JPS63114038A - イオン注入方法 - Google Patents
イオン注入方法Info
- Publication number
- JPS63114038A JPS63114038A JP25838286A JP25838286A JPS63114038A JP S63114038 A JPS63114038 A JP S63114038A JP 25838286 A JP25838286 A JP 25838286A JP 25838286 A JP25838286 A JP 25838286A JP S63114038 A JPS63114038 A JP S63114038A
- Authority
- JP
- Japan
- Prior art keywords
- ion
- deflection
- scanning
- electrode
- ion beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 20
- 238000010884 ion-beam technique Methods 0.000 claims abstract description 60
- 238000005468 ion implantation Methods 0.000 claims abstract description 18
- 150000002500 ions Chemical class 0.000 claims description 35
- 230000003111 delayed effect Effects 0.000 abstract description 5
- 230000001133 acceleration Effects 0.000 abstract description 4
- 230000005684 electric field Effects 0.000 abstract description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000007943 implant Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25838286A JPS63114038A (ja) | 1986-10-31 | 1986-10-31 | イオン注入方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25838286A JPS63114038A (ja) | 1986-10-31 | 1986-10-31 | イオン注入方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63114038A true JPS63114038A (ja) | 1988-05-18 |
JPH0563897B2 JPH0563897B2 (enrdf_load_stackoverflow) | 1993-09-13 |
Family
ID=17319465
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25838286A Granted JPS63114038A (ja) | 1986-10-31 | 1986-10-31 | イオン注入方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63114038A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006318913A (ja) * | 2005-05-14 | 2006-11-24 | Fei Co | 帯電粒子ビームの偏向信号補償 |
-
1986
- 1986-10-31 JP JP25838286A patent/JPS63114038A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006318913A (ja) * | 2005-05-14 | 2006-11-24 | Fei Co | 帯電粒子ビームの偏向信号補償 |
Also Published As
Publication number | Publication date |
---|---|
JPH0563897B2 (enrdf_load_stackoverflow) | 1993-09-13 |
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