JPH0570121B2 - - Google Patents

Info

Publication number
JPH0570121B2
JPH0570121B2 JP59132019A JP13201984A JPH0570121B2 JP H0570121 B2 JPH0570121 B2 JP H0570121B2 JP 59132019 A JP59132019 A JP 59132019A JP 13201984 A JP13201984 A JP 13201984A JP H0570121 B2 JPH0570121 B2 JP H0570121B2
Authority
JP
Japan
Prior art keywords
thin film
film
thickness
light
coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59132019A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6113201A (ja
Inventor
Shigeyuki Takahashi
Kaoru Yamaki
Takayuki Kuroda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Chemical Industries Ltd filed Critical Daicel Chemical Industries Ltd
Priority to JP59132019A priority Critical patent/JPS6113201A/ja
Publication of JPS6113201A publication Critical patent/JPS6113201A/ja
Publication of JPH0570121B2 publication Critical patent/JPH0570121B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/111Anti-reflection coatings using layers comprising organic materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Surface Treatment Of Optical Elements (AREA)
JP59132019A 1984-06-28 1984-06-28 光線透過率の大きい薄膜の製造法 Granted JPS6113201A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59132019A JPS6113201A (ja) 1984-06-28 1984-06-28 光線透過率の大きい薄膜の製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59132019A JPS6113201A (ja) 1984-06-28 1984-06-28 光線透過率の大きい薄膜の製造法

Publications (2)

Publication Number Publication Date
JPS6113201A JPS6113201A (ja) 1986-01-21
JPH0570121B2 true JPH0570121B2 (OSRAM) 1993-10-04

Family

ID=15071618

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59132019A Granted JPS6113201A (ja) 1984-06-28 1984-06-28 光線透過率の大きい薄膜の製造法

Country Status (1)

Country Link
JP (1) JPS6113201A (OSRAM)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5225328B2 (OSRAM) * 1973-09-19 1977-07-07
JPS5666802A (en) * 1979-11-05 1981-06-05 Seiko Epson Corp Antireflection film of optical parts made of synthetic resin

Also Published As

Publication number Publication date
JPS6113201A (ja) 1986-01-21

Similar Documents

Publication Publication Date Title
JPS6235359A (ja) コ−テツド薄膜の製造法
JPS6038821A (ja) エッチング方法
US20020182519A1 (en) Non absorbing reticle and method of making same
US6627356B2 (en) Photomask used in manufacturing of semiconductor device, photomask blank, and method of applying light exposure to semiconductor wafer by using said photomask
US6586159B2 (en) Method for using a coated fluoropolymer substrate pellicle in semiconductor fabrication
KR900001665B1 (ko) 레지스트 도포방법
JPH0570121B2 (OSRAM)
JPS63113501A (ja) 反射防止膜
JPS63216052A (ja) 露光方法
JPH02124572A (ja) 透明樹脂薄膜
TW202419930A (zh) 用於投射曝光裝置的反射鏡
JP2550281Y2 (ja) ペリクル用フレーム
JPH049061A (ja) 高光線透過性防塵体
JPH06242596A (ja) 遮光膜を有する基材およびその製造方法
JPS6053871B2 (ja) 露光方法
JPH07111235A (ja) 露光方法および装置
JPH1172924A (ja) パターン形成方法
JPS6083019A (ja) パタ−ン反射型投影露光方法
JPS5877229A (ja) パタ−ン転写用マスクおよびその製造方法
JPS5825379Y2 (ja) フオトマスク
JP2003131356A (ja) ホトマスクの製造方法および描画装置
JPH0525815U (ja) 弾性表面波装置の製造装置。
JPH03152540A (ja) マスク基板およびこれを用いたフォトマスクの作成方法
JPH0652704B2 (ja) 投影露光方法及び装置
JPH0628229B2 (ja) X線露光用マスク