JPH0568094B2 - - Google Patents
Info
- Publication number
- JPH0568094B2 JPH0568094B2 JP31561889A JP31561889A JPH0568094B2 JP H0568094 B2 JPH0568094 B2 JP H0568094B2 JP 31561889 A JP31561889 A JP 31561889A JP 31561889 A JP31561889 A JP 31561889A JP H0568094 B2 JPH0568094 B2 JP H0568094B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- cup
- spin chuck
- processing liquid
- airflow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 60
- 239000007788 liquid Substances 0.000 claims description 23
- 238000004381 surface treatment Methods 0.000 claims description 14
- 230000002265 prevention Effects 0.000 claims description 6
- 230000002093 peripheral effect Effects 0.000 description 6
- 101150038956 cup-4 gene Proteins 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000007664 blowing Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 101100327917 Caenorhabditis elegans chup-1 gene Proteins 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31561889A JPH03175617A (ja) | 1989-12-04 | 1989-12-04 | 基板の回転式表面処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31561889A JPH03175617A (ja) | 1989-12-04 | 1989-12-04 | 基板の回転式表面処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03175617A JPH03175617A (ja) | 1991-07-30 |
| JPH0568094B2 true JPH0568094B2 (de) | 1993-09-28 |
Family
ID=18067532
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31561889A Granted JPH03175617A (ja) | 1989-12-04 | 1989-12-04 | 基板の回転式表面処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03175617A (de) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05109612A (ja) * | 1991-10-18 | 1993-04-30 | Fujitsu Ltd | レジスト塗布装置 |
| US6977098B2 (en) | 1994-10-27 | 2005-12-20 | Asml Holding N.V. | Method of uniformly coating a substrate |
| US7030039B2 (en) | 1994-10-27 | 2006-04-18 | Asml Holding N.V. | Method of uniformly coating a substrate |
| US7018943B2 (en) | 1994-10-27 | 2006-03-28 | Asml Holding N.V. | Method of uniformly coating a substrate |
| JPH0945611A (ja) * | 1995-07-27 | 1997-02-14 | Dainippon Screen Mfg Co Ltd | 回転式基板塗布装置 |
| JP5802444B2 (ja) * | 2011-06-15 | 2015-10-28 | 東京応化工業株式会社 | 塗布装置及び塗布方法 |
| JP6543534B2 (ja) | 2015-08-26 | 2019-07-10 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置 |
-
1989
- 1989-12-04 JP JP31561889A patent/JPH03175617A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03175617A (ja) | 1991-07-30 |
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