JPH0563897B2 - - Google Patents

Info

Publication number
JPH0563897B2
JPH0563897B2 JP25838286A JP25838286A JPH0563897B2 JP H0563897 B2 JPH0563897 B2 JP H0563897B2 JP 25838286 A JP25838286 A JP 25838286A JP 25838286 A JP25838286 A JP 25838286A JP H0563897 B2 JPH0563897 B2 JP H0563897B2
Authority
JP
Japan
Prior art keywords
deflection
electrode
ion
scan
ion beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP25838286A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63114038A (ja
Inventor
Toshiharu Ozawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP25838286A priority Critical patent/JPS63114038A/ja
Publication of JPS63114038A publication Critical patent/JPS63114038A/ja
Publication of JPH0563897B2 publication Critical patent/JPH0563897B2/ja
Granted legal-status Critical Current

Links

JP25838286A 1986-10-31 1986-10-31 イオン注入方法 Granted JPS63114038A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25838286A JPS63114038A (ja) 1986-10-31 1986-10-31 イオン注入方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25838286A JPS63114038A (ja) 1986-10-31 1986-10-31 イオン注入方法

Publications (2)

Publication Number Publication Date
JPS63114038A JPS63114038A (ja) 1988-05-18
JPH0563897B2 true JPH0563897B2 (enrdf_load_stackoverflow) 1993-09-13

Family

ID=17319465

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25838286A Granted JPS63114038A (ja) 1986-10-31 1986-10-31 イオン注入方法

Country Status (1)

Country Link
JP (1) JPS63114038A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5431634B2 (ja) * 2005-05-14 2014-03-05 エフ・イ−・アイ・カンパニー 帯電粒子ビームの偏向信号補償

Also Published As

Publication number Publication date
JPS63114038A (ja) 1988-05-18

Similar Documents

Publication Publication Date Title
JPH0530016B2 (enrdf_load_stackoverflow)
JPH04226021A (ja) 物体を荷電粒子ビームで照射する方法
US4645929A (en) Method and apparatus for the compensation of charges in secondary ion mass spectrometry (SIMS) of specimens exhibiting poor electrical conductivity
US4835399A (en) Charged particle beam apparatus
US3881108A (en) Ion microprobe analyzer
US4983850A (en) Ion implantation device
JPH0563897B2 (enrdf_load_stackoverflow)
JPH025346A (ja) イオン注入装置およびイオンビームの調整方法
JP3379128B2 (ja) イオン注入装置
JPS6212624B2 (enrdf_load_stackoverflow)
JPH0754683B2 (ja) 帯電防止法
JP3381288B2 (ja) イオン注入装置
JPH0731996B2 (ja) イオン注入装置
JPH025347A (ja) イオン注入方法
JPS63148526A (ja) イオンビーム注入装置
JPH01252771A (ja) イオン注入装置
JPH03138844A (ja) イオンマイクロアナライザ
JPH02121252A (ja) 荷電粒子ビーム複合装置
JPH025341A (ja) イオン注入装置
JPH02260361A (ja) イオン注入装置
JPH03176649A (ja) オージェ電子分光装置
JPH03102750A (ja) イオン注入装置におけるイオンビームの走査制御装置
JPH01252772A (ja) イオン注入装置
JPH0257952A (ja) 二次イオン質量分析装置
JPH04171648A (ja) イオン注入装置