JPH0568539B2 - - Google Patents

Info

Publication number
JPH0568539B2
JPH0568539B2 JP24366485A JP24366485A JPH0568539B2 JP H0568539 B2 JPH0568539 B2 JP H0568539B2 JP 24366485 A JP24366485 A JP 24366485A JP 24366485 A JP24366485 A JP 24366485A JP H0568539 B2 JPH0568539 B2 JP H0568539B2
Authority
JP
Japan
Prior art keywords
shroud
film
cylinder
aluminum
ion plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP24366485A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62102518A (ja
Inventor
Yutaka Kato
Eizo Isoyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Altemira Co Ltd
Original Assignee
Showa Aluminum Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Aluminum Corp filed Critical Showa Aluminum Corp
Priority to JP24366485A priority Critical patent/JPS62102518A/ja
Publication of JPS62102518A publication Critical patent/JPS62102518A/ja
Publication of JPH0568539B2 publication Critical patent/JPH0568539B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP24366485A 1985-10-29 1985-10-29 半導体製造装置用シユラウドの製造方法 Granted JPS62102518A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24366485A JPS62102518A (ja) 1985-10-29 1985-10-29 半導体製造装置用シユラウドの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24366485A JPS62102518A (ja) 1985-10-29 1985-10-29 半導体製造装置用シユラウドの製造方法

Publications (2)

Publication Number Publication Date
JPS62102518A JPS62102518A (ja) 1987-05-13
JPH0568539B2 true JPH0568539B2 (OSRAM) 1993-09-29

Family

ID=17107165

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24366485A Granted JPS62102518A (ja) 1985-10-29 1985-10-29 半導体製造装置用シユラウドの製造方法

Country Status (1)

Country Link
JP (1) JPS62102518A (OSRAM)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01261816A (ja) * 1988-04-12 1989-10-18 Showa Alum Corp 真空チャンバにおける真空用冷却装置

Also Published As

Publication number Publication date
JPS62102518A (ja) 1987-05-13

Similar Documents

Publication Publication Date Title
JP2013501139A (ja) コーティングされた基材を調製するためのプロセス、コーティングされた基材、及びその使用
US5403629A (en) Formation of interlayers for application of aluminum diffusion coatings
WO1993010275A1 (fr) Procede de formation d'une couche de revetement par evaporation
CN100516283C (zh) 一氧化硅蒸镀材料及其制造方法
JPH0568539B2 (OSRAM)
US2898234A (en) Method of producing composite metallic bodies
JP5615297B2 (ja) 亜鉛を基礎とした合金層を有するディスクリート製品を被覆する方法
JPH0553871B2 (OSRAM)
JPH07113182A (ja) 金属基板を金属又は金属合金の被覆層で被覆する方法及び 装置
JPH0568540B2 (OSRAM)
JPS59166681A (ja) 耐食部材
US3281262A (en) Art of bonding of vacuum metallized coatings to metal substrates
JPH022282B2 (OSRAM)
JPH05311401A (ja) 蒸着Ａｌめっき材
JPS59229280A (ja) アルミニウム製熱交換器の製造方法
CN110777329B (zh) 一种提高钢材在锌液中润湿性的方法
JP2506162B2 (ja) 耐食性溶射材料およびその製造方法と、耐食性皮膜の形成方法
JPH021859Y2 (OSRAM)
JP2004509461A (ja) 熱処理された半導体基板の汚染を減少させるための装置および方法
JPH0310076A (ja) 熱分解窒化ホウ素膜の被覆方法
CN118932268A (zh) 一种金属复合材料及其制备方法、应用
JPH0219489A (ja) アルミニウム材の表面処理方法
JPS62101019A (ja) 半導体製造装置用シユラウドの製造方法
JPH06158285A (ja) Ａｌ系蒸着めっき材の製造方法
JPS6261667B2 (OSRAM)