JPH0563010B2 - - Google Patents
Info
- Publication number
- JPH0563010B2 JPH0563010B2 JP61278328A JP27832886A JPH0563010B2 JP H0563010 B2 JPH0563010 B2 JP H0563010B2 JP 61278328 A JP61278328 A JP 61278328A JP 27832886 A JP27832886 A JP 27832886A JP H0563010 B2 JPH0563010 B2 JP H0563010B2
- Authority
- JP
- Japan
- Prior art keywords
- film thickness
- resist
- wafer
- reflectance
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27832886A JPS63131517A (ja) | 1986-11-20 | 1986-11-20 | レジスト塗布膜厚制御装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27832886A JPS63131517A (ja) | 1986-11-20 | 1986-11-20 | レジスト塗布膜厚制御装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6206922A Division JP2613183B2 (ja) | 1994-08-31 | 1994-08-31 | レジスト膜形成装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63131517A JPS63131517A (ja) | 1988-06-03 |
| JPH0563010B2 true JPH0563010B2 (cg-RX-API-DMAC7.html) | 1993-09-09 |
Family
ID=17595796
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27832886A Granted JPS63131517A (ja) | 1986-11-20 | 1986-11-20 | レジスト塗布膜厚制御装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63131517A (cg-RX-API-DMAC7.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0239520A (ja) * | 1988-07-29 | 1990-02-08 | Tokyo Electron Ltd | レジスト膜厚の測定方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60257136A (ja) * | 1984-06-01 | 1985-12-18 | Hitachi Ltd | フオトレジストの膜厚測定装置 |
| JPS62235734A (ja) * | 1986-04-04 | 1987-10-15 | Nec Corp | 半導体装置の製造方法 |
-
1986
- 1986-11-20 JP JP27832886A patent/JPS63131517A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63131517A (ja) | 1988-06-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| LAPS | Cancellation because of no payment of annual fees |