JPH0564846B2 - - Google Patents

Info

Publication number
JPH0564846B2
JPH0564846B2 JP60193925A JP19392585A JPH0564846B2 JP H0564846 B2 JPH0564846 B2 JP H0564846B2 JP 60193925 A JP60193925 A JP 60193925A JP 19392585 A JP19392585 A JP 19392585A JP H0564846 B2 JPH0564846 B2 JP H0564846B2
Authority
JP
Japan
Prior art keywords
magnetic field
base material
permanent magnet
holding means
permanent magnets
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60193925A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6254907A (ja
Inventor
Yukio Nakagawa
Yoichi Ooshita
Kunio Hirasawa
Tadashi Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP19392585A priority Critical patent/JPS6254907A/ja
Publication of JPS6254907A publication Critical patent/JPS6254907A/ja
Publication of JPH0564846B2 publication Critical patent/JPH0564846B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Thin Magnetic Films (AREA)
JP19392585A 1985-09-04 1985-09-04 スパツタ装置 Granted JPS6254907A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19392585A JPS6254907A (ja) 1985-09-04 1985-09-04 スパツタ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19392585A JPS6254907A (ja) 1985-09-04 1985-09-04 スパツタ装置

Publications (2)

Publication Number Publication Date
JPS6254907A JPS6254907A (ja) 1987-03-10
JPH0564846B2 true JPH0564846B2 (enExample) 1993-09-16

Family

ID=16316020

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19392585A Granted JPS6254907A (ja) 1985-09-04 1985-09-04 スパツタ装置

Country Status (1)

Country Link
JP (1) JPS6254907A (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0774441B2 (ja) * 1987-06-05 1995-08-09 株式会社日立製作所 イオンビ−ムスパツタ装置
US5026470A (en) * 1989-12-19 1991-06-25 International Business Machines Sputtering apparatus
JP2009138277A (ja) * 2009-01-27 2009-06-25 Canon Anelva Corp マグネトロンスパッタリング装置
US8246798B2 (en) * 2009-03-02 2012-08-21 Canon Anelva Corporation Substrate processing apparatus and apparatus and method of manufacturing magnetic device
JP5910656B2 (ja) * 2014-03-25 2016-04-27 Tdk株式会社 スパッタリング成膜装置
CN108138312B (zh) * 2016-03-29 2020-11-03 株式会社爱发科 磁性膜成膜装置及磁性膜成膜方法
CN107313019B (zh) * 2017-07-14 2019-11-29 北京北方华创微电子装备有限公司 磁性薄膜沉积腔室及薄膜沉积设备
KR102698409B1 (ko) 2018-02-13 2024-08-23 에바텍 아크티엔게젤샤프트 마그네트론 스퍼터링 방법 및 장치

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58100411A (ja) * 1981-12-11 1983-06-15 Matsushita Electric Ind Co Ltd 強磁性体膜の形成方法
JPS6039157A (ja) * 1983-08-12 1985-02-28 Hitachi Ltd 非晶質磁性合金の製造方法

Also Published As

Publication number Publication date
JPS6254907A (ja) 1987-03-10

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