JPH056177B2 - - Google Patents

Info

Publication number
JPH056177B2
JPH056177B2 JP58210934A JP21093483A JPH056177B2 JP H056177 B2 JPH056177 B2 JP H056177B2 JP 58210934 A JP58210934 A JP 58210934A JP 21093483 A JP21093483 A JP 21093483A JP H056177 B2 JPH056177 B2 JP H056177B2
Authority
JP
Japan
Prior art keywords
pattern
defect
memory
virtual
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58210934A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60103616A (ja
Inventor
Giichi Hori
Yoji Yabuhara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Renesas Eastern Japan Semiconductor Inc
Original Assignee
Hitachi Tokyo Electronics Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Tokyo Electronics Co Ltd, Hitachi Ltd filed Critical Hitachi Tokyo Electronics Co Ltd
Priority to JP58210934A priority Critical patent/JPS60103616A/ja
Publication of JPS60103616A publication Critical patent/JPS60103616A/ja
Publication of JPH056177B2 publication Critical patent/JPH056177B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58210934A 1983-11-11 1983-11-11 欠陥検査方法および装置 Granted JPS60103616A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58210934A JPS60103616A (ja) 1983-11-11 1983-11-11 欠陥検査方法および装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58210934A JPS60103616A (ja) 1983-11-11 1983-11-11 欠陥検査方法および装置

Publications (2)

Publication Number Publication Date
JPS60103616A JPS60103616A (ja) 1985-06-07
JPH056177B2 true JPH056177B2 (enrdf_load_stackoverflow) 1993-01-26

Family

ID=16597501

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58210934A Granted JPS60103616A (ja) 1983-11-11 1983-11-11 欠陥検査方法および装置

Country Status (1)

Country Link
JP (1) JPS60103616A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60126829A (ja) * 1983-12-14 1985-07-06 Nippon Jido Seigyo Kk パタ−ンの欠陥検査装置に用いる走査速度の自動制御方法
JP2002148031A (ja) * 2000-10-20 2002-05-22 Applied Materials Inc パターン検査方法及び装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5341030A (en) * 1976-09-25 1978-04-14 Nippon Suidou Setsukeishiya Kk Pipe path equipment for place with large head from upper flow to lower flow
JPS5472975A (en) * 1977-11-24 1979-06-11 Hitachi Ltd Mask inspecting method
JPS55105329A (en) * 1978-12-28 1980-08-12 Fujitsu Ltd Inspecting method for pattern

Also Published As

Publication number Publication date
JPS60103616A (ja) 1985-06-07

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