31 2011-03-17 Nitto Denko Corp 被切断体からのダイシング表面保護テープの剥離除去方法
JP2011171688A (ja) * 2010-01-19 2011-09-01 Sony Chemical & Information Device Corp 接着フィルム付き電子部品の製造方法および実装体の製造方法

Also Published As

Publication number Publication date
JPS6461208A (en) 1989-03-08

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