JPH056340B2 - - Google Patents
Info
- Publication number
- JPH056340B2 JPH056340B2 JP58187391A JP18739183A JPH056340B2 JP H056340 B2 JPH056340 B2 JP H056340B2 JP 58187391 A JP58187391 A JP 58187391A JP 18739183 A JP18739183 A JP 18739183A JP H056340 B2 JPH056340 B2 JP H056340B2
- Authority
- JP
- Japan
- Prior art keywords
- deflection
- electron beam
- exposed
- height
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58187391A JPS6079722A (ja) | 1983-10-06 | 1983-10-06 | 電子線露光方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58187391A JPS6079722A (ja) | 1983-10-06 | 1983-10-06 | 電子線露光方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6079722A JPS6079722A (ja) | 1985-05-07 |
| JPH056340B2 true JPH056340B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-01-26 |
Family
ID=16205200
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58187391A Granted JPS6079722A (ja) | 1983-10-06 | 1983-10-06 | 電子線露光方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6079722A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000091225A (ja) | 1998-07-16 | 2000-03-31 | Advantest Corp | 荷電粒子ビ―ム露光装置及び露光方法 |
| KR100334636B1 (ko) * | 1998-07-16 | 2002-04-27 | 히로시 오우라 | 노출된 시료의 표면 상에 부분적인 불균일이 있는 경우에도 고도로 정밀한 노출을 할 수 있는 대전 입자빔 노출 장치 및 노출 방법 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5760205A (en) * | 1980-09-30 | 1982-04-12 | Jeol Ltd | Exposure be electron beam |
| JPS57140734U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1981-02-27 | 1982-09-03 | ||
| US4468565A (en) * | 1981-12-31 | 1984-08-28 | International Business Machines Corporation | Automatic focus and deflection correction in E-beam system using optical target height measurements |
-
1983
- 1983-10-06 JP JP58187391A patent/JPS6079722A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6079722A (ja) | 1985-05-07 |