JPS5760205A - Exposure be electron beam - Google Patents

Exposure be electron beam

Info

Publication number
JPS5760205A
JPS5760205A JP55136161A JP13616180A JPS5760205A JP S5760205 A JPS5760205 A JP S5760205A JP 55136161 A JP55136161 A JP 55136161A JP 13616180 A JP13616180 A JP 13616180A JP S5760205 A JPS5760205 A JP S5760205A
Authority
JP
Japan
Prior art keywords
light
amplifier
supplied
output
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55136161A
Other languages
Japanese (ja)
Other versions
JPS6341401B2 (en
Inventor
Teruaki Okino
Shigeo Konno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP55136161A priority Critical patent/JPS5760205A/en
Publication of JPS5760205A publication Critical patent/JPS5760205A/en
Publication of JPS6341401B2 publication Critical patent/JPS6341401B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Measurement Of Optical Distance (AREA)

Abstract

PURPOSE:To enable accurate exposure by projecting a light from a light source aslant on the surface of a material to be exposed, by detecting the light reflected therefrom and by generating a signal according to the position of an image thereby formed. CONSTITUTION:A light 6 from a lamp 5 is turned into a parallel beams tilted to the surface of the material 1 to be exposed, by a collimator lens 7, and then falls on a light-intercepting plate 8. The beams passing the light-intercepting plate 8 are imaged on the material 1 through the intermediary of a filter 9 and an imaging lens 10. The beams reflected by the material 1 fall on a photocathode 12 through an imaging lens 11. An output signal delivered from a secondary electron multiplier tube 16 is supplied to amplifiers 20 and 22 through the intermediary of a preamplifier 17 and a differential amplifier 18. An output from the amplifier 22 is supplied as a gain adjusting signal to a deflection signal amplifier 4, while an output from the amplifier 20 is supplied to a deflection coil 21.
JP55136161A 1980-09-30 1980-09-30 Exposure be electron beam Granted JPS5760205A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55136161A JPS5760205A (en) 1980-09-30 1980-09-30 Exposure be electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55136161A JPS5760205A (en) 1980-09-30 1980-09-30 Exposure be electron beam

Publications (2)

Publication Number Publication Date
JPS5760205A true JPS5760205A (en) 1982-04-12
JPS6341401B2 JPS6341401B2 (en) 1988-08-17

Family

ID=15168738

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55136161A Granted JPS5760205A (en) 1980-09-30 1980-09-30 Exposure be electron beam

Country Status (1)

Country Link
JP (1) JPS5760205A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6079722A (en) * 1983-10-06 1985-05-07 Jeol Ltd Electron beam exposing method
JPS6134936A (en) * 1984-07-26 1986-02-19 Hitachi Ltd Specimen surface height correcting process of electron beam image drawing device
JPS61129825A (en) * 1984-11-29 1986-06-17 Toshiba Mach Co Ltd Electron beam exposure equipment
JPS61290414A (en) * 1985-06-19 1986-12-20 Hitachi Ltd Focusing device
JPS62140420A (en) * 1985-12-16 1987-06-24 Canon Inc Position detector of surface
JPS62140419A (en) * 1985-12-16 1987-06-24 Canon Inc Position detector of surface
JPS63238509A (en) * 1987-03-27 1988-10-04 Miyano:Kk Length measuring instrument with laser
JPH01217207A (en) * 1988-02-25 1989-08-30 Jeol Ltd Non-contact optical displacement measuring apparatus
US5162642A (en) * 1985-11-18 1992-11-10 Canon Kabushiki Kaisha Device for detecting the position of a surface
JP2008029198A (en) * 2007-09-14 2008-02-07 Sanyo Electric Co Ltd Inverter circuit arrangement equipped with temperature detection circuit

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6079722A (en) * 1983-10-06 1985-05-07 Jeol Ltd Electron beam exposing method
JPH056340B2 (en) * 1983-10-06 1993-01-26 Nippon Electron Optics Lab
JPS6134936A (en) * 1984-07-26 1986-02-19 Hitachi Ltd Specimen surface height correcting process of electron beam image drawing device
JPS61129825A (en) * 1984-11-29 1986-06-17 Toshiba Mach Co Ltd Electron beam exposure equipment
JPS61290414A (en) * 1985-06-19 1986-12-20 Hitachi Ltd Focusing device
US5162642A (en) * 1985-11-18 1992-11-10 Canon Kabushiki Kaisha Device for detecting the position of a surface
JPS62140420A (en) * 1985-12-16 1987-06-24 Canon Inc Position detector of surface
JPS62140419A (en) * 1985-12-16 1987-06-24 Canon Inc Position detector of surface
JPH0217929B2 (en) * 1985-12-16 1990-04-24 Canon Kk
JPS63238509A (en) * 1987-03-27 1988-10-04 Miyano:Kk Length measuring instrument with laser
JPH01217207A (en) * 1988-02-25 1989-08-30 Jeol Ltd Non-contact optical displacement measuring apparatus
JP2008029198A (en) * 2007-09-14 2008-02-07 Sanyo Electric Co Ltd Inverter circuit arrangement equipped with temperature detection circuit

Also Published As

Publication number Publication date
JPS6341401B2 (en) 1988-08-17

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