JPH0565584B2 - - Google Patents

Info

Publication number
JPH0565584B2
JPH0565584B2 JP59002916A JP291684A JPH0565584B2 JP H0565584 B2 JPH0565584 B2 JP H0565584B2 JP 59002916 A JP59002916 A JP 59002916A JP 291684 A JP291684 A JP 291684A JP H0565584 B2 JPH0565584 B2 JP H0565584B2
Authority
JP
Japan
Prior art keywords
boat
vapor deposition
mesh
present
view
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59002916A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60149766A (ja
Inventor
Masaki Ito
Sotaro Edokoro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP291684A priority Critical patent/JPS60149766A/ja
Publication of JPS60149766A publication Critical patent/JPS60149766A/ja
Publication of JPH0565584B2 publication Critical patent/JPH0565584B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/26Vacuum evaporation by resistance or inductive heating of the source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP291684A 1984-01-11 1984-01-11 蒸着用ボ−ト Granted JPS60149766A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP291684A JPS60149766A (ja) 1984-01-11 1984-01-11 蒸着用ボ−ト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP291684A JPS60149766A (ja) 1984-01-11 1984-01-11 蒸着用ボ−ト

Publications (2)

Publication Number Publication Date
JPS60149766A JPS60149766A (ja) 1985-08-07
JPH0565584B2 true JPH0565584B2 (enrdf_load_stackoverflow) 1993-09-20

Family

ID=11542669

Family Applications (1)

Application Number Title Priority Date Filing Date
JP291684A Granted JPS60149766A (ja) 1984-01-11 1984-01-11 蒸着用ボ−ト

Country Status (1)

Country Link
JP (1) JPS60149766A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6047433B2 (ja) * 2013-03-15 2016-12-21 長州産業株式会社 蒸着源坩堝

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59113174A (ja) * 1982-12-17 1984-06-29 Matsushita Electric Ind Co Ltd 薄膜形成方法および薄膜形成装置

Also Published As

Publication number Publication date
JPS60149766A (ja) 1985-08-07

Similar Documents

Publication Publication Date Title
Musselman et al. Low-temperature synthesis of large-area, free-standing nanorod arrays on ITO/glass and other conducting substrates
US4105807A (en) Production of thin, stable, solid electrolyte films of high ionic conductivity
WO1999004057A1 (en) Method and apparatus for forming thin functional film
US6730198B2 (en) Container-shaped physical vapor deposition targets
JPH0565584B2 (enrdf_load_stackoverflow)
JPH0534426B2 (enrdf_load_stackoverflow)
JPH05190877A (ja) ダイオード素子の製造方法
JPH0565585B2 (enrdf_load_stackoverflow)
JPS637092B2 (enrdf_load_stackoverflow)
JPS60154430A (ja) 酸化物陰極
JPS5855563A (ja) 蒸着方法
Ivanov et al. Electrochemical formation of amorphous selenium films doped by lead selenide nanoparticles
JPH08144044A (ja) 硫化スズ膜の製造方法
JPS6326485B2 (enrdf_load_stackoverflow)
JPS6335062B2 (enrdf_load_stackoverflow)
JPS5887077A (ja) サ−マルヘツド
JPH0241165Y2 (enrdf_load_stackoverflow)
JPH0233373B2 (enrdf_load_stackoverflow)
van Amstel et al. Porous carbides as evaporation sources for vacuum deposition of metal and semiconductor layers
JPS59203644A (ja) 蒸発源用るつぼ
JPH021331B2 (enrdf_load_stackoverflow)
JPS5939348A (ja) 真空内試料加熱装置
JPS58108131A (ja) 金属蒸着複合体
CN116685148A (zh) 自支撑铁电薄膜的制备方法及其室温下产生铁电性的方法
JPH02167896A (ja) 結晶膜成長用基板及びその形成方法